专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07382462B2 Device for measuring the reflection factor 有权
标题翻译：用于测量反射系数的装置
公开(公告)号：US07382462B2
公开(公告)日：2008-06-03
申请号：US11355106
申请日：2006-02-16
申请人： Shigeki Matsumoto , Shigenori Nozawa , Yoshimasa Ogawa
发明人： Shigeki Matsumoto , Shigenori Nozawa , Yoshimasa Ogawa
IPC分类号： G01N21/55 , G01N21/47
CPC分类号： G01N21/4738 , G01N21/8483 , G01N2021/478
摘要： A device for measuring the reflection factor by irradiating a measurement area of a microchip with light, and in which a light receiving part is made to receive light reflected from the measurement area for determination of the reflection factor of the measurement area. The light receiving part is located in an angular region θ, satisfying the relationship (½)α≦θ≦sin−1(1/n) and being located between angles θmin and θmax, θmin and θmax (in°) being angles which the reflection light forms with respect to a normal on the edge of the irradiated surface of the area to be measured in a virtual plane which contains the emission center of the light emitting part and which is perpendicular to the microchip, wherein θmin is ½ α and θmax corresponds to sin−1(1/n), where α (°) is the scattering angle of the light radiated by the light emitting part which is located directly above the area to be measured, and wherein n is the index of refraction of the transparent component.
摘要翻译：一种用于通过用光照射微芯片的测量区域来测量反射系数的装置，并且其中使光接收部分接收从测量区域反射的光以确定测量区域的反射系数。光接收部分位于角度区域θ中，满足关系（½）α<=θ<= SIN＆lt; 1＆gt;（1 / n），并且位于θ< / SUB>和θ，θ＆lt; min＆lt;＆gt;和θmax（°）是反射光相对于正常形成的角度在包含发光部分的发射中心并且垂直于微芯片的虚拟平面中待测量区域的被照射表面的边缘，其中θ分别为1/2和θ< SUB> max 对应于sin ^{（1 / n），其中α（°）是由位于区域正上方的发光部分辐射的光的散射角被测量，并且其中n是透明组分的折射率。}

2. 发明申请

US20060186407A1 Device for measuring the reflection factor 有权
标题翻译：用于测量反射系数的装置
公开(公告)号：US20060186407A1
公开(公告)日：2006-08-24
申请号：US11355106
申请日：2006-02-16
申请人： Shigeki Matsumoto , Shigenori Nozawa , Yoshimasa Ogawa
发明人： Shigeki Matsumoto , Shigenori Nozawa , Yoshimasa Ogawa
IPC分类号： H01L31/0376
CPC分类号： G01N21/4738 , G01N21/8483 , G01N2021/478
摘要： A device for measuring the reflection factor by irradiating a measurement area of a microchip with light, and in which a light receiving part is made to receive light reflected from the measurement area for determination of the reflection factor of the measurement area. The light receiving part is located in an angular region θ, satisfying the relationship (1/2)α≦θ≦ sin-1(1/n) and being located between angles θmin and θmax, θmin and θmax (in°) being angles which the reflection light forms with respect to a normal on the edge of the irradiated surface of the area to be measured in a virtual plane which contains the emission center of the light emitting part and which is perpendicular to the microchip, wherein θmin is 1/2 α and θmax corresponds to sin-1(1/n), where α (°) is the scattering angle of the light radiated by the light emitting part which is located directly above the area to be measured, and wherein n is the index of refraction of the transparent component.
摘要翻译：一种用于通过用光照射微芯片的测量区域来测量反射系数的装置，并且其中使光接收部分接收从测量区域反射的光以确定测量区域的反射系数。光接收部分位于角度区域θ中，满足关系（1/2）α1=θ1=（1 / n），并且位于θ< 最小和/或最小和/或最小（°）是反射光形成的角度，相对于在包含发光部分的发射中心并且垂直于微芯片的虚拟平面中待测量区域的被照射表面的边缘上的正常，其中θ分别为1/2 α和θ最大值对应于sin（1 / n）（1 / n），其中α（°）是由位于的发光部分辐射的光的散射角直接在要测量的区域上方，并且其中n是透明组分的折射率。

