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    • 4. 发明授权
    • Dispersion measurement system and method in an optical communication network
    • 光通信网络中的色散测量系统和方法
    • US08699875B2
    • 2014-04-15
    • US13810957
    • 2011-07-19
    • Emilio BraviGiuseppe TaliDavid McDonaldMichael ToddDavid Bernard
    • Emilio BraviGiuseppe TaliDavid McDonaldMichael ToddDavid Bernard
    • G01N21/41H04B10/07H04B17/00G01N21/84
    • H04B10/07951G01M11/332G01M11/335G01M11/338H04B10/073
    • The invention relates to a system and method of dispersion measurement in an optical fiber network. The invention provides means for transmitting from a transmitting node, using a single tunable laser transmitter, two consecutive bursts of data at different wavelengths λ1 and λ2 to a receiver node, wherein each burst of data comprises a unique sequence of amplitude modulated data, and wherein the two sequences are injected with a fixed known delay. The delay between the two consecutive bursts of data is maintained by selective switching of the tunable laser, such that clock recovery circuitry at the receiver node remains locked during the delay between the two bursts. The dispersion measurements method of the present invention is based on walk off and bit position detection between two wavelengths suitable for fast optical burst switching network is described. This method does not require an operator, extra equipment, or traffic interruption on the network.
    • 本发明涉及光纤网络中色散测量的系统和方法。 本发明提供了用于使用单个可调谐激光发射器从不同波长λ1和λ2的两个连续的数据突发传送到接收机节点的装置,其中每个数据突发包括幅度调制数据的唯一序列,并且其中 两个序列以固定的已知延迟注入。 通过可调谐激光器的选择性切换来维持两个连续的数据脉冲之间的延迟,使得接收器节点处的时钟恢复电路在两个脉冲串之间的延迟期间保持锁定。 本发明的色散测量方法是基于步行和适用于快速光突发交换网络的两个波长之间的位位置检测进行描述的。 该方法不需要网络上的操作员,额外的设备或流量中断。
    • 6. 发明申请
    • SYSTEM AND METHOD FOR ELECTRONIC PROCESSING OF CYMBAL VIBRATION
    • 用于电子处理圆柱振动的系统和方法
    • US20120144980A1
    • 2012-06-14
    • US12966965
    • 2010-12-13
    • John V. RoderickJulia TruchsessChristopher RyanDavid McDonaldJonathan A. Marks
    • John V. RoderickJulia TruchsessChristopher RyanDavid McDonaldJonathan A. Marks
    • G10H3/12G10H3/03
    • G10H3/143G10H3/186G10H2230/321
    • In one embodiment, an electronic cymbal system includes a first pickup configured to generate an electrical signal representative of vibrations in a first cymbal, and a controller configured to receive the first electrical signal and to process the first electrical signal to generate an output. The controller includes a digital signal processor (DSP) configured to subject a version of the first electrical signal to a digital signal processing technique. The digital signal processing technique includes one or more of dynamic range compression, expansion, frequency equalization, harmonic excitation, comb filtering, and pitch shifting. The cymbals may be any of variety of known cymbals, such as hi-hat, crash and ride cymbals, and may be of the perforated type configured to reduce noise for indoor use. Lighting control may be provided to illuminate the cymbal for functional or aesthetic purposes.
    • 在一个实施例中,电子钹系统包括被配置为产生代表第一钹的振动的电信号的第一拾取器和被配置为接收第一电信号并且处理第一电信号以产生输出的控制器。 控制器包括被配置为将第一电信号的版本对数字信号处理技术进行管理的数字信号处理器(DSP)。 数字信号处理技术包括动态范围压缩,扩展,频率均衡,谐波激励,梳状滤波和音调偏移中的一个或多个。 钹可以是各种已知的钹,例如踩hat,碰撞和乘坐钹,并且可以是被配置为减少室内使用噪声的穿孔类型。 可以提供照明控制以照亮钹的功能或美观目的。
    • 8. 发明授权
    • Planarization method in the fabrication of a circuit
    • 电路制造中的平面化方法
    • US07966722B2
    • 2011-06-28
    • US12172079
    • 2008-07-11
    • David HartDavid McDonaldGuillaume BoucheSudarsan Uppili
    • David HartDavid McDonaldGuillaume BoucheSudarsan Uppili
    • H05K3/02
    • H03H3/02H03H9/175H03H9/584H03H9/589H03H2003/025Y10T29/42Y10T29/49128Y10T29/4913Y10T29/49155Y10T29/49156Y10T29/49165
    • Planarization methods for maintaining planar surfaces in the fabrication of such devices as BAW devices and capacitors on a planar or planarized substrate are described. In accordance with the method, a metal layer is deposited and patterned, and an oxide layer is deposited using a high density plasma chemical vapor deposition (HDP CVD) process to a thickness equal to the thickness of the metal layer. The HDP CVD process provides an oxide layer on the patterned metal tapering upward from the edge of the patterned metal layer. Then, after masking and etching the oxide layer from the patterned metal layer, the patterned metal layer and surrounding oxide layer form a substantially planar layer, interrupted by small remaining oxide protrusions at the edges of the patterned layer. These small remaining oxide protrusions may be too small to significantly disturb the flatness of a further oxide or other layer or they may be further mitigated by the application of another HDP CVD oxide film.
    • 描述了在平面或平面化基板上制造诸如BAW器件和电容器之类的器件的平面表面的平面化方法。 根据该方法,沉积和图案化金属层,并且使用高密度等离子体化学气相沉积(HDP CVD)工艺将氧化物层沉积到厚度等于金属层的厚度。 HDP CVD工艺在图案化金属的图案化金属层的边缘上向上逐渐变细的氧化层。 然后,在从图案化的金属层掩蔽和蚀刻氧化物层之后,图案化的金属层和周围的氧化物层形成基本平坦的层,被图案化层的边缘处的小的剩余的氧化物突起中断。 这些小的剩余氧化物突起可能太小而不能显着地扰乱另外的氧化物或其它层的平坦度,或者可以通过施加另一HDP CVD氧化物膜进一步减轻它们。