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1. 发明申请

US20060160359A1 Vacuum processing apparatus 审中-公开
标题翻译：真空加工设备
公开(公告)号：US20060160359A1
公开(公告)日：2006-07-20
申请号：US10546803
申请日：2004-02-12
申请人： Shigeru Kasai , Susumu Katoh , Tomohito Komatsu , Tetsuya Saito , Sumi Tanaka
发明人： Shigeru Kasai , Susumu Katoh , Tomohito Komatsu , Tetsuya Saito , Sumi Tanaka
IPC分类号： H01L21/44 , C23C16/00
CPC分类号： C23C16/45521 , C23C16/455
摘要： A vacuum processing apparatus is constituted of the following portions: a processing container with the bottom, capable of drawing vacuum; a placement platform installed in the container; a heating portion for heating a substrate on the platform; a processing gas-feeding portion for feeding a processing gas into the container; a partitioning portion surrounding a space between the platform and the bottom of the container and partitioning off the space from a processing space in the container; a purge gas-feeding portion for feeding a purge gas into the space surrounded by the partitioning portion; a purge gas-discharging portion for discharging the purge gas from the space surrounded by the partitioning portion; a control portion for controlling the purge gas-feeding portion and/or the purge gas-discharging portion so as to regulate the pressure in the space surrounded by the partitioning portion; and a temperature-detecting portion penetrating the bottom of the container, inserted in the space surrounded by the partitioning portion, and having the top end in contact with the platform. The partitioning portion has the lower end in surface-contact with the bottom of the container. The control portion regulates the pressure in the space surrounded by the partitioning portion to a pressure higher than that in the processing space in the container.
摘要翻译：真空处理装置由以下部分构成：具有底部的能够抽真空的处理容器; 安装在容器中的放置平台; 用于加热所述平台上的基板的加热部分; 处理气体供给部，用于将处理气体供给到所述容器中; 围绕所述平台和所述容器的底部之间的空间并将所述空间与所述容器中的处理空间分隔开的分隔部分; 净化气体供给部分，用于将净化气体供给到由分隔部分包围的空间中; 净化气体排出部，用于从由分隔部包围的空间排出净化气体; 用于控制净化气体供给部分和/或净化气体排出部分以便调节由分隔部分包围的空间中的压力的控制部分; 以及穿过容器底部的温度检测部分，插入由分隔部分包围的空间中，并且顶端与平台接触。分隔部分的下端与容器的底部表面接触。控制部将由分隔部包围的空间内的压力调整为高于容器内的处理空间的压力。

2. 发明申请

US20070163713A1 Gas supply system and processing system 审中-公开
标题翻译：供气系统及处理系统
公开(公告)号：US20070163713A1
公开(公告)日：2007-07-19
申请号：US10525207
申请日：2003-08-25
申请人： Shigeru Kasai , Sumi Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sumi Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23F1/00
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.
摘要翻译：提供了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的原料气体提供到处理设备中。一种处理系统，包括：处理装置，包括用于将特定材料气体注入处理容器26中的气体注入装置42，以便对被处理物体W进行特定处理，所述原料气体由金属化合物材料 M蒸汽压低; 以及用于向所述气体注入装置供应所述特定材料气体的气体供应系统24，所述气体注入装置是淋浴喷头部分，所述气体供应系统提供：从所述喷头部分向上延伸的气体通道56; 附着在所述气体通道的上端部分的材料储存罐58，用于在其中容纳所述金属化合物材料; 以及用于打开/关闭所述气体通道的打开/关闭阀60。

