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1. 发明申请

US20050141825A1 Optical transmitter module 有权
标题翻译：光发射模块
公开(公告)号：US20050141825A1
公开(公告)日：2005-06-30
申请号：US10838258
申请日：2004-05-05
申请人： Shin-Ge Lee , Chun-Hsing Lee , Chih-Li Chen , Chiung-Hung Wang , Shun-Tien Lee
发明人： Shin-Ge Lee , Chun-Hsing Lee , Chih-Li Chen , Chiung-Hung Wang , Shun-Tien Lee
IPC分类号： G02B6/12 , H04B10/04 , H04B10/06
CPC分类号： H01L31/02005 , H01L31/0203 , H01L31/022408
摘要： An optical transmitter module includes light-emitting devices with coaxial type packaging. Coplanar anode and cathode electrodes of one light-emitting device are mounted on a substrate so that heat generated from the light-emitting device can be effectively dissipated through the substrate. Furthermore, the direct electric connection between the light-emitting device and the substrate eliminates the requirement of wire boding for electric connection, increasing the performance of the optical transmitter module in high speed signal operation.
摘要翻译：光发射机模块包括具有同轴型包装的发光装置。将一个发光装置的共面阳极和阴极电极安装在基板上，使得可以通过基板有效地散发由发光装置产生的热量。此外，发光装置与基板之间的直接电连接消除了用于电连接的导线的要求，从而在高速信号操作中增加了光发射模块的性能。

2. 发明授权

US07139449B2 Optical transmitter module 有权
标题翻译：光发射模块
公开(公告)号：US07139449B2
公开(公告)日：2006-11-21
申请号：US10838258
申请日：2004-05-05
申请人： Shin-Ge Lee , Chun-Hsing Lee , Chih-Li Chen , Chiung-Hung Wang , Shun-Tien Lee
发明人： Shin-Ge Lee , Chun-Hsing Lee , Chih-Li Chen , Chiung-Hung Wang , Shun-Tien Lee
IPC分类号： G02B6/12 , G02B6/36 , H04B10/00
CPC分类号： H01L31/02005 , H01L31/0203 , H01L31/022408
摘要： An optical transmitter module includes light-emitting devices with coaxial type packaging. Coplanar anode and cathode electrodes of one light-emitting device are mounted on a substrate so that heat generated from the light-emitting device can be effectively dissipated through the substrate. Furthermore, the direct electric connection between the light-emitting device and the substrate eliminates the requirement of wire boding for electric connection, increasing the performance of the optical transmitter module in high speed signal operation.
摘要翻译：光发射机模块包括具有同轴型包装的发光装置。将一个发光装置的共面阳极和阴极电极安装在基板上，使得可以通过基板有效地散发由发光装置产生的热量。此外，发光装置与基板之间的直接电连接消除了用于电连接的导线的要求，从而在高速信号操作中增加了光发射模块的性能。

3. 发明申请

US20050121736A1 Receiver optical subassembly 审中-公开
标题翻译：接收器光学组件
公开(公告)号：US20050121736A1
公开(公告)日：2005-06-09
申请号：US10854243
申请日：2004-05-27
申请人： Chiung-Hun Wang , Chun-Hsing Lee , Yi-Ming Chen , Shin-Ge Lee , Chih-Li Chen , Ming-Fa Huang , Chih-Hao Hsu
发明人： Chiung-Hun Wang , Chun-Hsing Lee , Yi-Ming Chen , Shin-Ge Lee , Chih-Li Chen , Ming-Fa Huang , Chih-Hao Hsu
IPC分类号： H01L29/267 , H01L33/00
CPC分类号： H01L31/0203 , G02B6/4206 , G02B6/423 , H01L31/02327
摘要： A receiver optical subassembly for transforming received optical signal into electrical signal includes at least a ceramic substrate, a photo receiver and a transimpedance amplifier. There are high-speed traces formed on the substrate. The positive and negative pads of the photo receiver are coplanar and connected to the traces without wire bonding so as to reduce the parasitic impedance effect and improve the high-speed performance of the optical subassembly. The transimpedance amplifier is electrically connected to the traces via flip chip, wire bonding or other methods. The photo receiver and the transimpedance amplifier are connected via the high-speed traces formed on the substrate.
摘要翻译：用于将接收的光信号变换为电信号的接收器光学子组件至少包括陶瓷衬底，光接收器和跨阻放大器。在基板上形成高速迹线。光接收器的正极和负极焊盘共面并且连接到迹线而不引线接合，从而减小寄生阻抗效应并提高光学组件的高速性能。跨阻放大器通过倒装芯片，引线接合或其他方法电连接到迹线。光接收器和跨阻放大器经由形成在基板上的高速迹线连接。

