专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08158016B2 Methods of operating an electromagnet of an ion source 有权
标题翻译：操作离子源电磁铁的方法
公开(公告)号：US08158016B2
公开(公告)日：2012-04-17
申请号：US12037598
申请日：2008-02-26
申请人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
发明人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
IPC分类号： G01L21/30 , B44C1/22
CPC分类号： H01J37/08 , H01J27/18 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/67069
摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.
摘要翻译：操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束，测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。

2. 发明申请

US20080179284A1 METHODS OF OPERATING AN ELECTROMAGNET OF AN ION SOURCE 有权
标题翻译：一种离子源的电磁操作方法
公开(公告)号：US20080179284A1
公开(公告)日：2008-07-31
申请号：US12037598
申请日：2008-02-26
申请人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
发明人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
IPC分类号： G01L21/30 , B44C1/22
CPC分类号： H01J37/08 , H01J27/18 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/67069
摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.
摘要翻译：操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束，测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。

3. 发明授权

US07557362B2 Ion sources and methods for generating an ion beam with a controllable ion current density distribution 有权
标题翻译：用于产生具有可控离子电流密度分布的离子束的离子源和方法
公开(公告)号：US07557362B2
公开(公告)日：2009-07-07
申请号：US11678979
申请日：2007-02-26
申请人： Rustam Yevtukhov , Alan V. Hayes , Viktor Kanarov , Boris L. Druz
发明人： Rustam Yevtukhov , Alan V. Hayes , Viktor Kanarov , Boris L. Druz
IPC分类号： H01J49/10 , H01J1/50 , H01J37/08
CPC分类号： H01J37/08 , H01J27/18 , H01J37/3053 , H01J37/32422 , H01J2237/061 , H01J2237/083 , H01L21/31105
摘要： Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.
摘要翻译：用于产生具有可控离子电流密度分布的离子束的离子源和方法。离子源包括放电室和适于产生用于改变放电室内的等离子体的密度分布的磁场的电磁体，从而改变离子电流密度分布。

4. 发明授权

US08835869B2 Ion sources and methods for generating an ion beam with controllable ion current density distribution 有权
标题翻译：用于产生具有可控离子电流密度分布的离子束的离子源和方法
公开(公告)号：US08835869B2
公开(公告)日：2014-09-16
申请号：US13448282
申请日：2012-04-16
申请人： Rustam Yevtukhov , Boris L. Druz , Viktor Kanarov , Alan V. Hayes
发明人： Rustam Yevtukhov , Boris L. Druz , Viktor Kanarov , Alan V. Hayes
IPC分类号： H01J49/10 , H01J1/50 , H01J37/08 , H01J37/305 , H01L21/311 , H01J27/18
CPC分类号： H01J27/18 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/31105
摘要： Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.
摘要翻译：用于产生具有可控离子电流密度分布的离子束的离子源和方法。离子源包括具有靠近第一端的光栅位置的放电室和靠近与第一端相对的第二端的重入容器。等离子体成形器从入口容器延伸到等离子体放电室中。等离子体成形器的位置相对于基于栅格的离子光学器件是可调节的，使得等离子体成形器可以可操作地改变放电室内的等离子体密度分布。

5. 发明申请

US20120211166A1 ION SOURCES AND METHODS FOR GENERATING AN ION BEAM WITH CONTROLLABLE ION CURRENT DENSITY DISTRIBUTION 有权
标题翻译：用于产生具有可控离子电流密度分布的离子束的离子源和方法
公开(公告)号：US20120211166A1
公开(公告)日：2012-08-23
申请号：US13448282
申请日：2012-04-16
申请人： Rustam Yevtukhov , Boris L. Druz , Viktor Kanarov , Alan V. Hayes
发明人： Rustam Yevtukhov , Boris L. Druz , Viktor Kanarov , Alan V. Hayes
IPC分类号： B05C9/00 , H01J27/16
CPC分类号： H01J27/18 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/31105
摘要： Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.
摘要翻译：用于产生具有可控离子电流密度分布的离子束的离子源和方法。离子源包括具有靠近第一端的光栅位置的放电室和靠近与第一端相对的第二端的重入容器。等离子体成形器从入口容器延伸到等离子体放电室中。等离子体成形器的位置相对于基于栅格的离子光学器件是可调节的，使得等离子体成形器可以可操作地改变放电室内的等离子体密度分布。

6. 发明授权

US07183716B2 Charged particle source and operation thereof 有权
标题翻译：带电粒子源及其操作
公开(公告)号：US07183716B2
公开(公告)日：2007-02-27
申请号：US10772132
申请日：2004-02-04
申请人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Ira Reiss , Roger P. Fremgen, Jr. , Adrian Celaru , Kurt E. Williams , Carlos Fernando de Mello Borges , Boris L. Druz , Renga Rajan , Hari Hegde
发明人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Ira Reiss , Roger P. Fremgen, Jr. , Adrian Celaru , Kurt E. Williams , Carlos Fernando de Mello Borges , Boris L. Druz , Renga Rajan , Hari Hegde
IPC分类号： H01J7/24
CPC分类号： H01L21/67253 , H01J27/18 , H01J37/321 , H01J37/32458 , H01L21/67069
摘要： A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.
摘要翻译：带电粒子源利用新颖的等离子体处理室，RF线圈和离子光学器件，以实现高均匀性。等离子体处理室具有可移动的并且包括可调节形状或位置的延伸部的入口容器，以使包含在室内的等离子体更均匀。一个或多个可以是静态或移动的磁体可以包括在重入容器内。离子光学器件包括具有多个孔的栅格，以及每个围绕孔的调谐特征。这些调谐功能可以减小相关孔径的直径，或增加该孔径的长度，从而形成从网格出现的更均匀的子束。 RF线圈包括在其至少一个角度区域中邻近绕组定位的磁通集中器，以调谐由此产生的磁场。

7. 发明授权

US07414355B2 Charged particle beam extraction and formation apparatus 有权
标题翻译：带电粒子束提取和形成装置
公开(公告)号：US07414355B2
公开(公告)日：2008-08-19
申请号：US11207656
申请日：2005-08-18
申请人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
发明人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
IPC分类号： H01J3/14 , H01J37/09 , H01J40/04
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
摘要翻译：带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。不对称的紧固销便于滑动热膨胀同时限制栅格电极。电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。

8. 发明授权

US07005782B2 Charged particle beam extraction and formation apparatus 有权
公开(公告)号：US07005782B2
公开(公告)日：2006-02-28
申请号：US10855245
申请日：2004-05-27
申请人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
发明人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
IPC分类号： H01J17/04
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

9. 发明授权

US06774550B2 Charged particle beam extraction and formation apparatus 有权
标题翻译：带电粒子束提取和形成装置
公开(公告)号：US06774550B2
公开(公告)日：2004-08-10
申请号：US10413176
申请日：2003-04-14
申请人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
发明人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
IPC分类号： H01J1900
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
摘要翻译：带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。不对称的紧固销便于滑动热膨胀同时限制栅格电极。电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。

10. 发明授权

US06590324B1 Charged particle beam extraction and formation apparatus 有权
标题翻译：带电粒子束提取和形成装置
公开(公告)号：US06590324B1
公开(公告)日：2003-07-08
申请号：US09390841
申请日：1999-09-07
申请人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
发明人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Daniel Yakovlevitch
IPC分类号： H01J2700
CPC分类号： H01J27/024 , H01J27/022 , H01J37/08 , H01J37/3053 , H01J2237/061 , H01J2237/3151
摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
摘要翻译：带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。不对称的紧固销便于滑动热膨胀同时限制栅格电极。电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式