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1. 发明授权

US06818148B1 Resist composition and patterning method 有权
标题翻译：抗蚀剂组成和图案化方法
公开(公告)号：US06818148B1
公开(公告)日：2004-11-16
申请号：US09401490
申请日：1999-09-22
申请人： Satoshi Watanabe , Toyohisa Sakurada , Yoshitaka Yanagi , Shigehiro Nagura , Toshinobu Ishihara
发明人： Satoshi Watanabe , Toyohisa Sakurada , Yoshitaka Yanagi , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： C09K1300
CPC分类号： G03F7/0048
摘要： A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.
摘要翻译：提供了一种抗蚀剂组合物，其包括含氟化学表面活性剂，其功能是随着含氟表面活性剂的量的增加，抗蚀剂组合物的涂层与水或碱性显影剂水溶液的接触角降低。抗蚀剂组合物形成具有厚度均匀性，无缺陷的涂层，并且当涂覆在基材上时可用基础显影剂水溶液润湿，并且具有良好的储存稳定性，因为在溶液形式储存期间颗粒不增加。

2. 发明授权

US6033828A Partially hydrogenated polymers and chemically amplified positive resist compositions 失效
标题翻译：部分氢化聚合物和化学增幅阳性抗蚀剂组合物
公开(公告)号：US6033828A
公开(公告)日：2000-03-07
申请号：US12583
申请日：1998-01-26
申请人： Junji Shimada , Osamu Watanabe , Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
发明人： Junji Shimada , Osamu Watanabe , Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： C08F8/04 , G03F7/004 , G03F7/039 , G03C1/492 , C08F12/08 , C08F12/24
CPC分类号： G03F7/039 , C08F8/04 , G03F7/0045
摘要： A polymer comprising recurring units of formula (1) is provided wherein some of the hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups are replaced by acid labile groups. The polymer is crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or alcoholic hydroxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and alcoholic hydroxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, letter x is 0 or a positive integer, y is a positive integer, x+y.ltoreq.5, letters p and q are positive numbers satisfying p+q=1 and 0
摘要翻译：提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基的一些氢原子被酸不稳定基团取代。聚合物在分子内和/或分子之间交联，具有由一些残留的酚羟基和/或醇羟基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团。酸不稳定基团和交联基团的用量平均为全部酚羟基和醇羟基的0摩尔％至80摩尔％以上。聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，字母x是0或正整数，y是正整数，x + y <5，字母p和q是满足p + q = 1的正数， 0

3. 发明授权

US5942367A Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 失效
公开(公告)号：US5942367A
公开(公告)日：1999-08-24
申请号：US839107
申请日：1997-04-23
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： C08F8/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , C08F8/00 , G03F7/0045 , C08F2810/20 , C08F2810/30 , Y10S430/106
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

4. 发明授权

US06830866B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06830866B2
公开(公告)日：2004-12-14
申请号：US10170345
申请日：2002-06-14
申请人： Tomohiro Kobayashi , Tsunehiro Nishi , Satoshi Watanabe , Takeshi Kinsho , Shigehiro Nagura , Toshinobu Ishihara
发明人： Tomohiro Kobayashi , Tsunehiro Nishi , Satoshi Watanabe , Takeshi Kinsho , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： G03F7038
CPC分类号： G03F7/0392 , C08G61/06 , G03F7/0395 , G03F7/0397
摘要： A resist composition comprising a hydrogenated product of ring-opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance, and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：包含开环易位聚合物和聚（甲基）丙烯酸衍生物作为基础树脂的氢化产物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于微图案化电子束或深紫外线。

5. 发明授权

US06312869B1 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 有权
标题翻译：化学扩增正型抗蚀剂组合物，图案形成方法，以及制备具有交联基团的聚合物的方法
公开(公告)号：US06312869B1
公开(公告)日：2001-11-06
申请号：US09592419
申请日：2000-06-12
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： G03F7039
CPC分类号： G03F7/039 , C08F8/00 , C08F2810/20 , C08F2810/30 , G03F7/0045 , Y10S430/106 , C08F112/14
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

6. 发明授权

US6106993A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US6106993A
公开(公告)日：2000-08-22
申请号：US114067
申请日：1998-07-13
申请人： Satoshi Watanabe , Osamu Watanabe , Shigehiro Nagura , Toshinobu Ishihara
发明人： Satoshi Watanabe , Osamu Watanabe , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and optionally, (D) a dissolution rate regulator. The base resin (B) is a hydroxystyrene copolymer having different acid labile groups and Mw of 3,000-300,000. The resist composition is highly sensitive to actinic radiation such as deep-UV, electron beam and X-ray, can be developed with aqueous base to form a pattern, and is thus suitable for use in a fine patterning technique.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）基础树脂，（C）光致酸产生剂，和任选的（D）溶出速率调节剂。基础树脂（B）是具有不同酸不稳定基团和Mw为3,000-300,000的羟基苯乙烯共聚物。抗蚀剂组合物对光化辐射如深UV，电子束和X射线高度敏感，可以用碱水溶液显影以形成图案，因此适用于精细图案化技术。

