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1. 发明授权

US07030998B2 Phase measurement apparatus for measuring characterization of optical thin films 失效
标题翻译：用于测量光学薄膜表征的相位测量装置
公开(公告)号：US07030998B2
公开(公告)日：2006-04-18
申请号：US10356231
申请日：2003-01-31
申请人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
发明人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
摘要翻译：用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和计算单元，用于基于剪切干扰信息计算胶片的相位特性。

2. 发明授权

US07327467B2 Phase measuring method and apparatus for measuring characterization of optical thin films 失效
标题翻译：用于测量光学薄膜表征的相位测量方法和装置
公开(公告)号：US07327467B2
公开(公告)日：2008-02-05
申请号：US11264044
申请日：2005-11-02
申请人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
发明人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
摘要翻译：用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和计算单元，用于基于剪切干扰信息计算胶片的相位特性。

3. 发明申请

US20060055940A1 Phase measuring method and apparatus for measuring characterization of optical thin films 失效
标题翻译：用于测量光学薄膜表征的相位测量方法和装置
公开(公告)号：US20060055940A1
公开(公告)日：2006-03-16
申请号：US11264044
申请日：2005-11-02
申请人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
发明人： Seiji Takeuchi , Akiyoshi Suzuki , Minoru Yoshii
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
摘要翻译：用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和计算单元，用于基于剪切干扰信息计算胶片的相位特性。

4. 发明授权

US5861952A Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
标题翻译：包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置
公开(公告)号：US5861952A
公开(公告)日：1999-01-19
申请号：US984509
申请日：1992-12-02
申请人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
发明人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
IPC分类号： G01N21/94 , G01B9/02 , G01N21/88
CPC分类号： G01N21/94
摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要翻译：具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。激光束随后被半反射镜分开。其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

5. 发明授权

US5610715A Displacement detecting system, an expose apparatus, and a device manufacturing method employing a scale whose displacement is detected by a selected detection head 失效
标题翻译：位移检测系统，曝光装置以及使用由所选检测头检测位移的标度的装置制造方法
公开(公告)号：US5610715A
公开(公告)日：1997-03-11
申请号：US412309
申请日：1995-03-29
申请人： Minoru Yoshii , Kyoichi Miyazaki , Seiji Takeuchi
发明人： Minoru Yoshii , Kyoichi Miyazaki , Seiji Takeuchi
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , G01B9/02
CPC分类号： G03F7/70775 , G03F9/70
摘要： A displacement detecting system includes a scale provided on a surface of a movable object and having a diffraction grating formed along a predetermined direction, a head unit disposed above the surface of the movable object and having a plurality of detection heads, for detecting displacement of the scale in the predetermined direction, the detection heads being disposed along a direction different from the predetermined direction, and a selecting device for selecting at least one detection head out of the detection heads, for detection of a displacement of the scale in the predetermined direction.
摘要翻译：位移检测系统包括设置在可移动物体的表面上并具有沿着预定方向形成的衍射光栅的标尺，头单元，其设置在可移动物体的表面上方并具有多个检测头，用于检测位移检测头沿着与预定方向不同的方向设置，以及选择装置，用于从检测头中选择至少一个检测头，以检测标尺在预定方向上的位移。

6. 发明授权

US5486919A Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 失效
标题翻译：用于在具有图案的基板上检查颗粒（如果有的话）的检查方法和装置
公开(公告)号：US5486919A
公开(公告)日：1996-01-23
申请号：US76951
申请日：1993-06-15
申请人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
发明人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
IPC分类号： G01J9/02 , G01J9/04 , G01N21/88 , G01N21/94 , G03F7/20 , G01B9/02
CPC分类号： G03F7/70616 , G01N21/88 , G01N21/94 , G03F7/7065 , G03F7/70916 , G01J2009/0261 , G01J9/04 , G01N2021/4792 , G01N21/8806
摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要翻译：公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

