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1. 发明授权

US5866298A Radiation sensitive composition for color filters 失效
标题翻译：用于滤色片的辐射敏感组合物
公开(公告)号：US5866298A
公开(公告)日：1999-02-02
申请号：US754811
申请日：1996-11-21
申请人： Satoshi Iwamoto , Yasumi Wanibe , Hiroaki Nemoto , Nobuo Bessho
发明人： Satoshi Iwamoto , Yasumi Wanibe , Hiroaki Nemoto , Nobuo Bessho
IPC分类号： G03F7/004 , A61K31/726 , C07D233/54 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/021 , G03F7/028 , G03F7/031 , G03F7/105
CPC分类号： C07D233/64 , A61K31/726 , G03F7/0007 , G03F7/031 , G03F7/105 , Y10S430/117
摘要： A radiation sensitive composition for color filters comprising (A) a colorant, (B) a binder polymer, (C) a poly-functional monomer, (D) a photopolymerization initiator containing at least one biimidazole compound typified by 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-biimidazole and 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and (E) a solvent. The composition can be used for the manufacture of color filters exhibiting excellent photographic sensitivity and superior contrast, while effectively controlling production of residual insoluble material during development process.
摘要翻译：一种用于滤色器的辐射敏感组合物，包括（A）着色剂，（B）粘合剂聚合物，（C）多官能单体，（D）含有至少一种以2,2'-双（2-氯苯基）-4,4'，5,5'-四（4-乙氧基羰基苯基） - 联咪唑和2,2'-双（2,4-二氯苯基）-4,4'，5,5'-四苯基联咪唑，和（E）溶剂。该组合物可用于制造具有优异的照相感光度和优异对比度的滤色片，同时有效控制显影过程中残余不溶物质的产生。

2. 发明授权

US06572963B2 Process of forming a pattern on a substrate 失效
公开(公告)号：US06572963B2
公开(公告)日：2003-06-03
申请号：US09978106
申请日：2001-10-17
申请人： Hideaki Masuko , Tadahiko Udagawa , Hiroaki Nemoto , Nobuo Bessho
发明人： Hideaki Masuko , Tadahiko Udagawa , Hiroaki Nemoto , Nobuo Bessho
IPC分类号： B32B1800
CPC分类号： H01L21/31144 , G03F7/0007 , H05K1/092 , H05K3/025 , H05K3/06 , H05K3/064 , H05K3/207 , H05K2203/0156 , Y10S428/913 , Y10S428/914 , Y10T428/2457 , Y10T428/24579 , Y10T428/24802 , Y10T428/24893 , Y10T428/24909 , Y10T428/24917 , Y10T428/24926 , Y10T428/252 , Y10T428/256 , Y10T428/26 , Y10T428/31649 , Y10T428/31681
摘要： A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.

3. 发明授权

US06890663B2 Process of forming a pattern on a substrate 失效
标题翻译：在基板上形成图案的工艺
公开(公告)号：US06890663B2
公开(公告)日：2005-05-10
申请号：US10277704
申请日：2002-10-23
申请人： Hideaki Masuko , Tadahiko Udagawa , Hiroaki Nemoto , Nobuo Bessho
发明人： Hideaki Masuko , Tadahiko Udagawa , Hiroaki Nemoto , Nobuo Bessho
IPC分类号： G03F7/00 , H01L21/311 , H05K1/09 , H05K3/02 , H05K3/06 , H05K3/20 , B32B15/08
CPC分类号： H01L21/31144 , G03F7/0007 , H05K1/092 , H05K3/025 , H05K3/06 , H05K3/064 , H05K3/207 , H05K2203/0156 , Y10S428/913 , Y10S428/914 , Y10T428/2457 , Y10T428/24579 , Y10T428/24802 , Y10T428/24893 , Y10T428/24909 , Y10T428/24917 , Y10T428/24926 , Y10T428/252 , Y10T428/256 , Y10T428/26 , Y10T428/31649 , Y10T428/31681
摘要： A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.
摘要翻译：一种在基板上形成无机材料层图案的方法。该方法包括以下步骤：将负载在支撑膜上的无机粉末分散糊层转移到基板表面，以在基板上形成无机粉末分散浆料层; 在转移到基材表面的无机粉末分散糊层上形成抗蚀膜; 通过掩模将抗蚀剂膜曝光以形成抗蚀剂图案的潜像; 显影曝光的抗蚀剂膜以形成抗蚀剂图案; 蚀刻无机粉末分散糊层的暴露部分以形成对应于抗蚀剂图案的无机粉末分散糊层图案; 并烘烤该图案以形成无机材料层图案。

