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1. 发明申请

US20080289577A1 Workpiece processing apparatus 审中-公开
标题翻译：工件加工装置
公开(公告)号：US20080289577A1
公开(公告)日：2008-11-27
申请号：US12152039
申请日：2008-05-12
申请人： Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
发明人： Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
IPC分类号： C23C16/00
CPC分类号： H01L21/67069
摘要： A workpiece processing apparatus S, which comprises: a plasma generator unit 6 including a plasma generation section 18 operable to plasmatize a given gas supplied thereto, and emit the plasmatized gas therefrom; and a transport mechanism 2 adapted to support a target workpiece W in a position beneath the plasma generation section 18, wherein the plasmatized gas is emitted onto the workpiece W to carry out a given processing. The workpiece processing apparatus S further includes a setup frame 4 adapted to set up the plasma generator unit 6 to allow the plasma generation section 18 to be located over the workpiece. The plasma generator unit 6 is mounted to the setup frame 4 in a manner capable of being drawn out of a setup position where the plasma generation section 18 is positioned over the workpiece W, in a horizontal direction.
摘要翻译：工件处理装置S，其包括：等离子体发生器单元6，其包括等离子体产生部分18，其可操作以等离子体化供给的给定气体，并从其中排出等离子体化气体; 以及适于将目标工件W支撑在等离子体产生部18下方的输送机构2，其中等离子体化气体被发射到工件W上以进行给定的处理。工件处理装置S还包括适于建立等离子体发生器单元6以允许等离子体产生部分18位于工件上方的安装框架4。等离子体发生器单元6以能够从等离子体产生部分18在水平方向上位于工件W上方的设置位置被拉出的方式安装到安装框架4上。

2. 发明授权

US07976672B2 Plasma generation apparatus and work processing apparatus 失效
标题翻译：等离子体发生装置和作业处理装置
公开(公告)号：US07976672B2
公开(公告)日：2011-07-12
申请号：US11705906
申请日：2007-02-13
申请人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
发明人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , B23K9/00 , B23K9/02
CPC分类号： H01J37/32935 , H01J37/32192 , H01J37/32311 , H05B6/78
摘要： A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
摘要翻译：提供了一种等离子体产生装置，其包括：产生微波的微波产生部分; 气体供给部，其供给要变成等离子体的气体; 等离子体产生喷嘴，其包括接收微波的接收部件，并且基于所接收的微波的能量将气体转换成等离子体，并发射等离子体气体; 以及光检测单元，其检测由等离子体气体发射的光并产生电信息。

3. 发明申请

US20080053988A1 Plasma generation apparatus and workpiece processing apparatus using the same 审中-公开
标题翻译：等离子体发生装置和使用其的工件处理装置
公开(公告)号：US20080053988A1
公开(公告)日：2008-03-06
申请号：US11895706
申请日：2007-08-27
申请人： Kiyotaka Arai , Hirofumi Mankawa , Hidetaka Matsuuchi , Ryuichi Iwasaki , Kazuhiro Yoshida , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
发明人： Kiyotaka Arai , Hirofumi Mankawa , Hidetaka Matsuuchi , Ryuichi Iwasaki , Kazuhiro Yoshida , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
IPC分类号： H05B6/68
CPC分类号： H05B6/72 , H01J37/32192 , H01J37/32229 , H01J37/32275 , H01J37/32752 , H01J37/32825 , H05B6/705 , H05B6/78
摘要： Disclosed is a plasma generation apparatus, which comprises a microwave generation section adapted to generate a microwave, a gas supply section adapted to supply a gas to be plasmatized, a plasma generation nozzle which is provided with an inner electrode adapted to receive the microwave and an outer electrode concentrically disposed outside the inner electrode, and adapted to plasmatize the gas supplied from the gas supply section thereinto, based on energy of the microwave, and emit the plasmatized gas from a distal end thereof; and an adapter attached to the distal end of the plasma generation nozzle. In the plasma generation apparatus, the inner and outer electrodes of the plasma generation nozzle are disposed to allow a glow discharge to be induced therebetween so as to plasmatize the gas in a space defined therebetween, and, according to a new supply of the gas into the space, emit the plasmatized gas under atmospheric pressures from a ring-shaped spout of the space in the distal end of the plasma generation nozzle. The adapter is adapted to convert the ring-shaped spout to a lengthwise spout thereof.
摘要翻译：公开了一种等离子体产生装置，其包括适于产生微波的微波产生部分，适于供应待等离子体化气体的气体供应部分，具有适于接收微波的内部电极的等离子体产生喷嘴和外部电极同心地设置在内部电极的外部，并且适于基于微波的能量等离子体化从气体供应部分供应的气体，并从其远端发射等离子体化气体; 以及连接到等离子体产生喷嘴的远端的适配器。在等离子体产生装置中，等离子体产生喷嘴的内电极和外电极被设置成允许在它们之间引起辉光放电，以便在其间限定的空间中等离子体化气体，并且根据新的气体供应该空间在大气压下从等离子体生成喷嘴的远端的空间的环状喷口排出等离子体化气体。适配器适于将环形喷嘴转换成其纵向喷口。