3. 发明授权

US07854962B2 Gas supply method using a gas supply system 失效
标题翻译：供气方式采用供气系统
公开(公告)号：US07854962B2
公开(公告)日：2010-12-21
申请号：US12320197
申请日：2009-01-21
申请人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23C16/448
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： Disclosed herein is a processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss. The processing system has a processing apparatus including a gas injection injector for injecting a specific material gas into a processing vessel in order to provide specific processing to an object to be processed W, the material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system for supplying the specific material gas to the gas injector, the gas injector is a shower head portion and the gas supply system provides: a gas passage extending upwardly from the showerhead portion; a material reservoir tank attached to the upper-end portion of the gas passage for containing the metallic compound material therein; and an open/close valve for opening/closing the gas passage.
摘要翻译：这里公开了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的材料气体提供到处理装置中。处理系统具有处理装置，该处理装置包括用于将特定材料气体注入到处理容器中的气体注入喷射器，以便对被加工物W进行特定处理，所述原料气体由低蒸气的金属化合物M 压力; 以及用于将特定材料气体供给到气体喷射器的气体供给系统，气体喷射器是淋浴头部分，气体供应系统提供：从喷头部分向上延伸的气体通道; 附着在气体通道的上端部分的材料储存罐，用于在其中容纳金属化合物材料; 以及用于打开/关闭气体通道的打开/关闭阀。

4. 发明申请

US20090133755A1 Gas supply system and proessing system 失效
标题翻译：供气系统和进气系统
公开(公告)号：US20090133755A1
公开(公告)日：2009-05-28
申请号：US12320197
申请日：2009-01-21
申请人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23C16/448 , G05D7/06
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided.In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.
摘要翻译：提供了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的原料气体提供到处理设备中。一种处理系统，包括：处理装置，包括用于将特定材料气体注入处理容器26中的气体注入装置42，以便对被处理物体W进行特定处理，所述原料气体由金属化合物材料 M蒸汽压低; 以及用于向所述气体注入装置供应所述特定材料气体的气体供应系统24，所述气体注入装置是淋浴喷头部分，所述气体供应系统提供：从所述喷头部分向上延伸的气体通道56; 附着在所述气体通道的上端部分的材料储存罐58，用于在其中容纳所述金属化合物材料; 以及用于打开/关闭所述气体通道的打开/关闭阀60。

5. 发明申请

US20080163818A1 Substrate heating apparatus and purging method thereof 审中-公开
标题翻译：基板加热装置及其清洗方法
公开(公告)号：US20080163818A1
公开(公告)日：2008-07-10
申请号：US12000010
申请日：2007-12-06
申请人： Tetsuya Saito , Shigeru Kasai
发明人： Tetsuya Saito , Shigeru Kasai
IPC分类号： H01L21/683 , C23C16/00
CPC分类号： C23C16/4408 , C23C16/4401 , C23C16/4411 , C23C16/4586 , H01L21/67098 , H01L21/67103 , H01L21/67109 , H01L21/67115 , H01L21/68792
摘要： A substrate heating apparatus of the present invention, which heats a substrate mounted on a mount table 104 having heating means 108, in a processing vessel 102, includes a supporting part 202 made from a first material to support the mount table, a sealing part 204 made from a second material different from the first material in heat conductivity to seal the supporting part and the processing vessel and a joint part 206 for joining the supporting part and the sealing part in an airtight manner. With the constitution, by selecting the first material and the second material of different heat conductivities properly, it is possible to reduce a heat gradient between the top of the mount table and the bottom of the mount table. As a result, it is possible to shorten a supporting structure for the mount table, in length.
摘要翻译：本发明的基板加热装置将处理容器102中安装有具有加热装置108的安装台104的基板加热的基板加热装置包括由第一材料制成以支撑安装台的支撑部分202，密封部分204 由不同于导热性的第一材料的第二材料制成以密封支撑部分和处理容器，以及用于以气密方式接合支撑部分和密封部分的接合部分206。通过构成，通过适当地选择不同导热率的第一材料和第二材料，可以减小安装台的顶部和安装台的底部之间的热梯度。结果，可以缩短安装台的支撑结构的长度。

