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    • 2. 发明授权
    • Flat mask for cathode ray tube
    • US06621201B2
    • 2003-09-16
    • US10127727
    • 2002-04-23
    • Sang-Ho JeonJong-Han RheeHyang-Jin KohJun-Jong LeeDong-Hwan Kim
    • Sang-Ho JeonJong-Han RheeHyang-Jin KohJun-Jong LeeDong-Hwan Kim
    • H01J2980
    • H01J29/07H01J2229/0788
    • The present invention describes the details of a flat mask before tension is applied, an assembling method of that flat mask, and a tension mask assembly manufactured by using that method in order to obtain satisfactory thermal expansion, uniform stress distribution and linearity. The flat mask includes an apertured portion and supporting ends surrounding the apertured portion. The apertured portion comprises a plurality of concave pin-cushion type or convex barrel type strips, a plurality of real bridges connecting strips and dividing slots, and dummy bridges formed in the slots. The short supporting ends have the same width along a longitudinal direction and are formed to have the same curvature as the strips facing the supporting ends. The short supporting ends are preferably half-etched in order to make the volume of material removed from the short supporting ends greater than the volume of material removed from the apertured portion. Therefore, the short supporting ends can have grooves on their front and rear sides. In addition, the corner portions of the supporting ends are made to have sloping sides at a predetermined angle. As a result of manufacturing the tension mask by using the method of the present invention, the apertured portions of the tension mask have satisfactory thermal expansion, uniform stress distribution and linearity. In addition, it is possible for the tension mask to be prevented from having deformation caused by heat treatment after being held under tension.
    • 4. 发明授权
    • Color selection apparatus for cathode ray tube having real and dummy bridges
    • 具有实际和虚拟桥梁的阴极射线管选色装置
    • US06825600B2
    • 2004-11-30
    • US10155370
    • 2002-05-23
    • Soon-Cheol ShinJong-Han RheeSang-Ho JeonJun-Jong LeeHyang-Jin Koh
    • Soon-Cheol ShinJong-Han RheeSang-Ho JeonJun-Jong LeeHyang-Jin Koh
    • H01J2980
    • H01J29/07H01J2229/075H01J2229/0755
    • A color selection apparatus for a cathode ray tube. A mask is formed having a long axis and a short axis. A frame supports the mask in one of a long axis direction and a short axis direction. The mask has a plurality of strips separated by a predetermined distance. A plurality of first beam apertures are formed as single long slits between the strips in a center portion of the mask. A plurality of second beam apertures are formed on outer portions of the mask to both sides of the center portion of the mask. The second beam apertures are divided into a plurality of individual units within a single column by real bridges and at least one dummy bridge for each individual second beam aperture unit. The at least on dummy bridge extends inwardly from the strips but does not cross completely through the individual second beam aperture unit.
    • 一种用于阴极射线管的颜色选择装置。 形成具有长轴和短轴的掩模。 框架在长轴方向和短轴方向之一上支撑掩模。 掩模具有分开预定距离的多个条。 多个第一光束孔形成在掩模的中心部分中的条之间的单个长缝隙。 多个第二光束孔径在掩模的外部部分形成在掩模的中心部分的两侧。 第二光束孔径通过实际桥梁和用于每个单独的第二光束孔径单元的至少一个虚拟桥梁分成单个列中的多个单独的单元。 至少在虚拟桥上从条带向内延伸,但不完全穿过单独的第二光束孔径单元。
    • 5. 发明授权
    • Tension mask for color CRT, method for manufacturing the tension mask, and exposure mask used in the manufacture of the tension mask
    • 用于彩色CRT的张力罩,制造张力罩的方法和用于制造张力罩的曝光掩模
    • US06762545B2
    • 2004-07-13
    • US09836550
    • 2001-04-18
    • Deok-Hyeon ChoeJong-Han RheeSang-Ho JeonYoung-Bin Im
    • Deok-Hyeon ChoeJong-Han RheeSang-Ho JeonYoung-Bin Im
    • H01J2907
    • H01J9/146H01J29/07
    • A tension mask for a color cathode-ray tube, a method for manufacturing the tension mask, and an exposure mask for use in the manufacture of the tension mask are provided. The tension mask is manufactured by depositing photosensitive layers over the top and bottom surfaces of a steel foil. An upper exposure mask with a pattern including a series of parallel upper light transmission portions arranged in lines is aligned over the top surface of the steel foil, and a lower exposure mask with a pattern is aligned over the bottom surface of the steel foil. Here, the pattern of the lower exposure mask includes a series of parallel lower light transmission portions arranged in lines, a plurality of first light shielding portions intersecting adjacent lower light transmission portions among the series of the parallel lower light transmission portions, and a plurality of second light shielding portions partially extending between the edges of the adjacent lower light transmission portions. Following this, the photosensitive layers uncovered with the lower and upper exposure masks are exposed using an exposure light source, and then the upper and lower exposure masks are removed from the steel foil and developing the photosensitive layers remaining on the steel foil. Lastly, the steel foil which has undergone the developing process is etched, so that the tension mask is completed.
