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1. 发明申请

US20080149592A1 Plasma etch process for controlling line edge roughness 审中-公开
标题翻译：用于控制线边缘粗糙度的等离子体蚀刻工艺
公开(公告)号：US20080149592A1
公开(公告)日：2008-06-26
申请号：US11986545
申请日：2007-11-20
申请人： Rodolfo P. Belen , Edward P. Hammond , Brian K. Hatcher , Dan Katz , Theodoros Panagopoulos , Alexander M. Paterson , Valentin N. Todorow
发明人： Rodolfo P. Belen , Edward P. Hammond , Brian K. Hatcher , Dan Katz , Theodoros Panagopoulos , Alexander M. Paterson , Valentin N. Todorow
IPC分类号： B44C1/22
CPC分类号： H01L21/31116 , H01J37/321 , H01J37/32165 , H01J37/32449 , H01L21/033
摘要： Line edge smoothness in a hardmask etch process is improved by widening the chamber pressure process window by applying VHF power and increasing the chamber pressure to near the maximum value of the widened process window.
摘要翻译：硬掩模蚀刻工艺中的线边缘平滑度通过使用VHF功率加宽腔室压力过程窗口并将腔室压力增加到接近加宽过程窗口的最大值来改善。

2. 发明申请

US20080193673A1 Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode 审中-公开
标题翻译：使用中室气体分配板，调谐等离子体流动控制栅格和电极处理工件的方法
公开(公告)号：US20080193673A1
公开(公告)日：2008-08-14
申请号：US11998458
申请日：2007-11-28
申请人： Alexander M. Paterson , John P. Holland , Theodoros Panagopoulos , Edward P. Hammond , Brian K. Hatcher , Valentin N. Todorow , Dan Katz
发明人： Alexander M. Paterson , John P. Holland , Theodoros Panagopoulos , Edward P. Hammond , Brian K. Hatcher , Valentin N. Todorow , Dan Katz
IPC分类号： H05H1/34
CPC分类号： H01J37/32422 , H01J37/32091 , H01J37/321 , H01J37/32357 , H01J37/32449
摘要： A method of processing a workpiece in a plasma reactor chamber is disclosed. The method includes providing an in-situ gas distribution plate between the workpiece and a ceiling of the chamber that divides the chamber into upper and lower chamber regions. The method further includes providing in the in-situ plate an array of feed-through openings with different opening sizes to present a non-uniform distribution of gas flow resistance for gas flow from the upper chamber region to the lower chamber region. A first process gas is introduced into the upper chamber region and a plasma is generated a plasma in the upper chamber region. A second process gas is introduced in the lower chamber region through gas injection orifices of the in-situ gas distribution plate.
摘要翻译：公开了一种在等离子体反应器室中处理工件的方法。该方法包括在工件和腔室的天花板之间提供原位气体分配板，该室将室分成上腔室和下室区域。该方法还包括在原位板中提供具有不同开口尺寸的馈通开口阵列，以呈现从上室区域到下腔室区域的气流的气流阻力的不均匀分布。将第一工艺气体引入上室区域，并且在上室区域中产生等离子体。第二工艺气体通过原位气体分配板的气体注入孔引入下腔室区域。

