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    • 1. 发明授权
    • Discharge reactor
    • 放电反应堆
    • US5549874A
    • 1996-08-27
    • US49866
    • 1993-04-20
    • Ichiro KamiyaRyoichi ShinjoTakeshi MurakamiYukiko NishiokaMinoru Harada
    • Ichiro KamiyaRyoichi ShinjoTakeshi MurakamiYukiko NishiokaMinoru Harada
    • H01J49/02C01B13/11B01J19/08
    • C01B13/11C01B2201/34Y10S422/907
    • A discharge reactor that generates silent discharge and/or creeping discharge between dielectric and high voltage electrode and/or grounded electrode, said dielectric being located between high voltage electrode and grounded electrode, and which generates clean ozone in the discharge space 1 as it passes through said discharge space 1 or as it is held within said discharge space 1, which discharge reactor is characterized in that the dielectric is made of highly purified quartz glass (SiO.sub.2) or single-crystal sapphire which is a highly purified crystallized aluminium oxide or high-purity alumina ceramics which is the firing of highly purified aluminum oxide. Further, in order to obtain cleaner and highly concentration ozone, at least the electrode or electrodes in the area of the discharge space which is to be exposed to discharge are made of a high-purity aluminum material and at least the area of the discharge space which is to be exposed to discharge is further coated with an anodic oxidation film.
    • 一种在电介质和高电压电极和/或接地电极之间产生静电放电和/或爬电放电的放电反应器,所述电介质位于高电压电极和接地电极之间,并且在放电空间1中通过时产生干净的臭氧 所述放电空间1或其保持在所述放电空间1内,该放电反应器的特征在于电介质由高度纯化的石英玻璃(SiO 2)或单晶蓝宝石制成,其是高度纯化的结晶的氧化铝或高纯度的结晶的氧化铝, 纯度高的氧化铝陶瓷,是高纯度氧化铝的烧制。 此外,为了获得更清洁和高浓度的臭氧,至少要放电的放电空间区域中的电极或电极由高纯度铝材料制成,并且至少放电空间的区域 进一步用阳极氧化膜进行曝光。
    • 6. 发明授权
    • Method and apparatus for generating ozone and methods of its use
    • 用于生成臭氧的方法和装置及其使用方法
    • US5632868A
    • 1997-05-27
    • US518418
    • 1995-08-23
    • Minoru HaradaRyoichi ShinjoManabu TsujimuraRempei NakataKunihiro MiyazakiNaruhiko KajiYutaka Nakano
    • Minoru HaradaRyoichi ShinjoManabu TsujimuraRempei NakataKunihiro MiyazakiNaruhiko KajiYutaka Nakano
    • C01B13/10C01B13/11C23C8/12C23C16/40C23C16/44C23C16/448
    • C23C16/448C01B13/10C01B13/11C23C16/402C23C16/4402C23C8/12C01B2201/60
    • Ozonizer (10) which supplies a feed gas to ozone generating cell (11) under application of a high voltage and which delivers an ozone gas through an ozone gas transport path (consisting of pipes (14) and (15)) as it has been generated in said ozone generating cell (11) is characterized in that the ozone gas transport path is furnished with means for removing at least one of NOx, HF and SOx (in the drawings, the means is for removing NOx) and that the ozone gas from the ozone generating cell (11) is passed through said removing means, whereby at least one of NOx, HF and SOx in said ozone gas is removed before it is delivered to a subsequent stage. The product ozone is not contaminated with Cr compounds at all or insufficiently contaminated to cause any practical problems in the fabrication of highly integrated semiconductor devices.Alternatively, ozonizer (10) which comprises an ozone generating cell (11) having an inlet (8) for supplying a feed gas, high voltage applying means (35) and an outlet (29) for discharging the ozone generated, and ozone delivery paths (30) and (31) for delivering the generated ozone is characterized in that oxygen (1) supplemented with 10-20 vol % of carbon dioxide and/or carbon monoxide (2) is used as the feed gas. The thus produced ozone is significantly low in the level of Cr compounds and, hence, can suitably be used in the formation of metal oxides, in particular, silicon oxide.
