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1. 发明授权

US07508493B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07508493B2
公开(公告)日：2009-03-24
申请号：US11675204
申请日：2007-02-15
申请人： Seiji Takeuchi , Kenji Yamazoe , Yumiko Ohsaki , Minoru Yoshii
发明人： Seiji Takeuchi , Kenji Yamazoe , Yumiko Ohsaki , Minoru Yoshii
IPC分类号： G03B27/72
CPC分类号： G03F7/70108 , G03F7/70566
摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.
摘要翻译：曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态测量单位。

2. 发明申请

US20070188730A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070188730A1
公开(公告)日：2007-08-16
申请号：US11675204
申请日：2007-02-15
申请人： Seiji Takeuchi , Kenji Yamazoe , Yumiko Ohsaki , Minoru Yoshii
发明人： Seiji Takeuchi , Kenji Yamazoe , Yumiko Ohsaki , Minoru Yoshii
IPC分类号： G03B27/72
CPC分类号： G03F7/70108 , G03F7/70566
摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.
摘要翻译：曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态测量单位。

3. 发明申请

US20080062427A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080062427A1
公开(公告)日：2008-03-13
申请号：US11851029
申请日：2007-09-06
申请人： Yumiko Ohsaki , Yasuhiro Sawada , Kenji Yamazoe , Seiji Takeuchi
发明人： Yumiko Ohsaki , Yasuhiro Sawada , Kenji Yamazoe , Seiji Takeuchi
IPC分类号： G01B9/02
CPC分类号： G03F7/70566 , G02B27/0025 , G03F7/706
摘要： An exposure apparatus includes an interferometer which forms interference fringes including aberration information on projection optics using polarized light beams emitted from an illumination system, and a processor which calculates the optical characteristics of the projection optics on the basis of interference patterns sequentially formed by the interferometer using at least three different polarized light beams sequentially generated by a polarization controller. The optical characteristics include unpolarization aberration which does not depend on the polarization state of light entering the projection optics, and polarization aberration which depends on the polarization state of the light entering the projection optics.
摘要翻译：曝光装置包括：干涉仪，其形成干涉条纹，其包括使用从照明系统发射的偏振光束的投影光学器件上的像差信息;以及处理器，其基于由干涉仪依次形成的干涉图案来计算投影光学元件的光学特性，所述干涉图案使用由偏振控制器顺序产生的至少三个不同的偏振光束。光学特性包括不依赖于进入投影光学器件的光的偏振状态的非偏振像差，以及取决于进入投影光学器件的光的偏振状态的偏振像差。

4. 发明授权

US07675629B2 Exposure apparatus and device manufacturing method using a common path interferometer to form an interference pattern and a processor to calculate optical characteristics of projection optics using the interference pattern 失效
标题翻译：使用公共路径干涉仪形成干涉图案的曝光装置和装置制造方法以及使用干涉图案计算投影光学元件的光学特性的处理器
公开(公告)号：US07675629B2
公开(公告)日：2010-03-09
申请号：US11851029
申请日：2007-09-06
申请人： Yumiko Ohsaki , Yasuhiro Sawada , Kenji Yamazoe , Seiji Takeuchi
发明人： Yumiko Ohsaki , Yasuhiro Sawada , Kenji Yamazoe , Seiji Takeuchi
IPC分类号： G01B9/02
CPC分类号： G03F7/70566 , G02B27/0025 , G03F7/706
摘要： An exposure apparatus including an illumination system which illuminates an original, and projection optics which project a pattern of the original illuminated by the illumination system onto a substrate. The apparatus includes an interferometer which forms an interference pattern including aberration information on the projection optics using a polarized light beam emitted from the illumination system, in which the interferometer is a common path interferometer in which two light beams forming interference pattern pass along a path in the projection optics, and a processor which calculates optical characteristics of the projection optics on the basis of the interference pattern formed by the interferometer. The illumination system including a polarization controller which sequentially generates at least three difference polarized light beams with respective polarization states different from each other. The processor separates first aberration and second aberration from wavefront aberration represented by the interference patterns sequentially formed by the interferometer using the at least three different polarized light beams, by calculating a data of the interference patterns, the first aberration being aberration which does not change dependent on a polarization state of polarized light beam entering the projection optics. The second aberration is aberration which changes dependent on the polarization state of the polarized light beam entering the projection optics.
摘要翻译：一种曝光装置，包括照亮原稿的照明系统，以及投影光学元件，其将由照明系统照射的原稿的图案投影到基板上。该装置包括干涉仪，其使用从照明系统发射的偏振光形成包括投影光学器件上的像差信息的干涉图案，其中干涉仪是公共路径干涉仪，其中形成干涉图案的两个光束沿着路径投影光学器件和基于由干涉仪形成的干涉图案来计算投影光学元件的光学特性的处理器。所述照明系统包括偏振控制器，其顺序地产生具有彼此不同的各自偏振状态的至少三个差分偏振光束。处理器通过计算干涉图案的数据，使用至少三个不同的偏振光束分离由干涉仪顺序形成的干涉图案所表示的波前像差的第一像差和第二像差，第一像差是不依赖于变化的像差在入射到投影光学器件的偏振光束的偏振状态下。第二像差是根据进入投影光学器件的偏振光束的偏振状态而变化的像差。

