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1. 发明授权

US08747046B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US08747046B2
公开(公告)日：2014-06-10
申请号：US13022313
申请日：2011-02-07
申请人： Ryoichi Isomura , Susumu Tauchi , Hideaki Kondo
发明人： Ryoichi Isomura , Susumu Tauchi , Hideaki Kondo
IPC分类号： B65G49/07 , H01L21/677
CPC分类号： H01L21/67184 , H01L21/67742
摘要： The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened.
摘要翻译：真空处理装置由两个真空转移容器组成，其中晶片被转移通过; 两个真空处理容器分别连接到这些真空转移容器上; 能够将连接在真空传送容器之间的晶片存储在其中的中间室容器; 连接到所述真空转移容器之一的锁定室; 以及分别设置在真空转移容器，真空处理容器，中间室容器和锁定室中的多个阀，用于气密地打开/关闭这些容器和腔室之间的通信; 其中在设置在真空处理容器的处理室和真空传送容器的真空传送室之间的阀打开之前，设置在中间室容器的两侧的任何一个阀关闭。

2. 发明申请

US20120163943A1 VACUUM PROCESSING APPARATUS 有权
标题翻译：真空加工设备
公开(公告)号：US20120163943A1
公开(公告)日：2012-06-28
申请号：US13022313
申请日：2011-02-07
申请人： Ryoichi ISOMURA , Susumu Tauchi , Hideaki Kondo
发明人： Ryoichi ISOMURA , Susumu Tauchi , Hideaki Kondo
IPC分类号： H01L21/677
CPC分类号： H01L21/67184 , H01L21/67742
摘要： The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened.
摘要翻译：真空处理装置由两个真空转移容器组成，其中晶片被转移通过; 两个真空处理容器分别连接到这些真空转移容器上; 能够将连接在真空传送容器之间的晶片存储在其中的中间室容器; 连接到所述真空转移容器之一的锁定室; 以及分别设置在真空传送容器，真空处理容器，中间室容器和锁定室之间的多个阀，用于气密地打开/关闭这些容器和腔室之间的通信; 其中在设置在真空处理容器的处理室和真空传送容器的真空传送室之间的阀打开之前，设置在中间室容器的两侧的任何一个阀关闭。

3. 发明申请

US20130183121A1 VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：真空加工设备
公开(公告)号：US20130183121A1
公开(公告)日：2013-07-18
申请号：US13409371
申请日：2012-03-01
申请人： Ryoichi Isomura , Susumu Tauchi , Hideaki Kondo , Michiaki Kobayashi
发明人： Ryoichi Isomura , Susumu Tauchi , Hideaki Kondo , Michiaki Kobayashi
IPC分类号： H01L21/677
CPC分类号： H01L21/67745 , H01L21/67184
摘要： In a vacuum processing apparatus having a plurality of vacuum processing chambers at least one of which are coupled to each of a plurality of vacuum transfer chambers which are behind an atmospheric transfer chamber and have vacuum transfer robots in their interior to transfer a wafer, taking out a plurality of wafers in a cassette and transferring successively to the plurality of the vacuum processing chambers, and thereafter returning to the cassette, the wafers are controlled to be transferred to all of the vacuum processing chambers coupled to the backmost vacuum transfer chamber and thereafter a next wafer is transferred to a vacuum processing chamber which becomes possible for the next wafer to be transferred in before they are possible to be transferred out from the vacuum processing chambers coupled to the backmost vacuum transfer chamber and arranged backmost.
摘要翻译：在具有多个真空处理室的真空处理设备中，其中至少一个真空处理室连接到大气传输室后面的多个真空传送室中的每一个，并且在其内部具有真空传送机器人以转移晶片，取出在盒中的多个晶片并连续地传送到多个真空处理室，然后返回到盒子，晶片被控制为传送到耦合到最后面的真空传送室的所有真空处理室，之后是下一个晶片被转移到真空处理室，该真空处理室在下一个晶片可能被转移到可能的状态下，可以从耦合到最后面的真空传输室的真空处理室转出并最后排列。

