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1. 发明授权

US09892940B2 Spray assembly and wet etching device having the same 有权
公开(公告)号：US09892940B2
公开(公告)日：2018-02-13
申请号：US14781137
申请日：2015-07-08
申请人： Shenzhen China Star Optoelectronics Technology Co., Ltd.
发明人： Jia Li
IPC分类号： B05B1/20 , H01L21/67 , B05B13/02 , B05B15/08
CPC分类号： H01L21/6708 , B05B1/20 , B05B13/02 , B05B13/0278 , B05B15/65 , B05B15/68 , H01L21/6715
摘要： A spray assembly including a spray pipe with a bottom provided with a plurality of first through holes, each having a nozzle, wherein the nozzle includes a slider with an area larger than the first through hole, to cover the first through hole. The nozzle is connected to the slider and protrudes from the first through hole; the nozzle also includes a locking member to connect the slider to the spray pipe. The slider can move to adjust the position of the nozzle in the first through hole. There also provides a wet etching device including a spray unit, wherein the spray unit includes a plurality of spray assemblies as mentioned above, and a plurality of spray pipes in the plurality of spray assemblies are arranged in parallel with each other or approximately in parallel with each other.

2. 发明授权

US09474165B2 Substrate delivery device and strong acid or strong base etching adequate for wet process 有权
标题翻译：基材输送装置和强酸或强碱蚀刻足以进行湿法处理
公开(公告)号：US09474165B2
公开(公告)日：2016-10-18
申请号：US14398447
申请日：2014-08-15
申请人： Shenzhen China Star Optoelectronics Technology Co., Ltd.
发明人： Haifeng Deng , Jia Li
IPC分类号： H05K3/00 , B65G49/06 , H01L21/673 , C03C15/00 , C09K13/08 , H01L31/18 , H01L51/56 , H05K3/06 , H01L21/677
CPC分类号： H05K3/068 , B65G49/064 , C03C15/00 , C09K13/08 , H01L21/67706 , H01L21/6776 , H01L31/18 , H01L51/56
摘要： The present invention provides a substrate delivery device and a strong acid or strong base etching adequate for a wet process. The substrate delivery device comprises: a plurality of first delivery rollers (2) parallel to one another in an etching chamber (1), a plurality of second delivery rollers (4) parallel to one another in a cleaning chamber (3) and a carrier (5) employed for carrying a substrate (100); the carrier (5) comprises two first side frames (51) located along a direction of delivering the substrate (100), two second side frames (53) connected to ends of the two first side frames (51), a plurality of first and second connection parts (55, 57) which are intercrossing and orthogonal in an area surrounded by the two first side frames (51) and the two second side frames (53) and a plurality of supports (59) at joins of the plurality of first and second connection parts (55, 57); the plurality of first and second connection parts (55, 57) are intercrossing and orthogonal with one another to form a plurality of hollow parts (52); the substrate (100) is located on the carrier (5).
摘要翻译：本发明提供了一种衬底输送装置和适用于湿法的强酸或强碱蚀刻。基板输送装置包括：在蚀刻室（1）中彼此平行的多个第一输送辊（2），在清洁室（3）中彼此平行的多个第二输送辊（4）和载体（5）用于承载基板（100）; 载体（5）包括沿着输送基板（100）的方向定位的两个第一侧框架（51），连接到两个第一侧框架（51）的端部的两个第二侧框架（53），多个第一和在由两个第一侧框架（51）和两个第二侧框架（53）围绕的区域中交叉且正交的第二连接部件（55,57）和在多个第一侧框架（51）的连接处的多个支撑件和第二连接部分（55,57）; 多个第一和第二连接部分（55,57）彼此交叉并正交，以形成多个中空部分（52）; 基板（100）位于载体（5）上。

3. 发明授权

US09522844B2 Low temperature poly-silicon thin film preparation apparatus and method for preparing the same 有权
标题翻译：低温多晶硅薄膜制备装置及其制备方法
公开(公告)号：US09522844B2
公开(公告)日：2016-12-20
申请号：US14408337
申请日：2014-09-23
申请人： Shenzhen China Star Optoelectronics Technology Co., Ltd.
发明人： Jia Li
IPC分类号： F26B21/06 , C03C17/245 , C03C23/00
CPC分类号： C03C17/245 , C03C23/0025 , C03C23/0075 , C03C2217/262 , C03C2218/31
摘要： A low temperature poly-silicon thin film preparation apparatus and a method for preparing the same are disclosed, the preparation apparatus comprises a substrate cleaning tank and an ozone generating device connected thereto, such that not only can blow off residual liquid on a surface of a glass substrate, but can also allow the glass substrate to directly contact the ozone, such that a silicon film on the surface of the glass substrate is more smooth and less impure, and an oxide film formed on the surface is more uniform since it contacts with the ozone at the first time after being cleaned by hydrofluoric acid, therefore the crystalline effect is more excellent.
摘要翻译：公开了一种低温多晶硅薄膜制备装置及其制备方法，所述制备装置包括基板清洗槽和与其连接的臭氧发生装置，使得不仅可以将残留液体吹出到玻璃基板，也可以使玻璃基板直接接触臭氧，使得玻璃基板表面的硅膜更平滑，更不透明，并且形成在表面上的氧化膜更均匀，因为它与臭氧在第一次被氢氟酸清洗后，结晶效果更好。

