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    • 4. 发明申请
    • Apparatus and method for making call connection when parties try to sumultaneously call each other
    • 当各方尝试同时呼叫时进行呼叫连接的装置和方法
    • US20070121831A1
    • 2007-05-31
    • US11501908
    • 2006-08-10
    • Seong-Gu KimJae-Kwon OhChan-Ho Ha
    • Seong-Gu KimJae-Kwon OhChan-Ho Ha
    • H04M11/00
    • H04M3/42H04M3/42059H04M3/42102H04M2201/18H04M2201/22
    • An apparatus and method for establishing a call connection when two parties try to simultaneously call each other are provided, in which, a simultaneous signal comparator determines, upon receipt of a call connection request, whether a calling terminal and a called terminal are trying to call each other simultaneously, and if the calling terminal and the called terminal are busy when calling each other simultaneously, requests rejection of a call connection request from at least one of the calling terminal and the called terminal, and setup a call connection between the calling terminal and the called terminal. A switch rejects the call connection request from the at least one of the calling terminal and the called terminal, and establishes the call connection between the calling terminal and the called terminal according to the request of the simultaneous signal comparator.
    • 提供了一种当双方尝试同时呼叫时建立呼叫连接的装置和方法,其中同时信号比较器在接收到呼叫连接请求时确定主叫终端和被叫终端是否正在尝试呼叫 并且如果主叫终端和被叫终端同时呼叫时忙碌,则请求从主叫终端和被叫终端中的至少一个拒绝呼叫连接请求,并且在呼叫终端之间建立呼叫连接 和被叫终端。 交换机拒绝来自主叫终端和被叫终端中的至少一个的呼叫连接请求,并且根据同时信号比较器的请求建立主叫终端与被叫终端之间的呼叫连接。
    • 9. 发明授权
    • Sputtering apparatus for forming a metal film using a magnetic field
    • 使用磁场形成金属膜的溅射装置
    • US06723215B2
    • 2004-04-20
    • US10106220
    • 2002-03-27
    • Young-Kyou ParkHyeon-Ill UmJai-Kwang ShinSeong-Gu Kim
    • Young-Kyou ParkHyeon-Ill UmJai-Kwang ShinSeong-Gu Kim
    • C23C1435
    • C23C14/35H01J37/3402
    • A sputtering apparatus includes a sputtering chamber, a target disposed in the sputtering chamber, and a magnetic field generator for generating a rotating magnetic field at the front of the target. The magnetic field generator includes a main magnetic field-generating part that faces the back of the target and is horizontally (laterally) offset from a vertical line passing through the center of the target. A magnetic annulus of the main magnetic field-generating part forms a magnetic enclosure having openings therethrough at locations faced in the directions of the central and peripheral portions of the target. The magnetic field-generating part thus produces a magnetic field having a non-uniform distribution at the front of the target. A substrate is positioned within the sputtering chamber facing the front of the target. A metal layer is formed by sputtering atoms from the front of the target onto the substrate. The behavior of the sputtered atoms can be effectively controlled by the magnetic field.
    • 溅射装置包括溅射室,设置在溅射室中的靶和用于在靶的前部产生旋转磁场的磁场发生器。 磁场发生器包括面向目标背面的水平(横向)偏离通过目标中心的垂直线的主磁场产生部分。 主磁场产生部分的磁环形成一个磁性外壳,在与目标的中心部分和周边部分的方向相对的位置处具有穿过其的开口。 因此,磁场产生部分产生在靶的前部具有不均匀分布的磁场。 衬底位于溅射室内面向靶的前部。 通过将原子从靶的前部溅射到基底上而形成金属层。 溅射原子的行为可以被磁场有效地控制。