7. 发明授权

US6030746A Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions 失效
标题翻译：二苯基和三苯基单萜烃衍生物，溶解抑制剂和化学增强正性抗蚀剂组合物
公开(公告)号：US6030746A
公开(公告)日：2000-02-29
申请号：US831749
申请日：1997-04-01
申请人： Takeshi Nagata , Satoshi Watanabe , Tsunehiro Nishi , Jun Hatakeyama , Shigehiro Nagura , Toshinobu Ishihara
发明人： Takeshi Nagata , Satoshi Watanabe , Tsunehiro Nishi , Jun Hatakeyama , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： C07C43/205 , C07C43/30 , C07C43/303 , C07C43/315 , C07C43/32 , C07C69/28 , C07C69/30 , C07C69/712 , C07C69/96 , C07F7/06 , C07F7/08 , C07F7/18 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： C07C43/303 , C07C69/96 , G03F7/0045 , C07C2101/14 , G03F7/039 , Y10S430/118
摘要： Di- or triphenyl monoterpene hydrocarbon derivatives of formula (1) are novel. ##STR1## X is a di- or trivalent monoterpene hydrocarbon group, R.sup.1 to R.sup.3 are hydrogen or an alkyl, alkoxy, alkoxyalkyl, alkenyl or aryl group, R.sup.4 is hydrogen or an acid labile group, at least one R.sup.4 being an acid labile group, letter n is an integer of 1-5, j, k and m are integers of 0-4, n+j+k+m=5, and p is 2 or 3. When used as a dissolution rate regulator, the compound of formula (1) exerts remarkably enhanced dissolution inhibitory effect and minimized light absorption in the deep-UV region. A chemically amplified positive resist composition having the compound of formula (1) blended therein is highly sensitive to actinic radiation such as deep-UV radiation, electron beam and X-ray, especially KrF excimer laser light, and has improved sensitivity, resolution and plasma etching resistance.
摘要翻译：式（1）的二 - 或三苯基单萜烃衍生物是新颖的。 X是二价或三价单萜烃基，R 1至R 3是氢或烷基，烷氧基，烷氧基烷基，烯基或芳基，R 4是氢或酸不稳定基团，至少一个R 4是酸不稳定基团，字母n 是1-5的整数，j，k和m是0-4，n + j + k + m = 5的整数，p是2或3.当用作溶出速率调节剂时，式 1）在深紫外区域发挥显着增强的溶解抑制作用和最小化的光吸收。具有其中混合的式（1）化合物的化学放大正性抗蚀剂组合物对光化辐射如深UV辐射，电子束和X射线，特别是KrF准分子激光具有高度敏感性，并且具有改善的灵敏度，分辨率和等离子体耐腐蚀性。

8. 发明授权

US5814694A Anti-reflective coating composition 失效
标题翻译：防反射涂料组合物
公开(公告)号：US5814694A
公开(公告)日：1998-09-29
申请号：US833052
申请日：1997-04-03
申请人： Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
发明人： Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： C08K5/09
CPC分类号： C08K5/09
摘要： A water-soluble coating composition for forming a layer to be placed on the upper surface of a resist is provided without use of Freons. The material includes an aqueous solution containing a) at least one water-soluble polymer selected from the group consisting of poly(N-vinylpyrrolidone) homopolymers and water-soluble copolymers of N-vinylpyrrolidone and other vinyl monomers, b) at least one fluorine-containing organic acid, and c) at least one amino acid derivative. The film formed through use of the material of the invention serves as both an anti-reflective film and a protective film. The material of the present invention provides a number of advantages in the formation of resist patterns, including excellent film-forming properties, excellent dimensional accuracy and aligning accuracy, simple and easy handling, high productivity, and good reproducibility.
摘要翻译：在不使用氟利昂的情况下，提供用于形成被放置在抗蚀剂的上表面上的层的水溶性涂料组合物。该材料包括含有a）至少一种选自聚（N-乙烯基吡咯烷酮）均聚物和N-乙烯基吡咯烷酮和其它乙烯基单体的水溶性共聚物的水溶性聚合物的水溶液，b）至少一种含氟 - 含有机酸，和c）至少一种氨基酸衍生物。通过使用本发明的材料形成的膜既用作抗反射膜又用作保护膜。本发明的材料在形成抗蚀剂图形方面提供了许多优点，包括优异的成膜性能，优异的尺寸精度和对准精度，操作简便且易于操作，生产率高，再现性好。

9. 发明授权

US5876900A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US5876900A
公开(公告)日：1999-03-02
申请号：US831300
申请日：1997-04-01
申请人： Satoshi Watanabe , Toshinobu Ishihara , Shigehiro Nagura , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Toshinobu Ishihara , Shigehiro Nagura , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03F7/029 , G03F7/033
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight-average molecular weight of 3,000-300,000 and a dispersity of 1.0 to 1.5, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition is sensitive to actinic radiation, especially KrF excimer laser beam, has high sensitivity and resolution, and forms a resist pattern having improved plasma etching resistance and heat resistance.
摘要翻译：化学放大型正性抗蚀剂组合物含有（A）有机溶剂，（B）具有酚羟基的聚羟基苯乙烯形式的基础树脂，其中一些被羟基烷基保护，并且其重均分子量为3,000-300,000 分散度为1.0〜1.5，（C）光致酸产生剂，（D）含乙烯基醚基的化合物。该组合物对光化辐射敏感，特别是KrF准分子激光束，具有高灵敏度和分辨率，并且形成具有改善的等离子体耐蚀刻性和耐热性的抗蚀剂图案。

10. 发明授权

US06335141B1 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 有权
标题翻译：化学扩增正型抗蚀剂组合物，图案形成方法，以及制备具有交联基团的聚合物的方法
公开(公告)号：US06335141B1
公开(公告)日：2002-01-01
申请号：US09592423
申请日：2000-06-12
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： G03F7039
CPC分类号： G03F7/039 , C08F8/00 , C08F2810/20 , C08F2810/30 , G03F7/0045 , Y10S430/106 , C08F112/14
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

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