7. 发明授权

US5750294A Best focus determining method 失效
标题翻译：最佳焦点确定方法
公开(公告)号：US5750294A
公开(公告)日：1998-05-12
申请号：US685464
申请日：1996-07-24
申请人： Masanobu Hasegawa , Minoru Yoshii , Seiji Takeuchi
发明人： Masanobu Hasegawa , Minoru Yoshii , Seiji Takeuchi
IPC分类号： G03B27/72 , G03F7/20 , G03F7/207 , G03F7/22 , G03F9/00 , G03F9/02 , H01L21/027
CPC分类号： G03F7/70558 , G03F7/70241 , G03F7/70591 , G03F7/70641
摘要： Disclosed is a method of determining a best focus position or best exposure amount of a projection lens in an arrangement wherein a reticle is placed on a plane perpendicular to an optical axis of the projection lens, wherein a pattern having periodicity in a predetermined direction is provided on a surface of the reticle, wherein the pattern is transferred to a photosensitive substrate by the projection lens to form a printed pattern thereon. The method includes providing the pattern by using a plurality of zigzag openings of a constant line width, extending in a direction perpendicular to the predetermined direction and being arrayed with a constant periodicity along that direction, transferring the pattern to the photosensitive substrate sequentially with different focus positions to form plural printed patterns thereon, imaging the printed patterns upon an image pickup surface of photoelectrically converting means; calculating, from an imagewise signal produced by the photoelectrically converting means, information related to one frequency component of zigzag lines, constituting an outline of an image of the zigzag opening, and determining the best focus position on the basis of the information.
摘要翻译：公开了一种确定投影透镜的最佳聚焦位置或最佳曝光量的方法，其中将掩模版放置在垂直于投影透镜的光轴的平面上，其中提供了沿预定方向具有周期性的图案在掩模版的表面上，其中通过投影透镜将图案转印到感光基板上，以在其上形成印刷图案。该方法包括通过使用在垂直于预定方向的方向上延伸的恒定线宽度的多个之字形开口来提供图案，并沿着该方向以恒定的周期排列，以不同的焦点依次传送图案到感光基片在其上形成多个印刷图案的位置，将印刷图案成像在光电转换装置的图像拾取表面上; 根据由光电转换装置产生的成像信号，计算与Z字形线的一个频率分量有关的信息，构成Z字形开口的图像的轮廓，并根据该信息确定最佳对焦位置。

8. 发明授权

US07508493B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07508493B2
公开(公告)日：2009-03-24
申请号：US11675204
申请日：2007-02-15
申请人： Seiji Takeuchi , Kenji Yamazoe , Yumiko Ohsaki , Minoru Yoshii
发明人： Seiji Takeuchi , Kenji Yamazoe , Yumiko Ohsaki , Minoru Yoshii
IPC分类号： G03B27/72
CPC分类号： G03F7/70108 , G03F7/70566
摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.
摘要翻译：曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态测量单位。

9. 发明授权

US5767962A Inspection system and device manufacturing method using the same 失效
标题翻译：检验系统和装置制造方法采用该方法
公开(公告)号：US5767962A
公开(公告)日：1998-06-16
申请号：US755352
申请日：1996-11-25
申请人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01B11/30 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/66 , G01N21/00
CPC分类号： G01N21/94
摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.
摘要翻译：检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。

10. 发明授权

US5541729A Measuring apparatus utilizing diffraction of reflected and transmitted light 失效
$Measuring apparatus utilizing diffraction of reflected and transmitted light$
标题翻译：利用衍射反射和透射光的测量装置
公开(公告)号：US5541729A
公开(公告)日：1996-07-30
申请号：US47655
申请日：1993-04-19
申请人： Seiji Takeuchi , Minoru Yoshii , Hiroyasu Nose
发明人： Seiji Takeuchi , Minoru Yoshii , Hiroyasu Nose
IPC分类号： G01B9/02 , G01B11/00 , G01D5/38 , G02B27/28 , G03F9/00
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02027 , G01D5/38 , G03F9/7049 , G01B2290/15 , G01B2290/30 , G01B2290/45 , G01B2290/70
摘要： In measuring apparatus for detecting relative displacement of a diffraction grating, a light beam is separated in an optical unit such as polarizing beam splitter into a reflected light beam and a transmitted light beam which beams are projected onto the diffraction grating. The diffracted light of the reflected and transmitted light beams are deflected by a deflection unit to be projected again onto the diffraction grating for rediffraction. The rediffracted light of the reflected and transmitted light beams are combined in the polarizing beam splitter and a detector detects the interference state of the combined rediffracted light. The deflection unit deflects the diffracted light beams of the reflected light and transmitted light so that they reenter the diffraction grating after traveling along the same optical path in the directions opposite to each other. The apparatus provides a simple configuration that prevents reduction of light intensity and provides the same optical path for both reference and displacement measuring light beams so that errors caused by fluctuation in air and heterogeneity in optical components are cancelled.
摘要翻译：在用于检测衍射光栅的相对位移的测量装置中，光束在诸如偏振分束器的光学单元中被分离为反射光束和透射光束，该光束被投射到衍射光栅上。反射和透射光束的衍射光被偏转单元偏转，以再次投影到衍射光栅上以进行红移。反射和透射光束的再衍射光组合在偏振分束器中，检测器检测组合的红光的干涉状态。偏转单元使反射光的衍射光和透射光偏转，使得它们沿相同的光路在彼此相反的方向上行进之后重新进入衍射光栅。该装置提供了防止光强降低的简单结构，并为参考和位移测量光束提供相同的光路，从而消除由空气波动和光学部件中的异质性引起的误差。

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