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1. 发明申请

US20120009332A1 METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE 审中-公开
标题翻译：制造有机发光显示装置的方法
公开(公告)号：US20120009332A1
公开(公告)日：2012-01-12
申请号：US13180454
申请日：2011-07-11
申请人： Sang-Yeol Kim , Il-Seok Park , Kyul Han , Mu-Hyun Kim
发明人： Sang-Yeol Kim , Il-Seok Park , Kyul Han , Mu-Hyun Kim
IPC分类号： B05D5/06
CPC分类号： H01L51/56 , C23C14/042 , C23C14/56 , H01L21/67173 , H01L51/001 , H01L51/0011 , H01L2227/323
摘要： A method of manufacturing an organic light-emitting display device, which simplifies fabrication processes of the organic light-emitting display device and improves manufacturing yield. This method includes preparing a substrate that has a number of first regions and a second region surrounding the first regions. The substrate is conveyed into a chamber. An organic emission layer is formed in a direction on a surface of the substrate. A first metal layer is formed on the organic emission layer so as to correspond to the first regions, and the organic emission layer formed on the second region is removed.
摘要翻译：一种制造有机发光显示装置的方法，其简化了有机发光显示装置的制造工艺并提高了制造成品率。该方法包括制备具有多个第一区域的基板和围绕第一区域的第二区域。将基板输送到室中。在基板的表面的方向上形成有机发光层。在有机发光层上形成与第一区域对应的第一金属层，去除形成在第二区域上的有机发光层。

2. 发明授权

US08697468B2 Organic light-emitting display apparatus and method of manufacturing the same 有权
标题翻译：有机发光显示装置及其制造方法
公开(公告)号：US08697468B2
公开(公告)日：2014-04-15
申请号：US13443767
申请日：2012-04-10
申请人： Sang-Yeol Kim , Il-Seok Park , Kyul Han
发明人： Sang-Yeol Kim , Il-Seok Park , Kyul Han
IPC分类号： H01L33/62
CPC分类号： H01L51/5203 , H01L27/3246 , H01L51/5092
摘要： An organic light-emitting apparatus includes a substrate; a first electrode formed on the substrate, where the first electrode is a cathode, an electron injection layer formed to contact an upper surface of the first electrode and including Mg, an intermediate layer formed on the electron injection layer and including an organic emission layer, and a second electrode which is formed on the intermediate layer and is an anode.
摘要翻译：有机发光装置包括：基板; 形成在所述基板上的第一电极，其中所述第一电极为阴极;电子注入层，形成为与所述第一电极的上表面接触并且包括Mg，形成在所述电子注入层上并包括有机发射层的中间层; 以及形成在中间层上并且是阳极的第二电极。

3. 发明申请

US20130015491A1 ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：有机发光显示装置及其制造方法
公开(公告)号：US20130015491A1
公开(公告)日：2013-01-17
申请号：US13443767
申请日：2012-04-10
申请人： Sang-Yeol Kim , Il-Seok Park , Kyul Han
发明人： Sang-Yeol Kim , Il-Seok Park , Kyul Han
IPC分类号： H01L33/62
CPC分类号： H01L51/5203 , H01L27/3246 , H01L51/5092
摘要： An organic light-emitting apparatus includes a substrate; a first electrode formed on the substrate, where the first electrode is a cathode, an electron injection layer formed to contact an upper surface of the first electrode and including Mg, an intermediate layer formed on the electron injection layer and including an organic emission layer, and a second electrode which is formed on the intermediate layer and is an anode.
摘要翻译：有机发光装置包括：基板; 形成在所述基板上的第一电极，其中所述第一电极为阴极;电子注入层，形成为与所述第一电极的上表面接触并且包括Mg，形成在所述电子注入层上并包括有机发射层的中间层; 以及形成在中间层上并且是阳极的第二电极。

