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1. 发明授权

US07854962B2 Gas supply method using a gas supply system 失效
标题翻译：供气方式采用供气系统
公开(公告)号：US07854962B2
公开(公告)日：2010-12-21
申请号：US12320197
申请日：2009-01-21
申请人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23C16/448
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： Disclosed herein is a processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss. The processing system has a processing apparatus including a gas injection injector for injecting a specific material gas into a processing vessel in order to provide specific processing to an object to be processed W, the material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system for supplying the specific material gas to the gas injector, the gas injector is a shower head portion and the gas supply system provides: a gas passage extending upwardly from the showerhead portion; a material reservoir tank attached to the upper-end portion of the gas passage for containing the metallic compound material therein; and an open/close valve for opening/closing the gas passage.
摘要翻译：这里公开了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的材料气体提供到处理装置中。处理系统具有处理装置，该处理装置包括用于将特定材料气体注入到处理容器中的气体注入喷射器，以便对被加工物W进行特定处理，所述原料气体由低蒸气的金属化合物M 压力; 以及用于将特定材料气体供给到气体喷射器的气体供给系统，气体喷射器是淋浴头部分，气体供应系统提供：从喷头部分向上延伸的气体通道; 附着在气体通道的上端部分的材料储存罐，用于在其中容纳金属化合物材料; 以及用于打开/关闭气体通道的打开/关闭阀。

2. 发明申请

US20070163713A1 Gas supply system and processing system 审中-公开
标题翻译：供气系统及处理系统
公开(公告)号：US20070163713A1
公开(公告)日：2007-07-19
申请号：US10525207
申请日：2003-08-25
申请人： Shigeru Kasai , Sumi Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sumi Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23F1/00
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.
摘要翻译：提供了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的原料气体提供到处理设备中。一种处理系统，包括：处理装置，包括用于将特定材料气体注入处理容器26中的气体注入装置42，以便对被处理物体W进行特定处理，所述原料气体由金属化合物材料 M蒸汽压低; 以及用于向所述气体注入装置供应所述特定材料气体的气体供应系统24，所述气体注入装置是淋浴喷头部分，所述气体供应系统提供：从所述喷头部分向上延伸的气体通道56; 附着在所述气体通道的上端部分的材料储存罐58，用于在其中容纳所述金属化合物材料; 以及用于打开/关闭所述气体通道的打开/关闭阀60。

3. 发明授权

US5056228A Jig for cross hatching test 失效
标题翻译：夹具用于交叉孵化试验
公开(公告)号：US5056228A
公开(公告)日：1991-10-15
申请号：US588432
申请日：1990-09-26
申请人： Norihiko Yamamoto , Manabu Nakamura
发明人： Norihiko Yamamoto , Manabu Nakamura
IPC分类号： B43L13/24 , G01N19/04 , G01N33/32
CPC分类号： B43L13/24 , G01N19/04 , G01N33/32
摘要： A jig for a cross hatching test which is rectangular in shape and is used for ruling straight lines intersecting each other at a predetermined angle on a rectangular test plate, including (a) a first straight line passing on the surface of the jig with an angle, for adjusting the left longer side of the test plate to draw a straight line on the test plate with the right longer side of the jig; (b) a second straight line orthogonal to the first straight line, for adjusting the lower shorter side of the test plate; (c) a third straight line with the predetermined angle to the left longer side of the jig, for adjusting the drawn straight line to draw another straight line with the left longer side of the jib with the predetermined angle to the previously drawn straight line; and (d) an opening interposed in the middle of the first straight line, for adjusting the left longer side of the plate to the first straight line to draw the straight line on the test plate with the right longer side of the jig.
摘要翻译：一种交叉阴影试验用夹具，其形状为矩形，用于将矩形测定板上以规定角度相交的直线形成为直线，其特征在于，包括：（a）以夹角为准的通过所述夹具的表面的第一直线用于调整测试板的左侧长边以在夹具的右侧长边将测试板上的直线画成直线; （b）与第一直线正交的第二直线，用于调整测试板的较短的短边; （c）具有与夹具的左侧长度相对的预定角度的第三直线，用于调整拉出的直线以与起先拉出的直线以预定角度将起重臂的左侧长边拉出另一条直线; 和（d）插入在第一直线的中间的开口，用于将板的左侧长度调整到第一直线，以使夹具的右侧长度方向将测试板上的直线拉伸。

