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    • 8. 发明授权
    • Method for producing a surface relief pattern
    • 表面浮雕图案的制造方法
    • US4402571A
    • 1983-09-06
    • US234959
    • 1981-02-17
    • James J. CowanArthur M. GerberWarren D. Slafer
    • James J. CowanArthur M. GerberWarren D. Slafer
    • G02B5/18G03F7/00G03F7/20
    • G03F7/70408G02B5/1857G03F7/001G03F7/2006Y10S359/90
    • Surface relief patterns of predetermined configuration are fabricated by a process which involves exposing a photosensitive material at a first position to a laser interference pattern, rotating said material about an axis perpendicular to its surface to a second position, exposing said material at said second position to a laser interference pattern, wherein at least one and preferably both of said exposures is individually below the effective threshold for linear response of said material, the points of intersection of the two fringe patterns being exposed above said threshold as a result of the combined exposures, and developing said material. The method provides a facile technique for the manufacture of surface relief patterns and is particularly useful when the pattern is of submicrometer size and difficult to manufacture by mechanical means.
    • 通过包括将第一位置处的感光材料暴露于激光干涉图案的方法制造出预定结构的表面浮雕图案,将所述材料围绕其表面垂直的轴线旋转到第二位置,将所述材料在所述第二位置将所述材料暴露于 激光干涉图案,其中至少一个且优选两个所述曝光单独低于所述材料的线性响应的有效阈值,作为组合曝光的结果,两条边缘图案的交点相互暴露在所述阈值之上, 并开发所述材料。 该方法提供了用于制造表面浮雕图案的简便技术,并且当图案具有亚微米尺寸并且难以通过机械方法制造时特别有用。