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    • 4. 发明授权
    • Transparent toner, image forming method, and toner set
    • 透明调色剂,成像方法和调色剂组合
    • US08609315B2
    • 2013-12-17
    • US13556817
    • 2012-07-24
    • Satoshi YoshidaTsuyoshi Murakami
    • Satoshi YoshidaTsuyoshi Murakami
    • G03G9/08
    • G03G9/0819G03G9/0827G03G9/09G03G15/6585
    • A transparent toner includes toner particles having a volume average particle diameter in the range of 18 μm to 28 μm, and satisfying formulae (1) and (2): 0.1≦Ntb/Nta×100≦2.5  (1) 0≦Ntc/Nta×100≦1.0  (2) Nta is the number of particles under the measurement conditions satisfying 0.5 μm≦circle-equivalent diameter≦200 μm, and 0.40≦circularity≦1.00; Ntb is the number of particles under the measurement conditions satisfying 0.5×Dta (μm)≦circle-equivalent diameter≦2.5×Dta (μm), and 0.60≦circularity≦0.90; and Ntc is the number of particles under the measurement conditions satisfying 2.5×Dta (μm)≦circle-equivalent diameter≦200 μm, and 0.40≦circularity≦1.00; Dta is the average circle-equivalent diameter under the measurement conditions satisfying 0.5μm≦circle-equivalent diameter≦200 μm, and 0.40≦circularity≦1.00.
    • 透明调色剂包括体积平均粒径在18μm到28μm之间的调色剂颗粒,并满足式(1)和(2):0.1 @ Ntb / Nta×100 @ 2.5(1)0 @ Ntc / Nta ×100@1.0(2)Nta是在200μm的圆当量直径下满足0.5μm的测量条件下的颗粒数,1.00的圆形度为0.40 @ Ntb是在满足0.5×Dta(mum)@圆当量直径@2.5×Dta(mum)的测量条件下的颗粒数,和0.60 @圆度@ 0.90; Ntc是在200μm条件下的圆当量直径满足2.5×Dta(mum)的测量条件下的颗粒数,1.00的圆形度为0.40 @ Dta是在200μm条件下满足0.5mum@circle-当量直径和0.40 @圆形度@ 1.00的测量条件下的平均圆当量直径。
    • 7. 发明授权
    • Film forming apparatus
    • 成膜装置
    • US08833298B2
    • 2014-09-16
    • US13537597
    • 2012-06-29
    • Izumi SatoIsao ShirataniSatoshi AsariTsuyoshi Murakami
    • Izumi SatoIsao ShirataniSatoshi AsariTsuyoshi Murakami
    • C23C16/44C23C16/00B05C11/00
    • C23C16/44B05C11/00C23C16/00
    • A film forming apparatus includes a substrate holding unit holding substrates at intervals; a reaction chamber accommodating the substrate holding unit; a raw material gas supply pipe supplying a raw material gas of a thin film to the substrate; a support unit supporting the reaction chamber; a heating unit being disposed outside the reaction chamber and heating the substrates; a protection pipe including one end portion fixed to the support unit, being extended along an arrangement direction of the substrates between the substrate holding unit and the reaction chamber, and including a temperature measuring unit inserted therein; and a protrusion portion being provided on at least one of an outer surface of the protection pipe and an inner surface of the reaction chamber, and providing a gap between the outer surface of the protection pipe and the inner surface of the reaction chamber.
    • 一种成膜设备包括:一个保持基板的基板保持单元; 容纳所述基板保持单元的反应室; 原料气体供给管,其向所述基板供给薄膜的原料气体; 支撑反应室的支撑单元; 加热单元设置在反应室外部并加热基板; 保护管,其包括固定到所述支撑单元的一个端部,沿着所述基板保持单元和所述反应室之间的所述基板的排列方向延伸,并且包括插入其中的温度测量单元; 并且在所述保护管的外表面和所述反应室的内表面中的至少一个上设置有突起部,并且在所述保护管的外表面和所述反应室的内表面之间设置间隙。