4. 发明申请

US20050003600A1 Gas treating device and gas treating method 审中-公开
标题翻译：气体处理装置和气体处理方法
公开(公告)号：US20050003600A1
公开(公告)日：2005-01-06
申请号：US10485299
申请日：2002-08-01
申请人： Shigeru Kasai , Norihiko Yamamoto , Masayuki Tanaka
发明人： Shigeru Kasai , Norihiko Yamamoto , Masayuki Tanaka
IPC分类号： C23C16/455 , C23C16/14 , C23C16/44 , H01L21/285 , H01L21/768 , H01L21/8238
CPC分类号： C23C16/4557 , C23C16/14 , C23C16/4411 , C23C16/4412 , C23C16/45519 , C23C16/45521 , C23C16/45523 , C23C16/45565 , C23C16/45572 , H01L21/28562 , H01L21/76843 , H01L21/76876 , H01L21/76877
摘要： A gas processing apparatus 1 includes a processing container 2 for applying a processing to a wafer W while using a processing gas, a mount table 5 arranged in the processing container 2 to mount the wafer W, a shower head 22 arranged corresponding to the wafer W on the mount table 5 to discharge the processing gas into the processing container 2 and exhausting means 132 for exhausting the interior of the processing container 2. The shower head 22 has first gas discharging holes 46 arranged corresponding to the wafer W mounted on the mount table 5 and second gas discharging holes 47 arranged around the first gas discharging holes 46 independently to discharge the processing gas to the peripheral part of the wafer W. Thus, with a uniform gas supply to a substrate, it is possible to perform a uniform gas processing.
摘要翻译：气体处理装置1包括：处理容器2，用于在使用处理气体的同时对晶片W进行处理;安装台5，布置在处理容器2中以安装晶片W;喷淋头22，其对应于晶片W布置在安装台5上将处理气体排出到处理容器2和用于排出处理容器2内部的排气装置132.喷淋头22具有与安装在安装台上的晶片W相对应布置的第一排气孔46 5和第二气体排出孔47独立地布置在第一气体排出孔46周围，以将处理气体排出到晶片W的周边部分。因此，通过向基板供给均匀的气体，可以进行均匀的气体处理。

5. 发明申请

US20090151639A1 Gas processing apparatus and gas processing method 审中-公开
标题翻译：气体处理设备和气体处理方法
公开(公告)号：US20090151639A1
公开(公告)日：2009-06-18
申请号：US12314326
申请日：2008-12-08
申请人： Shigeru Kasai , Norihiko Yamamoto , Masayuki Tanaka
发明人： Shigeru Kasai , Norihiko Yamamoto , Masayuki Tanaka
IPC分类号： C23C16/455
CPC分类号： C23C16/4557 , C23C16/14 , C23C16/4411 , C23C16/4412 , C23C16/45519 , C23C16/45521 , C23C16/45523 , C23C16/45565 , C23C16/45572 , H01L21/28562 , H01L21/76843 , H01L21/76876 , H01L21/76877
摘要： A gas processing apparatus 1 includes a processing container 2 for applying a processing to a wafer W while using a processing gas, a mount table 5 arranged in the processing container 2 to mount the wafer W, a shower head 22 arranged corresponding to the wafer W on the mount table 5 to discharge the processing gas into the processing container 2 and exhausting means 132 for exhausting the interior of the processing container 2. The shower head 22 has first gas discharging holes 46 arranged corresponding to the wafer W mounted on the mount table 5 and second gas discharging holes 47 arranged around the first gas discharging holes 46 independently to discharge the processing gas to the peripheral part of the wafer W. Thus, with a uniform gas supply to a substrate, it is possible to perform a uniform gas processing.
摘要翻译：气体处理装置1包括：处理容器2，用于在使用处理气体的同时对晶片W进行处理;安装台5，布置在处理容器2中以安装晶片W;喷淋头22，其对应于晶片W布置在安装台5上将处理气体排出到处理容器2和用于排出处理容器2内部的排气装置132.喷淋头22具有与安装在安装台上的晶片W相对应布置的第一排气孔46 5和第二气体排出孔47独立地布置在第一气体排出孔46周围，以将处理气体排出到晶片W的周边部分。因此，通过向基板供给均匀的气体，可以进行均匀的气体处理。

