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1. 发明授权

US09556371B2 Homogeneous blending 有权
标题翻译：均匀混合
公开(公告)号：US09556371B2
公开(公告)日：2017-01-31
申请号：US13618088
申请日：2012-09-14
申请人： Saeed H. Mohseni , Elizabeth K. Gramm , Deepak Mahulikar
发明人： Saeed H. Mohseni , Elizabeth K. Gramm , Deepak Mahulikar
IPC分类号： B01J13/00 , C09G1/02 , C09K3/14
CPC分类号： C09K3/1463 , C09G1/02
摘要： A method of forming a colloidal dispersion includes providing a first continuous material flow, providing a second continuous material flow, combining the first and second continuous material flows, and moving a continuous flow of a colloidal dispersion in a direction downstream of the first and second continuous flows. The first continuous material flow includes one or more of a diluent (e.g., deionized water), a base, and an acid, and the second continuous material flow includes an abrasive particle solution. The first and second material flows are combined with a Reynolds number greater than about 4400 and less than about 25000 (e.g., about 7400 to about 25000). The colloidal dispersion includes the diluent, the base, the acid, and abrasive particles from the abrasive particle solution.
摘要翻译：形成胶态分散体的方法包括提供第一连续材料流，提供第二连续材料流，组合第一和第二连续材料流，以及在第一和第二连续材料的下游方向上移动胶体分散体的连续流动流动。第一连续材料流包括稀释剂（例如去离子水），碱和酸中的一种或多种，并且第二连续材料流包括研磨颗粒溶液。第一和第二材料流与大于约4400且小于约25000（例如约7400至约25000）的雷诺数组合。胶体分散体包括来自磨料颗粒溶液的稀释剂，碱，酸和磨料颗粒。

2. 发明授权

US08303806B2 Fluid processing 有权
标题翻译：流体加工
公开(公告)号：US08303806B2
公开(公告)日：2012-11-06
申请号：US12702602
申请日：2010-02-09
申请人： Saeed H. Mohseni , Deepak Mahulikar
发明人： Saeed H. Mohseni , Deepak Mahulikar
IPC分类号： B01D35/157 , B01D29/50 , B01D35/00
CPC分类号： B01D35/143 , B01D29/56 , B01D29/96 , B01D2201/265
摘要： Fluid processing apparatuses and systems are disclosed. In some embodiments the fluid processing apparatuses include a movable enclosure, a plurality of filter housings disposed substantially within the movable enclosure, and a stand disposed within the enclosure. The filter housings are in fluid communication with one another. Each filter housing defines an elongate path and is configured to support a respective filter along the elongate flow path to filter a substantially continuous flow of fluid. The stand supports each filter housing such that the elongate flow path of each filter housing is substantially parallel to a vertical axis, wherein each filter housing is independently rotatable, relative to the stand.
摘要翻译：公开了流体处理装置和系统。在一些实施例中，流体处理设备包括可移动的外壳，基本上设置在可移动外壳内的多个过滤器外壳以及设置在外壳内的支架。过滤器壳体彼此流体连通。每个过滤器壳体限定细长的路径并且构造成沿着细长流动路径支撑相应的过滤器以过滤基本连续的流体流。支架支撑每个过滤器壳体，使得每个过滤器壳体的细长流动路径基本上平行于垂直轴线，其中每个过滤器壳体相对于支架独立地可旋转。

3. 发明申请

US20110215053A1 Fluid Processing 有权
标题翻译：流体加工
公开(公告)号：US20110215053A1
公开(公告)日：2011-09-08
申请号：US12850915
申请日：2010-08-05
申请人： Saeed H. Mohseni , Deepak Mahulikar
发明人： Saeed H. Mohseni , Deepak Mahulikar
IPC分类号： B01D37/00 , B01D29/50
CPC分类号： B01D35/143 , B01D29/56 , B01D29/96 , B01D2201/265
摘要： Fluid processing apparatuses and systems are disclosed. In some embodiments the fluid processing apparatuses include a movable enclosure, a plurality of filter housings disposed substantially within the movable enclosure, and a stand disposed within the enclosure. The filter housings are in fluid communication with one another. Each filter housing defines an elongate path and is configured to support a respective filter along the elongate flow path to filter a substantially continuous flow of fluid. The stand supports each filter housing such that the elongate flow path of each filter housing is substantially parallel to a vertical axis, wherein each filter housing is independently rotatable, relative to the stand.
摘要翻译：公开了流体处理装置和系统。在一些实施例中，流体处理设备包括可移动的外壳，基本上设置在可移动外壳内的多个过滤器外壳以及设置在外壳内的支架。过滤器壳体彼此流体连通。每个过滤器壳体限定细长的路径并且构造成沿着细长流动路径支撑相应的过滤器以过滤基本连续的流体流。支架支撑每个过滤器壳体，使得每个过滤器壳体的细长流动路径基本上平行于垂直轴线，其中每个过滤器壳体相对于支架独立地可旋转。