4. 发明授权

US08270069B2 UV light generator 有权
标题翻译：紫外光发生器
公开(公告)号：US08270069B2
公开(公告)日：2012-09-18
申请号：US12841941
申请日：2010-07-22
申请人： Hsin-Chia Su , Chien-Ming Huang , Yao-Wun Jhang , Chih-Li Chen
发明人： Hsin-Chia Su , Chien-Ming Huang , Yao-Wun Jhang , Chih-Li Chen
IPC分类号： G02F1/37 , G02F1/355
CPC分类号： G02F1/37 , G02F2201/16 , G02F2201/17
摘要： A UV light generator for receiving a baseband light beam from a baseband light source is provided. The UV light generator includes a first lens unit, a second lens unit, a first frequency doubling crystal and a second frequency doubling crystal. The baseband light beam from the baseband light source passes through the first lens unit. The first lens unit and the second lens unit control a minimum of baseband light spot position and a minimum of second harmonic light spot position. The first frequency doubling crystal is disposed between the first lens unit and the second lens unit, and located on the minimum of baseband light spot position. The second frequency doubling crystal is disposed between the first lens unit and the second lens unit, and located on the minimum of second harmonic light spot position.
摘要翻译：提供了用于从基带光源接收基带光束的UV光发生器。 UV光发生器包括第一透镜单元，第二透镜单元，第一倍频晶体和第二倍频晶体。来自基带光源的基带光束通过第一透镜单元。第一透镜单元和第二透镜单元控制最小的基带光点位置和最小二次谐波光点位置。第一倍频晶体设置在第一透镜单元和第二透镜单元之间，并且位于基带光点位置的最小值上。第二倍频晶体设置在第一透镜单元和第二透镜单元之间，并且位于第二谐波光点位置的最小值上。

5. 发明申请

US20080213676A1 PHASE SHIFT MASK FOR AVOIDING PHASE CONFLICT 审中-公开
标题翻译：用于避免相冲突的相移片
公开(公告)号：US20080213676A1
公开(公告)日：2008-09-04
申请号：US11854510
申请日：2007-09-12
申请人： Chih-Li Chen , Tsan Lu
发明人： Chih-Li Chen , Tsan Lu
IPC分类号： G03F1/00
CPC分类号： G03F1/30
摘要： A phase shift mask comprises a glass substrate with a surface and a metal layer. The glass substrate comprises a first phase section, a second phase section and a border section. The metal layer is covered on the glass substrate and defining a pattern comprising a plurality of parallel lines, the first phase section and the second phase section. The terminal of at least one of the lines is not rectangular and a distance between the tips of the lines in the first phase section are defined to be not less than the width of the first phase section.
摘要翻译：相移掩模包括具有表面和金属层的玻璃基板。玻璃基板包括第一相部分，第二相部分和边界部分。金属层被覆盖在玻璃基板上并且限定包括多条平行线，第一相段和第二相段的图案。至少一条线的端子不是矩形的，并且第一相部分中的线的尖端之间的距离被限定为不小于第一相部分的宽度。

6. 发明申请

US20060243997A1 High power LEDs 有权
标题翻译：大功率LED
公开(公告)号：US20060243997A1
公开(公告)日：2006-11-02
申请号：US11415150
申请日：2006-05-02
申请人： Chun Yang , Hong-Xi Cao , Chia-Tai Kuo , Chih-Li Chen , Cheng-Fa Chen , Ji-Bin Horng
发明人： Chun Yang , Hong-Xi Cao , Chia-Tai Kuo , Chih-Li Chen , Cheng-Fa Chen , Ji-Bin Horng
IPC分类号： H01L33/00
CPC分类号： H01L33/641 , H01L33/483 , H01L33/60 , H01L33/647 , H01L2224/45144 , H01L2224/48091 , H01L2924/12041 , H01L2924/00014 , H01L2924/00
摘要： A high power LED has at least a porous material layer, a thermal conductive layer and a chip. The thermal conductive layer is disposed on the surface of the porous material layer and the chip is disposed on the thermal conductive layer. Heat generated by the chip is conducted from the thermal conductive layer to the porous material layer, and convected outside via the porous material layer. Thereby, surface area in contact with the air is increased and high thermal conductivity and high heat convection are also achieved.
摘要翻译：大功率LED至少具有多孔材料层，导热层和芯片。导热层设置在多孔材料层的表面上，芯片设置在导热层上。由芯片产生的热量从导热层传导到多孔材料层，并通过多孔材料层在外面对流。因此，与空气接触的表面积增加，并且也实现了高导热性和高热对流性。

7. 发明申请

US20090170079A1 Regulation of RUNX1 for Treatment of Pain 有权
标题翻译： RUNX1治疗疼痛的调节
公开(公告)号：US20090170079A1
公开(公告)日：2009-07-02
申请号：US11884800
申请日：2006-03-03
申请人： Qiufu Ma , Chih-Li Chen , Clifford J. Woolf , Daniel C. Broom
发明人： Qiufu Ma , Chih-Li Chen , Clifford J. Woolf , Daniel C. Broom
IPC分类号： C12Q1/68
CPC分类号： G01N33/5023 , G01N33/5308 , G01N33/6872 , G01N33/6875 , G01N2800/2842
摘要： Methods are provides for identifying candidate agents for use in inhibiting expression of certain receptors and ion channels in nociceptors. Also provided are methods for identifying candidates agents for use in inhibiting neurophathic and other types of pain.
摘要翻译：方法提供用于鉴定用于抑制伤害感受器中某些受体和离子通道表达的候选试剂。还提供了用于鉴定用于抑制神经性和其它类型的疼痛的候选药物的方法。