3. 发明授权

US08912507B2 Light irradiation device for dental implants 有权
标题翻译：牙科植入物的光照射装置
公开(公告)号：US08912507B2
公开(公告)日：2014-12-16
申请号：US13823721
申请日：2011-09-05
申请人： Yoshimasa Ogawa
发明人： Yoshimasa Ogawa
IPC分类号： A61L2/10 , A61C8/00
CPC分类号： A61C8/0089 , A61C8/0022 , A61L2/10
摘要： A light irradiation device for dental implants, which is capable of reliably performing a required ultraviolet ray irradiation treatment to screw type dental implants, is provided. The light irradiation device for dental implants irradiates screw type dental implants with ultraviolet rays wherein each of the screw type implants has a screw part comprising a spiral protrusion. The light irradiation device comprises a casing, a stage that is provided within the casing, in which the plurality of dental implants are disposed and held so as to be aligned in one direction, and an ultraviolet ray irradiation lamp that is disposed within the casing, wherein the entire surface of the protrusion that forms the screw part of each of the plurality of dental implants held on the stage is irradiated with the ultraviolet rays emitted from the ultraviolet ray irradiation lamp.
摘要翻译：提供了能够可靠地对螺旋型牙植入物进行所需的紫外线照射处理的牙科植入物的光照射装置。用于牙科植入物的光照射装置用紫外线照射螺旋型牙植入物，其中每个螺钉型植入物具有包括螺旋突起的螺钉部分。光照射装置包括：壳体，设置在壳体内的台架，多个牙植入体沿其一个方向排列并保持成一个方向;以及紫外线照射灯，其设置在壳体内，其中，由紫外线照射灯发出的紫外线照射形成保持在台架上的多个牙植入物的螺纹部的突起的整个面。

4. 发明授权

US08436988B2 Clinical laboratory test apparatus 有权
标题翻译：临床实验室检测仪器
公开(公告)号：US08436988B2
公开(公告)日：2013-05-07
申请号：US12923059
申请日：2010-08-31
申请人： Yoshimasa Ogawa
发明人： Yoshimasa Ogawa
IPC分类号： G01N1/10
CPC分类号： B04B5/0407 , B04B7/02 , B04B7/08 , G01N35/00029 , G01N2035/00495
摘要： A clinical laboratory testing apparatus comprises a microchip for holding a sample liquid; a rotation body for rotating the microchip; a rotation drive mechanism; a lock mechanism for locking the microchip on the rotation body; a measurement room that holds the microchip and the rotation body; a protection cover; a light source that irradiates the measuring cell of the microchip; and a light receiving unit, wherein a centrifugal separation processing of a specimen in the sample liquid is performed in the microchip.
摘要翻译：一种临床实验室测试装置包括用于保持样品液体的微芯片; 用于旋转微芯片的旋转体; 旋转驱动机构; 用于将微芯片锁定在旋转体上的锁定机构; 保持微芯片和旋转体的测量室; 保护盖; 照射微芯片的测量单元的光源; 以及光接收单元，其中在所述微芯片中执行样品液体中的样本的离心分离处理。

5. 发明申请

US20080204654A1 Device For Installing Suction Jig For Eyeglass Lens and Method For Determining Suction Jig Installation Position 失效
标题翻译：用于安装眼镜镜头吸引夹具的装置和用于确定吸取夹具安装位置的方法
公开(公告)号：US20080204654A1
公开(公告)日：2008-08-28
申请号：US10594318
申请日：2005-03-24
申请人： Tsutomu Kigawa , Kazuo Kitamura , Nobuo Kochi , Takahiro Watanabe , Yoshimasa Ogawa
发明人： Tsutomu Kigawa , Kazuo Kitamura , Nobuo Kochi , Takahiro Watanabe , Yoshimasa Ogawa
IPC分类号： G02C13/00 , G01M11/02
CPC分类号： G01M11/0214 , B24B9/146 , B24B13/005 , B24B49/12 , G01M11/0207
摘要： An automatic suction device for an eyeglass lens and a method for determining suction jig installation position, capable of recognizing that a frame exchange lens holder is being installed on a placement table, making transition to installation work of a frame exchange mode, and avoiding an erroneous contact between the frame exchange frame and a lens holding frame. The kind of holding means placed on the placement table is determined from an image of the inside of an opening (141), which image is taken by a CCD camera (105), and the installation position of a suction jig (121) at an eyeglass lens (L) placed on a frame exchange lens holder (300) is obtained.
摘要翻译：一种用于眼镜镜片的自动抽吸装置和一种用于确定抽吸夹具安装位置的方法，其能够识别出将框架更换镜架保持器安装在放置台上，转变为框架更换模式的安装工作，并避免错误框架更换框架与透镜保持架之间的接触。放置在放置台上的保持装置的种类根据由CCD照相机（105）拍摄的开口（141）的内部的图像和吸入夹具（121）的安装位置获得放置在框架更换镜架（300）上的眼镜镜片（L）。

