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1. 发明授权

US08080280B1 Nanostructure templating using low temperature atomic layer deposition 有权
标题翻译：使用低温原子层沉积的纳米结构模板
公开(公告)号：US08080280B1
公开(公告)日：2011-12-20
申请号：US11872749
申请日：2007-10-16
申请人： Robert K. Grubbs , Gregory R. Bogart , John A. Rogers
发明人： Robert K. Grubbs , Gregory R. Bogart , John A. Rogers
IPC分类号： C23C16/00
CPC分类号： C23C16/46 , C23C16/45525
摘要： Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.
摘要翻译：描述了用于制备在所需高温下机械，化学和热稳定的纳米结构的方法，所述纳米结构具有的稳定性温度低于所需升高的温度。所述方法包括通过使用渐变温度沉积方案的模板将在期望的高温下稳定的原子层沉积（ALD）结构层沉积到模板上。至少一个结构层在小于或等于模板的稳定温度的初始温度下沉积，随后在逐渐增加的沉积温度下进行沉积，直至实现所需的高温稳定性。纳米结构模板包括通过接近场纳米图案（PnP）方法制造的具有大约100nm的特征的三维（3D）聚合物模板。

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