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1. 发明授权

US08605278B2 Method and apparatus for inspecting patterned media disk 失效
标题翻译：用于检查图案化介质盘的方法和装置
公开(公告)号：US08605278B2
公开(公告)日：2013-12-10
申请号：US13332598
申请日：2011-12-21
申请人： Ryuta Suzuki , Yu Yanaka , Yu Kusaka
发明人： Ryuta Suzuki , Yu Yanaka , Yu Kusaka
IPC分类号： G01N21/00
CPC分类号： G01N21/55 , G01N21/956
摘要： In an inspection apparatus that inspects both surfaces of a patterned media disk, to perform inspection while maintaining a high level of throughput, a patterned media disk inspection apparatus of the present invention includes an optical inspection unit, a table unit that includes plural substrate rotation drive units on which a substrate is mounted and rotated and rotates and conveys the substrates mounted on the substrate rotation drive units between a position at which the substrate is inspected by the optical inspection unit and a position at which the substrate is taken out and supplied, a substrate reversing unit, a cassette unit that accommodates substrates, and a substrate handling unit that takes out an uninspected substrate from the cassette unit and supplies the uninspected substrate to the table unit, and further stores a substrate, both surfaces of which have already been inspected, in the cassette unit.
摘要翻译：在检查图案化介质盘的两个表面的检查装置中，为了在保持高水平的生产量的同时执行检查，本发明的图案化介质盘检查装置包括光学检查单元，台部单元，其包括多个基板旋转驱动单元，其上安装和旋转基板并旋转并将安装在基板旋转驱动单元上的基板传送到由光学检查单元检查基板的位置和基板被取出和供应的位置之间; 基板反转单元，容纳基板的盒单元以及从盒单元取出未预期基板并将未预期基板提供到台单元的基板处理单元，并且还存储两个表面已被检查的基板，在盒式单元中。

2. 发明申请

US20120320367A1 INSPECTION METHOD AND DEVICE FOR SAME 审中-公开
标题翻译：检测方法和装置
公开(公告)号：US20120320367A1
公开(公告)日：2012-12-20
申请号：US13577287
申请日：2011-02-01
申请人： Yu Yanaka , Shigeru Serikawa , Kiyotaka Horie , Ryuta Suzuki
发明人： Yu Yanaka , Shigeru Serikawa , Kiyotaka Horie , Ryuta Suzuki
IPC分类号： G01J3/42
CPC分类号： G11B5/84 , G01N21/956 , G11B5/855
摘要： In order to rapidly inspect shape defects in the object of inspection that is the minute pattern on a magnetic recording medium formed from patterned media, in the disclosed patterned media defect inspection method detected spectral waveform data is compared with reference-standard spectral reflectance waveform data, which is stored in a database and the pattern-shape of which is known, and defects are detected. The type of the defects is determined on the basis of the disparity, for each detected wavelength, between the spectral waveform data of the detected defects, and the reference-standard spectral reflectance waveform data.
摘要翻译：为了快速检查在由图案化介质形成的磁记录介质上的微小图案的检查对象中的形状缺陷，将所公开的图案化介质缺陷检查方法检测的光谱波形数据与参考标准光谱反射率波形数据进行比较，其被存储在数据库中，其图案形状是已知的，并且检测到缺陷。基于检测到的缺陷的光谱波形数据与参考标准光谱反射率波形数据之间的每个检测波长的差异来确定缺陷的类型。

3. 发明授权

US08547545B2 Method and apparatus for inspecting a surface of a substrate 失效
标题翻译：用于检查基板表面的方法和装置
公开(公告)号：US08547545B2
公开(公告)日：2013-10-01
申请号：US13210418
申请日：2011-08-16
申请人： Hideaki Sasazawa , Takayuki Ishiguro , Kiyotaka Horie , Yu Yanaka
发明人： Hideaki Sasazawa , Takayuki Ishiguro , Kiyotaka Horie , Yu Yanaka
IPC分类号： G01N21/88 , G01N21/55 , G01N21/47
CPC分类号： G01N21/8851 , G01N21/95 , G01N2021/4711 , G01N2021/556 , G01N2021/8854 , G01N2021/8874
摘要： The present invention provides a method and apparatus for inspecting a surface of a substrate. The apparatus includes: a rotatable stage on which a substrate to be inspected is placed; an inspection optical system having an illumination light source for emitting light to a substrate placed on the stage and a detector for detecting light from the substrate which is irradiated with the light from the illumination light source; an A/D converter for amplifying and A/D converting signals output from the detector in the inspection optical system; and a defect detector for detecting defects in a surface of the substrate by processing signals output from the detector and converted by the A/D converter and classifying the defected defects. The defect detector extracts micro defects in the surface of the substrate by processing the signals output from the detector, and detects linear defects existing discretely in a linear region.
摘要翻译：本发明提供一种用于检查基板表面的方法和装置。该装置包括：可旋转台，放置待检查的基板; 具有用于向放置在载物台上的基板发光的照明光源的检查光学系统和用于检测来自基板的光的检测器，所述检测光照射来自照明光源的光; A / D转换器，用于放大和A / D转换检测光学系统中的检测器输出的信号; 以及缺陷检测器，用于通过处理从检测器输出并由A / D转换器转换并对缺陷缺陷进行分类的信号来检测基板的表面中的缺陷。缺陷检测器通过处理从检测器输出的信号来提取衬底表面的微缺陷，并检测线性区域中离散存在的线性缺陷。

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