专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06773876B2 Silver halide emulsion, production process thereof and novel pyridinium compound 失效
标题翻译：卤化银乳剂，其制备方法和新型吡啶鎓化合物
公开(公告)号：US06773876B2
公开(公告)日：2004-08-10
申请号：US10059003
申请日：2002-01-30
申请人： Shigeharu Urabe , Shinichi Ichikawa , Kazutaka Takahashi , Tadashi Inaba
发明人： Shigeharu Urabe , Shinichi Ichikawa , Kazutaka Takahashi , Tadashi Inaba
IPC分类号： G03C107
CPC分类号： G03C1/07 , G03C1/0051 , G03C1/047 , G03C2001/0153 , G03C2200/03 , G03C2200/43
摘要： A silver halide emulsion comprising tabular grains having a very small thickness with the main surfaces thereof having a very large surface area and being (111) face, is disclosed. More specifically, a silver halide emulsion is disclosed, comprising light-sensitive silver halide grains having a silver bromide content of 70 mol % or more, with 60 % or more of the entire projected area of said silver halide grains being occupied by tabular grains having an average grain thickness of less than 0.04 &mgr;m, an average equivalent-circle diameter of 4 &mgr;m or more, and (111) face as main surfaces.
摘要翻译：公开了一种卤化银乳剂，其包含具有非常小的厚度的片状颗粒，其主表面具有非常大的表面积和（111）面。更具体地，公开了一种卤化银乳剂，其包含感光卤化银颗粒具有70摩尔％以上的溴化银含量，所述卤化银颗粒的整个投影面积的60％以上被平均粒度小于0.04μm的平片状颗粒占据，平均当量圆直径为 4个以上，（111）面为主面。

2. 发明授权

US08617417B2 Cleaning composition, method for producing semiconductor device, and cleaning method 有权
标题翻译：清洗组合物，半导体装置的制造方法以及清洗方法
公开(公告)号：US08617417B2
公开(公告)日：2013-12-31
申请号：US13107199
申请日：2011-05-13
申请人： Tadashi Inaba , Kazutaka Takahashi , Tomonori Takahashi , Atsushi Mizutani
发明人： Tadashi Inaba , Kazutaka Takahashi , Tomonori Takahashi , Atsushi Mizutani
IPC分类号： C09K13/00
CPC分类号： C11D11/0047 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/5004
摘要： Provided are a cleaning composition which is capable of inhibiting the metal of a semiconductor substrate from corrosion, and has an excellent removability of plasma etching residues and/or ashing residues on the semiconductor substrate, a method for producing a semiconductor device, and a cleaning method using the cleaning composition. The cleaning composition for removing plasma etching residues and/or ashing residues formed on a semiconductor substrate, and a preparation method and a cleaning method for a semiconductor device, using the cleaning composition, wherein the cleaning composition includes (Component a) water; (Component b) an amine compound; (Component c) hydroxylamine and/or a salt thereof; (Component d) a quaternary ammonium compound; (Component e) an organic acid; and (Component f) a water-soluble organic solvent; and has a pH of 6 to 9.
摘要翻译：本发明提供能够抑制半导体衬底的金属腐蚀并且具有优异的半导体衬底上的等离子体蚀刻残留物和/或灰化残留物的可除去性的清洁组合物，半导体器件的制造方法和清洁方法使用清洁组合物。用于除去形成在半导体衬底上的等离子体蚀刻残渣和/或灰化残留物的清洁组合物，以及使用该清洁组合物的半导体器件的制备方法和清洁方法，其中所述清洁组合物包含（组分a）水; （组分b）胺化合物; （组分c）羟胺和/或其盐; （组分d）季铵化合物; （组分e）有机酸; 和（组分f）水溶性有机溶剂; pH为6〜9。

