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1. 发明授权

US4193797A Method for making photoresists 失效
标题翻译：制造光致抗蚀剂的方法
公开(公告)号：US4193797A
公开(公告)日：1980-03-18
申请号：US308856
申请日：1972-11-22
申请人： Abraham B. Cohen , Robert B. Heiart
发明人： Abraham B. Cohen , Robert B. Heiart
IPC分类号： G03F7/16 , G03C5/00
CPC分类号： G03F7/161
摘要： A process for forming a photoresist which comprises:(1) applying to a surface the surface of a solid unexposed photosensitive layer of thermoplastic photosoluble or photodesensitizable material, the other surface being adhered to a film support, then in either order(2) exposing the layer, and(3) stripping the support, and then(4) washing away the exposed areas of the layer.The surface bearing the resist can be etched, plated, or treated in other ways.
摘要翻译：一种用于形成光致抗蚀剂的方法，包括：（1）向表面施加热塑性可光或可光硬化材料的固体未曝光感光层的表面，另一表面粘附到薄膜载体上，然后以任何顺序（2）层，和（3）剥离载体，然后（4）洗掉层的暴露区域。承载抗蚀剂的表面可以以其他方式进行蚀刻，镀覆或处理。

2. 发明授权

US4522903A Sequential automatic registration and imagewise exposure of a sheet substrate 失效
标题翻译：片状基材的顺序自动配准和成像曝光
公开(公告)号：US4522903A
公开(公告)日：1985-06-11
申请号：US387536
申请日：1982-06-11
申请人： Robert B. Heiart , Abraham B. Cohen
发明人： Robert B. Heiart , Abraham B. Cohen
IPC分类号： G03B27/02 , G03B27/18 , G03F3/10 , G03F7/20 , G03F7/22 , H05K3/00 , G03F9/00
CPC分类号： G03F3/103 , G03F7/22 , H05K3/0082
摘要： Method for repetitive registering and imagewise exposing to actinic radiation a sheet substrate containing a photosensitive layer with use of a sequence of related photomasks. A liquid layer separates the photosensitive layer and each photomask during the exposure step.
摘要翻译：使用相关光掩模序列重复配准和成像曝光含光敏层的片状基材的方法。在曝光步骤期间，液体层分离感光层和每个光掩模。

3. 发明授权

US4527890A Automatic repetitive registration and imagewise exposure of sheet substrates 失效
标题翻译：片材基材的自动重复配准和成像曝光
公开(公告)号：US4527890A
公开(公告)日：1985-07-09
申请号：US523357
申请日：1983-08-15
申请人： Robert B. Heiart , Abraham B. Cohen
发明人： Robert B. Heiart , Abraham B. Cohen
IPC分类号： G03F7/22 , H05K3/00 , G03B27/30
CPC分类号： G03F7/22 , H05K3/0082
摘要： Apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates employing liquid applicator means to allow a photomask to contact a photosensitive layer on the substrate through a liquid.
摘要翻译：用于将使用液体施加器装置的相似片状基片的序列对准和成像曝光于光化辐射的装置，以允许光掩模通过液体与基底上的感光层接触。

4. 发明授权

US4518667A Automatic repetitive registration and image wise exposure of sheet substrates 失效
标题翻译：片材基材的自动重复配准和图像曝光
公开(公告)号：US4518667A
公开(公告)日：1985-05-21
申请号：US387534
申请日：1982-06-11
申请人： Robert B. Heiart , Abraham B. Cohen
发明人： Robert B. Heiart , Abraham B. Cohen
IPC分类号： G03B27/02 , G03F7/20 , G03F7/22 , H05K3/00 , H05K3/02 , G03F9/00
CPC分类号： G03F7/22 , H05K3/0082
摘要： Method and apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates. A liquid layer separates the photosensitive layer and each photomask during the exposure step.
摘要翻译：用于配准和成像曝光于光化辐射的方法和装置一系列相似的片状基片。在曝光步骤期间，液体层分离感光层和每个光掩模。