3. 发明申请

US20080178805A1 Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode 审中-公开
标题翻译：中室气体分布板，调谐等离子体流量控制栅格和电极
公开(公告)号：US20080178805A1
公开(公告)日：2008-07-31
申请号：US11998468
申请日：2007-11-28
申请人： Alexander M. Paterson , John P. Holland , Theodoros Panagopoulos , Edward P. Hammond , Brian K. Hatcher , Valentin N. Todorow , Dan Katz
发明人： Alexander M. Paterson , John P. Holland , Theodoros Panagopoulos , Edward P. Hammond , Brian K. Hatcher , Valentin N. Todorow , Dan Katz
IPC分类号： C23C16/513
CPC分类号： H01J37/32422 , H01J37/32091 , H01J37/321 , H01J37/32357 , H01J37/32449
摘要： A plasma reactor is provided for processing a workpiece such as a semiconductor wafer or a dielectric mask. The reactor chamber has a ceiling, a side wall and a workpiece support pedestal inside the chamber and facing the ceiling along an axis of symmetry and defining a chamber volume between the pedestal and the ceiling. An RF plasma source power applicator is provided at the ceiling. An in-situ electrode body inside the chamber lies divides the chamber into upper and lower chamber regions. The in-situ electrode comprises plural flow-through passages extending parallel to the axis and having different opening sizes, the passages being radially distributed by opening size in accordance with a desired radial distribution of gas flow resistance through the in-situ electrode body.
摘要翻译：提供等离子体反应器来处理诸如半导体晶片或电介质掩模的工件。反应器室具有在室内的天花板，侧壁和工件支撑基座，并且沿着对称轴面对天花板，并且限定基座和天花板之间的室容积。在天花板处设置RF等离子体源功率施加器。室内的原位电极体将腔室分为上腔室和下腔室。原位电极包括平行于轴线延伸并且具有不同开口尺寸的多个流通通道，根据通过原位电极体的气流阻力的期望径向分布，通道径向分布为开口尺寸。

4. 发明申请

US20080236490A1 PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD GAS DISTRIBUTION SHOWERHEAD 审中-公开
标题翻译：具有超导电感天线和超高压气体分布的等离子体反应器
公开(公告)号：US20080236490A1
公开(公告)日：2008-10-02
申请号：US11693089
申请日：2007-03-29
申请人： ALEXANDER PATERSON , Valentin N. Todorow , Theodoros Panagopoulos , Brian K. Hatcher , Dan Katz , Edward P. Hammond , John P. Holland
发明人： ALEXANDER PATERSON , Valentin N. Todorow , Theodoros Panagopoulos , Brian K. Hatcher , Dan Katz , Edward P. Hammond , John P. Holland
IPC分类号： C23C16/00
CPC分类号： H01J37/3244 , H01J37/32091 , H01J37/321
摘要： A plasma reactor for processing a workpiece includes a gas distribution showerhead having a lid, a manifold having a top surface facing the lid and a bottom surface opposing the top surface. Top surface channels in the manifold top surface form a first set of plural paths extending from a first gas input point to plural path ends of the top surface channels. Gas distribution orifices extend axially through the manifold at respective ones of the path ends. Bottom surface channels in the manifold bottom surface form plural paths extending from locations at each of the gas distribution orifices to plural gas distribution path ends. The showerhead further includes a showerhead piece facing the manifold bottom surface and having plural gas injection orifices extending through the showerhead piece.
摘要翻译：用于加工工件的等离子体反应器包括具有盖的气体分配喷头，具有面向盖的顶表面的歧管和与顶表面相对的底表面。歧管顶表面中的顶表面通道形成从第一气体输入点延伸到顶表面通道的多个路径端的多个路径的第一组。气体分配孔在相应的路径端轴向延伸穿过歧管。歧管底表面中的底表面通道形成从每个气体分配孔处的位置延伸到多个气体分配路径端部的多个路径。淋浴头还包括面向歧管底面的喷头片，并具有延伸穿过喷头片的多个气体喷射孔。