4. 发明授权

US5792589A Radiation sensitive composition containing a fluorescent substance dispersed therein 失效
标题翻译：含有分散在其中的荧光物质的辐射敏感性组合物
公开(公告)号：US5792589A
公开(公告)日：1998-08-11
申请号：US794935
申请日：1997-02-04
申请人： Tadahiko Udagawa , Hideaki Masuko , Hiroaki Nemoto , Nobuo Bessho
发明人： Tadahiko Udagawa , Hideaki Masuko , Hiroaki Nemoto , Nobuo Bessho
IPC分类号： C09K11/02 , C08F2/38 , C08F2/44 , C08F2/50 , G03F7/031 , H01J11/36 , H01J11/38 , H01J11/42 , H01J17/04
CPC分类号： G03F7/031 , Y10S430/117
摘要： A radiation sensitive composition containing a fluorescent substance dispersed therein, comprising (A) the fluorescent substance, (B) an organic polymer binder, (C) at least one optically crosslinkable compound selected from optically crosslinkable monomers and oligomers, and (D) an optically radical-generating agent which comprises (a) a 2,4,5-triaryl imidazole dimer, (b) an amino group-containing benzophenone photosensitizer, and (c) a thiol compound represented by the following formula (1): ##STR1## wherein Z is --O--, --S--, --NH-- or --CONH--. This radiation sensitive composition can provide a fluorescent screen having a larger film thickness and a higher display brightness and hence, will greatly contribute to increases in the size and precision of a fluorescent display device such as a plasma display panel.
摘要翻译：一种含有分散在其中的荧光物质的辐射敏感组合物，其包含（A）荧光物质，（B）有机聚合物粘合剂，（C）至少一种选自光学交联单体和低聚物的光学交联化合物，和（D）光学自由基产生剂，其包含（a）2,4,5-三芳基咪唑二聚体，（b）含氨基的二苯甲酮光敏剂，和（c）由下式（1）表示的硫醇化合物：NH-。这种辐射敏感组合物可以提供具有更大膜厚度和更高显示亮度的荧光屏，因此将极大地有助于诸如等离子体显示面板的荧光显示装置的尺寸和精度的增加。

5. 发明授权

US06337028B1 Process of forming a pattern on a substrate 有权
标题翻译：在基板上形成图案的工艺
公开(公告)号：US06337028B1
公开(公告)日：2002-01-08
申请号：US09189400
申请日：1998-11-10
申请人： Hideaki Masuko , Tadahiko Udagawa , Hiroaki Nemoto , Nobuo Bessho
发明人： Hideaki Masuko , Tadahiko Udagawa , Hiroaki Nemoto , Nobuo Bessho
IPC分类号： H04B3312
CPC分类号： H01L21/31144 , G03F7/0007 , H05K1/092 , H05K3/025 , H05K3/06 , H05K3/064 , H05K3/207 , H05K2203/0156 , Y10S428/913 , Y10S428/914 , Y10T428/2457 , Y10T428/24579 , Y10T428/24802 , Y10T428/24893 , Y10T428/24909 , Y10T428/24917 , Y10T428/24926 , Y10T428/252 , Y10T428/256 , Y10T428/26 , Y10T428/31649 , Y10T428/31681
摘要： A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.
摘要翻译：一种在基板上形成无机材料层图案的方法。该方法包括以下步骤：将负载在支撑膜上的无机粉末分散糊层转移到基板表面，以在基板上形成无机粉末分散浆料层; 在转移到基材表面的无机粉末分散糊层上形成抗蚀膜; 通过掩模将抗蚀剂膜曝光以形成抗蚀剂图案的潜像; 显影曝光的抗蚀剂膜以形成抗蚀剂图案; 蚀刻无机粉末分散糊层的暴露部分以形成对应于抗蚀剂图案的无机粉末分散糊层图案; 并烘烤该图案以形成无机材料层图案。

