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    • 3. 发明申请
    • SPUTTERING DEVICE
    • 喷射装置
    • US20130270111A1
    • 2013-10-17
    • US13740596
    • 2013-01-14
    • Bo-Hwan PARKWoo-Su LEE
    • Bo-Hwan PARKWoo-Su LEE
    • C23C14/56
    • C23C14/56
    • A sputtering device, including a chamber providing a reaction space, a sputter unit including a target disposed in the chamber, and a conveying unit including a plurality of rollers for supporting a substrate and for conveying the substrate relative to the target along a first direction, the conveying unit including fixed roller units having a predetermined diameter, and a variable roller unit having a diameter that changes in a second direction at both ends thereof, the second direction being orthogonal to the first direction.
    • 一种溅射装置,包括提供反应空间的室,包括设置在室中的靶的溅射单元,以及包括用于支撑基板并用于相对于目标沿着第一方向输送基板的多个辊的输送单元, 所述输送单元包括具有预定直径的固定辊单元和可变辊单元,所述可变辊单元的两端具有沿第二方向变化的直径,所述第二方向与所述第一方向正交。