4. 发明申请

US20070193517A1 Plasma generation apparatus and work processing apparatus 失效
标题翻译：等离子体发生装置和作业处理装置
公开(公告)号：US20070193517A1
公开(公告)日：2007-08-23
申请号：US11705906
申请日：2007-02-13
申请人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
发明人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi , Masaaki Mike
IPC分类号： H01L21/306 , C23F1/00 , C23C16/00
CPC分类号： H01J37/32935 , H01J37/32192 , H01J37/32311 , H05B6/78
摘要： A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
摘要翻译：提供了一种等离子体产生装置，其包括：产生微波的微波产生部分; 气体供给部，其供给要变成等离子体的气体; 等离子体产生喷嘴，其包括接收微波的接收部件，并且基于所接收的微波的能量将气体转换成等离子体，并发射等离子体气体; 以及光检测单元，其检测由等离子体气体发射的光并产生电信息。

5. 发明授权

US08128783B2 Plasma generator and work processing apparatus provided with the same 有权
标题翻译：等离子发生器和工作处理装置相同
公开(公告)号：US08128783B2
公开(公告)日：2012-03-06
申请号：US12310896
申请日：2007-09-12
申请人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
发明人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , B23K9/00 , B23K9/02 , H01J17/26 , H01J7/24 , H05B31/26
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32229 , H01J37/32256
摘要： A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
摘要翻译：提供了一种等离子体发生器，其包括：产生微波的微波产生部分; 用于传播微波的波导; 多个等离子体产生喷嘴，其沿着微波传播的方向彼此分离地附接到波导，接收微波，并且基于该微波的能量产生并发射等离子体气体; 以及对应于等离子体产生喷嘴的一部分或全部部分的多个刺针，并且分别设置在波导管中，以便在微波传播方向上彼此隔开预定距离的后方位置。

6. 发明申请

US20090200910A1 Plasma generator and work processing apparatus provided with the same 有权
标题翻译：等离子发生器和工作处理装置相同
公开(公告)号：US20090200910A1
公开(公告)日：2009-08-13
申请号：US12310896
申请日：2007-09-12
申请人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
发明人： Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
IPC分类号： H05H1/24
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32229 , H01J37/32256
摘要： A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
摘要翻译：提供了一种等离子体发生器，其包括：产生微波的微波产生部分; 用于传播微波的波导; 多个等离子体产生喷嘴，其沿着微波传播的方向彼此分离地附接到波导，接收微波，并且基于该微波的能量产生并发射等离子体气体; 以及对应于等离子体产生喷嘴的一部分或全部部分的多个刺针，并且分别设置在波导管中，以便在微波传播方向上彼此隔开预定距离的后方位置。

7. 发明申请

US20080296268A1 Plasma generator and workpiece processing apparatus using the same 审中-公开
标题翻译：等离子发生器和工件加工设备使用相同
公开(公告)号：US20080296268A1
公开(公告)日：2008-12-04
申请号：US12154384
申请日：2008-05-22
申请人： Masaaki Mike , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi
发明人： Masaaki Mike , Hirofumi Mankawa , Shigeru Masuda , Hirofumi Hayashi
IPC分类号： H05H1/34
CPC分类号： H01L21/67069 , H01J37/32192 , H01J37/32825 , H05H1/46
摘要： Disclosed are a plasma generator and a workpiece processing apparatus, wherein an adapter 38 is attached to a distal end of each of a plurality of plasma generation nozzles 31 to convert a spot-shaped spout port of the plasma generation nozzle 31 to a lengthwise sport port 387, and a cover member 93 is provided to cover the plasma generation nozzles 31 so as to allow a narrow space to be defined between the cover member 93 and a workpiece, whereby plasma spouted from the spout port 387 is retained in the space in such a manner as to hit against and rebound from the workpiece into the space. This makes it possible to subject a workpiece having a relatively large surface area to plasma exposure in a uniform manner, while suppressing cooling of plasma in the space to allow the plasma to survive for a relatively long period of time (reduce a plasma disappearance rate) so as to provide enhanced efficiency of plasma exposure.
摘要翻译：公开了一种等离子体发生器和工件处理装置，其中适配器38连接到多个等离子体产生喷嘴31中的每一个的远端，以将等离子体产生喷嘴31的点状喷口端口转换成纵向运动端口 387，并且设置盖构件93以覆盖等离子体产生喷嘴31，以便在盖构件93和工件之间限定狭窄的空间，从而从喷口387喷出的等离子体保持在该空间中一种从工件撞击和反弹到空间的方式。这使得可以以均匀的方式对具有相对大的表面积的工件进行等离子体曝光，同时抑制空间中的等离子体的冷却，以允许等离子体存活相当长的时间段（降低等离子体消失速率）从而提高等离子体曝光的效率。