6. 发明申请

US20130264495A1 ULTRAVIOLET IRRADIATION DEVICE FOR IMPLANTS 有权
标题翻译：用于植入物的紫外线辐射装置
公开(公告)号：US20130264495A1
公开(公告)日：2013-10-10
申请号：US13991568
申请日：2011-10-18
申请人： Yoshimasa Ogawa
发明人： Yoshimasa Ogawa
IPC分类号： A61L2/10
CPC分类号： A61L2/10 , A61C8/0087 , A61C19/002 , A61L2/0047 , A61L2202/21
摘要： Disclosed herein is an ultraviolet irradiation device for removing organic contaminants from implants using ultraviolet rays. In the present invention, the implants can be easily and smoothly put into or pulled out of a processing chamber, and the implants can be reliably prevented from being recontaminated after the ultraviolet irradiation process has finished. For this, the ultraviolet irradiation device includes a housing provided with an openable door, an ultraviolet lamp installed in the housing, a carriage provided in the housing so as to be extractable, and an implant mount unit placed on the carriage in such a way that the implant mount unit can be disposed facing the ultraviolet lamp in the housing. The implant mount unit includes a mounting board removably placed on the carriage, and an implant support removably placed on the mounting board.
摘要翻译：本文公开了一种使用紫外线从植入物去除有机污染物的紫外线照射装置。在本发明中，能够容易且顺利地将植入物投入到处理室中或从处理室中拉出，并且能够可靠地防止植入物在紫外线照射处理结束后再次再污染。为此，紫外线照射装置包括设置有可打开门的壳体，安装在壳体中的紫外灯，设置在壳体中以便可抽出的滑架，以及放置在滑架上的植入物安装单元，植入物安装单元可以布置成面向壳体中的紫外线灯。植入物安装单元包括可拆卸地放置在托架上的安装板和可移除地放置在安装板上的植入物支架。

7. 发明授权

US07639038B2 Terminating resistance adjusting method, semiconductor integrated circuit and semiconductor device 失效
标题翻译：终端电阻调节方法，半导体集成电路和半导体器件
公开(公告)号：US07639038B2
公开(公告)日：2009-12-29
申请号：US11485396
申请日：2006-07-13
申请人： Yutaka Nemoto , Yoshimasa Ogawa , Miki Yanagawa , Makoto Koga
发明人： Yutaka Nemoto , Yoshimasa Ogawa , Miki Yanagawa , Makoto Koga
IPC分类号： H03K17/16 , H03K19/003
CPC分类号： H04L25/0298
摘要： A terminal resistance adjusting method adjusts a terminating resistance within a semiconductor integrated circuit. The method includes obtaining a comparison result by comparing a reference voltage and a voltage of a first node that is coupled to a first voltage via a current supply circuit, the first voltage being one of a power supply voltage and a ground voltage, controlling a monitoring resistor part which has a plurality of first resistors when making a calibration, so as to selectively couple the first resistors in parallel between the first node and a second voltage based on the comparison result, the second voltage being the other of the power supply voltage and the ground voltage, and controlling a terminating resistor part which has a plurality of second resistors when controlling the terminating resistance of the terminating part, so as to selectively couple the second resistors in parallel between a second node and the second voltage based on the comparison result similarly to the first resistors of the monitoring resistor part.
摘要翻译：终端电阻调整方法调整半导体集成电路内的终端电阻。该方法包括通过比较经由电流供应电路耦合到第一电压的第一节点的参考电压和电压，第一电压是电源电压和接地电压之一来获得比较结果，控制监视电阻部分，当进行校准时具有多个第一电阻器，以便基于比较结果选择性地将第一电阻并联在第一节点和第二电压之间，第二电压是电源电压的另一个，接地电压，并且当控制终端部分的终止电阻时控制具有多个第二电阻器的终端电阻器部分，以便基于比较结果选择性地将第二电阻并联连接在第二节点和第二电压之间类似于监控电阻器部分的第一个电阻。

