会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • Patterning of ionic polymers
    • 离子聚合物图案化
    • US09023458B2
    • 2015-05-05
    • US12311811
    • 2007-10-18
    • Michal LahavAdam WinklemanMax NarovlyanskyRaquel Perez-CastillejosEmily A. WeissLeonard N. J. RodriguezGeorge M. Whitesides
    • Michal LahavAdam WinklemanMax NarovlyanskyRaquel Perez-CastillejosEmily A. WeissLeonard N. J. RodriguezGeorge M. Whitesides
    • B32B3/00B05D3/06B82Y10/00B82Y40/00G03F7/00
    • G03F7/0002B82Y10/00B82Y40/00Y10T428/24479
    • In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.
    • 一方面,提供了离子型聚合物(例如聚(丙烯酸))的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚(丙烯酸)(CCL-PAA)的微米级或亚微米级的图案。 在一个实施方案中,可以在微流体通道内通过使交联剂(例如金属阳离子如Ag +,Ca 2+,Pd 2+,Al 3+,La 3+和Ti 4+)的溶液流过微流体通道,所述溶液可以将部分离子型聚合物与 解决方案。 在另一个实施方案中,构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂(例如重氮萘酚 - 酚醛清漆树脂)之后,CCL-PAA的暴露区域可以通过水溶液进行蚀刻。 有利地,图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如,在一些实施方案中,可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒,并制备多孔,低k电介质基底。
    • 9. 发明申请
    • PATTERNING OF IONIC POLYMERS
    • 离子聚合物的构图
    • US20100233434A1
    • 2010-09-16
    • US12311811
    • 2007-10-18
    • Michal LahavAdam WinklemanMax NarovlyanskyRaquel Perez-CastillejosEmily A. WeissLeonard N.J. RodriguezGeorge M. Whitesides
    • Michal LahavAdam WinklemanMax NarovlyanskyRaquel Perez-CastillejosEmily A. WeissLeonard N.J. RodriguezGeorge M. Whitesides
    • B01J41/12B32B3/00B05D3/06G03F7/20
    • G03F7/0002B82Y10/00B82Y40/00Y10T428/24479
    • In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.
    • 一方面,提供了离子型聚合物(例如聚(丙烯酸))的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚(丙烯酸)(CCL-PAA)的微米级或亚微米级的图案。 在一个实施方案中,可以在微流体通道内通过使交联剂(例如金属阳离子如Ag +,Ca 2+,Pd 2+,Al 3+,La 3+和Ti 4+)的溶液流过微流体通道,所述溶液可以将部分离子型聚合物与 解决方案。 在另一个实施方案中,构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂(例如重氮萘酚 - 酚醛清漆树脂)之后,CCL-PAA的暴露区域可以通过水溶液进行蚀刻。 有利地,图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如,在一些实施方案中,可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒,并制备多孔,低k电介质基底。