5. 发明申请

US20080230008A1 PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION 审中-公开
标题翻译：等离子体物种和通过脉冲甚高频操作的均匀控制
公开(公告)号：US20080230008A1
公开(公告)日：2008-09-25
申请号：US11689405
申请日：2007-03-21
申请人： Alexander Paterson , Theodoros Panagopoulos , Valentin N. Todorov , Brian K. Hatcher , Dan Katz , Edward P. Hammond , John P. Holland
发明人： Alexander Paterson , Theodoros Panagopoulos , Valentin N. Todorov , Brian K. Hatcher , Dan Katz , Edward P. Hammond , John P. Holland
IPC分类号： C23C16/513 , H05H1/24
CPC分类号： H01J37/32146 , H01J37/32091 , H01J37/32165
摘要： An apparatus for processing a substrate has a chamber, a high frequency power source, and a low frequency power source. The chamber has a first and second electrode disposed therein. The high frequency power source is electrically coupled to either the first or second electrode to supply a first RF signal. The low frequency power source electrically coupled to either the first or second electrode to supply a second RF signal. The first RF signal is pulsed on and off so as to enhance electron loss in the chamber.
摘要翻译：用于处理衬底的设备具有腔室，高频电源和低频电源。该室具有设置在其中的第一和第二电极。高频电源电耦合到第一或第二电极以提供第一RF信号。所述低频电源电耦合到所述第一或第二电极以提供第二RF信号。第一RF信号被脉冲打开和关闭，以增强腔室中的电子损失。

6. 发明申请

US20080206483A1 PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS DISTRIBUTION PLATE WHILE ADJUSTING PLASMA DISTRIBUTION 有权
标题翻译：通过调整等离子体分配的气体分配板进行电感耦合等离子体处理
公开(公告)号：US20080206483A1
公开(公告)日：2008-08-28
申请号：US11679122
申请日：2007-02-26
申请人： ALEXANDER PATERSON , Valentin N. Todorov , Theodoros Panagopoulos , Brian K. Hatcher , Dan Katz , Edward P. Hammond , John P. Holland
发明人： ALEXANDER PATERSON , Valentin N. Todorov , Theodoros Panagopoulos , Brian K. Hatcher , Dan Katz , Edward P. Hammond , John P. Holland
IPC分类号： H05H1/00
CPC分类号： H01J37/32082 , C23C16/505 , H01J37/32091 , H01J37/321 , H01J37/3244
摘要： A method of processing a workpiece in the chamber of a plasma reactor having a ceiling overlying the workpiece by introducing a process gas into the chamber through a gas distribution plate in the ceiling. The gas is introduced by distributing gas flow from a first gas input to plural gas distribution orifices extending through a manifold of the gas distribution plate, and distributing gas flow from each of the plural gas distribution orifices to plural gas injection orifices in a showerhead of the gas distribution plate. The method further includes restricting gas flow in the gas distribution plate to paths having arcuate lengths about an axis of symmetry less than a complete circle. The method also includes capacitively and inductively coupling plasma source power into the chamber through the gas distribution. The method further includes adjusting the plasma ion density radial distribution in the process region by adjusting the ratio between the amounts of the capacitively coupled VHF power and the inductively coupled power.
摘要翻译：一种在等离子体反应器的腔室中处理工件的方法，该等离子体反应器具有通过天花板中的气体分配板将工艺气体引入室中，该顶板覆盖工件。通过将气体流从第一气体输入分配到延伸穿过气体分配板的歧管的多个气体分配孔，并将气体流从多个气体分配孔中的每一个分配到多个气体喷射孔中，从而引入气体气体分配板。该方法还包括将气体分配板中的气流限制在具有小于完整圆的对称轴的弧形长度的路径上。该方法还包括通过气体分布将等离子体源功率电容和电感耦合到腔室中。该方法还包括通过调节电容耦合VHF功率和电感耦合功率的量之间的比例来调节处理区域中的等离子体离子密度径向分布。

7. 发明授权

US4708630A Apparatus for labeling blow-molded articles by placing label directly on the parison 失效
标题翻译：用于通过将标签直接放置在型坯上来标记吹塑制品的装置
公开(公告)号：US4708630A
公开(公告)日：1987-11-24
申请号：US864366
申请日：1986-05-19
申请人： Edward P. Hammond
发明人： Edward P. Hammond
IPC分类号： B29C49/04 , B29C49/24
CPC分类号： B29C49/24 , B29C2049/2412 , B29C49/04
摘要： Apparatus for the in-mold labeling of a blow-molded, thermoplastic article wherein one or more labels are tangentially attached to the outer surface of an extruded parison at a predetermined location before the parison is expanded into a finished article.
摘要翻译：吹塑成型的热塑性制品的模内标签的装置，其中一个或多个标签在型坯膨胀成成品之前在预定位置切向地附接到挤压型坯的外表面。