5. 发明申请

US20090066925A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD 失效
标题翻译：测量装置，曝光装置和装置制造方法
公开(公告)号：US20090066925A1
公开(公告)日：2009-03-12
申请号：US12205288
申请日：2008-09-05
申请人： Yumiko Ohsaki , Seiji Takeuchi
发明人： Yumiko Ohsaki , Seiji Takeuchi
IPC分类号： G03B27/72 , G01B9/02
CPC分类号： G03B27/72 , G03F7/70566
摘要： The present invention provides a measurement apparatus comprising a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and the optical system, a second polarization control unit which is inserted between the optical system and an image sensor, includes a phase plate, and is configured to control the polarization state of the light, and a processing unit configured to calculate the optical characteristics of the optical system, based on a plurality of interference patterns sequentially sensed by the image sensor by rotating the phase plate.
摘要翻译：本发明提供了一种测量装置，包括：第一偏振控制单元，被配置为将进入待测光学系统的光的偏振状态控制为至少两个不同的偏振状态;波前分割单元，其插入在第一偏振控制单元并且所述光学系统，插入在所述光学系统和图像传感器之间的第二偏振光控制单元包括相位板，并且被配置为控制所述光的偏振状态，以及处理单元，被配置为计算所述光学特性的光学特性光学系统基于通过旋转相位板由图像传感器顺序感测的多个干涉图案。

6. 发明授权

US07688424B2 Measurement apparatus, exposure apparatus, and device fabrication method 失效
标题翻译：测量装置，曝光装置和装置制造方法
公开(公告)号：US07688424B2
公开(公告)日：2010-03-30
申请号：US12205288
申请日：2008-09-05
申请人： Yumiko Ohsaki , Seiji Takeuchi
发明人： Yumiko Ohsaki , Seiji Takeuchi
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03B27/72 , G03F7/70566
摘要： The present invention provides a measurement apparatus including a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and the optical system, a second polarization control unit which is inserted between the optical system and an image sensor, includes a phase plate, and is configured to control the polarization state of the light, and a processing unit configured to calculate the optical characteristics of the optical system, based on a plurality of interference patterns sequentially sensed by the image sensor by rotating the phase plate.
摘要翻译：本发明提供一种测量装置，包括：第一偏振控制单元，被配置为将进入待测光学系统的光的偏振状态控制为至少两个不同的偏振状态;波前分割单元，其被插入在第一偏振控制单元并且所述光学系统，插入在所述光学系统和图像传感器之间的第二偏振光控制单元包括相位板，并且被配置为控制所述光的偏振状态，以及处理单元，被配置为计算所述光学特性的光学特性光学系统基于通过旋转相位板由图像传感器顺序感测的多个干涉图案。

