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1. 发明授权

US10727257B2 Exposure mask and method of manufacturing a substrate using the exposure mask 有权
公开(公告)号：US10727257B2
公开(公告)日：2020-07-28
申请号：US16720177
申请日：2019-12-19
申请人： Samsung Display Co., Ltd.
发明人： Seung-Bo Shim , Jun-Gi Kim , Yong-Jun Park , Yang-Ho Jung , Jin-Ho Ju
IPC分类号： H01L27/12 , G03F1/38 , G03F1/22
摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

2. 发明申请

US20150162356A1 DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：显示装置及其制造方法
公开(公告)号：US20150162356A1
公开(公告)日：2015-06-11
申请号：US14316523
申请日：2014-06-26
申请人： Samsung Display Co., Ltd.
发明人： Seung-Bo Shim , Dong-Hyun Yu , Jin-Ho Ju
IPC分类号： H01L27/12 , H01L21/32
CPC分类号： G03F1/50 , G03F1/00 , H01L21/0274 , H01L21/31144 , H01L21/32 , H01L27/1214 , H01L27/124 , H01L27/1248 , H01L27/1259 , H01L29/66757 , H01L51/0541 , H01L51/0545
摘要： A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.
摘要翻译：一种显示装置，包括：基板，包括第一区域和第二区域;基板上的栅极线和数据线;基板上的薄膜晶体管，连接到栅极线和数据线;以及连接有像素电极的像素电极到所述薄膜晶体管，其中所述第二区域具有第二接触孔，所述第二接触孔的面积大于所述第一区域的第一接触孔的面积。

3. 发明申请

US20160139504A1 PHOTO MASK AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：照片掩模及其制造方法
公开(公告)号：US20160139504A1
公开(公告)日：2016-05-19
申请号：US14678743
申请日：2015-04-03
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jun-Hyuk Woo , Jeong-Won Kim , Kwang-Woo Park , Dong-Eon Lee , Seung-Bo Shim , Jin-Ho Ju
IPC分类号： G03F1/80 , G03F1/38
CPC分类号： G03F1/38 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0007
摘要： A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
摘要翻译：光掩模包括透明基板和掩模图案。掩模图案设置在透明基板上。掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。发送部分与阻挡部分相邻。阻挡部分包括第一阻挡层，光引导层和第二阻挡层。第一阻挡层设置在透明基板上。第一阻挡层透射光的一部分。第一阻挡层包括多个阻挡图案，包括第一阻挡材料。光引导层设置在第一阻挡层上。光导层将光的透射部分引导到光导层的侧表面。第二阻挡层反射光的透射部分。

4. 发明授权

US10529751B2 Exposure mask and method of manufacturing a substrate using the exposure mask 有权
公开(公告)号：US10529751B2
公开(公告)日：2020-01-07
申请号：US16135003
申请日：2018-09-19
申请人： Samsung Display Co., Ltd.
发明人： Seung-Bo Shim , Jun-Gi Kim , Yong-Jun Park , Yang-Ho Jung , Jin-Ho Ju
IPC分类号： H01L27/12 , G03F1/38 , G03F1/22
摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

5. 发明申请

US20150171118A1 DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE 有权
标题翻译：显示基板和制造显示基板的方法
公开(公告)号：US20150171118A1
公开(公告)日：2015-06-18
申请号：US14322859
申请日：2014-07-02
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Seung-Bo Shim , Jin-Ho Ju , Jun-Gi Kim , Yang-Ho Jung
IPC分类号： H01L27/12
CPC分类号： H01L27/1248 , H01L27/124 , H01L27/1288
摘要： A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.
摘要翻译：显示基板包括具有第一区域和第二区域的基板，在基板的第一区域中设置导体图案，并且包括第一导电图案和第二导电图案，第一导电图案具有栅电极和源极电极，第二导电图案具有源电极和漏电极，绝缘层图案位于导电图案上并且暴露导电图案的外侧壁，有机层设置在第一区域和第二区域中基板并覆盖绝缘层图案，并且在有机层上设置像素电极，并且通过有机层中的接触孔与漏电极电连接。

