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    • 4. 发明申请
    • PRIMER RESIN FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
    • 用于半导体器件和半导体器件的PRIMER树脂
    • US20100207282A1
    • 2010-08-19
    • US12733635
    • 2008-09-18
    • Makoto UchidaShigeru MotekiRyutaro TanakaHiromi Morita
    • Makoto UchidaShigeru MotekiRyutaro TanakaHiromi Morita
    • H01L23/29C08L33/24C08L63/00H01L21/56
    • C08L79/08C08G73/10C08G73/1046C08G73/106C08L63/00C08L2666/22C09J5/02C09J163/00C09J179/08H01L23/293H01L2924/0002H01L2924/00
    • The present invention relates to a primer resin for semiconductor devices which comprises a polyamide resin represented by the following formula (1): (wherein, R1 represents a tetravalent aromatic tetracarboxylic acid residue selected from the group consisting of pyromellitic acid, 3,4,3′,4′-diphenyl ether tetracarboxylic acid, 2,3,6,7-naphthalenetetracarboxylic acid and 3,4,3′,4′-benzophenone tetracarboxylic acid, R2 represents at least one kind of divalent diamine residue selected from the group consisting of diamino-4,4′-hydroxydiphenylsulfone, 4,4′-diamino-3,3′5,5′-tetraethyldiphenylmethane and 1,3-bis-(aminophenoxy)benzene, and n is a repeating number and represents a positive number of 10 to 1000) and has a lead frame comprising copper or 42 alloy, a semiconductor device having said primer resin layer between a lead frame comprising copper or 42 alloy and a cured product of a sealing resin, and a semiconductor sealing epoxy resin composition containing said primer resin; and said semiconductor device has an extremely improved adhesiveness between said lead frame and a cured product of a sealing resin composition and also is excellent in heat resistance and low moisture absorption.
    • 本发明涉及一种半导体器件用底漆树脂,其包含下述式(1)表示的聚酰胺树脂:(其中,R1表示选自均苯四酸,3,4,...的四价芳香族四羧酸残基 ',4'-二苯基醚四羧酸,2,3,6,7-萘四甲酸和3,4,3',4'-二苯甲酮四羧酸,R2表示选自以下的至少一种二价二胺残基: 的二氨基-4,4'-羟基二苯基砜,4,4'-二氨基-3,3'5,5'-四乙基二苯基甲烷和1,3-双 - (氨基苯氧基)苯,n为重复数,表示正数 10至1000),并具有包括铜或42合金的引线框架,在包括铜或42合金的引线框架和密封树脂的固化产物之间具有所述底漆树脂层的半导体器件和含有 说底线 树脂; 并且所述半导体器件在所述引线框与密封树脂组合物的固化产物之间具有非常改善的粘合性,并且还具有优异的耐热性和低吸湿性。
    • 7. 发明授权
    • Primer resin for semiconductor device and semiconductor device
    • 用于半导体器件和半导体器件的底漆树脂
    • US08410620B2
    • 2013-04-02
    • US12733635
    • 2008-09-18
    • Makoto UchidaShigeru MotekiRyutaro TanakaHiromi Morita
    • Makoto UchidaShigeru MotekiRyutaro TanakaHiromi Morita
    • H01L23/29
    • C08L79/08C08G73/10C08G73/1046C08G73/106C08L63/00C08L2666/22C09J5/02C09J163/00C09J179/08H01L23/293H01L2924/0002H01L2924/00
    • The present invention relates to a primer resin for semiconductor devices which comprises a polyamide resin represented by the following formula (1): (wherein, R1 represents a tetravalent aromatic tetracarboxylic acid residue selected from the group consisting of pyromellitic acid, 3,4,3′,4′-diphenyl ether tetracarboxylic acid, 2,3,6,7-naphthalenetetracarboxylic acid and 3,4,3′,4′-benzophenone tetracarboxylic acid, R2 represents at least one kind of divalent diamine residue selected from the group consisting of diamino-4,4′-hydroxydiphenylsulfone, 4,4′-diamino-3,3′5,5′-tetraethyldiphenylmethane and 1,3-bis-(aminophenoxy)benzene, and n is a repeating number and represents a positive number of 10 to 1000) and has a lead frame comprising copper or 42 alloy, a semiconductor device having said primer resin layer between a lead frame comprising copper or 42 alloy and a cured product of a sealing resin, and a semiconductor sealing epoxy resin composition containing said primer resin; and said semiconductor device has an extremely improved adhesiveness between said lead frame and a cured product of a sealing resin composition and also is excellent in heat resistance and low moisture absorption.
    • 本发明涉及一种半导体器件用底漆树脂,其包含下述式(1)表示的聚酰胺树脂:(其中,R1表示选自均苯四酸,3,4,...的四价芳香族四羧酸残基 ',4'-二苯基醚四羧酸,2,3,6,7-萘四甲酸和3,4,3',4'-二苯甲酮四羧酸,R2表示选自以下的至少一种二价二胺残基: 的二氨基-4,4'-羟基二苯基砜,4,4'-二氨基-3,3'5,5'-四乙基二苯基甲烷和1,3-双 - (氨基苯氧基)苯,n为重复数,表示正数 10至1000),并具有包括铜或42合金的引线框架,在包括铜或42合金的引线框架和密封树脂的固化产物之间具有所述底漆树脂层的半导体器件和含有 说底线 树脂; 并且所述半导体器件在所述引线框与密封树脂组合物的固化产物之间具有非常改善的粘合性,并且还具有优异的耐热性和低吸湿性。