6. 发明授权

US07618494B2 Substrate holding structure and substrate processing device 有权
标题翻译：基板保持结构和基板处理装置
公开(公告)号：US07618494B2
公开(公告)日：2009-11-17
申请号：US10568683
申请日：2004-08-18
申请人： Sumi Tanaka , Tetsuya Saito , Masuhiro Natsuhara , Hirohiko Nakata
发明人： Sumi Tanaka , Tetsuya Saito , Masuhiro Natsuhara , Hirohiko Nakata
IPC分类号： H01L21/00 , C23C16/00 , C23C14/00
CPC分类号： H01L21/68792 , H01L21/67103
摘要： The object of the present invention is to prevent damage due to thermal stress induced into a substrate holding table in a substrate holding structure for holding a substrate to be processed. In the substrate holding structure having the substrate holding table arranged at the top of a support column, a flanged part is defined by an inner circumferential surface and an outer circumferential surface at a joint between the support column and the substrate holding table. The inner circumferential surface is formed of an inclined surface, which is inclined such that the inner diameter of the flanged part successively increases as approaching the lower surface of the substrate holding table. On the lower surface of the substrate holding table to which the flanged part is joined, a U-shaped groove is formed so as to correspond to the outer circumferential surface of the flanged part.
摘要翻译：本发明的目的是防止由于在用于保持待处理的基板的基板保持结构中引入基板保持台的热应力的损坏。在具有布置在支撑柱的顶部的基板保持台的基板保持结构中，由支撑柱和基板保持台之间的接合处的内周面和外周面限定凸缘部。内圆周表面由倾斜的表面形成，使得当接近基板保持台的下表面时，凸缘部分的内径依次增加。在与凸缘部接合的基板保持台的下表面上形成有与凸缘部的外周面对应的U字形槽。

7. 发明申请

US20060191639A1 Substrate holding structure and substrate processing device 有权
公开(公告)号：US20060191639A1
公开(公告)日：2006-08-31
申请号：US10568683
申请日：2004-08-18
申请人： Sumi Tanaka , Tetsuya Saito , Masuhiro Natsuhara , Hirohiko Nakata
发明人： Sumi Tanaka , Tetsuya Saito , Masuhiro Natsuhara , Hirohiko Nakata
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： H01L21/68792 , H01L21/67103
摘要： The object of the present invention is to prevent damage due to thermal stress induced into a substrate holding table in a substrate holding structure for holding a substrate to be processed. In the substrate holding structure having the substrate holding table arranged at the top of a support column, a flanged part is defined by an inner circumferential surface and an outer circumferential surface at a joint between the support column and the substrate holding table. The inner circumferential surface is formed of an inclined surface, which is inclined such that the inner diameter of the flanged part successively increases as approaching the lower surface of the substrate holding table. On the lower surface of the substrate holding table to which the flanged part is joined, a U-shaped groove is formed so as to correspond to the outer circumferential surface of the flanged part.

8. 发明授权

US08091387B2 Method of manufacturing glass articles, method of manufacturing glass gobs, and method of manufacturing optical elements 有权
标题翻译：制造玻璃制品的方法，制造玻璃料滴的方法以及制造光学元件的方法
公开(公告)号：US08091387B2
公开(公告)日：2012-01-10
申请号：US10802837
申请日：2004-03-18
申请人： Yoshinori Iguchi , Katsumi Utsugi , Atsushi Uezaki , Junichi Watanabe , Tetsuya Saito , Akira Murakami
发明人： Yoshinori Iguchi , Katsumi Utsugi , Atsushi Uezaki , Junichi Watanabe , Tetsuya Saito , Akira Murakami
IPC分类号： C03B7/10 , C03B7/12 , C03B7/14
CPC分类号： C03B7/12 , C03B7/14 , C03B40/04 , Y02P40/57
摘要： A method of manufacturing high-quality preforms from glass melt, manufacturing glass elements, such as lenses, by press molding these preforms and, manufacturing optical elements by reheating and press molding these glass gobs. In the method glass gobs are continuously separated from a glass melt flow continuously flowing out of a nozzle and the separated glass gobs are formed with glass forming members that are intermittently or continuously moving. A support member is made to approach the front end of the nozzle, the front end of the glass melt flow is received by the support member, and the support member is dropped more rapidly than the rate of flow of the glass melt flow to separate a glass gob from the glass melt flow. The separated glass gob is transferred from the support member to a stopped or moving glass forming member to mold a glass article.
摘要翻译：一种从玻璃熔体制造高品质预成型件的方法，通过对这些预型件进行压制成型制造玻璃元件，例如透镜，以及通过再加热和压制这些玻璃料滴来制造光学元件。在该方法中，玻璃料料从连续流出喷嘴的玻璃熔体流连续分离，并且分离的玻璃料滴形成为间歇或连续移动的玻璃形成部件。使支撑构件靠近喷嘴的前端，玻璃熔体流的前端被支撑构件接收，并且支撑构件比玻璃熔体流的流动速度更快地下落以分离玻璃料滴从玻璃熔体流出。分离的玻璃料滴从支撑构件转移到停止或移动的玻璃形成构件以模制玻璃制品。

