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1. 发明授权

US09575405B2 Photo mask and method of manufacturing the same 有权
标题翻译：照相面具及其制造方法
公开(公告)号：US09575405B2
公开(公告)日：2017-02-21
申请号：US14678743
申请日：2015-04-03
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jun-Hyuk Woo , Jeong-Won Kim , Kwang-Woo Park , Dong-Eon Lee , Seung-Bo Shim , Jin-Ho Ju
IPC分类号： G03F1/38 , G03F1/58 , G03F1/80 , G03F1/54 , G03F7/00
CPC分类号： G03F1/38 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0007
摘要： A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
摘要翻译：光掩模包括透明基板和掩模图案。掩模图案设置在透明基板上。掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。传送部分与阻挡部分相邻。阻挡部分包括第一阻挡层，光引导层和第二阻挡层。第一阻挡层设置在透明基板上。第一阻挡层透射光的一部分。第一阻挡层包括多个阻挡图案，包括第一阻挡材料。光引导层设置在第一阻挡层上。光导层将光的透射部分引导到光导层的侧表面。第二阻挡层反射光的透射部分。

2. 发明授权

US08911926B2 Photoresist composition and method of forming a metal pattern using the same 有权
标题翻译：光刻胶组合物和使用其形成金属图案的方法
公开(公告)号：US08911926B2
公开(公告)日：2014-12-16
申请号：US13857554
申请日：2013-04-05
申请人： Samsung Display Co., Ltd.
发明人： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
IPC分类号： G03C1/52 , G03F7/022 , G03F7/00 , B21B27/10 , B05D3/10 , B21B45/02
CPC分类号： G03F7/022 , B05D3/107 , B21B27/10 , B21B45/02 , G03F7/00 , G03F7/0045 , G03F7/40
摘要： A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
摘要翻译：公开了一种形成金属图案的方法。在该方法中，在基底基板上形成金属层。将光致抗蚀剂组合物涂覆在金属层上以形成涂层。光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。涂层被曝光。部分去除涂层以形成光致抗蚀剂图案。通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。

3. 发明授权

US09490278B2 Photo mask and method of manufacturing thin film transistor using the same 有权
标题翻译：使用其制造薄膜晶体管的光掩模和方法
公开(公告)号：US09490278B2
公开(公告)日：2016-11-08
申请号：US14740378
申请日：2015-06-16
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Kwang-Woo Park , Jeong-Won Kim , Jun-Hyuk Woo , Gwui-Hyun Park , Jin-Ho Ju
IPC分类号： H01L27/32 , H01L27/12 , G02B5/30 , G02B1/08 , G02F1/13 , G03F1/38
CPC分类号： H01L27/1288 , G02B1/08 , G02B5/3033 , G02B5/3058 , G02F1/1303 , G03F1/38 , H01L29/66969 , H01L29/7869
摘要： According to an exemplary embodiment of the present invention, a photomask includes a transparent substrate and a polarizing pattern. A polarizing pattern is disposed on a transparent substrate. The polarizing pattern polarize light.
摘要翻译：根据本发明的示例性实施例，光掩模包括透明基板和偏振图案。偏光图案设置在透明基板上。偏光图案使光线偏光。

4. 发明授权

US09069258B2 Mask having assist pattern 有权
标题翻译：面具有辅助图案
公开(公告)号：US09069258B2
公开(公告)日：2015-06-30
申请号：US13835567
申请日：2013-03-15
申请人： Samsung Display Co., LTD.
发明人： Bong-Yeon Kim , Min Kang , Seung-Bo Shim , Jong-kwang Lee , Jin-Ho Ju , Jeong-Won Kim , Tae-Gyun Kim , Chul-Won Park , Jun-Hyuk Woo , Hyun-Joo Lee
IPC分类号： G03F1/42
CPC分类号： G03F1/42
摘要： A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
摘要翻译：掩模可以包括电路区域和像素区域。电路区域包括电路图案。像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。

5. 发明申请

US20150136728A1 CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME 有权
标题翻译：清洁组合物及使用其制造金属接线的方法
公开(公告)号：US20150136728A1
公开(公告)日：2015-05-21
申请号：US14264193
申请日：2014-04-29
申请人： Samsung Display Co., Ltd. , Cowon Innotech Inc.
发明人： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC分类号： C11D11/00 , H05K3/06 , C11D7/06 , C11D7/32 , C11D7/26 , C11D7/08 , H01L21/02 , H05K3/26
CPC分类号： C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
摘要： A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
摘要翻译：清洁组合物包含约0.01至约5重量％的螯合剂; 约0.01至约0.5重量％的有机酸; 约0.01至约1.0重量％的无机酸; 约0.01至约5重量％的碱金属化合物; 和去离子水。