8. 发明申请

US20090244539A1 MICROCHIP TESTING DEVICE 有权
标题翻译：微型测试设备
公开(公告)号：US20090244539A1
公开(公告)日：2009-10-01
申请号：US12401888
申请日：2009-03-11
申请人： Yoshimasa Ogawa , Katsuoki Miyasu , Yoshihiko Okumura
发明人： Yoshimasa Ogawa , Katsuoki Miyasu , Yoshihiko Okumura
IPC分类号： G01N21/59 , G01N21/01
CPC分类号： G01N21/255 , B01L3/5027 , B01L9/527 , G01J1/08 , G01J2001/0276 , G01N2035/00158
摘要： A testing device equipped with: a microchip having a receiver for a test fluid, a discharge lamp which emits light into the microchip test fluid receiver, a light source housing in which the discharge lamp is located, and an arithmetic calculation mechanism, which calculates the concentration of the component to be detected, based on the intensity of the light emitted from the test fluid container unit. To reduce the size of the device and to shield the arithmetic calculation mechanism from electromagnetic waves generated around the light source, the light source housing is equipped with shielding connected to the ground on the outside of the light source housing made of insulating material. The light source housing is positioned within an enclosure of the testing device holding the microchip and containing the arithmetic calculation mechanism, analysis output device(s), etc.
摘要翻译：一种测试装置，配备有：具有用于测试流体的接收器的微芯片，向微芯片测试流体接收器发射光的放电灯，放电灯所在的光源壳体，以及算术计算机构，基于从测试流体容器单元发射的光的强度，待检测的组分的浓度。为了减小装置的尺寸并屏蔽算术计算机构与光源周围产生的电磁波，光源外壳配备有与由绝缘材料制成的光源外壳的外部接地的屏蔽。光源壳体位于保持微芯片的测试装置的外壳内，并包含算术计算机构，分析输出装置等。

9. 发明授权

US06984161B2 Lens grinding processing apparatus 失效
标题翻译：镜片研磨处理装置
公开(公告)号：US06984161B2
公开(公告)日：2006-01-10
申请号：US10664621
申请日：2003-09-19
申请人： Yasuo Suzuki , Yoshimasa Ogawa , Yasuhito Eto
发明人： Yasuo Suzuki , Yoshimasa Ogawa , Yasuhito Eto
IPC分类号： B24B49/00
CPC分类号： B24B49/00 , B24B9/146
摘要： A lens grinding processing apparatus of the present invention has lens rotating shafts 23 and 24 for holding an eyeglass lens ML, a lens retaining members (300, 320) fixed respectively to opposed end sections of the lens rotating shafts 23 and 24 capable of slanting adjustably, a drilling device (drilling processing device 200) for drilling a hole for a point frame into the slanted eyeglass lens ML, and a grinding stone (grinding stone 35, chamfering stones 224, 225) for grinding and processing a circumferential part of the eyeglass lens ML.
摘要翻译：本发明的透镜研磨处理装置具有用于保持眼镜镜片ML的透镜旋转轴23和24，分别固定在能够可调节地倾斜的透镜旋转轴23和24的相对端部的透镜保持部件（300,320），用于将点框架的孔钻入倾斜眼镜镜片ML的钻孔装置（钻孔处理装置200），以及用于研磨和加工眼镜片的圆周部分的研磨石（磨石35，倒角钻石224,225）镜头ML。

10. 发明授权

US08729501B2 Ultraviolet irradiation device for implants 有权
标题翻译：用于植入物的紫外线照射装置
公开(公告)号：US08729501B2
公开(公告)日：2014-05-20
申请号：US13991568
申请日：2011-10-18
申请人： Yoshimasa Ogawa
发明人： Yoshimasa Ogawa
IPC分类号： A61L2/10
CPC分类号： A61L2/10 , A61C8/0087 , A61C19/002 , A61L2/0047 , A61L2202/21
摘要： Disclosed herein is an ultraviolet irradiation device for removing organic contaminants from implants using ultraviolet rays. In the present invention, the implants can be easily and smoothly put into or pulled out of a processing chamber, and the implants can be reliably prevented from being recontaminated after the ultraviolet irradiation process has finished. For this, the ultraviolet irradiation device includes a housing provided with an openable door, an ultraviolet lamp installed in the housing, a carriage provided in the housing so as to be extractable, and an implant mount unit placed on the carriage in such a way that the implant mount unit can be disposed facing the ultraviolet lamp in the housing. The implant mount unit includes a mounting board removably placed on the carriage, and an implant support removably placed on the mounting board.
摘要翻译：本文公开了一种使用紫外线从植入物去除有机污染物的紫外线照射装置。在本发明中，能够容易且顺利地将植入物投入到处理室中或从处理室中拉出，并且能够可靠地防止植入物在紫外线照射处理结束后再次再污染。为此，紫外线照射装置包括设置有可打开门的壳体，安装在壳体中的紫外灯，设置在壳体中以便可抽出的滑架，以及放置在滑架上的植入物安装单元，植入物安装单元可以布置成面向壳体中的紫外线灯。植入物安装单元包括可拆卸地放置在托架上的安装板和可移除地放置在安装板上的植入物支架。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式