3. 发明授权

US08647523B2 Etching composition 有权
标题翻译：蚀刻组成
公开(公告)号：US08647523B2
公开(公告)日：2014-02-11
申请号：US13415390
申请日：2012-03-08
申请人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
发明人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
IPC分类号： C03C15/00
CPC分类号： H01L21/32134 , C09K13/06 , C23F1/16 , C23F1/28 , C23F1/30 , C23F1/44 , H01L21/28518 , H01L21/76843
摘要： This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
摘要翻译：本公开涉及含有至少一种磺酸，至少一种含卤化物阴离子的化合物，卤化物为氯化物或溴化物，至少一种含有硝酸根或亚硝酰基离子的化合物和水的蚀刻组合物。所述至少一种磺酸可以为所述组合物的约25重量％至约95重量％。卤化物阴离子可以是氯化物或溴化物，并且可以是组合物的约0.01重量％至约0.5重量％。硝酸盐或亚硝酰离子可以为组合物的约0.1重量％至约20重量％。水可以是组合物的至少约3重量％。

4. 发明申请

US20120231632A1 Novel Etching Composition 有权
标题翻译：新型蚀刻成分
公开(公告)号：US20120231632A1
公开(公告)日：2012-09-13
申请号：US13415390
申请日：2012-03-08
申请人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
发明人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
IPC分类号： H01L21/306 , C09K13/06 , C09K13/00
CPC分类号： H01L21/32134 , C09K13/06 , C23F1/16 , C23F1/28 , C23F1/30 , C23F1/44 , H01L21/28518 , H01L21/76843
摘要： This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
摘要翻译：本公开涉及含有至少一种磺酸，至少一种含卤化物阴离子的化合物，卤化物为氯化物或溴化物，至少一种含有硝酸根或亚硝酰基离子的化合物和水的蚀刻组合物。所述至少一种磺酸可以为所述组合物的约25重量％至约95重量％。卤化物阴离子可以是氯化物或溴化物，并且可以是组合物的约0.01重量％至约0.5重量％。硝酸盐或亚硝酰离子可以为组合物的约0.1重量％至约20重量％。水可以是组合物的至少约3重量％。

5. 发明授权

US08083964B2 Metal-polishing liquid and polishing method 有权
标题翻译：金属抛光液和抛光方法
公开(公告)号：US08083964B2
公开(公告)日：2011-12-27
申请号：US12055930
申请日：2008-03-26
申请人： Toru Yamada , Makoto Kikuchi , Tadashi Inaba , Takahiro Matsuno , Takamitsu Tomiga , Kazutaka Takahashi
发明人： Toru Yamada , Makoto Kikuchi , Tadashi Inaba , Takahiro Matsuno , Takamitsu Tomiga , Kazutaka Takahashi
IPC分类号： C03C15/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1436 , C09K3/1463
摘要： A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), R1 represents an alkyl group having 1 to 4 carbon atoms and R2 represents an alkylene group having 1 to 4 carbon atoms.
摘要翻译： 1.一种金属抛光液，其特征在于，在所述半导体装置的制造方法中，对铜或铜合金的导体膜进行化学机械研磨的金属研磨液，所述金属抛光液含有：（1）式）; 和（2）表面活性剂，其中，在式（I）中，R 1表示碳原子数1〜4的烷基，R 2表示碳原子数1〜4的亚烷基。

6. 发明授权

US07820777B2 Composition, film and producing method therefor 失效
标题翻译：组合物，薄膜及其制备方法
公开(公告)号：US07820777B2
公开(公告)日：2010-10-26
申请号：US11515014
申请日：2006-09-05
申请人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
发明人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
IPC分类号： C08G77/442 , B32B9/04 , H01L21/31 , H01L21/469
CPC分类号： C08G77/20 , C08G77/045 , C09D183/04 , Y10T428/31663
摘要： A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.
摘要翻译：一种组合物，其包含：含有m个RSi（O0.5）3单元的化合物（I）的聚合物，其中m表示8〜16的整数; 并且R各自独立地表示不可水解基团，条件是R 1中的至少两个表示含有乙烯基或乙炔基的基团，并且其中每个RSi（O0.5）3单元连接到另一个 RSi（O0.5）3单元，通过在RSi（O0.5）3单元中的每一个中共享氧原子，以形成笼结构，并且其中在组合物中包含的固体组分中形成聚合物质化合物（I）的反应为60质量％以上。