4. 发明授权

US08211193B2 Ultrapure colloidal silica for use in chemical mechanical polishing applications 有权
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US08211193B2
公开(公告)日：2012-07-03
申请号：US11526132
申请日：2006-09-22
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14 , C09K13/00 , C09K13/02 , B24B1/00 , C01B33/12 , C03C15/00 , C03C25/68
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
摘要翻译：一种对基材表面进行化学机械抛光的方法，包括以下步骤：使除了钾和钠之外的每种微量金属杂质含有少于200ppb的多种胶体二氧化硅颗粒的组合物接触，其含量小于2ppm 残余醇，其中不包括钾和钠的痕量金属的累积浓度在约0.5至约5ppm的范围内; 和用于悬浮颗粒的介质; 其中所述组合物是超纯胶体二氧化硅分散体; 并且其中所述接触在足以平坦化基底的温度和时间段内进行。

5. 发明授权

US08779011B2 Ultrapure colloidal silica for use in chemical mechanical polishing applications 有权
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US08779011B2
公开(公告)日：2014-07-15
申请号：US13405027
申请日：2012-02-24
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： C01B33/141 , C01B33/143 , C09C1/68 , C09K13/06
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： A method for producing and using an ultrapure colloidal silica dispersion is disclosed. The ultrapure colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and less than 2 ppm residual alcohol. The method comprises dissolving a fumed silica in an aqueous solvent comprising an alkali metal hydroxide to produce an alkaline silicate solution, removing the alkali metal via ion exchange to generate a silicic acid solution, adjusting temperature, concentration and pH of said silicic acid solution to values sufficient to initiate nucleation and particle growth, and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion.
摘要翻译：公开了一种制备和使用超纯胶体二氧化硅分散体的方法。超纯胶体二氧化硅分散体中含有少于200ppb的痕量金属杂质，不包括钾和钠，少于2ppm的残余醇。该方法包括将热解法二氧化硅溶解在包含碱金属氢氧化物的水性溶剂中以产生碱性硅酸盐溶液，通过离子交换除去碱金属以产生硅酸溶液，将所述硅酸溶液的温度，浓度和pH值调节至数值足以引发成核和颗粒生长，并以足以产生胶体二氧化硅分散体的速率冷却硅酸溶液。

6. 发明申请

US20130067998A1 Homogeneous Blending 有权
标题翻译：均匀混合
公开(公告)号：US20130067998A1
公开(公告)日：2013-03-21
申请号：US13618088
申请日：2012-09-14
申请人： Saeed H. Mohseni , Elizabeth K. Gramm , Deepak Mahulikar
发明人： Saeed H. Mohseni , Elizabeth K. Gramm , Deepak Mahulikar
IPC分类号： C09K13/00 , G01N1/44 , G01N1/10 , C09K13/02 , C09G1/02
CPC分类号： C09K3/1463 , C09G1/02
摘要： A method of forming a colloidal dispersion includes providing a first continuous material flow, providing a second continuous material flow, combining the first and second continuous material flows, and moving a continuous flow of a colloidal dispersion in a direction downstream of the first and second continuous flows. The first continuous material flow includes one or more of a diluent (e.g., deionized water), a base, and an acid, and the second continuous material flow includes an abrasive particle solution. The first and second material flows are combined with a Reynolds number greater than about 4400 and less than about 25000 (e.g., about 7400 to about 25000). The colloidal dispersion includes the diluent, the base, the acid, and abrasive particles from the abrasive particle solution.
摘要翻译：形成胶态分散体的方法包括提供第一连续材料流，提供第二连续材料流，组合第一和第二连续材料流，以及在第一和第二连续材料的下游方向上移动胶体分散体的连续流动流动。第一连续材料流包括稀释剂（例如去离子水），碱和酸中的一种或多种，并且第二连续材料流包括研磨颗粒溶液。第一和第二材料流与大于约4400且小于约25000（例如约7400至约25000）的雷诺数组合。胶体分散体包括来自磨料颗粒溶液的稀释剂，碱，酸和磨料颗粒。

7. 发明申请

US20120145950A1 ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING APPLICATIONS 有权
标题翻译：用于化学机械抛光应用的超细胶体硅胶
公开(公告)号：US20120145950A1
公开(公告)日：2012-06-14
申请号：US13405027
申请日：2012-02-24
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R.M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R.M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： C09K13/00 , B82Y30/00
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb, of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol. A method for producing and using the same is also disclosed.
摘要翻译：一种超纯胶态二氧化硅分散体，其包含平均或聚集体粒径为约10至约200nm的胶体二氧化硅颗粒，其中胶态二氧化硅分散体中除了钾和钠之外的每种痕量金属杂质少于200ppb，并且具有小于2ppm的残余酒精。还公开了其制造和使用方法。