6. 发明授权

US06299785B1 Electrode formation process 失效
标题翻译：电极形成过程
公开(公告)号：US06299785B1
公开(公告)日：2001-10-09
申请号：US09296241
申请日：1999-04-22
申请人： Tsutomu Shimokawa , Hideaki Masuko , Hiroaki Nemoto , Nobuo Bessho
发明人： Tsutomu Shimokawa , Hideaki Masuko , Hiroaki Nemoto , Nobuo Bessho
IPC分类号： G02F1135
CPC分类号： H05K3/207 , H05K1/0306 , H05K1/092 , H05K3/025 , H05K3/06 , H05K2201/035 , H05K2203/0156
摘要： A process for the preparation of an electrode, which comprises: (1) transferring a conductive paste layer supported on a base film to a substrate to form the conductive paste layer on the substrate; (2) forming a resist film on the conductive paste layer transferred to the substrate; (3) exposing the resist film through a mask to form a resist pattern latent image; (4) developing the exposed resist film to form a resist pattern; (5) etching exposed portions of the conductive paste layer to form a conductive paste layer pattern corresponding to the resist pattern; and (6) thermosetting the pattern to form a conductive layer pattern.
摘要翻译：一种制备电极的方法，包括：（1）将负载在基膜上的导电浆料层转移到基底上以在基底上形成导电糊层; （2）在转印到基板上的导电糊层上形成抗蚀膜; （3）通过掩模使抗蚀剂膜曝光以形成抗蚀剂图案潜像; （4）显影曝光的抗蚀剂膜以形成抗蚀剂图案; （5）蚀刻导电膏层的暴露部分以形成对应于抗蚀图案的导电膏层图案; 和（6）使图案热固以形成导电层图案。

7. 发明授权

US5847015A Pigment-dispersed radiation-sensitive composition for color filters 失效
标题翻译：用于滤色片的颜料分散辐射敏感组合物
公开(公告)号：US5847015A
公开(公告)日：1998-12-08
申请号：US782283
申请日：1997-01-13
申请人： Yusuke Tajima , Nobuo Bessho , Hiroaki Nemoto , Fumine Shitani
发明人： Yusuke Tajima , Nobuo Bessho , Hiroaki Nemoto , Fumine Shitani
IPC分类号： C08F2/50 , G03F7/00 , G03F7/033 , G03C7/12 , G03F7/008 , G03F9/00
CPC分类号： G03F7/0007 , G03F7/033
摘要： A radiation-sensitive composition which comprises (A) a binder polymer which is a copolymer comprising (A-1) a monomer containing an alcoholic hydroxyl group, (A-2) a macromonomer, and (A-3) other monomer copolymerizable with the above monomers; (B) a pigment, and (C) a radiation-sensitive compound. This radiation-sensitive composition is suited as a color-dispersed composition for a color filter which does not cause surface soiling and which has an excellent adhesion of a formed pixel to a glass substrate.
摘要翻译：一种辐射敏感性组合物，其包含（A）粘合剂聚合物，所述粘合剂聚合物是包含（A-1）含有醇羟基的单体的共聚物，（A-2）大分子单体和（A-3）可与以上单体; （B）颜料，（C）辐射敏感性化合物。该辐射敏感性组合物适合作为不会引起表面污染并且具有优异的形成像素与玻璃基板的附着力的滤色器的分色组合物。

8. 发明授权

US08679654B2 Magnetic recording medium including plural FePt alloy layers including carbon, oxides or nitrides 有权
标题翻译：磁记录介质包括包含碳，氧化物或氮化物的多个FePt合金层
公开(公告)号：US08679654B2
公开(公告)日：2014-03-25
申请号：US13372116
申请日：2012-02-13
申请人： Hiroaki Nemoto , Ikuko Takekuma , Kimio Nakamura , Junichi Sayama
发明人： Hiroaki Nemoto , Ikuko Takekuma , Kimio Nakamura , Junichi Sayama
IPC分类号： G11B5/66 , G11B5/65 , C22C38/00 , C22C5/04
CPC分类号： G11B5/653 , C22C5/04 , C22C38/002 , C22C2202/02 , G11B5/65 , G11B5/66
摘要： Surface flatness of magnetic recording medium to which a magnetic recording layer made of L10 FePt magnetic alloy thin film, with distance between a magnetic head and a magnetic recording medium sufficiently reduced. The magnetic recording layer includes: magnetic layers containing a magnetic alloy including Fe and Pt as principal materials; and one non-magnetic material selected from carbon, oxide and nitride. The first magnetic layer disposed closer to a substrate has a granular structure in which magnetic alloy grains including FePt alloy as the principal material are separated from grain boundaries including the non-magnetic material as the principal material. The second magnetic layer disposed closer to the surface than the first magnetic layer is fabricated so as to have a homogeneous structure in which an FePt alloy and the non-magnetic material are mixed in a state finer than diameters of the FePt magnetic alloy grains in the first magnetic layer.
摘要翻译：由L10FePt磁性合金薄膜制成的磁记录层，磁头和磁记录介质之间的距离充分降低的磁记录介质的表面平整度。磁记录层包括：含有以Fe和Pt为主要材料的磁性合金的磁性层; 和一种选自碳，氧化物和氮化物的非磁性材料。靠近基板设置的第一磁性层具有以包含FePt合金作为主要材料的磁性合金颗粒与包括非磁性材料在内的晶界作为主要材料的颗粒结构。制造比第一磁性层更靠近表面的第二磁性层，以具有均匀的结构，其中FePt合金和非磁性材料以比FePt磁性合金粒子的直径小的状态混合第一磁性层。

