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    • 3. 发明授权
    • Image forming apparatus having removable belt
    • 具有可拆卸带的图像形成装置
    • US08103189B2
    • 2012-01-24
    • US12393896
    • 2009-02-26
    • Masafumi Maeda
    • Masafumi Maeda
    • G03G15/08
    • G03G15/1685G03G2215/0141G03G2215/1623
    • A belt unit having a belt stretched by a plurality of rollers is removably mounted in an image forming apparatus. A pressure removing member moves a tension roller for applying tension to the belt from a first position to apply the tension to the belt to a second position to remove the tension from the belt. After the belt unit is positioned and mounted in the apparatus body by engaging the rollers with positioning portions in an apparatus body frame in a state in which the tension roller is moved to the second position by the pressure removing member, the tension is applied to the belt by moving the tension roller to the first position by the pressure removing member.
    • 具有由多个辊拉伸的带的带单元可移除地安装在图像形成装置中。 压力去除构件使张紧辊从第一位置移动到带上,以将张力施加到带到第二位置以从带中去除张力。 在带单元被定位并安装在装置本体中之后,通过在通过压力移除构件将张紧辊移动到第二位置的状态下将辊与定位部分接合在装置主体框架中,将张力施加到 通过压力去除构件将张紧辊移动到第一位置。
    • 5. 发明授权
    • Image fixing apparatus with heater and heater holder contacting the heater
    • 具有加热器和加热器支架的图像定影装置接触加热器
    • US07366455B2
    • 2008-04-29
    • US11213991
    • 2005-08-30
    • Atsushi IwasakiHiroaki SakaiAkira KatoTomoyuki MakihiraMasafumi Maeda
    • Atsushi IwasakiHiroaki SakaiAkira KatoTomoyuki MakihiraMasafumi Maeda
    • G03G15/20
    • G03G15/2042
    • The image fixing apparatus includes a heater having a heat generating resistor on a substrate, a heater holder for holding said heater, and a backup roller for forming a nip portion in cooperation with said heater, wherein said heater holder has, in a direction along a short side of said heater, a contact area facing said resistor forming area and coming into contact with said heater, and non-contact areas provided on both sides of the contact area and not coming into contact with said heater, and the contact area has a width equal to or larger than the resistor forming area. With this configuration, it is possible to provide the image fixing apparatus capable of restraining a stress applied to the heater and an image heating apparatus capable of restraining a rise in temperature of a sheet non-feeding portion.
    • 图像定影装置包括在基板上具有发热电阻器的加热器,用于保持加热器的加热器保持器和与所述加热器协作形成夹持部分的支承辊,其中所述加热器保持器沿着沿着 所述加热器的短边,面对所述电阻器形成区域并与所述加热器接触的接触区域和设置在接触区域两侧并且不与所述加热器接触的非接触区域,并且接触区域具有 宽度等于或大于电阻器形成区域。 利用这种结构,可以提供能够抑制施加于加热器的应力的图像定影装置和能够抑制片材非进给部分的温度上升的图像加热装置。
    • 6. 发明申请
    • SUBSTRATE TREATING APPARATUS
    • 基板处理装置
    • US20080092805A1
    • 2008-04-24
    • US11948198
    • 2007-11-30
    • Yoshihisa YamadaMasafumi MaedaTakashi Taguchi
    • Yoshihisa YamadaMasafumi MaedaTakashi Taguchi
    • B05C13/00B05C11/00
    • H01L21/67748H01L21/67178H01L21/67225H01L21/67276Y10S414/135
    • A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusively for post-exposure bake (PEB). Substrate transport along each path is carried out independently of substrate transport along the other. A fourth main transport mechanism is interposed as a predetermined substrate transport mechanism between transfer points consisting of a buffer acting as a temporary storage module for temporarily storing the substrates and a post-exposure bake (PEB) unit corresponding to a predetermined treating unit. This arrangement forms the path for transporting the substrates between the buffer and the PEB unit, to allow PEB treatment of the substrates to be performed smoothly. Similarly, the substrates are transported smoothly to the buffer.
    • 形成向前方向路径(第一基板输送路径),用于沿正向方向输送基板,使基板通过曝光装置。 单独的基板输送路径(第二基板输送路径)专门用于后曝光烘烤(PEB)。 沿着每个路径的基板传送独立于沿着另一个的基板传送进行。 第四主要传送机构作为预定的基板传送机构,在由用作临时存储基板的临时存储模块的缓冲器和对应于预定处理单元的曝光后烘烤(PEB)单元组成的传送点之间。 该布置形成用于在缓冲器和PEB单元之间传送基板的路径,以允许平滑地执行基板的PEB处理。 类似地,衬底被平滑地输送到缓冲器。
    • 7. 发明授权
    • Substrate treating apparatus
    • 底物处理装置
    • US07323060B2
    • 2008-01-29
    • US11008842
    • 2004-12-10
    • Yoshihisa YamadaMasafumi MaedaTakashi Taguchi
    • Yoshihisa YamadaMasafumi MaedaTakashi Taguchi
    • B05C13/02
    • H01L21/67748H01L21/67178H01L21/67225H01L21/67276Y10S414/135
    • A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusively for post-exposure bake (PEB). Substrate transport along each path is carried out independently of substrate transport along the other. A fourth main transport mechanism is interposed as a predetermined substrate transport mechanism between transfer points consisting of a buffer acting as a temporary storage module for temporarily storing the substrates and a post-exposure bake (PEB) unit corresponding to a predetermined treating unit. This arrangement forms the path for transporting the substrates between the buffer and the PEB unit, to allow PEB treatment of the substrates to be performed smoothly. Similarly, the substrates are transported smoothly to the buffer.
    • 形成向前方向路径(第一基板输送路径),用于沿正向方向输送基板,使基板通过曝光装置。 单独的基板输送路径(第二基板输送路径)专门用于后曝光烘烤(PEB)。 沿着每个路径的基板传送独立于沿着另一个的基板传送进行。 第四主要传送机构作为预定的基板传送机构,在由用作临时存储基板的临时存储模块的缓冲器和对应于预定处理单元的曝光后烘烤(PEB)单元组成的传送点之间。 该布置形成用于在缓冲器和PEB单元之间传送基板的路径,以允许平滑地执行基板的PEB处理。 类似地,衬底被平滑地输送到缓冲器。