7. 发明申请

US20080309265A1 Motor Control Device 有权
标题翻译：电机控制装置
公开(公告)号：US20080309265A1
公开(公告)日：2008-12-18
申请号：US10585416
申请日：2004-01-07
申请人： Kei Terada , Tetsuaki Nagano , Yasunobu Harada , Kazutaka Takahashi
发明人： Kei Terada , Tetsuaki Nagano , Yasunobu Harada , Kazutaka Takahashi
IPC分类号： H02P21/00
CPC分类号： H02P21/06
摘要： In a motor control device according to the invention, upon velocity control of a motor, a superimposed signal generating unit 9 outputs a superimposed signal idh of a repetitive waveform, such as a triangular wave or a sine wave. A d-axis current command generating unit 10 adds the superimposed signal idh generated by the superimposed signal generating unit 9d to a d-axis current command idc*0 and outputs a d-axis current command idc*. An axial misalignment detecting unit 11 (11a, 11b, 11c, and 11d) receives the d-axis current command idc* and a q-axis current command iqc* and outputs an axial misalignment angle estimation value Δθ̂. An axial misalignment correction unit 12 receives the axial misalignment angle estimation value Δθ̂ and an actual detected position θm and outputs a position after correction θm′. Therefore, detection and correction can be performed in real time through calculation at a given timing during a normal operation.
摘要翻译：在根据本发明的电动机控制装置中，在电动机的速度控制时，叠加信号生成单元9输出诸如三角波或正弦波的重复波形的叠加信号idh。 d轴电流指令生成部10将由叠加信号生成部9d生成的叠加信号idh与d轴电流指令idc * 0相加，并输出d轴电流指令idc *。轴向未对准检测单元11（11a，11b，11c和11d）接收d轴电流指令idc *和q轴电流指令iqc *，并输出轴向未对准角度估计值Deltathet。轴向未对准校正单元12接收轴向未对准角度估计值Deltathet和实际检测位置，并输出校正后的位置。因此，可以在正常操作期间的给定定时通过计算实时地进行检测和校正。

8. 发明授权

US07323840B2 Magnetic-pole detecting system for synchronous AC motor and magnetic-pole detecting method therefor 有权
标题翻译：同步交流电机磁极检测系统及其磁极检测方法
公开(公告)号：US07323840B2
公开(公告)日：2008-01-29
申请号：US10495078
申请日：2002-02-07
申请人： Kazutaka Takahashi , Yasunobu Harada
发明人： Kazutaka Takahashi , Yasunobu Harada
IPC分类号： H02P7/00
CPC分类号： H02P6/22
摘要： A magnetic-pole detecting system for synchronous AC motors and a magnetic-pole detecting method therefor are provided. The magnetic-pole detecting system for synchronous AC motors includes a position detector 10 for detecting the relative position between the moving element 3 and the stator of an AC motor 5; a phase-update command unit 52 for making a plurality of currents with different phases flow in coils 3a and 3b so that the moving element 3 moves to a plurality of stable points; a reversal command unit 56 for making currents flow in the coils 3a and 3b so that the moving element 3 reverses from the previous direction in which the moving element 3 has been moved by the phase-update command unit 52; a current cut-off command unit 54 for cutting off the currents flowing in the coils 3a and 3b when the position-detector 10 detects a movement of the moving element 3; a reversal-determining unit 64 for determining, based on a position-detecting signal from the position-detector 10, a direction in which the moving element has moved based on the phase-update command unit 52, and for determining that the determined direction has reversed between the previous and the present instances; and a stable-point-simulator for simulating a stable point by means of the phase of the currents flowing in the moving element 3 when the reversal-determining unit 64 has detected the reversal.
摘要翻译：提供了一种用于同步交流电动机的磁极检测系统及其磁极检测方法。用于同步交流电动机的磁极检测系统包括用于检测运动元件3和交流电动机5的定子之间的相对位置的位置检测器10; 用于使具有不同相位的多个电流的相位更新指令单元52在线圈3a和3b中流动，使得移动元件3移动到多个稳定点; 用于使电流在线圈3a和3b中流动的反转指令单元56，使得移动元件3从相位更新命令单元52移动了移动元件3的先前方向反转; 电流切断指令单元54，用于当位置检测器10检测到移动元件3的移动时，切断在线圈3a和3b中流动的电流; 反转确定单元64，用于基于来自位置检测器10的位置检测信号，基于相位更新命令单元52确定移动元件已经移动的方向，并且确定所确定的方向具有在之前和现在的情况之间相反; 以及用于当反转确定单元64检测到反转时通过在移动元件3中流动的电流的相位来模拟稳定点的稳定点模拟器。