4. 发明授权

US07075085B2 Method of measuring thickness of thin film using infrared thermal imaging system 有权
标题翻译：使用红外热成像系统测量薄膜厚度的方法
公开(公告)号：US07075085B2
公开(公告)日：2006-07-11
申请号：US10869903
申请日：2004-06-18
申请人： Il-Seok Park , Sang-Min Park
发明人： Il-Seok Park , Sang-Min Park
IPC分类号： G01J5/02
CPC分类号： G01B11/0658 , G01J5/0003 , G01J2005/0077 , G01J2005/0081
摘要： The present invention relates to a method of measuring the thickness of a thin film layer using an infrared thermal imaging system. The object of the present invention is to provide a method of measuring the thickness of a thin film layer fast in such a way as to obtain the two-dimensional (2-D) thickness distribution of the thin film layer at one time by measuring infrared spontaneous light emitted from a target surface using an infrared imaging camera. The present invention includes a means for measuring the thickness of a thin film coated on a flat base surface, which outputs the thickness of the thin film layer based on the emissivity of the base surface and the coating layer and the intensity of the infrared spontaneous light that is measured on the flat target surface and converted into temperature, and a means for measuring the thickness of a thin film layer coated on a curved base surface, which outputs the thickness of the thin film layer while considering directional emissivity attributable to the materials of the base surface and the coating layer.
摘要翻译：本发明涉及使用红外热成像系统测量薄膜层的厚度的方法。本发明的目的是提供一种通过测量红外线来一次获得薄膜层的二维（2-D）厚度分布的方式来快速测量薄膜层的厚度。使用红外成像照相机从目标表面发射的自发光。本发明包括用于测量涂覆在平坦基面上的薄膜的厚度的装置，其基于基底表面和涂层的发射率和红外自发光的强度输出薄膜层的厚度在平坦目标表面上测量并转换成温度，以及用于测量涂覆在弯曲基底表面上的薄膜层的厚度的装置，其输出薄膜层的厚度，同时考虑归因于材料的方向发射率基面和涂层。

5. 发明申请

US20050263706A1 Method of measuring thickness of thin film using infrared thermal imaging system 有权
标题翻译：使用红外热成像系统测量薄膜厚度的方法
公开(公告)号：US20050263706A1
公开(公告)日：2005-12-01
申请号：US10869903
申请日：2004-06-18
申请人： Il-Seok Park , Sang-Min Park
发明人： Il-Seok Park , Sang-Min Park
IPC分类号： G01B11/06 , G01J5/00 , G01J5/02
CPC分类号： G01B11/0658 , G01J5/0003 , G01J2005/0077 , G01J2005/0081
摘要： The present invention relates to a method of measuring the thickness of a thin film layer using an infrared thermal imaging system. The object of the present invention is to provide a method of measuring the thickness of a thin film layer fast in such a way as to obtain the two-dimensional (2-D) thickness distribution of the thin film layer at one time by measuring infrared spontaneous light emitted from a target surface using an infrared imaging camera. The present invention includes a means for measuring the thickness of a thin film coated on a flat base surface, which outputs the thickness of the thin film layer based on the emissivity of the base surface and the coating layer and the intensity of the infrared spontaneous light that is measured on the flat target surface and converted into temperature, and a means for measuring the thickness of a thin film layer coated on a curved base surface, which outputs the thickness of the thin film layer while considering directional emissivity attributable to the materials of the base surface and the coating layer.
摘要翻译：本发明涉及使用红外热成像系统测量薄膜层的厚度的方法。本发明的目的是提供一种通过测量红外线来一次获得薄膜层的二维（2-D）厚度分布的方式来快速测量薄膜层的厚度。使用红外成像照相机从目标表面发射的自发光。本发明包括用于测量涂覆在平坦基面上的薄膜的厚度的装置，其基于基底表面和涂层的发射率和红外自发光的强度输出薄膜层的厚度在平坦目标表面上测量并转换成温度，以及用于测量涂覆在弯曲基底表面上的薄膜层的厚度的装置，其输出薄膜层的厚度，同时考虑归因于材料的方向发射率基面和涂层。

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