8. 发明授权

US5184896A Self-expanding flexible pouch including improved extensible stay to maximize opening 失效
标题翻译：自扩展灵活的包包括改进的可扩展性保持最大限度的开放
公开(公告)号：US5184896A
公开(公告)日：1993-02-09
申请号：US774672
申请日：1991-10-11
申请人： Edward P. Hammond , Daniel J. Kinne , George L. Roseberry
发明人： Edward P. Hammond , Daniel J. Kinne , George L. Roseberry
IPC分类号： B65D33/00
CPC分类号： B65D33/007
摘要： A self-expanding flexible pouch that can be used as the measuring device for reconstituting a concentrated product contained therein. The pouch includes an improved one-piece extensible stay located in the throat area of the flexible pouch that is biased toward a relaxed, expanded, circular configuration but is initially held substantially flat in a stressed condition by the sealed top portion of the pouch. When the top portion of the pouch is removed, the improved stay expands to its relaxed, expanded configuration and thereby expands and opens the throat area of the pouch. The improved stay comprises a one-piece, continuous extensible loop having a pair of opposed hinges. The hinges are thinner in thickness than the remaining portions of the loop and aligned with the side peripheral edges of the pouch. Two opposed thick-walled sections are located between the opposed hinges. The opposed thick-walled sections provide the automatic opening force for the pouch. The thick-walled sections are substantially aligned with and secured in fixed relation to the front and back sidewall panels of the pouch. Two ribs are located on said opposed thick-walled sections to prevent the stay from sticking together. Four thin-walled transition sections are preferably employed to connect the hinges to the thick-walled sections to form the loop. The thin-walled transition sections are thinner in thickness than the thick-walled sections.

9. 发明授权

US5174658A Self-expanding and reclosable flexible pouch 失效
标题翻译：自扩展和可回收柔性袋
公开(公告)号：US5174658A
公开(公告)日：1992-12-29
申请号：US729119
申请日：1991-07-12
申请人： Charles D. Cook , Edward P. Hammond
发明人： Charles D. Cook , Edward P. Hammond
IPC分类号： B65D30/16 , B65D33/00 , B65D33/25
CPC分类号： B65D33/2541 , B65D33/007 , B65D33/2533 , Y10S150/90
摘要： A sealed, self-expanding, reclosable, flexible pouch having a pair of extensible stays located in the throat area of the pouch. The extensible stays are biased toward a circular configuration but are initially held substantially flat in a stressed condition by the pouch's sealed top portion. When the pouch's top portion is removed, the extensible stays expand to their relaxed expanded configuration and thereby expand and open the throat area of the pouch. An inwardly oriented male securement means is attached to one extensible stay and extends along the throat area of the pouch. A complementary inwardly oriented female securement means is attached to the other of the opposing extensible stays and extends along the throat area of pouch. The complementary male and female securement means permits the throat area of the pouch to be sufficiently closed after initial opening, thereby constraining the pouch's contents.
摘要翻译：密封的，自膨胀的，可重新闭合的柔性袋，其具有位于袋的喉部区域中的一对可延伸的支撑。可延伸的支撑件被朝向圆形构造偏置，但是最初通过袋的密封顶部部分在受压状态下基本保持平坦。当袋子的顶部被去除时，可延伸的支撑件膨胀到它们松弛的膨胀构型，从而膨胀和打开袋的喉部区域。向内定向的阳固定装置连接到一个可延伸的支柱并沿着袋的喉部区域延伸。互补的向内定向的母固定装置连接到另一个相对的可延伸支柱并且沿着袋的喉部区域延伸。互补的阳和阴固定装置允许袋子的喉部区域在初次打开之后充分关闭，从而约束袋的内容物。

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