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1. 发明授权

US09026921B2 Intelligent workspace 有权
标题翻译：智能工作区
公开(公告)号：US09026921B2
公开(公告)日：2015-05-05
申请号：US12885562
申请日：2010-09-19
申请人： Shiheng Shi , Qi Li , Weiliang Le , Wei Xue , Yulei Zhang , Yuanfei Cai
发明人： Shiheng Shi , Qi Li , Weiliang Le , Wei Xue , Yulei Zhang , Yuanfei Cai
IPC分类号： G06F3/00 , G06Q10/10 , H04L29/06
CPC分类号： G06Q10/103 , H04L65/403
摘要： Described herein is a technology for collaboration. In accordance with some implementations, the workspace tool is adapted to cooperate with an electronic communication system. Electronic communications related to the workspace tool are stored in a repository and are associated with respective workspaces. The workspace tool allows participants of a workspace to access all information related to the workspace.
摘要翻译：这里描述的是一种协作技术。根据一些实施方式，工作空间工具适于与电子通信系统协作。与工作空间工具相关的电子通信存储在存储库中，并与相应的工作空间相关联。工作空间工具允许工作区的参与者访问与工作空间相关的所有信息。

2. 发明申请

US20120023464A1 AUTOMATIC IDENTIFICATION OF SYSTEMATIC REPEATING DEFECTS IN SEMICONDUCTOR PRODUCTION 有权
标题翻译：自动识别半导体生产中的系统重复缺陷
公开(公告)号：US20120023464A1
公开(公告)日：2012-01-26
申请号：US13007556
申请日：2011-01-14
申请人： Paul Kuang Chi Lin , Dong Kang , Yong Gang Wang , Yulei Zhang
发明人： Paul Kuang Chi Lin , Dong Kang , Yong Gang Wang , Yulei Zhang
IPC分类号： G06F17/50
CPC分类号： G03F1/84 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N2021/8877
摘要： A method includes capturing an image of the pattern using one or more scans across a surface of the partially completed wafer. The method includes processing information associated with the captured image of the pattern in a first format (e.g., pixel domain) into a second format, e.g., transform domain. The method includes determining defect information associated with the image of the pattern in the second format and processing the defect information (e.g., wafer identification, product identification, layer information, x-y die scanned) to identify at least one defect associated with a spatial location of a repeating pattern on the partially completed wafer provided by a reticle. The method includes identifying the reticle associated with the defect and a stepper associated with the reticle having the defect and ceasing operation of the stepper. The damaged reticle is replaced, and the process resumes using a replaced reticle.
摘要翻译：一种方法包括使用在部分完成的晶片的表面上的一次或多次扫描来捕获图案的图像。该方法包括以与第一格式（例如，像素域）中的图案的捕获图像相关联的信息处理成第二格式，例如变换域。该方法包括确定与第二格式的图案的图像相关联的缺陷信息，并处理缺陷信息（例如，晶片识别，产品识别，层信息，xy模扫描），以识别与空间位置相关联的至少一个缺陷在由光罩提供的部分完成的晶片上的重复图案。所述方法包括识别与所述缺陷相关联的掩模版和与所述掩模版相关联的具有所述缺陷并且所述步进器停止操作的步进器。损坏的标线被更换，并且使用更换的掩模版恢复工艺。

3. 发明申请

US20130174191A1 SYSTEMS AND METHODS FOR INCENTIVIZING USER INTERACTION WITH PROMOTIONAL CONTENT ON A SECONDARY DEVICE 审中-公开
标题翻译：用于激励用户与辅助设备上的促销内容交互的系统和方法
公开(公告)号：US20130174191A1
公开(公告)日：2013-07-04
申请号：US13339914
申请日：2011-12-29
申请人： Robert Barr Thompson, JR. , Yulei Zhang
发明人： Robert Barr Thompson, JR. , Yulei Zhang
IPC分类号： H04N7/16 , G06F3/02 , G09G5/00
CPC分类号： H04N21/4784 , G06Q30/0207 , G06Q30/0241 , H04N21/4126 , H04N21/4307 , H04N21/4725 , H04N21/47815 , H04N21/812
摘要： Systems and methods for incentivizing user interaction with promotional content on a secondary device are provided. The secondary device may be synchronized with the media content displayed on a primary device to provide promotional opportunities relevant to the displayed content. A promotional opportunity may allow a user to identify an object (which may be a product placement) embedded within the primary media content. For instance, the user may be prompted to select the object using a display screen on the secondary device. Alternatively, the user may use the secondary device to capture a photograph of the embedded object as displayed on the primary device. The user may then be rewarded for correctly identifying or photographing the embedded object.
摘要翻译：提供了用于激励用户与辅助设备上的促销内容交互的系统和方法。辅助设备可以与显示在主设备上的媒体内容同步，以提供与所显示的内容相关的促销机会。促销机会可以允许用户识别嵌入主要媒体内容内的对象（可能是产品展示位置）。例如，可以提示用户使用辅助设备上的显示屏来选择对象。或者，用户可以使用辅助设备来捕获显示在主设备上的嵌入对象的照片。然后可以奖励用户正确识别或拍摄嵌入的对象。

4. 发明授权

US08312395B2 Automatic identification of systematic repeating defects in semiconductor production 有权
标题翻译：自动识别半导体生产中的系统重复缺陷
公开(公告)号：US08312395B2
公开(公告)日：2012-11-13
申请号：US13007556
申请日：2011-01-14
申请人： Paul Kuang Chi Lin , Dong Kang , Yong Gang Wang , Yulei Zhang
发明人： Paul Kuang Chi Lin , Dong Kang , Yong Gang Wang , Yulei Zhang
IPC分类号： G06F17/50
CPC分类号： G03F1/84 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N2021/8877
摘要： A method includes capturing an image of the pattern using one or more scans across a surface of the partially completed wafer. The method includes processing information associated with the captured image of the pattern in a first format (e.g., pixel domain) into a second format, e.g., transform domain. The method includes determining defect information associated with the image of the pattern in the second format and processing the defect information (e.g., wafer identification, product identification, layer information, x-y die scanned) to identify at least one defect associated with a spatial location of a repeating pattern on the partially completed wafer provided by a reticle. The method includes identifying the reticle associated with the defect and a stepper associated with the reticle having the defect and ceasing operation of the stepper. The damaged reticle is replaced, and the process resumes using a replaced reticle.
摘要翻译：一种方法包括使用在部分完成的晶片的表面上的一次或多次扫描来捕获图案的图像。该方法包括以与第一格式（例如，像素域）中的图案的捕获图像相关联的信息处理成第二格式，例如变换域。该方法包括确定与第二格式的图案的图像相关联的缺陷信息，并处理缺陷信息（例如，晶片识别，产品识别，层信息，xy模扫描），以识别与空间位置相关联的至少一个缺陷在由光罩提供的部分完成的晶片上的重复图案。所述方法包括识别与所述缺陷相关联的掩模版和与所述掩模版相关联的具有所述缺陷并且所述步进器停止操作的步进器。损坏的标线被更换，并且使用更换的掩模版恢复工艺。

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