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    • 2. 发明授权
    • Antistatic agent containing silver halide photographic light-sensitive
materials
    • 含有卤化银照相感光材料的抗静电剂
    • US4510233A
    • 1985-04-09
    • US499066
    • 1983-05-27
    • Shigeki YokoyamaAkira HibinoYukio MaekawaHiroshi Kawasaki
    • Shigeki YokoyamaAkira HibinoYukio MaekawaHiroshi Kawasaki
    • C09K3/16G03C1/85G03C1/89G03C1/84
    • G03C1/895
    • A silver halide photographic light-sensitive material comprised of a support base having thereon a silver halide emulsion layer and an antistatic layer. The antistatic layer contains a nonionic surface active agent having two polyoxyethylene chains in a molecule, the agent being represented by the formula (I): ##STR1## wherein R.sub.1 and R.sub.3 each represents a substituted or non-substituted alkyl, aryl, alkoxy, aryloxy, acyl, amido, sulfonamido, carbamoyl or sulfamoyl group, or a halogen atom, R.sub.2 and R.sub.4 each represents a hydrogen atom, a substituted or nonsubstituted alkyl, aryl, alkoxy, aryloxy, acyl, amido, sulfonamido, carbamoyl or sulfamoyl group, or a halogen atom, R.sub.5 and R.sub.6 each represents a hydrogen atom, or a substituted or nonsubstituted alkyl or aryl group, wherein the sum total of carbon atoms in R.sub.5 and R.sub.6 is 2 or more, or R.sub.5 and R.sub.6 may form a ring by linking with each other, and m and n independently each represents an average degree of polymerization of ethylene oxide which is 2 to 40. The antistatic layer provides a photographic material which has excellent antistatic effects without causing undesirable effects on the photographic properties of the material. The antistatic layer does not cause screen contamination and the antistatic effects do not deteriorate with the passage of time. Particularly good results are obtained with silver halide light-sensitive materials utilized with high speed processing at a high temperature especially when the materials are of high sensitivity.
    • 一种卤化银照相感光材料,由其上具有卤化银乳剂层和抗静电层的支撑基底组成。 抗静电层含有分子中具有两个聚氧乙烯链的非离子表面活性剂,该试剂由式(I)表示:其中R 1和R 3各自表示取代或未取代的烷基,芳基, 烷氧基,芳氧基,酰基,酰胺基,亚磺酰氨基,氨基甲酰基或氨磺酰基或卤素原子,R2和R4各自表示氢原子,取代或未取代的烷基,芳基,烷氧基,芳氧基,酰基,酰胺基,亚磺酰氨基,氨基甲酰基或氨磺酰基 基团或卤原子,R 5和R 6各自表示氢原子或取代或未取代的烷基或芳基,其中R 5和R 6中的碳原子总数为2以上,或者R 5和R 6可以形成环 通过彼此连接,m和n各自独立地表示环氧乙烷的平均聚合度为2〜40。抗静电层提供具有优异抗静电效果的照相材料,而不会对照相产生不期望的影响 材料的特性。 抗静电层不会引起屏幕污染,并且抗静电效果不会随着时间的流逝而恶化。 在高温高速加工中使用的卤化银感光材料,特别是当材料具有高灵敏度时,可获得特别好的结果。
    • 4. 发明授权
    • Silver halide photographic light-sensitive materials with antistatic
layer containing nonionic surface active agent
    • 卤化银照相感光材料,含抗静电层,含有非离子表面活性剂
    • US4518354A
    • 1985-05-21
    • US497285
    • 1983-05-23
    • Shigeki YokoyamaAkira HibinoYukio MaekawaHiroshi Kawasaki
    • Shigeki YokoyamaAkira HibinoYukio MaekawaHiroshi Kawasaki
    • C09K3/16C07C43/23C08G65/26C09D171/02G03C1/85G03C1/89G03C1/78
    • G03C1/895C07C43/23C08G65/2612C09D171/02
    • A silver halide photographic light-sensitive material is disclosed. The photographic material is comprised of a support base, a silver halide emulsion layer and an antistatic layer. The antistatic layer contains a nonionic surface active agent having two polyoxyethylene chains in a molecule represented by the formula (I): ##STR1## wherein R.sub.1 and R.sub.3 each represents a substituted or unsubstituted alkyl group, an aryl group, an alkoxy group, a halogen atom, an acyl group, an amido group, a sulfonamido group, a carbamoyl group or a sulfamoyl group, R.sub.2 and R.sub.4 each represents a hydrogen atom, a substituted or unsubstituted alkyl group, an aryl group, an alkoxy group, a halogen atom, an acyl group, an amido group, a sulfonamido group, a carbamoyl group or a sulfamoyl group, R.sub.5 represents a hydrogen atom, a methyl group or an .alpha.-furyl group, and m and n independently represents an average degree of polymerization of ethylene oxide, which is 2 to 40. By utilizing the compound of general formula (I) it is possible to obtain a photographic material which aids in eliminating screen contamination. The compound has good antistatic properties which do not change with the passage of time. Furthermore, the compound does not have undesirable effects on the photographic properties of the photographic material.