    • 提供了用于彩色阴极射线管的张力罩,用于制造张力罩的方法和用于制造张力罩的曝光掩模。 通过在钢箔的顶面和底面上沉积感光层来制造张力掩模。 具有排列成一行平行的上部光透射部分的图案的上部曝光掩模在钢箔的顶表面上对齐,并且具有图案的下部曝光掩模在钢箔的底表面上对准。 这里,低曝光掩模的图案包括:一系列平行的下行光传输部分,多个平行的下光传输部分中的多个第一遮光部分与相邻的下光传输部分相交, 第二遮光部分部分地延伸在相邻的下部光传输部分的边缘之间。 接下来,用曝光光源曝光未曝光的感光层,然后从钢箔上去除上,下曝光掩模,并显影保留在钢箔上的感光层。 最后,对经过显影处理的钢箔进行蚀刻,从而完成张力掩模。
    • 6. 发明授权
    • Cathode ray tube having shadow mask with improved shock absorption effect
    • 阴极射线管具有改善的减震效果的荫罩
    • US06710530B2
    • 2004-03-23
    • US10272001
    • 2002-10-17
    • Jun-Jong LeeKyou-Bong LeeJong-Han RheeSang-Ho Jeon
    • Jun-Jong LeeKyou-Bong LeeJong-Han RheeSang-Ho Jeon
    • H01J2980
    • H01J29/07H01J2229/0766
    • A cathode ray tube includes a panel with an inner phosphor screen, and a funnel sealed to the panel while facing the phosphor screen. The funnel is externally mounted with a deflection yoke. A neck is sealed to the rear of the funnel while mounting an electron gun to emit electron beams therein. A shadow mask is placed within the panel. The shadow mask has a hole-formation portion with a plurality of beam-guide holes, a non-holed portion externally surrounding the hole-formation portion while being shaped with a rectangular frame, and a skirt bent from the outer periphery of the non-holed portion to the rear of the panel. The skirt has a basic etching portion half-etched at a predetermined roughness. The components of the shadow mask are integrated into one body. A welding portion is formed at the bottom of the skirt with a plurality of welding points. A mask frame is internally suspension-fitted to the panel while being welded to the skirt to support the shadow mask. The skirt of the shadow mask has a subsidiary etching portion placed between the welding portion and the basic etching portion while being half-etched at a roughness greater than the roughness of the basic etching portion.
    • 阴极射线管包括具有内荧光屏的面板和在面向荧光屏的情况下与面板密封的漏斗。 漏斗外部安装有偏转线圈。 颈部密封到漏斗的后面,同时安装电子枪以在其中发射电子束。 荫罩放置在面板内。 荫罩具有孔形成部分,该孔形成部分具有多个光束引导孔,外部围绕孔形成部分的非孔部分,同时成形为矩形框架,以及从非易失性存储器的外周弯曲的裙部, 孔部分到面板的后部。 裙部具有以预定粗糙度半刻蚀的基本蚀刻部分。 荫罩的组件被集成到一个主体中。 焊接部分在裙部的底部形成有多个焊接点。 面罩框架内部悬挂于面板上,同时焊接到裙部以支撑荫罩。 荫罩的裙部具有放置在焊接部分和基本蚀刻部分之间的辅助蚀刻部分,同时以大于基本蚀刻部分的粗糙度的粗糙度进行半蚀刻。
    • 7. 发明授权
    • Method for crystallizing a silicon substrate
    • 硅衬底结晶方法
    • US09087697B2
    • 2015-07-21
    • US13890476
    • 2013-05-09
    • Sung-Ho KimMin-Hwan ChoiMin-Ji BaekSang-Kyung LeeSang-Ho JeonJong-Moo Huh
    • Sung-Ho KimMin-Hwan ChoiMin-Ji BaekSang-Kyung LeeSang-Ho JeonJong-Moo Huh
    • H01L21/02H01L21/66
    • H01L21/02686H01L21/02532H01L22/12H01L22/20
    • A method for crystallizing a silicon substrate includes manufacturing a crystallized silicon test substrate that is crystallized by scanning excimer laser annealing beams with different energy densities on respective areas of an amorphous silicon test substrate, irradiating a surface of the crystallized silicon test substrate using a light source, and measuring reflectivity corresponding to the respective areas of the crystallized silicon test substrate in a visible light wavelength range, extracting average reflectivities of the respective areas of the crystallized silicon test substrate in wavelength ranges corresponding to respective colors, calculating an optimum energy density (OPED) index per energy density by using a value acquired by subtracting average reflectivity of red-based colors from average reflectivity of blue-based colors, selecting an optimal energy density, and crystallizing an amorphous silicon substrate using the optimal energy density.
    • 一种硅衬底的结晶方法包括:制造结晶硅测试衬底,其通过在非晶硅测试衬底的各个区域上扫描具有不同能量密度的准分子激光退火光束而被结晶,使用光源照射结晶硅测试衬底的表面 ,并且在可见光波长范围内测量对应于结晶硅测试衬底的各个区域的反射率,提取结晶硅测试衬底的各个区域的平均反射率,其对应于各种颜色的波长范围,计算最佳能量密度(OPED )通过使用通过从基于蓝色的颜色的平均反射率减去红色颜色的平均反射率而获得的值,选择最佳能量密度,并使用最佳能量密度结晶非晶硅衬底而获得的值。