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1. 发明授权

US6115867A Apparatus for cleaning both sides of substrate 有权
标题翻译：用于清洁基板两侧的装置
公开(公告)号：US6115867A
公开(公告)日：2000-09-12
申请号：US135478
申请日：1998-08-17
申请人： Satoshi Nakashima , Takanori Miyazaki , Hiroki Taniyama , Toshikazu Arihisa
发明人： Satoshi Nakashima , Takanori Miyazaki , Hiroki Taniyama , Toshikazu Arihisa
IPC分类号： H01L21/304 , H01L21/00 , B08B7/04
CPC分类号： H01L21/67051 , H01L21/67046 , Y10S134/902
摘要： An apparatus for cleaning both sides of a substrate, incorporating a spin chuck for holding a substrate such that contact with at least a central portion of the substrate is prevented, a motor having a hollow shaft connected to the spin chuck to transmit rotating force to the spin chuck, a front-side cleaning mechanism for cleaning a surface of the substrate held by the spin chuck, and a back-side cleaning mechanism for rinsing a back side of the substrate held by the spin chuck, wherein the back-side cleaning mechanism is disposed to face the back side of the substrate held by the spin chuck through hollow portions of the hollow shaft.
摘要翻译：一种用于清洁基板的两侧的装置，包括用于保持基板的旋转卡盘以防止与基板的至少中心部分的接触的马达，具有连接到旋转卡盘的中空轴的马达将旋转力传递到旋转卡盘，用于清洁由旋转卡盘保持的基板的表面的前侧清洁机构和用于冲洗由旋转卡盘保持的基板的背面的背面清洁机构，其中后侧清洁机构通过空心轴的中空部分设置成面对由旋转卡盘保持的基板的背面。

2. 发明授权

US06276378B1 Apparatus for cleaning both sides of substrate 有权
标题翻译：用于清洁基板两侧的装置
公开(公告)号：US06276378B1
公开(公告)日：2001-08-21
申请号：US09638511
申请日：2000-08-11
申请人： Hiroki Taniyama , Toshikazu Arihisa
发明人： Hiroki Taniyama , Toshikazu Arihisa
IPC分类号： B08B302
CPC分类号： H01L21/67051 , H01L21/67046 , Y10S134/902
摘要： An apparatus for cleaning both sides of a substrate, incorporating a spin chuck for holding a substrate such that contact with at least a central portion of the substrate is prevented, a motor having a hollow shaft connected to the spin chuck to transmit rotating force to the spin chuck, a front-side cleaning mechanism for cleaning a surface of the substrate held by the spin chuck, and a back-side cleaning mechanism for rinsing a back side of the substrate held by the spin chuck, wherein the back-side cleaning mechanism is disposed to face the back side of the substrate held by the spin chuck through hollow portions of the hollow shaft.
摘要翻译：一种用于清洁基板的两侧的装置，包括用于保持基板的旋转卡盘以防止与基板的至少中心部分的接触的马达，具有连接到旋转卡盘的中空轴的马达将旋转力传递到旋转卡盘，用于清洁由旋转卡盘保持的基板的表面的前侧清洁机构和用于冲洗由旋转卡盘保持的基板的背面的背面清洁机构，其中后侧清洁机构通过空心轴的中空部分设置成面对由旋转卡盘保持的基板的背面。

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