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    • 6. 发明授权
    • Memory device and method of making same
    • 存储器件及其制作方法
    • US07902536B2
    • 2011-03-08
    • US11495927
    • 2006-07-28
    • Wolodymyr CzubatyjTyler LowreySergey Kostylev
    • Wolodymyr CzubatyjTyler LowreySergey Kostylev
    • H01L29/02H01L47/00
    • G11C11/5678G11C11/56G11C13/0004H01L45/06H01L45/122H01L45/143H01L45/144H01L45/148
    • A radial memory device includes a phase-change material, a first electrode in electrical communication with the phase-change material, the first electrode having a substantially planar first area of electrical communication with the phase-change material. The radial memory device also includes a second electrode in electrical communication with the phase-change material, the second electrode having a second area of electrical communication with the phase-change material, the second area being laterally spacedly disposed from the first area and substantially circumscribing the first area.Further, a method of making a memory device is disclosed. The steps include depositing a first electrode, depositing a first insulator, configuring the first insulator to define a first opening. The first opening provides for a generally planar first contact of the first electrode. The method further including the steps of depositing a phase-change material, depositing a second insulator, configuring the second insulator, depositing a second electrode having a second contact laterally displaced from said first contact, and configuring said second electrode.
    • 径向存储器件包括相变材料,与相变材料电连通的第一电极,第一电极具有与相变材料电连通的基本平坦的第一区域。 所述径向存储装置还包括与所述相变材料电连通的第二电极,所述第二电极具有与所述相变材料电连通的第二区域,所述第二区域与所述第一区域横向间隔设置并且基本上限定 第一个区域。 此外,公开了一种制造存储器件的方法。 这些步骤包括沉积第一电极,沉积第一绝缘体,构成第一绝缘体以限定第一开口。 第一开口提供第一电极的大致平面的第一接触。 该方法还包括以下步骤:沉积相变材料,沉积第二绝缘体,构成第二绝缘体,沉积具有从所述第一触点横向移位的第二触点的第二电极,以及配置所述第二电极。
    • 10. 发明申请
    • Chalcogenide devices incorporating chalcogenide materials having reduced germanium or telluruim content
    • 含有具有降低的锗或碲化物含量的硫族化物材料的硫族化物装置
    • US20070034850A1
    • 2007-02-15
    • US11200466
    • 2005-08-09
    • Sergey KostylevTyler LowreyGuy WickerWolodymyr Czubatyj
    • Sergey KostylevTyler LowreyGuy WickerWolodymyr Czubatyj
    • H01L47/00
    • H01L45/06H01L45/1233H01L45/144H01L45/1625
    • A chalcogenide material and chalcogenide memory device having less stringent requirements for formation, improved thermal stability and/or faster operation. The chalcogenide materials include materials comprising Ge, Sb and Te in which the Ge and/or Te content is lean relative to the commonly used Ge2Sb2Te5 chalcogenide composition. Electrical devices containing the instant chalcogenide materials show a rapid convergence of the set resistance during cycles of setting and resetting the device from its as-fabricated state, thus leading to a reduced or eliminated need to subject the device to post-fabrication electrical formation prior to end-use operation. Improved thermal stability is manifested in terms of prolonged stability of the resistance of the device at elevated temperatures, which leads to an inhibition of thermally induced setting of the reset state in the device. Significant improvements in the 10 year data retention temperature are demonstrated. Faster device operation is achieved through an increased speed of crystallization, which acts to shorten the time required to transform the chalcogenide material from its reset state to its set state in an electrical memory device.
    • 一种硫族化物材料和硫族化物记忆装置,其对形成,改进的热稳定性和/或更快的操作要求不太严格。 硫属化物材料包括Ge,Sb和Te的材料,其中Ge和/或Te含量相对于通常使用的Ge 2 Sb 2 Te 5是稀的 硫族化合物组合物。 包含瞬时硫族化物材料的电气装置显示设定循环期间的设定电阻的快速收敛以及将器件从其制造状态复位,从而导致减少或消除了将器件置于后制造电形成之前 最终使用操作。 改进的热稳定性表现在器件在升高的温度下的电阻的延长的稳定性,这导致抑制器件中复位状态的热诱导设置。 展示了10年数据保存温度的显着改进。 通过提高结晶速度实现更快的器件操作,其用于缩短将硫族化物材料从其复位状态转换到其在电存储器件中的设定状态所需的时间。