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    • 2. 发明授权
    • Process for preparing aromatic bisphosphates
    • 制备芳族二磷酸盐的方法
    • US5880308A
    • 1999-03-09
    • US761376
    • 1996-12-09
    • Shigeru KawataKiyoharu HiraoKazuo Noguchi
    • Shigeru KawataKiyoharu HiraoKazuo Noguchi
    • B01J27/06C07B61/00C07F9/09C07F9/12C08K5/52C08K5/523C09K21/12
    • C07F9/12
    • A process for preparing aromatic bisphosphates includes: a first step of reacting an aromatic monohydroxy compound having a steric hindrance group at the ortho position, with a phosphorus oxyhalide in the presence of a Lewis acid catalyst (a) to yield a reaction mixture containing diarylphosphorohalidate, and a second step of reacting the reaction mixture of the first step with an aromatic dihydroxy compound in the presence of a Lewis acid catalyst (b) to obtain an aromatic bisphosphate, wherein the aromatic monohydroxy compound and the phosphorus oxyhalide are reacted in a molar ratio of 2.0:1.0-1.1 in the first step, and the reaction mixture of the first step is subjected to a distillation treatment before the reaction of the second step, thereby obtaining the aromatic bisphosphate of high purity.
    • 一种制备芳族二磷酸盐的方法包括:在路易斯酸催化剂(a)存在下,使在邻位具有位阻基团的芳族单羟基化合物与磷酰卤反应的第一步骤,得到含有二芳基次氯酸盐的反应混合物, 和在路易斯酸催化剂(b)的存在下使第一步反应混合物与芳族二羟基化合物反应得到芳族二磷酸酯的第二步骤,其中芳族单羟基化合物和磷酰卤以摩尔比 为2.0:1.0-1.1,第一步骤的反应混合物在第二步反应之前进行蒸馏处理,从而得到高纯度的芳族二磷酸盐。
    • 4. 发明授权
    • Cooling apparatus and substrate treating apparatus
    • 冷却装置和基板处理装置
    • US08189169B2
    • 2012-05-29
    • US12156896
    • 2008-06-05
    • Futoshi ShimaiShigeru Kawata
    • Futoshi ShimaiShigeru Kawata
    • G03B27/42
    • H01L21/67109
    • The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 3 comprises a flat-box-shaped body 10, a cooling medium supply tube 11 which is inserted into the body 10, a nozzle 12 which is attached to the cooling medium supply tube 11 so as to eject the cooling medium toward the internal surface of the body, a pipe 13 for withdrawing water (refrigerant) ejected from the nozzle 12 toward the body 10, a chiller 14 for cooling the water from the pipe 13 to a predetermined temperature, and a circulating pipe 15 for sending the water which has been cooled by the chiller 14 back to the cooling medium supply tube 11.
    • 本发明的目的是提供一种能够在短时间内均匀地冷却基板,即使基板面积大的冷却装置。 冷却装置3包括平盒体10,插入主体10的冷却介质供给管11,安装在冷却介质供给管11上的喷嘴12,以将冷却介质朝向 主体的内表面,用于将从喷嘴12排出的水(制冷剂)向主体10排出的管道13,用于将水从管道13冷却到预定温度的冷却器14,以及用于将水 其被冷却器14冷却回冷却介质供应管11。
    • 5. 发明申请
    • Cooling apparatus and substrate treating apparatus
    • 冷却装置和基板处理装置
    • US20080304027A1
    • 2008-12-11
    • US12156896
    • 2008-06-05
    • Futoshi ShimaiShigeru Kawata
    • Futoshi ShimaiShigeru Kawata
    • G03B27/52
    • H01L21/67109
    • The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 3 comprises a flat-box-shaped body 10, a cooling medium supply tube 11 which is inserted into the body 10, a nozzle 12 which is attached to the cooling medium supply tube 11 so as to eject the cooling medium toward the internal surface of the body, a pipe 13 for withdrawing water (refrigerant) ejected from the nozzle 12 toward the body 10, a chiller 14 for cooling the water from the pipe 13 to a predetermined temperature, and a circulating pipe 15 for sending the water which has been cooled by the chiller 14 back to the cooling medium supply tube 11.
    • 本发明的目的是提供一种能够在短时间内均匀地冷却基板,即使基板面积大的冷却装置。 冷却装置3包括平盒体10,插入主体10的冷却介质供给管11,安装在冷却介质供给管11上的喷嘴12,以将冷却介质朝向 主体的内表面,用于将从喷嘴12排出的水(制冷剂)向主体10排出的管道13,用于将水从管道13冷却到预定温度的冷却器14,以及用于将水 其被冷却器14冷却回冷却介质供应管11。
    • 6. 发明申请
    • Substrate processing apparatus
    • 基板加工装置
    • US20070240642A1
    • 2007-10-18
    • US11786202
    • 2007-04-11
    • Futoshi ShimaiShigeru Kawata
    • Futoshi ShimaiShigeru Kawata
    • B05B7/06B05B1/28B05C13/02B05C13/00
    • H01L21/67051H01L21/67034
    • A multi-stage substrate processing apparatus in which each processing stage is carried out on a substrate while conveying said substrate includes a processing liquid supply device and a drying device arranged successively along a conveying direction of the substrate. The drying device comprises an air knife for drying a processing liquid on the substrate. A plurality of nozzles for supplying the processing liquid onto the substrate are provided in the processing liquid supply device. At least the nozzle in the final stage among the plurality of nozzles is pointed in an opposite direction to the conveying direction of the substrate. This apparatus shortens tact time of the processed substrate.
    • 一种多层基板处理装置,其中在输送所述基板的同时在基板上进行各处理台包括沿基板的输送方向依次配置的处理液供给装置和干燥装置。 干燥装置包括用于干燥基板上的处理液体的气刀。 在处理液供给装置中设置有用于将处理液供给到基板上的多个喷嘴。 至少在多个喷嘴中的最后阶段的喷嘴相对于基板的传送方向指向相反的方向。 该装置缩短处理后的基板的节拍时间。