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1. 发明申请

US20110305543A1 SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工设备
公开(公告)号：US20110305543A1
公开(公告)日：2011-12-15
申请号：US13156925
申请日：2011-06-09
申请人： Seiyo NAKASHIMA , Yuichi MATSUDA , Takashi NOGAMI , Shinobu SUGIURA , Tomoyuki YAMADA
发明人： Seiyo NAKASHIMA , Yuichi MATSUDA , Takashi NOGAMI , Shinobu SUGIURA , Tomoyuki YAMADA
IPC分类号： H01L21/677 , H01L21/673
CPC分类号： H01L21/67757 , H01L21/67017
摘要： A substrate processing apparatus includes a holder configured to hold a substrate and carry the substrate into a process chamber, a waiting station located outside the process chamber in which the holder waits prior to carrying the substrate into the process chamber, a circulation path configured to circulate a gas throughout the waiting station, and an exhaust path formed in the circulation path and configured to exhaust the gas from the waiting station.
摘要翻译：基板处理装置包括保持器，其构造成保持基板并将基板运送到处理室中，等待站位于处理室外部，其中保持器在将基板运送到处理室之前等待，循环路径被配置为循环整个等候站内的气体，以及形成在循环路径中的排气路径，其构造成从等待站排出气体。

2. 发明申请

US20090037855A1 SIMULATION METHOD AND COMPUTER-READABLE STORAGE MEDIUM 有权
标题翻译：模拟方法和计算机可读存储介质
公开(公告)号：US20090037855A1
公开(公告)日：2009-02-05
申请号：US12111470
申请日：2008-04-29
申请人： Yusuke TANEFUSA , Norihiro HARADA , Tsuyoshi SAKATA , Tomoyuki YAMADA
发明人： Yusuke TANEFUSA , Norihiro HARADA , Tsuyoshi SAKATA , Tomoyuki YAMADA
IPC分类号： G06F17/50
CPC分类号： G06F17/5031
摘要： A simulation method to be implemented in a computer causes the computer to execute a procedure carrying out a weighting with respect to layout parameters of a circuit, which is an analyzing target, based on priority information of cells forming the circuit, and converting the weighted layout parameters into physical characteristics and storing the physical characteristics in a memory part, a procedure converting the physical characteristic read from the memory part into circuit parameters and storing the circuit parameters into the memory part, and analyzing the circuit based on a net list including the circuit parameters read from the memory part.
摘要翻译：要在计算机中实现的模拟方法使得计算机基于作为分析对象的电路的布局参数，基于形成电路的单元的优先级信息来执行对加权的加权，并且将加权布局参数转换为物理特性并将物理特性存储在存储器部分中，将从存储器部分读取的物理特性转换为电路参数并将电路参数存储到存储器部分中的过程，以及基于包括电路的网络列表来分析电路参数从内存部分读取。

3. 发明申请

US20100078128A1 SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工设备
公开(公告)号：US20100078128A1
公开(公告)日：2010-04-01
申请号：US12568175
申请日：2009-09-28
申请人： Tomoyuki YAMADA , Mamoru Oishi , Kanako Kitayama
发明人： Tomoyuki YAMADA , Mamoru Oishi , Kanako Kitayama
IPC分类号： H01L21/465 , B05C11/00
CPC分类号： C23C16/455 , C23C16/45561 , Y10T137/218 , Y10T137/2202 , Y10T137/2213 , Y10T137/2218 , Y10T137/8593 , Y10T137/87917
摘要： A gas flow of a gas pipe is indicated before an electromagnetic valve is actually opened, so that the electromagnetic valve can be prevented from being opened or closed by a wrong manipulation or hazards caused by undesired mixing of gases can be avoided so as to improve safety. The substrate processing apparatus includes a state detection unit configured to detect an opening/closing request state and an opening/closing state of a valve installed at a gas pipeline; and a indication unit configured to indicate a gas flow state of the gas pipeline predicted according to the opening/closing request state and a gas flow state of the gas pipeline when the valve is opened, in a way that each state is distinguished.
摘要翻译：在电磁阀实际打开之前，指示气体管道的气体流动，从而可以防止电磁阀由于错误的操作而被打开或关闭，或者避免由于气体的不期望的混合引起的危险，从而提高安全性。基板处理装置包括状态检测单元，其被配置为检测安装在气体管道处的阀的打开/关闭请求状态和打开/关闭状态; 以及指示单元，其被配置为以每种状态被区分的方式指示根据打开/关闭请求状态预测的气体管道的气体流动状态和当打开阀时气体管道的气体流动状态。

