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1. 发明授权

US06247368B1 CMP wet application wafer sensor 失效
标题翻译： CMP湿式应用晶片传感器
公开(公告)号：US06247368B1
公开(公告)日：2001-06-19
申请号：US09225149
申请日：1999-01-04
申请人： Scott R. Cline , Willi O. Kalvaitis , Richard J. Lebel , Charles A. McKinney , Douglas P. Nadeau , Theodore G. van Kessel
发明人： Scott R. Cline , Willi O. Kalvaitis , Richard J. Lebel , Charles A. McKinney , Douglas P. Nadeau , Theodore G. van Kessel
IPC分类号： G01N2900
CPC分类号： H01L21/67265 , G01N29/11 , G01N29/28 , G01N29/40 , G01N2291/101 , H01L21/67259
摘要： A semiconductor post-polishing processing apparatus and method employing a non-optical wafer sensor for detecting the presence of a semiconductor wafer within the processing stations. The apparatus comprising a wet processing station, a wafer transport track, and the non-optical sensor. Preferably, the non-optical wafer sensor is a transducer, and most preferably, a piezo element, which emits and detects sound waves. The sound waves are reflected back to the emitter signaling the presence of a semiconductor wafer. The signal is sent to a receiver linked to a processor which is adapted to move a wafer holder situated at the end of the transport track to receive a wafer in the next available empty slot of the holder. The non-optical wafer sensor is impervious to slurry and CMP residue, film build-up, bubbles, wafer color/hue variations, and other wet environment problems.
摘要翻译：一种使用非光学晶片传感器来检测处理站内半导体晶片的存在的半导体后抛光处理装置和方法。该装置包括湿处理站，晶片传输轨道和非光学传感器。优选地，非光学晶片传感器是换能器，最优选地，发射和检测声波的压电元件。声波被反射回发射体，表明存在半导体晶片。信号被发送到连接到处理器的接收器，该处理器适于移动位于传送轨道的端部处的晶片保持器，以在保持器的下一个可用空槽中接收晶片。非光学晶片传感器不受浆料和CMP残留物，膜积聚，气泡，晶片颜色/色调变化和其他湿环境问题的影响。

2. 发明授权

US06500272B2 System for and method of purging/venting a brush arm bearing 失效
标题翻译：清洗/排气刷臂轴承的系统和方法
公开(公告)号：US06500272B2
公开(公告)日：2002-12-31
申请号：US09767039
申请日：2001-01-22
申请人： Scott R. Cline , Christopher E. Harvey , Willi O. Kalvaitis , Davis H. Moquin
发明人： Scott R. Cline , Christopher E. Harvey , Willi O. Kalvaitis , Davis H. Moquin
IPC分类号： B08B504
CPC分类号： B08B5/00 , B08B15/04
摘要： A purge/vent system (10) for and method of purging/venting a brush arm bearing. The purge/vent system includes a driven mechanism (12) and a support member (14) having a first cavity (48) for containing the driven mechanism. A gas supply system (24) is in fluid communication with the first cavity proximate the upper end (18) of the driven mechanism, and an evacuation system (26) is in fluid communication with the first cavity proximate the lower end (20) of the driven mechanism. In operation, the gas supply system supplies a gas to the first chamber and the evacuation system draws the gas from the first chamber. As the evacuation system draws the gas from the first chamber, the gas is drawn across and/or through the driven mechanism to keep the driven mechanism dry and/or remove foreign material from the first chamber.
摘要翻译：吹扫/排气系统（10）以及清洗/排气刷臂轴承的方法。吹扫/排气系统包括从动机构（12）和具有用于容纳被驱动机构的第一空腔（48）的支撑构件（14）。气体供应系统（24）在靠近从动机构的上端（18）处与第一空腔流体连通，并且排气系统（26）与靠近下端（20）的第一空腔流体连通驱动机制。在操作中，气体供应系统向第一室供应气体，抽真空系统从第一室抽取气体。当排气系统从第一室抽取气体时，气体被牵引穿过和/或通过从动机构，以使从动机构保持干燥和/或从第一室移除异物。

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