6. 发明申请

US20090133755A1 Gas supply system and proessing system 失效
标题翻译：供气系统和进气系统
公开(公告)号：US20090133755A1
公开(公告)日：2009-05-28
申请号：US12320197
申请日：2009-01-21
申请人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23C16/448 , G05D7/06
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided.In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.
摘要翻译：提供了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的原料气体提供到处理设备中。一种处理系统，包括：处理装置，包括用于将特定材料气体注入处理容器26中的气体注入装置42，以便对被处理物体W进行特定处理，所述原料气体由金属化合物材料 M蒸汽压低; 以及用于向所述气体注入装置供应所述特定材料气体的气体供应系统24，所述气体注入装置是淋浴喷头部分，所述气体供应系统提供：从所述喷头部分向上延伸的气体通道56; 附着在所述气体通道的上端部分的材料储存罐58，用于在其中容纳所述金属化合物材料; 以及用于打开/关闭所述气体通道的打开/关闭阀60。

7. 发明授权

US08079200B2 Bag transport and tilt-correction device 有权
标题翻译：袋运输和倾斜校正装置
公开(公告)号：US08079200B2
公开(公告)日：2011-12-20
申请号：US12381629
申请日：2009-03-13
申请人： Shoji Tsutsui , Kakue Nakamoto , Norihiko Yamamoto
发明人： Shoji Tsutsui , Kakue Nakamoto , Norihiko Yamamoto
IPC分类号： B31B1/90 , B65B43/39
CPC分类号： B65B43/465 , B65B3/02 , B65B57/02 , B65B61/186 , Y10S493/923
摘要： A bag transport and tilt-correction device for a system for, for instance, manufacturing bags with diagonal spouts, the device including openable and closeable gripping members, an air chuck that opens and closes the gripping members, a reciprocal movement mechanism that reciprocates the gripping members between the bag receiving position and the bag hand-over position, and a reciprocal swing mechanisms that swing the gripping members within the vertical plane along the width direction of the gripped bags. The gripping members are moved together with a reciprocal moving body, which is part of the reciprocal movement mechanisms, and attached to the bottom edge of swing levers, which are part of the reciprocal swing mechanism and operated by a cam during the reciprocal movement process, so as to swing together with it. The tilt of the bag is corrected by the swing motion of the gripping members.
摘要翻译：一种用于例如制造具有对角口的袋的系统的袋运输和倾斜校正装置，该装置包括可打开和可关闭的夹持构件，打开和关闭夹持构件的空气夹具，使夹紧物往复运动的往复运动机构在袋接收位置和袋移动位置之间的构件，以及沿着夹持袋的宽度方向在垂直平面内摆动夹持构件的往复摆动机构。夹持构件与作为往复运动机构的一部分的往复移动体一起移动，并且附接到作为往复摆动机构的一部分并且在往复运动过程中由凸轮操作的摆动杆的底部边缘，以便与它一起摇摆。通过夹持构件的摆动来纠正袋的倾斜。

8. 发明申请

US20090233778A1 Bag transport and tilt-correction device 有权
标题翻译：袋运输和倾斜校正装置
公开(公告)号：US20090233778A1
公开(公告)日：2009-09-17
申请号：US12381629
申请日：2009-03-13
申请人： Shoji Tsutsui , Kakue Nakamoto , Norihiko Yamamoto
发明人： Shoji Tsutsui , Kakue Nakamoto , Norihiko Yamamoto
IPC分类号： B31B1/90 , B65B43/39 , B65B57/02
CPC分类号： B65B43/465 , B65B3/02 , B65B57/02 , B65B61/186 , Y10S493/923
摘要： A bag transport and tilt-correction device for a system for, for instance, manufacturing bags with diagonal spouts, the device including openable and closeable gripping members, an air chuck that opens and closes the gripping members, a reciprocal movement mechanism that reciprocates the gripping members between the bag receiving position and the bag hand-over position, and a reciprocal swing mechanisms that swing the gripping members within the vertical plane along the width direction of the gripped bags. The gripping members are moved together with a reciprocal moving body, which is part of the reciprocal movement mechanisms, and attached to the bottom edge of swing levers, which are part of the reciprocal swing mechanism and operated by a cam during the reciprocal movement process, so as to swing together with it. The tilt of the bag is corrected by the swing motion of the gripping members.
摘要翻译：一种用于例如制造具有对角口的袋的系统的袋运输和倾斜校正装置，该装置包括可打开和可关闭的夹持构件，打开和关闭夹持构件的空气夹具，使夹紧物往复运动的往复运动机构在袋接收位置和袋移动位置之间的构件，以及沿着夹持袋的宽度方向在垂直平面内摆动夹持构件的往复摆动机构。夹持构件与作为往复运动机构的一部分的往复移动体一起移动，并且附接到作为往复摆动机构的一部分并且在往复运动过程中由凸轮操作的摆动杆的底部边缘，以便与它一起摇摆。通过夹持构件的摆动来纠正袋的倾斜。

