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    • 1. 发明授权
    • Chemically amplified resist compositions
    • 化学扩增抗蚀剂组合物
    • US06416927B1
    • 2002-07-09
    • US09675500
    • 2000-09-29
    • Sang-jun ChoiChun-geun ParkYoung-bum Koh
    • Sang-jun ChoiChun-geun ParkYoung-bum Koh
    • G03F7004
    • C08F220/18C08F222/06G03F7/0045G03F7/039Y10S430/111Y10S430/115
    • Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
    • 共聚物和三聚体用于化学增强抗蚀剂。 三元共聚物具有下式:其中R 3选自氢和C 1至C 10脂族烃,其中脂族烃包含选自氢,羟基,羧酸,羧酸酐及其组合的取代基 ; R4选自氢和C1至C10脂族烃,其中脂族烃包含选自氢,羟基,羧酸,羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; m和n分别为整数; 并且其中n /(m + n)为约0.1至约0.5。
    • 2. 发明授权
    • Chemically amplified resist compositions
    • 化学扩增抗蚀剂组合物
    • US06171754B2
    • 2001-01-09
    • US09124597
    • 1998-07-29
    • Sang-jun ChoiChun-geun ParkYoung-bum Koh
    • Sang-jun ChoiChun-geun ParkYoung-bum Koh
    • B03F7004
    • C08F220/18C08F222/06G03F7/0045G03F7/039Y10S430/111Y10S430/115
    • Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
    • 共聚物和三聚体用于化学增强抗蚀剂。 三元共聚物具有下式:其中R 3选自氢和C 1至C 10脂族烃,其中脂族烃包含选自氢,羟基,羧酸,羧酸酐及其组合的取代基 ; R4选自氢和C1至C10脂族烃,其中脂族烃包含选自氢,羟基,羧酸,羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; m和n分别为整数; 并且其中n /(m + n)为约0.1至约0.5。
    • 3. 发明授权
    • Terpolymer for amplified resist
    • 扩增抗蚀剂的三元共聚物
    • US06713229B2
    • 2004-03-30
    • US10153474
    • 2002-05-21
    • Sang-jun ChoiChun-geun ParkYoung-bum Koh
    • Sang-jun ChoiChun-geun ParkYoung-bum Koh
    • G03F7004
    • C08F220/18C08F222/06G03F7/0045G03F7/039Y10S430/111Y10S430/115
    • Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
    • 共聚物和三聚体用于化学增强抗蚀剂。 三元共聚物具有下式:其中R 3选自氢和C 1至C 10脂族烃,其中脂族烃包含选自氢,羟基,羧酸,羧酸酐及其组合的取代基 ; R4选自氢和C1至C10脂族烃,其中脂族烃包含选自氢,羟基,羧酸,羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; m和n分别为整数; 并且其中n /(m + n)为约0.1至约0.5。