9. 发明申请

US20100097667A1 IMAGE FORMING APPARATUS 失效
标题翻译：图像形成装置
公开(公告)号：US20100097667A1
公开(公告)日：2010-04-22
申请号：US12579265
申请日：2009-10-14
申请人： Yasuhiko Ikeda , Haruyuki Yanagi , Masaaki Ishibashi , Kenichi Nishimura , Sakiko Takizawa , Naofumi Sekine , Hiroshi Ogushi , Takeji Niikura , Tetsuya Saito , Tetsuhiro Nitta , Shigeyuki Sugiyama
发明人： Yasuhiko Ikeda , Haruyuki Yanagi , Masaaki Ishibashi , Kenichi Nishimura , Sakiko Takizawa , Naofumi Sekine , Hiroshi Ogushi , Takeji Niikura , Tetsuya Saito , Tetsuhiro Nitta , Shigeyuki Sugiyama
IPC分类号： H04N1/04 , H04N1/034
CPC分类号： H04N1/00538 , H04N1/00535 , H04N1/00557 , H04N1/00562
摘要： An image forming apparatus includes a printing section, a flatbed scanner section configured to read an original on a reading surface, and a moving mechanism configured to change the angle of the reading surface relative to an installation plane on which the apparatus is installed. The scanner section is capable of performing reading in each of a first mode where the angle of the reading surface is a first angle (vertical) and a second mode where the angle of the reading surface is a second angle (horizontal) different from the first angle.
摘要翻译：图像形成装置包括打印部分，被配置为在读取表面上读取原稿的平板扫描器部分和被配置为改变读取表面相对于安装有该装置的安装平面的角度的移动机构。扫描仪部分能够在第一模式中进行读取，其中读取表面的角度是第一角度（垂直）和第二模式，其中读取表面的角度是与第一角度（垂直）不同的第二角度角度。

10. 发明授权

US07681984B2 Image reading and recording apparatus 失效
标题翻译：图像读取和记录装置
公开(公告)号：US07681984B2
公开(公告)日：2010-03-23
申请号：US11831206
申请日：2007-07-31
申请人： Tetsuya Saito , Atsushi Yokomizo
发明人： Tetsuya Saito , Atsushi Yokomizo
IPC分类号： B41J23/00
CPC分类号： H04N1/00543 , H04N1/00554 , H04N1/00562
摘要： A scanner unit is revolvable disposed to a recording unit. The recording unit and the scanner unit are coupled with each other with a damper unit including a holder, a rod, and a spring. The damper unit is disposed so that the operating direction of the spring switches in process of the opening and the closing of the scanner unit. A guiding surface capable of abutting on the projection disposed on the rod is provided in the recording unit. The projection abuts on the guiding surface before the operating direction of the spring switches in process of the movement of the scanner unit from its opened position to its closed position.
摘要翻译：扫描器单元可旋转地设置在记录单元上。记录单元和扫描仪单元通过包括保持器，杆和弹簧的阻尼单元彼此联接。阻尼器单元设置成使得在扫描器单元的打开和关闭的过程中弹簧的操作方向转换。在记录单元中设置有能够抵靠设置在杆上的突起上的引导表面。在扫描器单元从其打开位置移动到其关闭位置的过程中，在弹簧的操作方向切换之前，突起抵靠在引导表面上。

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