6. 发明授权

US09576987B2 Display substrate and method of manufacturing the display substrate 有权
标题翻译：显示基板和制造显示基板的方法
公开(公告)号：US09576987B2
公开(公告)日：2017-02-21
申请号：US14322859
申请日：2014-07-02
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Seung-Bo Shim , Jin-Ho Ju , Jun-Gi Kim , Yang-Ho Jung
IPC分类号： H01L27/12 , H01L29/786 , H01L29/66 , H01L27/32
CPC分类号： H01L27/1248 , H01L27/124 , H01L27/1288
摘要： A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.
摘要翻译：显示基板包括具有第一区域和第二区域的基板，在基板的第一区域中设置导体图案，并且包括第一导电图案和第二导电图案，第一导电图案具有栅电极和源极电极，第二导电图案具有源电极和漏电极，绝缘层图案位于导电图案上并且暴露导电图案的外侧壁，有机层设置在第一区域和第二区域中基板并覆盖绝缘层图案，并且在有机层上设置像素电极，并且通过有机层中的接触孔与漏电极电连接。

7. 发明授权

US09093535B2 Method of planarizing substrate and method of manufacturing thin film transistor using the same 有权
标题翻译：平面化基板的方法和使用其制造薄膜晶体管的方法
公开(公告)号：US09093535B2
公开(公告)日：2015-07-28
申请号：US13677172
申请日：2012-11-14
申请人： Samsung Display Co., LTD.
发明人： Hyang-Shik Kong , Seung-Bo Shim , Jin-Ho Ju , Jun-Gi Kim
IPC分类号： H01L21/311 , H01L29/786 , H01L21/02 , H01L29/66 , H01L21/027 , H01L21/321
CPC分类号： H01L29/786 , H01L21/02697 , H01L21/0274 , H01L21/32115 , H01L29/66765 , H01L29/78603 , H01L29/7869
摘要： A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion.
摘要翻译：平面化基板的方法包括在基底基板的第一表面上形成导电图案，在基底基板和导电图案上形成正性光致抗蚀剂层，通过照射基底基板的第二表面将正性光致抗蚀剂层曝光在第一表面与光相对的位置，显影正性光致抗蚀剂层以在导电图案上形成突出部分，在基底基板和突出部分上形成平坦化层，并且消除突出部分。

8. 发明授权

US09069258B2 Mask having assist pattern 有权
标题翻译：面具有辅助图案
公开(公告)号：US09069258B2
公开(公告)日：2015-06-30
申请号：US13835567
申请日：2013-03-15
申请人： Samsung Display Co., LTD.
发明人： Bong-Yeon Kim , Min Kang , Seung-Bo Shim , Jong-kwang Lee , Jin-Ho Ju , Jeong-Won Kim , Tae-Gyun Kim , Chul-Won Park , Jun-Hyuk Woo , Hyun-Joo Lee
IPC分类号： G03F1/42
CPC分类号： G03F1/42
摘要： A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
摘要翻译：掩模可以包括电路区域和像素区域。电路区域包括电路图案。像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。

9. 发明授权

US10083998B2 Exposure mask and method of manufacturing a substrate using the exposure mask 有权
公开(公告)号：US10083998B2
公开(公告)日：2018-09-25
申请号：US15491279
申请日：2017-04-19
申请人： Samsung Display Co., Ltd.
发明人： Seung-Bo Shim , Jun-Gi Kim , Yong-Jun Park , Yang-Ho Jung , Jin-Ho Ju
IPC分类号： H01L27/14 , H01L27/12 , G03F1/38 , G03F1/22
CPC分类号： H01L27/1288 , G03F1/22 , G03F1/38 , H01L27/124
摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

10. 发明授权

US10018906B2 Display device and method of manufacturing the same 有权
公开(公告)号：US10018906B2
公开(公告)日：2018-07-10
申请号：US15018771
申请日：2016-02-08
申请人： Samsung Display Co., Ltd.
发明人： Seung-Bo Shim , Dong-Hyun Yu , Jin-Ho Ju
IPC分类号： G03F1/50 , H01L27/12 , G03F1/00 , H01L21/027 , H01L21/311 , H01L29/66 , H01L21/32 , H01L51/05
CPC分类号： G03F1/50 , G03F1/00 , H01L21/0274 , H01L21/31144 , H01L21/32 , H01L27/1214 , H01L27/124 , H01L27/1248 , H01L27/1259 , H01L29/66757 , H01L51/0541 , H01L51/0545
摘要： A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.

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