    • 公开了一种卤化银照相感光材料。 照相材料由支撑基底,卤化银乳剂层和抗静电层构成。 抗静电层含有在式(I)表示的分子中具有两个聚氧乙烯链的非离子表面活性剂:其中R 1和R 3各自表示取代或未取代的烷基,芳基,烷氧基,卤素 原子,酰基,酰胺基,亚磺酰氨基,氨基甲酰基或氨磺酰基,R 2和R 4各自表示氢原子,取代或未取代的烷基,芳基,烷氧基,卤素原子, 酰基,酰胺基,亚磺酰氨基,氨基甲酰基或氨磺酰基,R 5表示氢原子,甲基或α-呋喃基,m和n独立地表示环氧乙烷的平均聚合度 ,其为2至40.通过使用通式(I)的化合物,可以获得有助于消除荧光屏污染的照相材料。 该化合物具有良好的抗静电性能,随时间推移不变。 此外,化合物对照相材料的照相性质不具有不期望的影响。
    • 7. 发明授权
    • Silver halide photographic light-sensitive materials
    • 卤化银照相感光材料
    • US4623614A
    • 1986-11-18
    • US763111
    • 1985-08-07
    • Masakazu YoneyamaYukio MaekawaShigeki YokoyamaJunichi Yamanouchi
    • Masakazu YoneyamaYukio MaekawaShigeki YokoyamaJunichi Yamanouchi
    • C09K3/16G03C1/04G03C1/053G03C1/06G03C1/76G03C1/85G03C1/84
    • G03C1/7614Y10S430/151Y10S430/162
    • A silver halide photographic light-sensitive material is described, comprising a support having thereon at least one silver halide photographic light-sensitive emulsion layer, said photographic light-sensitive material further comprising at least one light-insensitive surface layer on at least one side thereof, at least one of said surface layer or layers comprising a graft polymer or copolymer having a silicone unit, and at least one of said surface layer or layers and a layer or layers adjacent to the surface layer or layers comprising an antistatic agent.The silver halide light-sensitive material has good antistatic property and reduced sliding friction without giving bad influences on the photographic properties; has good antistatic property and lubricity after development processing; has improved antistatic property and lubricity without reducing the coating properties at the production of the photographic light-sensitive material; and forms no scum during development processing.
    • 描述了一种卤化银照相感光材料,其包括其上具有至少一个卤化银照相感光乳剂层的载体,所述照相感光材料在至少一个侧面上还包含至少一个不透光表面层 ,所述表面层或层中的至少一个包含具有硅氧烷单元的接枝聚合物或共聚物,以及所述表面层或层中的至少一个以及与表面层相邻的层或包含抗静电剂的层。 卤化银感光材料具有良好的抗静电性能和降低的滑动摩擦,而不会对照相性能造成不良影响; 开发加工后具有良好的抗静电性和润滑性; 具有改善的抗静电性和润滑性,而不会降低在照相感光材料的生产中的涂布性能; 并且在开发处理期间不形成浮渣。