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1. 发明申请

US20060283095A1 Fumed silica to colloidal silica conversion process 审中-公开
标题翻译：气相二氧化硅胶体二氧化硅转化工艺
公开(公告)号：US20060283095A1
公开(公告)日：2006-12-21
申请号：US11152873
申请日：2005-06-15
申请人： Deepak Mahulikar , Yuhu Wang
发明人： Deepak Mahulikar , Yuhu Wang
IPC分类号： C01B33/20 , C01B33/141 , C09K3/14 , C01B33/12
CPC分类号： C09K3/1463 , C01B33/14 , C01B33/1435 , C01B33/22
摘要： A method of manufacturing a colloidal silica dispersion, by dissolving a fumed silica in an aqueous solvent having an alkali metal hydroxide to produce an alkaline silicate solution; removing the alkali metal via ion exchange to produce a silicic acid solution; adjusting the temperature, concentration and pH of the silicic acid solution to values sufficient to initiate nucleation and particle growth at elevated temperatures; and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion. The colloidal silica particles in the colloidal silica dispersion have a mean particle size about 2 nm to about 100 nm. Also provided is a method of chemical mechanical polishing a surface of a substrate by contacting the substrate and a composition having a plurality of colloidal silica particles according to the present invention and a medium for suspending the particles. The contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
摘要翻译：通过将热解法二氧化硅溶解在具有碱金属氢氧化物的水性溶剂中以制备碱性硅酸盐溶液来制备胶体二氧化硅分散体的方法; 通过离子交换除去碱金属，生成硅酸溶液; 将硅酸溶液的温度，浓度和pH调节到足以在升高的温度下引发成核和颗粒生长的值; 并以足以产生胶体二氧化硅分散体的速率冷却硅酸溶液。胶体二氧化硅分散体中的胶体二氧化硅颗粒的平均粒径约为2nm至约100nm。还提供了通过使基板和具有根据本发明的多个胶体二氧化硅颗粒的组合物和用于悬浮颗粒的介质的组合物进行化学机械抛光基板的表面的方法。接触在足以使基材平坦化的温度下进行一段时间。

2. 发明申请

US20120145950A1 ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING APPLICATIONS 有权
标题翻译：用于化学机械抛光应用的超细胶体硅胶
公开(公告)号：US20120145950A1
公开(公告)日：2012-06-14
申请号：US13405027
申请日：2012-02-24
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R.M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R.M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： C09K13/00 , B82Y30/00
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb, of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol. A method for producing and using the same is also disclosed.
摘要翻译：一种超纯胶态二氧化硅分散体，其包含平均或聚集体粒径为约10至约200nm的胶体二氧化硅颗粒，其中胶态二氧化硅分散体中除了钾和钠之外的每种痕量金属杂质少于200ppb，并且具有小于2ppm的残余酒精。还公开了其制造和使用方法。

3. 发明授权

US08779011B2 Ultrapure colloidal silica for use in chemical mechanical polishing applications 有权
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US08779011B2
公开(公告)日：2014-07-15
申请号：US13405027
申请日：2012-02-24
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： C01B33/141 , C01B33/143 , C09C1/68 , C09K13/06
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： A method for producing and using an ultrapure colloidal silica dispersion is disclosed. The ultrapure colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and less than 2 ppm residual alcohol. The method comprises dissolving a fumed silica in an aqueous solvent comprising an alkali metal hydroxide to produce an alkaline silicate solution, removing the alkali metal via ion exchange to generate a silicic acid solution, adjusting temperature, concentration and pH of said silicic acid solution to values sufficient to initiate nucleation and particle growth, and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion.
摘要翻译：公开了一种制备和使用超纯胶体二氧化硅分散体的方法。超纯胶体二氧化硅分散体中含有少于200ppb的痕量金属杂质，不包括钾和钠，少于2ppm的残余醇。该方法包括将热解法二氧化硅溶解在包含碱金属氢氧化物的水性溶剂中以产生碱性硅酸盐溶液，通过离子交换除去碱金属以产生硅酸溶液，将所述硅酸溶液的温度，浓度和pH值调节至数值足以引发成核和颗粒生长，并以足以产生胶体二氧化硅分散体的速率冷却硅酸溶液。