4. 发明申请

US20120027542A1 Vacuum processor 审中-公开
标题翻译：真空处理器
公开(公告)号：US20120027542A1
公开(公告)日：2012-02-02
申请号：US12805837
申请日：2010-08-20
申请人： Ryoichi Isomura , Susumu Tauchi , Hideaki Kondo
发明人： Ryoichi Isomura , Susumu Tauchi , Hideaki Kondo
IPC分类号： H01L21/677 , H01L21/673
CPC分类号： H01L21/67742
摘要： A vacuum processor includes a first transfer vessel that is connected on the back of a lock chamber connected on the back of an atmospheric transfer vessel and has a first robot; a second transfer vessel that is arranged at the back of this first transfer vessel, connected to the first transfer vessel, and has a second robot; a repeating vessel that connects the transfer vessels, and has a storage section in which the wafer is transferred between the robots; and a processing vessel that is connected, on an almost perpendicular side, to the repeating vessel around the second transfer vessel and in which the wafer is processed at a processing chamber, wherein the first robot has two arms that are expanded and contracted to both directions across a pivot axis, and the second robot has two arms that are expanded and contracted to the same direction around the pivot axis.
摘要翻译：真空处理器包括第一转移容器，其连接在连接在大气转移容器背面的锁定室的后部，并具有第一机器人; 第二转移容器，其布置在该第一转移容器的背面，连接到第一转移容器，并具有第二机器人; 连接转移容器的重复容器，并且具有其中晶片在机器人之间转移的存储部分; 以及处理容器，其在几乎垂直的一侧上连接到围绕第二转移容器的重复容器，并且其中晶片在处理室处理，其中第一机器人具有两个臂，两个臂被扩展和收缩到两个方向跨越枢转轴线，并且第二机器人具有两个臂，其围绕枢转轴线以相同的方向膨胀和收缩。

5. 发明申请

US20110318143A1 VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：真空加工设备
公开(公告)号：US20110318143A1
公开(公告)日：2011-12-29
申请号：US12854255
申请日：2010-08-11
申请人： Ryoichi ISOMURA , Susumu Tauchi , Hideaki Kondo
发明人： Ryoichi ISOMURA , Susumu Tauchi , Hideaki Kondo
IPC分类号： H01L21/677
CPC分类号： H01L21/67184 , H01L21/67161
摘要： A vacuum processing apparatus includes a first lock chamber and a second lock chamber coupled to a back face side of the atmospheric transfer chamber in parallel, a first transfer chamber coupled to a rear side of the first lock chamber, a second transfer chamber coupled, on the rear side of the first transfer chamber, a third transfer chamber coupled to the rear side of the second lock chamber, a first and a second relay chamber disposed between the first transfer chamber/the second transfer chamber and the first transfer chamber/the third transfer chamber to transfer a wafer between these chambers, and a plurality of processing chambers coupled to either the first, the second or the third transfer chamber, in addition, the number of the processing chambers coupled to the second transfer chamber is greater than that of the processing chambers coupled to either the first or the third transfer chamber, and the wafer alone processed in the processing chamber coupled to either the first or the second transfer chamber is transferred to the third robot in the second relay chamber.
摘要翻译：真空处理装置包括并联连接到大气传送室的背面侧的第一锁定室和第二锁定室，耦合到第一锁定室的后侧的第一传送室，耦合到第二锁定室第一传送室的后侧，耦合到第二锁定室的后侧的第三传送室，设置在第一传送室/第二传送室和第一传送室/第三传送室之间的第一和第二中继室传送室以在这些室之间传送晶片，以及耦合到第一，第二或第三传送室的多个处理室，另外，耦合到第二传送室的处理室的数量大于耦合到第一或第三传送室的处理室，以及在处理室中单独处理的晶片，其耦合到第一或第二传输室第二传送室被传送到第二中继室中的第三机器人。