4. 发明申请

US20180108545A1 WET ETCHING DEVICE AND EXPLOSION PREVENTION METHOD THEREOF 审中-公开
公开(公告)号：US20180108545A1
公开(公告)日：2018-04-19
申请号：US15117450
申请日：2016-06-20
申请人： Shenzhen China Star Optoelectronics Technology Co., Ltd.
发明人： Jia Li
IPC分类号： H01L21/67 , G02F1/13 , C23F1/00
CPC分类号： H01L21/67023 , C23F1/00 , C23F1/08 , C23F1/18 , G02F1/1303 , G02F1/136286 , G02F2001/13606 , H01L21/67051 , H01L21/6708 , H01L21/67109 , H01L21/67248 , H01L27/124
摘要： The present invention provides a wet etching device and an explosion prevention method thereof. The heater (22) is utilized to monitor the temperature in the liquid storage tank (2). When the temperature in the liquid storage tank (2) reaches the preset upper temperature limit, the control device (23) automatically deactivates the heater (22), and activates the chamber cleaning device (11) to spray the cleaning water. After washing the reaction chamber (1), the cleaning water flows back in the liquid storage tank (2) and neutralizes the etching solution in the liquid storage tank (2) to lower the temperature in the liquid storage tank (2). It can effectively monitor and reduce the temperature in the liquid storage tank (2) to prevent that the liquid storage tank (2) is overheated and explodes, to ensure the production safety and raise the production utilization rate.

5. 发明授权

US09487369B2 Swing-type sensor assembly 有权
标题翻译：摆式传感器组件
公开(公告)号：US09487369B2
公开(公告)日：2016-11-08
申请号：US14241423
申请日：2014-01-21
申请人： SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Jia Li
IPC分类号： G01H11/00 , B65H7/02 , G01H1/00
CPC分类号： B65H7/02 , B65H2406/122 , B65H2511/51 , B65H2513/40 , B65H2553/612 , G01H1/003 , B65H2220/01 , B65H2220/03
摘要： The present disclosure discloses a swing-type sensor assembly, comprising a support and a sensor vibrator. The support is provided with a pin shaft, and the sensor vibrator is connected to the pin shaft and capable of swinging about the pin shaft. The support is further connected to an air pipe, which is capable of blowing air towards the sensor vibrator. The air pipe is provided with a control valve, an inlet of which is connected, via a pipe, to a supply for clean and dry compressed air. The swing-type sensor assembly saves the sensor vibrator from easy adhesion, thus ensuring a restoring force thereof.
摘要翻译：本公开公开了一种摆动式传感器组件，其包括支撑件和传感器振动器。支撑件设置有销轴，传感器振动器连接到销轴并能够围绕销轴摆动。支撑件进一步连接到能够向传感器振动器吹送空气的空气管。空气管设置有控制阀，其入口经由管道连接到用于干净和干燥的压缩空气的供应。摆动式传感器组件可以使传感器振动器不易粘附，从而确保传感器振动器的恢复力。

6. 发明申请

US20150153219A1 SWING-TYPE SENSOR ASSEMBLY 有权
标题翻译： SWING型传感器总成
公开(公告)号：US20150153219A1
公开(公告)日：2015-06-04
申请号：US14241423
申请日：2014-01-21
申请人： SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Jia Li
IPC分类号： G01H1/00
CPC分类号： B65H7/02 , B65H2406/122 , B65H2511/51 , B65H2513/40 , B65H2553/612 , G01H1/003 , B65H2220/01 , B65H2220/03
摘要： The present disclosure discloses a swing-type sensor assembly, comprising a support and a sensor vibrator. The support is provided with a pin shaft, and the sensor vibrator is connected to the pin shaft and capable of swinging about the pin shaft. The support is further connected to an air pipe, which is capable of blowing air towards the sensor vibrator. The air pipe is provided with a control valve, an inlet of which is connected, via a pipe, to a supply for clean and dry compressed air. The swing-type sensor assembly saves the sensor vibrator from easy adhesion, thus ensuring a restoring force thereof.
摘要翻译：本公开公开了一种摆动式传感器组件，其包括支撑件和传感器振动器。支撑件设置有销轴，传感器振动器连接到销轴并能够围绕销轴摆动。支撑件进一步连接到能够向传感器振动器吹送空气的空气管。空气管设置有控制阀，其入口经由管道连接到用于干净和干燥的压缩空气的供应。摆动式传感器组件可以使传感器振动器不易粘附，从而确保传感器振动器的恢复力。

7. 发明授权

US09676661B2 Etching method of glass substrate and wet etching apparatus thereof 有权
公开(公告)号：US09676661B2
公开(公告)日：2017-06-13
申请号：US14381984
申请日：2014-07-14
申请人： Shenzhen China Star Optoelectronics Technology Co., Ltd.
发明人： Jia Li
IPC分类号： C03C15/00
CPC分类号： H01L21/67086 , C03C15/00 , H01L21/67051 , H01L21/67057 , H01L21/67075
摘要： The present invention provides an etching method of a glass substrate and a wet etching apparatus thereof. The etching method of the glass substrate comprises steps of: providing a glass substrate (1) to be etched, a wet bench (3), etchants and a supply line (7); setting a tank (9) in the wet bench (3); filling in the tank (9) with a predetermined amount of the etchants through the supply line (7); delivering the glass substrate (1) to be etched into the wet bench (3); raising the tank (9) until the glass substrate (1) is completely immersed with the etchants in the tank (9); lowering the tank (9) to expose the glass substrate (1) after a predetermined soaking time. The etching method of the glass substrate is simple and easy for operation. It is capable of shortening the etching process time and raising the production efficiency.

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