4. 发明申请

US20080230874A1 SEMICONDUCTOR DEVICE AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE 有权
标题翻译：半导体器件和半导体器件的制造方法
公开(公告)号：US20080230874A1
公开(公告)日：2008-09-25
申请号：US12053903
申请日：2008-03-24
申请人： Tomoyuki YAMADA , Fumio USHIDA , Shigetoshi TAKEDA , Tomoharu AWAYA , Koji BANNO , Takayoshi MINAMI
发明人： Tomoyuki YAMADA , Fumio USHIDA , Shigetoshi TAKEDA , Tomoharu AWAYA , Koji BANNO , Takayoshi MINAMI
IPC分类号： H01L23/58 , H01L21/304
CPC分类号： H01L23/562 , H01L21/78 , H01L23/5226 , H01L23/528 , H01L23/5283 , H01L23/53228 , H01L23/53238 , H01L23/585 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device provided on a semiconductor substrate includes an element region including an element, a moisture-resistant frame surrounding the element region, an insulating layer provided between the moisture-resistant frame and an outer peripheral edge of the semiconductor device and on the semiconductor substrate, a first metal line extending along the outer peripheral edge and provided in the insulating layer, and a groove provided in the insulating layer.
摘要翻译：设置在半导体基板上的半导体器件包括：包含元件的元件区域，围绕元件区域的防潮框架;设置在防潮框架和半导体器件的外周边缘之间以及半导体衬底上的绝缘层，沿着外周缘延伸并设置在绝缘层中的第一金属线和设置在绝缘层中的槽。

5. 发明申请

US20110035716A1 DESIGN SUPPORT PROGRAM, DESIGN SUPPORT DEVICE, AND DESIGN SUPPORT METHOD 有权
标题翻译：设计支持计划，设计支持设备和设计支持方法
公开(公告)号：US20110035716A1
公开(公告)日：2011-02-10
申请号：US12849337
申请日：2010-08-03
申请人： Toshio HINO , Tsuyoshi SAKATA , Tomoyuki YAMADA
发明人： Toshio HINO , Tsuyoshi SAKATA , Tomoyuki YAMADA
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/78
摘要： A design support program stored in a recording medium readable by a computer includes acquiring a first analysis result including information about an area included in circuit information of a design target circuit and a second analysis result relating to a path of the circuit information, the temperature of the area being equal to or higher than a certain temperature; determining an arbitrary cell on a non-critical path from among cells arranged in the area as a target cell for decreasing the area temperature; and outputting a result of the determination.
摘要翻译：存储在可由计算机读取的记录介质中的设计支持程序包括获取包括关于设计目标电路的电路信息中包括的区域的信息的第一分析结果和与电路信息的路径相关的第二分析结果，该面积等于或高于一定温度; 从布置在该区域中的小区之间的非关键路径上确定任意小区作为用于降低区域温度的目标小区; 并输出确定的结果。

6. 发明申请

US20090192652A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20090192652A1
公开(公告)日：2009-07-30
申请号：US12260211
申请日：2008-10-29
申请人： Tomoyuki YAMADA
发明人： Tomoyuki YAMADA
IPC分类号： G05D7/06 , H01L21/306 , C23C16/455
CPC分类号： H01L21/67109 , H01L21/67253
摘要： Provided is a substrate processing apparatus which is capable of detecting malfunction of mechanisms installed inside MFC. An inert gas supply line (308) for supplying an inert gas, a first shut-off valve (300) for shutting off the supply of the inert gas, a process gas supply line (310) for supplying a process gas, and a second shut-off valve (302) for shutting off the supply of the process gas are installed at the upstream side of the MFC (241). A gas supply pipe (232) connected to a process chamber (210), a third shut-off valve (304) for shutting off the supply of gas to the gas supply pipe (232), an exhaust vent line (318) which is exhaustible, a fourth shut-off valve (306) for shutting off the supply of gas to the exhaust vent line (318) are installed at the downstream side of the MFC (241). A main control unit (239) determines that the MFC (241) is abnormal if a transition time exceeds a previously set time when the MFC (241) transits from a close state to an open state while the shut-off valves are in a close state.
摘要翻译：提供了能够检测安装在MFC内部的机构的故障的基板处理装置。用于供应惰性气体的惰性气体供应管线（308），用于切断惰性气体供应的第一截止阀（300），用于供给处理气体的处理气体供应管线（310）和第二用于切断处理气体供给的切断阀（302）安装在MFC（241）的上游侧。连接到处理室（210）的气体供给管（232），用于切断向气体供给管（232）供给气体的第三切断阀（304），排气排气管线（318）在所述MFC（241）的下游侧安装有用于切断向所述排气导管（318）供给气体的第四截止阀（306）。如果当MFC（241）从关闭状态转换到打开状态而转换时间超过预先设定的时间时，主控制单元（239）确定MFC（241）异常，而截止阀处于闭合状态州。

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