    • 臭氧发生器(10),其在施加高压下向臭氧发生电池(11)供应进料气体,并且通过臭氧气体输送路径(由管道(14)和(15)组成)输送臭氧气体) 在臭氧发生电池(11)中产生的臭氧气体输送路径的特征在于,臭氧气体输送路径具有用于除去NOx,HF和SO x中的至少一种的装置(在附图中,用于除去NOx的装置),臭氧气体 从臭氧发生电池(11)通过所述去除装置,由此在所述臭氧气体中的NOx,HF和SO x中的至少一种在被输送到后续阶段之前被去除。 产物臭氧根本不被Cr化合物污染或污染不足,导致制造高度集成的半导体器件的任何实际问题。 或者,臭​​氧发生器(10)包括具有用于供应进料气体的入口(8)的臭氧发生电池(11),用于排出产生的臭氧的高压施加装置(35)和出口(29),以及臭氧输送路径 (30)和(31)用于输送生成的臭氧的特征在于,使用补充有10〜20体积%的二氧化碳和/或一氧化碳(2)的氧(1)作为原料气。 这样生成的臭氧在Cr化合物的含量上显着地很低,因此可以适当地用于形成金属氧化物,特别是氧化硅。
    • 8. 发明授权
    • Method and apparatus for generating ozone and methods of its use
    • 用于生成臭氧的方法和装置及其使用方法
    • US5792326A
    • 1998-08-11
    • US782390
    • 1997-01-13
    • Minoru HaradaRyoichi ShinjoManabu TsujimuraRempei NakataKunihiro MiyazakiNaruhiko KajiYutaka Nakano
    • Minoru HaradaRyoichi ShinjoManabu TsujimuraRempei NakataKunihiro MiyazakiNaruhiko KajiYutaka Nakano
    • C01B13/10C01B13/11C23C8/12C23C16/40C23C16/44C23C16/448
    • C23C16/448C01B13/10C01B13/11C23C16/402C23C16/4402C23C8/12C01B2201/60
    • Ozonizer (10) which supplies a feed gas to ozone generating cell (11) under application of a high voltage and which delivers an ozone gas through an ozone gas transport path (consisting of pipes (14) and (15)) as it has been generated in said ozone generating cell (11) is characterized in that the ozone gas transport path is furnished with means for removing at least one of NOx, HF and SOx (in the drawings, the means is for removing NOx) and that the ozone gas from the ozone generating cell (11) is passed through said removing means, whereby at least one of NOx, HF and SOx in said ozone gas is removed before it is delivered to a subsequent stage. The product ozone is not contaminated with Cr compounds at all or insufficiently contaminated to cause any practical problems in the fabrication of highly integrated semiconductor devices. Alternatively, ozonizer (10) which comprises an ozone generating cell (11) having an inlet (8) for supplying a feed gas, high voltage applying means (35) and an outlet (29) for discharging the ozone generated, and ozone delivery paths (30) and (31) for delivering the generated ozone is characterized in that oxygen (1) supplemented with 10-20 vol % of carbon dioxide and/or carbon monoxide (2) is used as the feed gas. The thus produced ozone is significantly low in the level of Cr compounds and, hence, can suitably be used in the formation of metal oxides, in particular, silicon oxide.
    • 臭氧发生器(10),其在施加高压下向臭氧发生电池(11)供应进料气体,并且通过臭氧气体输送路径(由管道(14)和(15)组成)输送臭氧气体) 在臭氧发生电池(11)中产生的臭氧气体输送路径的特征在于,臭氧气体输送路径具有用于除去NOx,HF和SO x中的至少一种的装置(在附图中,用于除去NOx的装置),臭氧气体 从臭氧发生电池(11)通过所述去除装置,由此在所述臭氧气体中的NOx,HF和SO x中的至少一种在被输送到后续阶段之前被去除。 产物臭氧根本不被Cr化合物污染或污染不足,导致制造高度集成的半导体器件的任何实际问题。 或者,臭​​氧发生器(10)包括具有用于供应进料气体的入口(8)的臭氧发生电池(11),用于排出产生的臭氧的高压施加装置(35)和出口(29),以及臭氧输送路径 (30)和(31)用于输送生成的臭氧的特征在于,使用补充有10〜20体积%的二氧化碳和/或一氧化碳(2)的氧(1)作为原料气。 这样生成的臭氧在Cr化合物的含量上显着地很低,因此可以适当地用于形成金属氧化物,特别是氧化硅。