专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20160077449A1 MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 有权
标题翻译：无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法
公开(公告)号：US20160077449A1
公开(公告)日：2016-03-17
申请号：US14635339
申请日：2015-03-02
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jung-Chul HEO , Hi-Kuk LEE , Jae-Hyuk CHANG , Sang-Hyun LEE , Jung-In PARK , Sang-Hyun YUN , Ki-Beom LEE , Hyun-Seok KIM , Kab-Jong SEO , Jun-Ho SIM , Byoung-Min YUN , Sang-Don JANG , Jae-Young JANG , Chang-Hoon KIM
IPC分类号： G03F7/20 , H01L27/12 , H01L29/786
CPC分类号： G03F7/70508 , G03F7/2022 , G03F7/2051 , G03F7/702 , G03F7/70291 , G03F7/70391 , H01L27/1222 , H01L27/124 , H01L27/1259 , H01L29/78669 , H01L29/78693 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
摘要翻译：无掩模曝光装置包括具有数字微镜装置的曝光头。数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。

2. 发明申请

US20150049316A1 EXPOSURE APPARATUS AND METHOD THEREOF 有权
标题翻译：曝光装置及其方法
公开(公告)号：US20150049316A1
公开(公告)日：2015-02-19
申请号：US14226621
申请日：2014-03-26
申请人： Samsung Display Co., Ltd.
发明人： Cha-Dong KIM , Hoon KANG , Chang-Hoon KIM , Sang-Hyun YUN , Jung-In PARK , Woo-Yong SUNG , Ki-Beom LEE , Hi-Kuk LEE , Jae-Hyuk CHANG
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/7055
摘要： An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.
摘要翻译：曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。照明构件被配置为将光改变为点光。突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。点灯投射在舞台上。检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。一个PEG与各个方向上的最小误差相关联。

3. 发明申请

US20130141714A1 METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME 有权
标题翻译：测量暴露光和曝光系统的均匀性的方法
公开(公告)号：US20130141714A1
公开(公告)日：2013-06-06
申请号：US13669751
申请日：2012-11-06
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jung-In PARK , Cha-Dong KIM , Su-Yeon SIM , Sang-Hyun YUN , Hi-Kuk LEE
IPC分类号： G01J1/00
CPC分类号： G01J1/00 , G03F7/20 , G03F7/70133
摘要： An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.
摘要翻译：曝光系统包括曝光装置，掩模，测试图案部分和均匀度测量部分。曝光装置包括第一模块和第二模块。第一和第二模块各自发光并且在重叠区域中重叠。掩模包括彼此间隔开的多个传输部分。每个传输部分具有小于重叠区域的宽度的宽度。测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。均匀度测量部件测量测试图案的均匀性。

4. 发明申请

US20140204392A1 STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF 有权
标题翻译：阶段传送装置及其位置测量方法
公开(公告)号：US20140204392A1
公开(公告)日：2014-07-24
申请号：US13959864
申请日：2013-08-06
申请人： Samsung Display Co., Ltd.
发明人： Hi Kuk LEE , Sang Don JANG , Jae Hyuk CHANG , Hyang-Shik KONG , Cha-Dong KIM , Chang Hoon KIM , Jung-In PARK , Sang Hyun YUN
IPC分类号： G01B11/14
CPC分类号： G03F7/70775
摘要： A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.
摘要翻译：舞台转移装置发明包括：传送台，物体安装在该传送台上，并在x-y平面内传送物体; 和台架位置测量装置。舞台位置测量装置在转印台上包括一维刻度; 被配置为与一维刻度重叠的一维刻度读取头，将测量光束照射到重叠的一维刻度并测量转印台的1Dy轴坐标; 转印台上的二维编码器; 以及被构造成与二维编码器重叠的二维编码器读取头，将测量光束照射到重叠的二维编码器，并测量转印台的2D x轴坐标和2D y轴坐标。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式