8. 发明授权

US08974677B2 Fluid processing 有权
标题翻译：流体加工
公开(公告)号：US08974677B2
公开(公告)日：2015-03-10
申请号：US12850915
申请日：2010-08-05
申请人： Saeed H. Mohseni , Deepak Mahulikar
发明人： Saeed H. Mohseni , Deepak Mahulikar
IPC分类号： C02F1/00 , B01D37/00 , B01D29/56 , B01D35/143 , B01D29/00
CPC分类号： B01D35/143 , B01D29/56 , B01D29/96 , B01D2201/265
摘要： Fluid processing apparatuses and systems are disclosed. In some embodiments the fluid processing apparatuses include a movable enclosure, a plurality of filter housings disposed substantially within the movable enclosure, and a stand disposed within the enclosure. The filter housings are in fluid communication with one another. Each filter housing defines an elongate path and is configured to support a respective filter along the elongate flow path to filter a substantially continuous flow of fluid. The stand supports each filter housing such that the elongate flow path of each filter housing is substantially parallel to a vertical axis, wherein each filter housing is independently rotatable, relative to the stand.
摘要翻译：公开了流体处理装置和系统。在一些实施例中，流体处理设备包括可移动的外壳，基本上设置在可移动外壳内的多个过滤器外壳以及设置在外壳内的支架。过滤器壳体彼此流体连通。每个过滤器壳体限定细长的路径并且构造成沿着细长流动路径支撑相应的过滤器以过滤基本连续的流体流。支架支撑每个过滤器壳体，使得每个过滤器壳体的细长流动路径基本上平行于垂直轴线，其中每个过滤器壳体相对于支架独立地可旋转。

9. 发明申请

US20120055865A1 CLEANING METHOD AND SYSTEM 审中-公开
标题翻译：清洁方法和系统
公开(公告)号：US20120055865A1
公开(公告)日：2012-03-08
申请号：US13159915
申请日：2011-06-14
申请人： Saeed H. Mohseni , Deepak Mahulikar , Elizabeth Gramm
发明人： Saeed H. Mohseni , Deepak Mahulikar , Elizabeth Gramm
IPC分类号： B01D29/00 , B08B3/12 , B08B3/00 , C09K13/00 , C11D17/00 , C09K13/04 , C09K13/02 , B08B7/04 , B08B9/00
CPC分类号： B08B3/08 , B01D41/04 , B08B3/14 , C11D3/43 , C11D7/50
摘要： A method for removing particles or deposits from a surface having particles or deposits thereon. The method involves contacting a surface with a chemical composition sufficient to selectively dissolve and remove at least a portion of the particles or deposits from the surface. The chemical composition is compatible with the surface. This disclosure also relates to a system of specially designed equipment for removing particles or deposits from a surface having particles or deposits thereon. The disclosure is useful, for example, in cleaning porous surfaces, media for cartridge, pleated and membrane surfaces, and internal walls of tanks or filter housings.
摘要翻译：从其上具有颗粒或沉积物的表面去除颗粒或沉积物的方法。该方法包括将表面与足以选择性地溶解并从表面去除至少一部分颗粒或沉积物的化学组合物接触。化学成分与表面相容。本公开还涉及一种用于从其上具有颗粒或沉积物的表面去除颗粒或沉积物的专门设计的设备的系统。本公开可用于例如清洁多孔表面，用于筒的介质，褶皱和膜表面以及罐或过滤器壳体的内壁。

10. 发明申请

US20060283095A1 Fumed silica to colloidal silica conversion process 审中-公开
标题翻译：气相二氧化硅胶体二氧化硅转化工艺
公开(公告)号：US20060283095A1
公开(公告)日：2006-12-21
申请号：US11152873
申请日：2005-06-15
申请人： Deepak Mahulikar , Yuhu Wang
发明人： Deepak Mahulikar , Yuhu Wang
IPC分类号： C01B33/20 , C01B33/141 , C09K3/14 , C01B33/12
CPC分类号： C09K3/1463 , C01B33/14 , C01B33/1435 , C01B33/22
摘要： A method of manufacturing a colloidal silica dispersion, by dissolving a fumed silica in an aqueous solvent having an alkali metal hydroxide to produce an alkaline silicate solution; removing the alkali metal via ion exchange to produce a silicic acid solution; adjusting the temperature, concentration and pH of the silicic acid solution to values sufficient to initiate nucleation and particle growth at elevated temperatures; and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion. The colloidal silica particles in the colloidal silica dispersion have a mean particle size about 2 nm to about 100 nm. Also provided is a method of chemical mechanical polishing a surface of a substrate by contacting the substrate and a composition having a plurality of colloidal silica particles according to the present invention and a medium for suspending the particles. The contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
摘要翻译：通过将热解法二氧化硅溶解在具有碱金属氢氧化物的水性溶剂中以制备碱性硅酸盐溶液来制备胶体二氧化硅分散体的方法; 通过离子交换除去碱金属，生成硅酸溶液; 将硅酸溶液的温度，浓度和pH调节到足以在升高的温度下引发成核和颗粒生长的值; 并以足以产生胶体二氧化硅分散体的速率冷却硅酸溶液。胶体二氧化硅分散体中的胶体二氧化硅颗粒的平均粒径约为2nm至约100nm。还提供了通过使基板和具有根据本发明的多个胶体二氧化硅颗粒的组合物和用于悬浮颗粒的介质的组合物进行化学机械抛光基板的表面的方法。接触在足以使基材平坦化的温度下进行一段时间。

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