8. 发明授权

US08268572B2 Methods to identify inhibitors of Runx1-mediated expression of nociceptive receptors and ion channels 有权
标题翻译：识别Runx1介导的伤害感受器和离子通道表达抑制剂的方法
公开(公告)号：US08268572B2
公开(公告)日：2012-09-18
申请号：US11884800
申请日：2006-03-03
申请人： Qiufu Ma , Chih-Li Chen , Clifford J. Woolf , Daniel C. Broom
发明人： Qiufu Ma , Chih-Li Chen , Clifford J. Woolf , Daniel C. Broom
IPC分类号： C12Q1/68 , G01N33/53 , G01N33/567
CPC分类号： G01N33/5023 , G01N33/5308 , G01N33/6872 , G01N33/6875 , G01N2800/2842
摘要： Methods are provided for identifying candidate agents for use in inhibiting expression of certain receptors and ion channels in nociceptors. Also provided are methods for identifying candidates agents for use in inhibiting neurophathic and other types of pain.
摘要翻译：提供了用于鉴定用于抑制伤害感受器中某些受体和离子通道表达的候选试剂的方法。还提供了用于鉴定用于抑制神经性和其它类型的疼痛的候选药物的方法。

9. 发明申请

US20080274414A1 HIGH-TRANSMISSION ATTENUATING PSM 有权
标题翻译：高传动衰减PSM
公开(公告)号：US20080274414A1
公开(公告)日：2008-11-06
申请号：US11777280
申请日：2007-07-12
申请人： Chih-Li Chen
发明人： Chih-Li Chen
IPC分类号： G03C5/00
CPC分类号： G03F1/32 , G03F1/36 , G03F7/70433
摘要： An attenuating PSM includes a quartz substrate, a first dummy pad pattern disposed on the quartz substrate, wherein the first dummy pad pattern is composed of a first phase shifter material layer with a transmission rate of greater than or equal to 15%, and a first opaque pattern disposed at a center area of the first dummy pad pattern. The first opaque pattern has a shape that is analogous to the first dummy pad pattern and surface area of the first opaque pattern is smaller than that of the first dummy pad pattern.
摘要翻译：衰减PSM包括石英衬底，设置在石英衬底上的第一虚拟衬垫图案，其中第一虚拟衬垫图案由透射率大于或等于15％的第一移相器材料层组成，不透明图案设置在第一虚拟焊盘图案的中心区域。第一不透明图案具有类似于第一虚拟衬垫图案的形状，并且第一不透明图案的表面积小于第一虚拟衬垫图案的表面积。

10. 发明申请

US20070178410A1 Method of forming three-dimensional lithographic pattern 审中-公开
标题翻译：形成三维光刻图案的方法
公开(公告)号：US20070178410A1
公开(公告)日：2007-08-02
申请号：US11453764
申请日：2006-06-14
申请人： Chiang-Lin Shih , Chih-Li Chen
发明人： Chiang-Lin Shih , Chih-Li Chen
IPC分类号： G03F7/20
CPC分类号： G03F7/2002 , G03F1/50 , H01L21/0274 , H01L21/76807
摘要： A method of forming a three-dimensional lithographic pattern is provided. The method includes providing a substrate. A first photoresist layer is formed on the substrate. The first photoresist layer corresponds to a first exposure removal dose. A second photoresist layer is formed on the first photoresist layer. The second photoresist layer corresponds to a second exposure removal dose, which is different from the first exposure removal dose. A reticle with multiple regions of different light transmittances is provided. Through the reticle, the first and second photoresist layers are exposed to form a first removable region in the first photoresist layer and a second removable region in the second photoresist layer. The second removable region is different from the first removable region. The first and second photoresist layers are then developed to remove the first and second removable regions.
摘要翻译：提供了形成三维光刻图案的方法。该方法包括提供基板。在基板上形成第一光致抗蚀剂层。第一光致抗蚀剂层对应于第一曝光去除剂量。在第一光致抗蚀剂层上形成第二光致抗蚀剂层。第二光致抗蚀剂层对应于与第一曝光去除剂量不同的第二曝光去除剂量。提供具有不同透光率的多个区域的掩模版。通过掩模版，第一和第二光致抗蚀剂层被暴露以在第一光致抗蚀剂层中形成第一可移除区域，并在第二光致抗蚀剂层中形成第二可除去区域。第二可移除区域与第一可移除区域不同。然后显影第一和第二光致抗蚀剂层以除去第一和第二可除去区域。

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