8. 发明授权

US08968651B2 Sterilization method 有权
标题翻译：灭菌方法
公开(公告)号：US08968651B2
公开(公告)日：2015-03-03
申请号：US13145744
申请日：2010-03-10
申请人： Hirofumi Hayashi , Tomoyuki Hirose , Kazuhiro Kimura , Masaaki Mike , Ryuichi Iwasaki , Shigeru Masuda , Toru Tanibata , Joongsoo Kim , Sang Hun Lee , Jae-Mo Koo , Orion Weihe , Andrew Way
发明人： Hirofumi Hayashi , Tomoyuki Hirose , Kazuhiro Kimura , Masaaki Mike , Ryuichi Iwasaki , Shigeru Masuda , Toru Tanibata , Joongsoo Kim , Sang Hun Lee , Jae-Mo Koo , Orion Weihe , Andrew Way
IPC分类号： A61L2/14 , A61L2/20
CPC分类号： A61L2/14 , A61L2/202 , A61L2202/122 , A61L2202/13 , A61L2202/14 , A61L2202/24
摘要： By focusing on the fact that nitrogen dioxide exhibits an increased sterilizing effect among other sterilant gases including nitrogen oxide, the present invention is made to provide a sterilization method which may be suitably used for sterilizing items to be sterilized such as medical instruments which require increased reliability by using a high concentration NO2 gas of 5,000 ppm or above, for example. An inside of a sterilizing chamber containing an item to be sterilized is humidified, and a concentration of NO2 in the sterilizing chamber is made to be from 9 to 100 mg/L by filling a high concentration NO2 gas.
摘要翻译：通过关注二氧化氮在包括氮氧化物在内的其他杀菌剂气体中显示出增加的杀菌效果的事实，本发明提供了一种杀菌方法，其可适用于杀菌消毒的物品，例如需要增加可靠性的医疗器械通过使用例如5000ppm以上的高浓度NO 2气体。含有待灭菌物品的灭菌室内部被加湿，并且通过填充高浓度的NO 2气体使灭菌室中的NO 2浓度为9〜100mg / L。

9. 发明授权

US08425852B2 High concentration NO2 generating system and method for generating high concentration NO2 using the generating system 有权
标题翻译：高浓度NO2生成系统及使用发电系统产生高浓度NO2的方法
公开(公告)号：US08425852B2
公开(公告)日：2013-04-23
申请号：US13144928
申请日：2010-03-03
申请人： Hidetaka Matsuuchi , Tomoyuki Hirose , Ryuichi Iwasaki , Masaaki Mike , Shigeru Masuda , Hirofumi Hayashi , Toru Tanibata , Joongsoo Kim , Sang Hun Lee , Jae-Mo Koo , Orion Weihe , Andrew Way
发明人： Hidetaka Matsuuchi , Tomoyuki Hirose , Ryuichi Iwasaki , Masaaki Mike , Shigeru Masuda , Hirofumi Hayashi , Toru Tanibata , Joongsoo Kim , Sang Hun Lee , Jae-Mo Koo , Orion Weihe , Andrew Way
IPC分类号： H05H1/18
CPC分类号： B01J19/126 , A61K33/00 , B01J19/088 , B01J2219/0883 , B01J2219/0896 , B82Y30/00 , C01B21/36 , H05H1/46 , H05H2001/4622
摘要： A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
摘要翻译：提供了一种高浓度NO 2气体发生系统，其包括通过连接室，等离子体发生器和循环装置构成的循环路径，其中通过在循环路径中循环包括氮和氧的气体混合物而产生NO 2。高浓度NO 2气体发生系统提供高浓度NO 2发生系统和高浓度NO 2产生方法，该方法使用高浓度（大约500ppm或更高）的NO 2的高浓度NO 2产生方法，用于高灭菌过程如灭菌的医疗仪器可以简单有选择地获得。另外，由于以室内空气为原料，成分的管理简单，安全性高，可以根据需要简单，有选择地制备高浓度的NO2。

10. 发明授权

US08580086B2 High concentration NO2 generating system and method for generating high concentration NO2 using the generating system 有权
公开(公告)号：US08580086B2
公开(公告)日：2013-11-12
申请号：US13846412
申请日：2013-03-18
申请人： Hidetaka Matsuuchi , Tomoyuki Hirose , Ryuichi Iwasaki , Masaaki Mike , Shigeru Masuda , Hirofumi Hayashi , Toru Tanibata , Joongsoo Kim , Sang Hun Lee , Jae-Mo Koo , Orion Weihe , Andrew Way
发明人： Hidetaka Matsuuchi , Tomoyuki Hirose , Ryuichi Iwasaki , Masaaki Mike , Shigeru Masuda , Hirofumi Hayashi , Toru Tanibata , Joongsoo Kim , Sang Hun Lee , Jae-Mo Koo , Orion Weihe , Andrew Way
IPC分类号： C01B21/36
CPC分类号： B01J19/126 , A61K33/00 , B01J19/088 , B01J2219/0883 , B01J2219/0896 , B82Y30/00 , C01B21/36 , H05H1/46 , H05H2001/4622
摘要： A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.

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