4. 发明申请

US20070254964A1 Ultrapure colloidal silica for use in chemical mechanical polishing applications 审中-公开
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US20070254964A1
公开(公告)日：2007-11-01
申请号：US11818730
申请日：2007-06-15
申请人： Deepak Mahulikar , Yuhu Wang , Ken Delbridge , Gert Moyaerts , Saeed Mohseni , Nichole Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken Delbridge , Gert Moyaerts , Saeed Mohseni , Nichole Koontz , Bin Hu , Liqing Wen
IPC分类号： B01F3/12 , B08B7/00
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol.
摘要翻译：一种超纯胶体二氧化硅分散体，其包含平均或聚集体粒径为约10至约200nm的胶体二氧化硅颗粒，其中所述胶体二氧化硅分散体在其中排列的不含钾和钠的痕量金属杂质少于200ppb，超过2 ppm的残留酒精。

5. 发明授权

US08211193B2 Ultrapure colloidal silica for use in chemical mechanical polishing applications 有权
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US08211193B2
公开(公告)日：2012-07-03
申请号：US11526132
申请日：2006-09-22
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14 , C09K13/00 , C09K13/02 , B24B1/00 , C01B33/12 , C03C15/00 , C03C25/68
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
摘要翻译：一种对基材表面进行化学机械抛光的方法，包括以下步骤：使除了钾和钠之外的每种微量金属杂质含有少于200ppb的多种胶体二氧化硅颗粒的组合物接触，其含量小于2ppm 残余醇，其中不包括钾和钠的痕量金属的累积浓度在约0.5至约5ppm的范围内; 和用于悬浮颗粒的介质; 其中所述组合物是超纯胶体二氧化硅分散体; 并且其中所述接触在足以平坦化基底的温度和时间段内进行。

6. 发明申请

US20070075292A1 Ultrapure colloidal silica for use in chemical mechanical polishing applications 有权
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US20070075292A1
公开(公告)日：2007-04-05
申请号：US11526132
申请日：2006-09-22
申请人： Deepak Mahulikar , Yuhu Wang , Ken Delbridge , Gert Moyaerts , Saeed Mohseni , Nichole Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken Delbridge , Gert Moyaerts , Saeed Mohseni , Nichole Koontz , Bin Hu , Liqing Wen
IPC分类号： C23F1/14 , C09K13/00
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
摘要翻译：一种对基材表面进行化学机械抛光的方法，包括以下步骤：使除了钾和钠之外的每种微量金属杂质含有少于200ppb的多种胶体二氧化硅颗粒的组合物接触，其含量小于2ppm 残余醇，其中不包括钾和钠的痕量金属的累积浓度在约0.5至约5ppm的范围内; 和用于悬浮颗粒的介质; 其中所述组合物是超纯胶体二氧化硅分散体; 并且其中所述接触在足以平坦化基底的温度和时间段内进行。

7. 发明申请

US20080308528A1 Nanoporous ultrafine alpha-alumina powders and sol-gel process of preparing same 有权
公开(公告)号：US20080308528A1
公开(公告)日：2008-12-18
申请号：US12228454
申请日：2008-08-13
申请人： Yuhu Wang
发明人： Yuhu Wang
IPC分类号： B44C1/22 , C09K3/14
CPC分类号： C01F7/442 , C01F7/02 , C01P2004/03 , C01P2004/52 , C01P2004/61 , C01P2006/12 , C09K3/1409 , C09K3/1463 , Y10S977/773 , Y10S977/777 , Y10S977/811 , Y10T428/2982
摘要： The present invention provides α-alumina powders comprising α-alumina particles of which at least 80% of the α-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise α-alumina powders of the invention. The invention further provides methods of manufacturing α-alumina powders and α-alumina slurries of the invention and methods of polishing using same.