9. 发明申请

US20100188769A1 METHOD AND DEVICE FOR INFORMATION RECORDING/REPRODUCING AND INFORMATION RECORDING MEDIUM 失效
标题翻译：用于信息记录/再现和信息记录介质的方法和装置
公开(公告)号：US20100188769A1
公开(公告)日：2010-07-29
申请号：US12710738
申请日：2010-02-23
申请人： Hiroaki Nemoto , Hideki Saga , Hirofumi Sukeda
发明人： Hiroaki Nemoto , Hideki Saga , Hirofumi Sukeda
IPC分类号： G11B5/02
CPC分类号： G11B11/10578 , G11B5/314 , G11B11/10502 , G11B11/10528 , G11B11/10576 , G11B2005/0005 , G11B2005/0021
摘要： In an information recording/reproducing method performing a thermo-magnetic recording, a tracking offset value of a recording light spot and/or a tracking offset value of a magnetic flux detecting element is changed in accordance with a radial position at which a tracking is performed at the present time, to make a direction of a magnetic wall of a recording magnetic domain in accord with a longitudinal direction of the magnetic flux detecting element. Alternatively, a shape of a heated area is changed to be in accord with the direction of the magnetic flux detecting means at respective radial position, to make the direction of the magnetic wall of the recording magnetic domain in accord with the longitudinal direction of the magnetic flux detecting element.
摘要翻译：在执行热磁记录的信息记录/再现方法中，根据执行跟踪的径向位置改变记录光点的跟踪偏移值和/或磁通量检测元件的跟踪偏移值目前为了根据磁通量检测元件的纵向方向制造记录磁畴的磁壁的方向。或者，加热区域的形状根据磁通检测单元的径向位置的方向变化，使得记录磁畴的磁壁的方向与磁性体的长度方向一致通量检测元件。

10. 发明授权

US07625646B2 Perpendicular magnetic recording medium and method of manufacturing it 失效
标题翻译：垂直磁记录介质及其制造方法
公开(公告)号：US07625646B2
公开(公告)日：2009-12-01
申请号：US11354085
申请日：2006-02-15
申请人： Yoshiyuki Hirayama , Ichiro Tamai , Takayuki Ichihara , Hiroyuki Nakagawa , Hiroaki Nemoto , Mineaki Kodama , Ikuko Takekuma
发明人： Yoshiyuki Hirayama , Ichiro Tamai , Takayuki Ichihara , Hiroyuki Nakagawa , Hiroaki Nemoto , Mineaki Kodama , Ikuko Takekuma
IPC分类号： G11B5/66
CPC分类号： G11B5/65 , G11B5/656 , G11B5/66 , G11B5/667 , G11B5/732 , G11B5/7325 , G11B5/84
摘要： Disclosed are a perpendicular magnetic recording medium with lower medium noise, insusceptible to thermal fluctuation and high recording resolution and a method of manufacturing it. As the step of forming a metal layer at the time of forming a recording layer on a non-magnetic substrate via a plurality of underlayers and the step of forming an oxide layer with an average thickness of 0.2 nm or less are repeated, the crystal grains are magnetically isolated without disturbing the orientation of the crystal grain of the recording layer of the perpendicular magnetic recording medium or without degrading the magnetic characteristic of the crystal grain of the recording layer.
摘要翻译：公开了一种具有较低介质噪声，不易受热波动和高记录分辨率的垂直磁记录介质及其制造方法。作为通过多个底层在非磁性基板上形成记录层时形成金属层的步骤，重复平均厚度为0.2nm以下的氧化物层的工序，晶粒磁性隔离，而不会干扰垂直磁记录介质的记录层的晶粒的取向，或不降低记录层的晶粒的磁特性。

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