9. 发明申请

US20060086319A1 Processing gas supply mechanism, film forming apparatus and method, and computer storage medium storing program for controlling same 审中-公开
标题翻译：处理气体供给机构，成膜装置和方法以及用于控制其的计算机存储介质存储程序
公开(公告)号：US20060086319A1
公开(公告)日：2006-04-27
申请号：US11297394
申请日：2005-12-09
申请人： Shigeru Kasai , Norihiko Yamamoto
发明人： Shigeru Kasai , Norihiko Yamamoto
IPC分类号： H01L21/306 , C23F1/00 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/16 , C23C16/4557
摘要： A processing gas supply mechanism installed on a processing chamber of a film forming apparatus for supplying a processing gas containing a metal organic compound onto a substrate to be processed includes a processing gas inlet opening for introducing the processing gas, a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening, a processing gas supply mechanism main body for forming the processing gas diffusion space, and one or more processing gas supply holes for supplying the processing gas from the diffusion space to a processing space on the substrate in the processing chamber. Further, the processing gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough.
摘要翻译：一种安装在用于将含有金属有机化合物的处理气体供给到待处理的基板上的成膜装置的处理室中的处理气体供给机构包括：用于引入处理气体的处理气体入口，用于使处理气体扩散的扩散空间从处理气体导入口导入的气体，用于形成处理气体扩散空间的处理气体供给机构主体，以及用于将处理气体从扩散空间供给到基板上的处理空间的一个或多个处理气体供给孔处理室。此外，当处理气体通过时，处理气体供给孔被成形为具有0.5至2.5的佩佩克数。

10. 发明申请

US20050120955A1 Film forming apparatus 审中-公开
标题翻译：成膜装置
公开(公告)号：US20050120955A1
公开(公告)日：2005-06-09
申请号：US11030899
申请日：2005-01-10
申请人： Hideaki Yamasaki , Yumiko Kawano , Norihiko Yamamoto
发明人： Hideaki Yamasaki , Yumiko Kawano , Norihiko Yamamoto
IPC分类号： C23C16/16 , C23C16/44 , C23C16/00
CPC分类号： C23C16/45561 , C23C16/16 , C23C16/4412
摘要： A film forming unit includes a source vessel for receiving a raw material from which source gas is produced, a processing vessel for applying a film forming process on a semiconductor substrate, a source supply line for supplying the source gas from the source vessel to the processing vessel, a gas exhaust line for exhausting gas from the processing vessel, having a vacuum pump system structured by a turbo molecular pump and a dry pump, and a pre-flow line branching off from the source supply line while bypassing the processing vessel and the turbo molecular pump, and joining to the gas exhaust line. Moreover, the source supply line includes piping having an inner diameter greater than 6.4 mm, and a turbo molecular pump is provided in the pre-flow line.
摘要翻译：成膜单元包括用于接收源气体的原料的源容器，用于在半导体衬底上施加成膜工艺的处理容器，用于将来自源容器的源气体供给至处理容器，用于排出来自处理容器的气体的排气管线，具有由涡轮分子泵和干式泵构成的真空泵系统，以及在绕过处理容器的同时从源供给管线分支的预流管线，涡轮分子泵，并连接到排气管路。此外，源供应管线包括内径大于6.4mm的管道，并且在预流动管线中设置涡轮分子泵。

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