8. 发明授权

US07638105B2 Nanoporous ultrafine α-alumina powders and sol-gel process of preparing same 有权
标题翻译：纳米多孔超细α-氧化铝粉末及其制备方法
公开(公告)号：US07638105B2
公开(公告)日：2009-12-29
申请号：US12228454
申请日：2008-08-13
申请人： Yuhu Wang
发明人： Yuhu Wang
IPC分类号： C01F7/00 , C23F1/00 , H01L21/461
CPC分类号： C01F7/442 , C01F7/02 , C01P2004/03 , C01P2004/52 , C01P2004/61 , C01P2006/12 , C09K3/1409 , C09K3/1463 , Y10S977/773 , Y10S977/777 , Y10S977/811 , Y10T428/2982
摘要： The present invention provides α-alumina powders comprising α-alumina particles of which at least 80% of the α-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise α-alumina powders of the invention. The invention further provides methods of manufacturing α-alumina powders and α-alumina slurries of the invention and methods of polishing using same.
摘要翻译：本发明提供包含α-氧化铝颗粒的α-氧化铝粉末，其中至少80％的α-氧化铝颗粒具有小于100nm的粒度。本发明还提供了包含本发明的α-氧化铝粉末的浆料，特别是水性浆料。本发明还提供了制造本发明的α-氧化铝粉末和α-氧化铝浆料的方法以及使用它们的抛光方法。

9. 发明授权

US07422730B2 Nanoporous ultrafine α-alumina powders and sol-gel process of preparing same 有权
标题翻译：纳米多孔超细α-氧化铝粉末及其制备方法
公开(公告)号：US07422730B2
公开(公告)日：2008-09-09
申请号：US10406085
申请日：2003-04-02
申请人： Yuhu Wang
发明人： Yuhu Wang
IPC分类号： C01F7/02 , C01F7/04
CPC分类号： C01F7/442 , C01F7/02 , C01P2004/03 , C01P2004/52 , C01P2004/61 , C01P2006/12 , C09K3/1409 , C09K3/1463 , Y10S977/773 , Y10S977/777 , Y10S977/811 , Y10T428/2982
摘要： The present invention provides α-alumina powders comprising α-alumina particles of which at least 80% of the α-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise α-alumina powders of the invention. The invention further provides methods of manufacturing α-alumina powders and α-alumina slurries of the invention and methods of polishing using same.
摘要翻译：本发明提供包含α-氧化铝颗粒的α-氧化铝粉末，其中至少80％的α-氧化铝颗粒具有小于100nm的粒度。本发明还提供了包含本发明的α-氧化铝粉末的浆料，特别是水性浆料。本发明还提供了制造本发明的α-氧化铝粉末和α-氧化铝浆料的方法以及使用它们的抛光方法。

10. 发明授权

US5541012A Infrared-to-visible up-conversion material 失效
标题翻译：红外到可见的上转换材料
公开(公告)号：US5541012A
公开(公告)日：1996-07-30
申请号：US329683
申请日：1994-10-26
申请人： Junichi Ohwaki , Yuhu Wang , Atsushi Shibukawa , Naruhito Sawanobori , Shinobu Nagahama
发明人： Junichi Ohwaki , Yuhu Wang , Atsushi Shibukawa , Naruhito Sawanobori , Shinobu Nagahama
IPC分类号： C09K11/77 , C09K11/85 , B32B9/00
CPC分类号： C09K11/7704 , C09K11/7705 , C09K11/7772 , C09K11/7773
摘要： A new infrared-to-visible up-conversion material is provided which can be applied to an infrared light identification element having a useful conversion efficiency and sensitivity for infrared light in the wavelength of 1.5 .mu.m band, 0.98 .mu.m band and 0.8 .mu.m band without the necessity of previous excitation of the material. This infrared-to-visible up-conversion material consists of an inorganic material comprising at least two elements of erbium (Er) and a halogen or compounds thereof.
摘要翻译：提供了一种新的红外到可见上转换材料，其可以应用于对波长为1.5μm波段，0.98μm波段和0.8μm波长的红外光具有有用的转换效率和灵敏度的红外光识别元件而不需要先前激发材料。这种红外到可见的上转换材料由包含铒（Er）和卤素或其化合物的至少两种元素的无机材料组成。

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