7. 发明授权

US07466395B2 Exposure apparatus and device manufacturing method using the apparatus 失效
标题翻译：使用该装置的曝光装置和装置制造方法
公开(公告)号：US07466395B2
公开(公告)日：2008-12-16
申请号：US11458767
申请日：2006-07-20
申请人： Yumiko Ohsaki , Akiyoshi Suzuki , Seiji Takeuchi
发明人： Yumiko Ohsaki , Akiyoshi Suzuki , Seiji Takeuchi
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70341 , G01M11/02 , G03F7/706
摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.
摘要翻译：一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

8. 发明申请

US20070019175A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD USING THE APPARATUS 失效
标题翻译：曝光装置和使用装置的装置制造方法
公开(公告)号：US20070019175A1
公开(公告)日：2007-01-25
申请号：US11458767
申请日：2006-07-20
申请人： Yumiko Ohsaki , Akiyoshi Suzuki , Seiji Takeuchi
发明人： Yumiko Ohsaki , Akiyoshi Suzuki , Seiji Takeuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G01M11/02 , G03F7/706
摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.
摘要翻译：一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

9. 发明授权

US07538854B2 Measuring apparatus and exposure apparatus having the same 失效
标题翻译：测量装置和具有该测量装置的曝光装置
公开(公告)号：US07538854B2
公开(公告)日：2009-05-26
申请号：US11276164
申请日：2006-02-16
申请人： Yumiko Ohsaki
发明人： Yumiko Ohsaki
IPC分类号： G03B27/52 , G03B27/72
CPC分类号： G03F7/706 , G01J9/02 , G02B27/60
摘要： A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system under test to 0.6 or less, and a detector for detecting an interference fringes formed by the light that passes through the numerical aperture decreasing part.
摘要翻译：一种用于测量在光出射侧具有大于0.6的数值孔径的被测光学系统的光学性能的测量装置，所述测量装置包括用于减小从光学器件退出的光的数值孔径的数值孔径减小部件被测系统为0.6以下，以及用于检测通过数值孔径减少部分的光形成的干涉条纹的检测器。

10. 发明申请

US20080316448A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：测量装置，曝光装置和装置制造方法
公开(公告)号：US20080316448A1
公开(公告)日：2008-12-25
申请号：US12143169
申请日：2008-06-20
申请人： Yumiko Ohsaki
发明人： Yumiko Ohsaki
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03F7/706 , G03F7/70566
摘要： A measurement apparatus comprises a polarization controller (2) which controls polarization of light which is incident on a detection target; a wavefront dividing unit (5) which divides a wavefront of the light from the polarization controller (2); a polarizing unit (6, 7) which polarizes the light transmitted through the target; a detector (8) which detects the light transmitted through the wavefront dividing unit and/or the polarizing unit; a processor (13) which calculates the optical characteristics of the target based on a detection result; and a first driving unit which moves the wavefront dividing unit with respect to the detector to position the wavefront dividing unit in or outside an optical path running from the target to the detector. The processor (13) calculates the optical characteristics using detection results obtained when the wavefront dividing unit is positioned in the optical path and obtained when the wavefront dividing unit is positioned outside the optical path.
摘要翻译：测量装置包括：偏振控制器（2），其控制入射在检测目标上的光的偏振; 分离来自偏振控制器（2）的光的波前的波前分割单元（5）; 偏振单元，其使透过所述目标物的光偏振; 检测器（8），其检测透过波前分割单元和/或偏振单元的光; 处理器（13），其基于检测结果来计算所述目标的光学特性; 以及第一驱动单元，其相对于检测器移动波前分割单元，以将波前分割单元定位在从目标运行到检测器的光路中或外部。处理器（13）使用当波前分割单元位于光路中并且当波前分割单元位于光路外部时获得的检测结果来计算光学特性。

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