6. 发明授权

US08849446B2 Vacuum processing apparatus and program 有权
标题翻译：真空加工设备及程序
公开(公告)号：US08849446B2
公开(公告)日：2014-09-30
申请号：US13021898
申请日：2011-02-07
申请人： Teruo Nakata , Hideaki Kondo , Susumu Tauchi , Keita Nogi
发明人： Teruo Nakata , Hideaki Kondo , Susumu Tauchi , Keita Nogi
IPC分类号： G06F7/00 , H01L21/677
CPC分类号： H01L21/677 , Y02P90/02 , Y10T29/41
摘要： The present invention provides an efficient transferring control method in a vacuum processing apparatus of a linear tool in which plural vacuum robots are arranged in transferring mechanical units to which process chambers are connected and processing-target members are passed and received among the plural vacuum robots. In addition, the present invention provides a vacuum processing apparatus in which there are provided plural controlling methods, and a unit which determines whether rates of the transferring robots are to be controlled or rates of the process chambers are to be controlled on the basis of processing time of each processing-target member and switches the controlling method in accordance with a site whose rate is controlled.
摘要翻译：本发明提供了一种线性工具的真空处理装置中的有效的传送控制方法，其中多个真空机器人被布置成传送处理室连接的机械单元，并且处理对象构件在多个真空机器人之间通过和接收。此外，本发明提供一种真空处理装置，其中提供多种控制方法，以及一个单元，其确定是否要控制转移机器人的速率或者基于处理来控制处理室的速率每个处理目标成员的时间，并根据控制率的位置切换控制方法。

7. 发明申请

US20110217148A1 VACUUM PROCESSING APPARATUS AND PROGRAM 有权
标题翻译：真空加工设备和程序
公开(公告)号：US20110217148A1
公开(公告)日：2011-09-08
申请号：US13021898
申请日：2011-02-07
申请人： Teruo NAKATA , Hideaki Kondo , Susumu Tauchi , Keita Nogi
发明人： Teruo NAKATA , Hideaki Kondo , Susumu Tauchi , Keita Nogi
IPC分类号： H01L21/677
CPC分类号： H01L21/677 , Y02P90/02 , Y10T29/41
摘要： The present invention provides an efficient transferring control method in a vacuum processing apparatus of a linear tool in which plural vacuum robots are arranged in transferring mechanical units to which process chambers are connected and processing-target members are passed and received among the plural vacuum robots. In addition, the present invention provides a vacuum processing apparatus in which there are provided plural controlling methods, and a unit which determines whether rates of the transferring robots are to be controlled or rates of the process chambers are to be controlled on the basis of processing time of each processing-target member and switches the controlling method in accordance with a site whose rate is controlled.
摘要翻译：本发明提供了一种线性工具的真空处理装置中的有效的传送控制方法，其中多个真空机器人被布置成传送处理室连接的机械单元，并且处理对象构件在多个真空机器人之间通过和接收。此外，本发明提供一种真空处理装置，其中提供多种控制方法，以及一个单元，其确定是否要控制转移机器人的速率或者基于处理来控制处理室的速率每个处理目标成员的时间，并且根据控制速率的站点来切换控制方法。

8. 发明授权

US09011065B2 Vacuum processing apparatus and operating method of vacuum processing apparatus 有权
标题翻译：真空处理装置和真空处理装置的操作方法
公开(公告)号：US09011065B2
公开(公告)日：2015-04-21
申请号：US12871333
申请日：2010-08-30
申请人： Susumu Tauchi , Hideaki Kondo , Teruo Nakata , Keita Nogi , Atsushi Shimoda , Takafumi Chida
发明人： Susumu Tauchi , Hideaki Kondo , Teruo Nakata , Keita Nogi , Atsushi Shimoda , Takafumi Chida
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01L21/67184 , H01L21/67196 , H01L21/67201 , H01L21/67745 , H01L21/67769 , Y10S414/139
摘要： A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.
摘要翻译：一种真空处理装置，包括具有用于传送晶片的多个盒架的大气传送室，用于存储晶片的锁定室，来自锁定室的晶片被转移到的第一真空传送室，连接到传送中间室到第一真空传送室，以及连接到传送中间室的第二真空传送室。至少一个真空处理室连接到第一真空传送室，并且两个或更多个真空处理室连接到第二真空传送室的后侧。多个闸阀设置在第一真空传送室与联接到第一真空传送室的锁定室，传送中间室和真空处理室中的每一个之间。还设置有用于控制闸阀的操作的控制单元。

