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    • 1. 发明授权
    • Double face polishing apparatus
    • 双面抛光装置
    • US07485029B2
    • 2009-02-03
    • US11882999
    • 2007-08-08
    • Satoki KandaHarumichi KoyamaMasahiro TakeuchiYoichi Morozumi
    • Satoki KandaHarumichi KoyamaMasahiro TakeuchiYoichi Morozumi
    • B24B7/00B24B9/00B24B57/02
    • B24B37/015B24B37/08B24B57/02
    • The double face polishing apparatus is capable of controlling an amount of supplying slurry to a lower polishing plate. The double face polishing apparatus comprises: a lower polishing plate and an upper polishing plate; a carrier provided between the polishing plates, the carrier having a through-hole for holding a workpiece; a plate driving unit for rotating the polishing plates; a carrier driving unit for rotating the carrier; ring-shaped ducts coaxially provided to the upper polishing plate; a slurry supply source supplying slurry to the ring-shaped ducts; and supply pipes for supplying the slurry to the lower polishing plate. The slurry is supplied to each of coaxial polishing zones of the lower polishing plate via the corresponding ring-shaped ducts and the supply pipes.
    • 双面抛光装置能够控制向下抛光板供给浆料的量。 双面抛光装置包括:下抛光板和上抛光板; 设置在所述研磨板之间的载体,所述载体具有用于保持工件的通孔; 用于旋转抛光板的板驱动单元; 用于使所述载体旋转的载体驱动单元; 同轴地设置到上抛光板的环形导管; 浆料供应源将浆料供应到环形管道; 并供应用于将浆料供应到下抛光板的管道。 通过相应的环形管道和供应管道将浆料供应到下抛光板的每个同轴抛光区域。
    • 2. 发明申请
    • Double face polishing apparatus
    • 双面抛光装置
    • US20080057831A1
    • 2008-03-06
    • US11882999
    • 2007-08-08
    • Satoki KandaHarumichi KoyamaMasahiro TakeuchiYoichi Morozumi
    • Satoki KandaHarumichi KoyamaMasahiro TakeuchiYoichi Morozumi
    • B24B49/14
    • B24B37/015B24B37/08B24B57/02
    • The double face polishing apparatus is capable of controlling an amount of supplying slurry to a lower polishing plate. The double face polishing apparatus comprises: a lower polishing plate and an upper polishing plate; a carrier provided between the polishing plates, the carrier having a through-hole for holding a workpiece; a plate driving unit for rotating the polishing plates; a carrier driving unit for rotating the carrier; ring-shaped ducts coaxially provided to the upper polishing plate; a slurry supply source supplying slurry to the ring-shaped ducts; and supply pipes for supplying the slurry to the lower polishing plate. The slurry is supplied to each of coaxial polishing zones of the lower polishing plate via the corresponding ring-shaped ducts and the supply pipes.
    • 双面抛光装置能够控制向下抛光板供给浆料的量。 双面抛光装置包括:下抛光板和上抛光板; 设置在所述研磨板之间的载体,所述载体具有用于保持工件的通孔; 用于旋转抛光板的板驱动单元; 用于使所述载体旋转的载体驱动单元; 同轴地设置到上抛光板的环形导管; 浆料供应源将浆料供应到环形管道; 并供应用于将浆料供应到下抛光板的管道。 通过相应的环形管道和供应管道将浆料供应到下抛光板的每个同轴抛光区域。
    • 6. 发明申请
    • Impedance adjustment circuit
    • 阻抗调节电路
    • US20090212816A1
    • 2009-08-27
    • US12379464
    • 2009-02-23
    • Hiromu KatoMasahiro Takeuchi
    • Hiromu KatoMasahiro Takeuchi
    • H03H11/30H03H11/02H03K19/003
    • H03H7/40
    • Disclosed is an impedance adjustment circuit including a comparator and a resistor control circuit. The comparator compares the resistance value of an external resistor and that of a replica resistor that forms a replica of a terminal resistor. The resistor control circuit includes a replica resistor control counter, a resistor-under-adjustment control signal holding circuit and a monitor circuit. The replica resistor control counter counts up and down based on the comparison result by the comparator to output a control signal to the replica resistor. The resistor-under-adjustment control signal holding circuit holds a control signal that is delivered to the terminal resistor. The monitor circuit receives the state of the counter and an output of the retention circuit and, in case the difference between the count state of the replica resistor control counter and an output of the resistor-under-adjustment control signal holding circuit is within a preset range, delivers the output of the resistor-under-adjustment control signal holding circuit as an input to the resistor-under-adjustment control signal holding circuit.
    • 公开了一种包括比较器和电阻器控制电路的阻抗调节电路。 比较器比较外部电阻的电阻值和形成端子电阻的复制品的复制电阻的电阻值。 电阻控制电路包括复制电阻控制计数器,电阻调节下调控制信号保持电路和监视电路。 复制电阻控制计数器根据比较器的比较结果向上和向下计数,以将控制信号输出到复制电阻。 电阻调节下调节控制信号保持电路保持传送到端子电阻器的控制信号。 监视电路接收计数器的状态和保持电路的输出,并且在复制电阻控制计数器的计数状态与电阻调节不足调整控制信号保持电路的输出之间的差在预设值 将电阻调节不足的控制信号保持电路的输出作为输入提供给电阻调整不足的控制信号保持电路。