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    • 4. 发明申请
    • POWER SEMICONDUCTOR DEVICE
    • 功率半导体器件
    • US20150187922A1
    • 2015-07-02
    • US14274249
    • 2014-05-09
    • SAMSUNG ELECTRO-MECHANICS CO., LTD.
    • In Hyuk SONGJi Yeon OhJi Hye KimSun Jae YoonJae Hoon Park
    • H01L29/739H01L29/10
    • H01L29/7397H01L29/42368
    • A power semiconductor device may include: a first conductivity-type drift region in which a plurality of trench gates each including a gate insulating layer disposed on a surface thereof and a conductive material filling the interior thereof are disposed; a second conductivity-type body region disposed on an inner side of an upper portion of the drift region and disposed to be in contact with the trench gate; a first conductivity-type emitter region disposed on an inner side of an upper portion of the body region and disposed to be in contact with the trench gate; and a hole accumulation region disposed in the drift region, disposed below the body region, and disposed between the trench gates.
    • 功率半导体器件可以包括:第一导电型漂移区,其中设置有各自包括设置在其表面上的栅极绝缘层的多个沟槽栅极和填充在其内部的导电材料; 第二导电型体区域,其设置在所述漂移区域的上部的内侧,并设置成与所述沟槽栅极接触; 第一导电型发射极区域,设置在所述主体区域的上部的内侧并且设置成与所述沟槽栅极接触; 以及设置在所述漂移区域中的空穴积聚区域,设置在所述主体区域的下方,并且设置在所述沟槽栅极之间。