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    • 3. 发明授权
    • Integrated circuit oscillator
    • 集成电路振荡器
    • US4652837A
    • 1987-03-24
    • US798268
    • 1985-11-15
    • Sebastiano D'ArrigoGiuliano ImondiSossio Vergara
    • Sebastiano D'ArrigoGiuliano ImondiSossio Vergara
    • H03K3/0231H03K5/15H03K3/02
    • H03K3/0231H03K5/1506
    • An oscillator for an integrated circuit which includes a Schmitt trigger having an upper threshold voltage V.sub.H and a lower threshold voltage V.sub.L, a capacitor coupled between an input to the trigger and ground, a current generator coupled to the trigger input for charging the capacitor at a constant rate and a current generator coupled to the trigger input for discharging the capacitor at a constant rate. A charge switch in series with the charging current generator reversibly couples the charging current generator between a source of high voltage and the trigger input in response to a change in state of the trigger from a first state to a second state. A discharge switch in series with the discharging current generator reversibly couples the latter across the capacitor in response to a change in state of the trigger from the second state to the first state.
    • 一种用于集成电路的振荡器,其包括具有上阈值电压VH和较低阈值电压VL的施密特触发器,耦合到触发器和地之间的电容器,耦合到触发输入端的电流发生器,用于在电容器 恒定速率和耦合到触发输入的电流发生器,以恒定速率放电电容器。 与充电电流发生器串联的充电开关响应于触发器的状态从第一状态到第二状态而将充电电流发生器可逆地耦合在高电压源和触发输入之间。 与放电电流发生器串联的放电开关响应于触发器的状态从第二状态到第一状态而将电容器可逆地耦合到电容器两端。
    • 9. 发明授权
    • Level-shifter circuit for integrated circuits
    • 用于集成电路的电平移位电路
    • US5157281A
    • 1992-10-20
    • US728928
    • 1991-07-12
    • Giovanni SantinSebastiano D'ArrigoMichael C. Smayling
    • Giovanni SantinSebastiano D'ArrigoMichael C. Smayling
    • G11C17/00G11C16/06H01L27/092H01L27/10H01L27/105
    • H01L27/0928H01L27/105
    • A level-shifter circuit includes a deep N-tank to insulate the N-channel portions of transistors from the substrate. The circuit is formed on a P-type substrate coupled to reference voltage Vss. A first field-effect transistor has first and second N+ doped regions formed in a third isolating P- doped region. The third doped region is formed in a fourth isolating N- doped region, which is formed in the substrate. A second transistor has first and second N+ doped regions formed in the same isolation regions as those of the first transistor. A third field-effect transistor has first and second P+ doped regions formed in an isolating N- region that is formed in the substrate. A fourth field-effect transistor has first and second N+ doped regions formed in the same isolation N- region as that of the third transistor. The gate of the first transistor is coupled to a first input. The first doped region of the first transistor is coupled to the output and the second doped region of the first transistor is coupled to the negative voltage Vn. The third doped region is coupled to the negative voltage Vn and the fourth doped region is coupled to the supply voltage Vdd. The second transistor is connected in feedback configuration to the first transistor. The gate of the third transistor is coupled to the second input. The first doped region of the third transistor is coupled to the output and the second doped region of the third transistor is coupled to the voltage Vp, which is more positive than the supply voltage Vdd. The fifth doped region of the third transistor is also coupled to the voltage Vp. The fourth transistor is connected in feedback configuration to the third transistor.