6. 发明申请

US20160230289A1 CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME 审中-公开
公开(公告)号：US20160230289A1
公开(公告)日：2016-08-11
申请号：US15134672
申请日：2016-04-21
申请人： Samsung Display Co., Ltd. , LTCAM CO., LTD.
发明人： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC分类号： C23F1/16 , C23F11/04 , C11D7/32 , C11D7/26 , C11D11/00 , C11D7/08
CPC分类号： C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
摘要： A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.

7. 发明授权

US09395619B2 Phase shift mask, patterning method using the same and method of manufacturing display panel using the same 有权
标题翻译：相移掩模，使用其的图案化方法以及使用其的显示面板的制造方法
公开(公告)号：US09395619B2
公开(公告)日：2016-07-19
申请号：US14307797
申请日：2014-06-18
申请人： Samsung Display Co., LTD.
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Jun-Hyuk Woo , Hyun-Joo Lee , Sang-Uk Lim , Jin-Ho Ju
IPC分类号： G03F1/26 , G03F7/40 , G03F7/20
CPC分类号： G03F1/26 , G02F2001/136231 , G03F7/20 , G03F7/40 , H01L27/1288
摘要： A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
摘要翻译：相移装置包括：包括透明基板的相移掩模和设置在透明基板上的相移图案，并且包括具有第一厚度的第一区域，第二区域的第二厚度小于第一厚度，具有第一开口宽度并限定在第一区域的第一开口，以及具有第二开口宽度并限定在第二区域的第二开口。

8. 发明申请

US20160139504A1 PHOTO MASK AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：照片掩模及其制造方法
公开(公告)号：US20160139504A1
公开(公告)日：2016-05-19
申请号：US14678743
申请日：2015-04-03
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jun-Hyuk Woo , Jeong-Won Kim , Kwang-Woo Park , Dong-Eon Lee , Seung-Bo Shim , Jin-Ho Ju
IPC分类号： G03F1/80 , G03F1/38
CPC分类号： G03F1/38 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0007
摘要： A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
摘要翻译：光掩模包括透明基板和掩模图案。掩模图案设置在透明基板上。掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。发送部分与阻挡部分相邻。阻挡部分包括第一阻挡层，光引导层和第二阻挡层。第一阻挡层设置在透明基板上。第一阻挡层透射光的一部分。第一阻挡层包括多个阻挡图案，包括第一阻挡材料。光引导层设置在第一阻挡层上。光导层将光的透射部分引导到光导层的侧表面。第二阻挡层反射光的透射部分。

9. 发明授权

US09869027B2 Cleaning composition and method of manufacturing metal wiring using the same 有权
公开(公告)号：US09869027B2
公开(公告)日：2018-01-16
申请号：US15134672
申请日：2016-04-21
申请人： Samsung Display Co., Ltd. , LTCAM CO., LTD.
发明人： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC分类号： C09K13/04 , C23F1/16 , C11D11/00 , H01L21/02 , H05K3/26 , C11D7/32 , C11D7/26 , C11D7/08 , C11D7/06 , C23F11/04 , H05K3/06 , H05K1/03 , H05K3/38
CPC分类号： C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
摘要： A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.

10. 发明授权

US09340759B2 Cleaning composition and method of manufacturing metal wiring using the same 有权
标题翻译：使用其制造金属布线的清洁组合物和方法
公开(公告)号：US09340759B2
公开(公告)日：2016-05-17
申请号：US14264193
申请日：2014-04-29
申请人： Samsung Display Co., Ltd. , Cowon Innotech Inc.
发明人： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC分类号： C09K13/04 , C11D11/00 , H01L21/02 , H05K3/26 , C11D7/32 , C11D7/26 , C11D7/08 , C11D7/06 , H05K3/06 , H05K1/03 , H05K3/38
CPC分类号： C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
摘要： A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
摘要翻译：清洁组合物包含约0.01至约5重量％的螯合剂; 约0.01至约0.5重量％的有机酸; 约0.01至约1.0重量％的无机酸; 约0.01至约5重量％的碱金属化合物; 和去离子水。

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