9. 发明申请

US20110218662A1 VACUUM PROCESSING APPARATUS AND PROGRAM 有权
标题翻译：真空加工设备和程序
公开(公告)号：US20110218662A1
公开(公告)日：2011-09-08
申请号：US13021888
申请日：2011-02-07
申请人： Teruo Nakata , Hideaki Kondo , Susumu Tauchi , Keita Nogi
发明人： Teruo Nakata , Hideaki Kondo , Susumu Tauchi , Keita Nogi
IPC分类号： G06F19/00
CPC分类号： G06F19/00
摘要： Provided is a method for controlling efficient transferring operations in a vacuum processing apparatus with a linear tool. In the apparatus, plural transferring robots are arranged in transferring mechanism units in which plural process chambers are connected with each other, and to-be-processed wafers are received and passed between plural transferring robots. As the transferring robots is far from the load lock, the number of transferring operations to the process chambers is set larger, the number of times of continuous transferring operations to the process chambers is set as small as possible, and an odd number of times of continuous transferring operations to buffer rooms is set, by a destination determination unit and operation control rules. Further, transferring operations are performed based on the destination determination unit and the operation control rules.
摘要翻译：提供了一种用于在具有线性工具的真空处理设备中控制有效传送操作的方法。在该装置中，在多个处理室相互连接的传送机构单元中配置有多个传送机器人，在多个传送机器人之间接收并通过待处理的晶片。由于传送机器人远离装载锁定，所以将处理室的传送操作的次数设定得较大，对处理室的连续传送操作的次数被设定得尽可能小，并且奇数次通过目的地确定单元和操作控制规则设置对缓冲室的连续传送操作。此外，基于目的地确定单元和操作控制规则执行传送操作。

10. 发明授权

US08538573B2 Vacuum processing apparatus and program 有权
标题翻译：真空加工设备及程序
公开(公告)号：US08538573B2
公开(公告)日：2013-09-17
申请号：US13021888
申请日：2011-02-07
申请人： Teruo Nakata , Hideaki Kondo , Susumu Tauchi , Keita Nogi
发明人： Teruo Nakata , Hideaki Kondo , Susumu Tauchi , Keita Nogi
IPC分类号： G06F19/00
CPC分类号： G06F19/00
摘要： Provided is a method for controlling efficient transferring operations in a vacuum processing apparatus with a linear tool. In the apparatus, plural transferring robots are arranged in transferring mechanism units in which plural process chambers are connected with each other, and to-be-processed wafers are received and passed between plural transferring robots. As the transferring robots is far from the load lock, the number of transferring operations to the process chambers is set larger, the number of times of continuous transferring operations to the process chambers is set as small as possible, and an odd number of times of continuous transferring operations to buffer rooms is set, by a destination determination unit and operation control rules. Further, transferring operations are performed based on the destination determination unit and the operation control rules.
摘要翻译：提供了一种用于在具有线性工具的真空处理设备中控制有效传送操作的方法。在该装置中，在多个处理室相互连接的传送机构单元中配置有多个传送机器人，在多个传送机器人之间接收并通过待处理的晶片。由于传送机器人远离装载锁定，所以将处理室的传送操作的次数设定得较大，对处理室的连续传送操作的次数被设定得尽可能小，并且奇数次通过目的地确定单元和操作控制规则设置对缓冲室的连续传送操作。此外，基于目的地确定单元和操作控制规则执行传送操作。

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