9. 发明申请

US20070175422A1 Control device for hydraulic actuator in piston 有权
标题翻译：活塞液压执行机构控制装置
公开(公告)号：US20070175422A1
公开(公告)日：2007-08-02
申请号：US11645669
申请日：2006-12-27
申请人： Kazutaka Takahashi , Yuuichi Ito , Takashi Kondo
发明人： Kazutaka Takahashi , Yuuichi Ito , Takashi Kondo
IPC分类号： F02B75/04 , F02D15/02
CPC分类号： F02B75/044 , F02D15/02
摘要： In a control device for a hydraulic actuator, one end of an oil passage that is provided through a connecting rod, a crankshaft and a crankcase supporting the crankshaft is connected to a hydraulic chamber of a hydraulic actuator provided in a piston connected to the crankshaft via the connecting rod with the other end of the oil passage being connected to an oil reservoir and a hydraulic pressure source via a main switching valve. An auxiliary switching valve is provided in the connecting rod. The auxiliary switching valve causes a downstream side of the oil passage that leads to the hydraulic chamber to open into the crankcase when the main switching valve allows the oil passage to communicate with the oil reservoir.
摘要翻译：在用于液压执行器的控制装置中，通过连杆，曲轴和支撑曲轴的曲柄轴设置的油路的一端连接到设置在与曲轴连接的活塞中的液压致动器的液压室油路另一端的连杆通过主切换阀连接到储油器和液压源。辅助切换阀设在连杆中。当主切换阀允许油路与储油器连通时，辅助切换阀使油路的下游侧通向液压室而进入曲轴箱。

10. 发明申请

US20060186845A1 Servo controller 有权
标题翻译：伺服控制器
公开(公告)号：US20060186845A1
公开(公告)日：2006-08-24
申请号：US10552825
申请日：2003-04-11
申请人： Kei Terada , Tetsuaki Nagano , Kazutaka Takahashi , Takashi Isoda
发明人： Kei Terada , Tetsuaki Nagano , Kazutaka Takahashi , Takashi Isoda
IPC分类号： H02P7/00
CPC分类号： G05B19/19 , G05B2219/41205
摘要： In a servo controller according to the invention, a position feedback correction unit (3) calculates a first-axis position feedback signal (pmfb1) based on a first-axis position (pm1) as a self-axis position, and a second-axis position (pm2) as an other-axis position; and a deviation between a model position (pal) and the first-axis position feedback signal (pmfb1) is inputted from a subtracter (5) to a position control unit (4), which performs positional control to output a velocity command. A velocity feedback correction unit (6) calculates a first-axis velocity feedback signal (wmfb1) from a first-axis velocity (wm1) as the self-axis velocity, and a second-axis velocity (wm2) as the other-axis velocity; and the velocity control unit (8) adds a model velocity (wa1) and the velocity command outputted from the position control unit (5), and subtracts the first-axis velocity feedback signal (wmfb1) therefrom, and outputs a feedback torque command (Tfb1) based on the corrected velocity command.
摘要翻译：在根据本发明的伺服控制器中，位置反馈校正单元（3）基于作为自轴位置的第一轴位置（pm 1）计算第一轴位置反馈信号（pmfb 1），并且第二轴位置反馈信号轴位置（pm 2）作为另一轴位置; 并且将模型位置（pal）和第一轴位置反馈信号（pmfb 1）之间的偏差从减法器（5）输入到执行位置控制以输出速度命令的位置控制单元（4）。速度反馈校正单元（6）从第一轴速度（wm 1）作为自身轴速度计算第一轴速度反馈信号（wmfb 1），另外作为第二轴速度（wm 2）轴速度速度控制单元（8）将模型速度（wa 1）和从位置控制单元（5）输出的速度指令相加，并从其中减去第一轴速度反馈信号（wmfb 1），并输出反馈扭矩命令（Tfb 1）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式