5. 发明授权

US4508802A Multiple registration and imaging process to form a set of registered imaged elements 失效
标题翻译：多次注册和成像过程，形成一套注册成像元件
公开(公告)号：US4508802A
公开(公告)日：1985-04-02
申请号：US387537
申请日：1982-06-11
申请人： Robert B. Heiart , Abraham B. Cohen
发明人： Robert B. Heiart , Abraham B. Cohen
IPC分类号： G03B27/02 , G03F7/16 , G03F7/20 , G03F7/22 , H05K3/00 , G03F9/00
CPC分类号： G03F7/16 , G03F7/22 , H05K3/0082
摘要： Method for registering and imagewise exposing to actinic radiation a sequence of sheet substrates which are registerable to one another to produce a composite image.A liquid layer separates the photomask and photosensitive layer of the substrate during the exposure.
摘要翻译：用于配准和成像地曝光光化辐射的方法，其可彼此对准以产生合成图像的一系列片状基片。在曝光期间，液体层分离基片的光掩模和感光层。

6. 发明授权

US5112726A Embedded catalyst receptors for metallization of dielectrics 失效
标题翻译：用于金属化电介质的嵌入式催化剂受体
公开(公告)号：US5112726A
公开(公告)日：1992-05-12
申请号：US362137
申请日：1989-06-06
申请人： Abraham B. Cohen , Roxy N. Fan , John A. Quinn
发明人： Abraham B. Cohen , Roxy N. Fan , John A. Quinn
IPC分类号： G03F7/004 , H05K3/00 , H05K3/18 , H05K3/38
CPC分类号： G03F7/0047 , H05K3/184 , H05K3/185 , H05K3/38 , H05K3/387 , H05K2201/0209 , H05K2203/0525 , H05K2203/1415 , H05K3/0023
摘要： The invention is directed to a laminate for the preparation of printed circuits by electroless plating of conductive metal thereon which comprisesa. an electrically insulative substrate bearingb. an adherent layer of crosslinked polymeric adhesive, which is insoluble in photodielectric developing solutions, having partially embedded therein finely divided particles of adsorbent which protrude from the adhesive surface away from the substrate, the protrusive surfaces of which are adsorptive with respect to electroless plating catalysts or reductive precursors thereof, andc. a solid layer of photodielectric adherently overlying the layer of adhesive and adsorbent particles.
摘要翻译：本发明涉及一种用于通过在其上无电镀导电金属来制备印刷电路的层压板，其包括a。 b。电绝缘基板轴承b。交联聚合物粘合剂的粘附层，其不溶于光致介质显影溶液，其部分地嵌入有从粘合剂表面远离基材突出的细分散的吸附剂颗粒，其突出表面相对于化学镀催化剂是吸附性的还原性前体，和c。固态的光致电介质层贴着粘合剂层和吸附剂颗粒。

7. 发明授权

US4414278A Crosslinked triacrylate polymer beads 失效
标题翻译：交联的三丙烯酸酯聚合物珠
公开(公告)号：US4414278A
公开(公告)日：1983-11-08
申请号：US370992
申请日：1982-04-22
申请人： Abraham B. Cohen , Christina N. Lazaridis
发明人： Abraham B. Cohen , Christina N. Lazaridis
IPC分类号： C08F22/10 , B32B5/16
CPC分类号： C08F22/105 , Y10T428/2982
摘要： Discrete, substantially nonswellable crosslinked polymeric beads, 0.7 to 20 .mu.m average diameter wherein at least 90% of the beads by population are below 20 .mu.m, which are nonagglomerating in any solvent or solvents including solvents for the liquid monomer or monomers used in preparation thereof. The polymeric beads are homopolymers of tri- and tetraacrylate and tri- and tetramethacrylate monomers, copolymers thereof, copolymers of one of said acrylate or methacrylate monomers with up to 50% of a monomer having a single terminal ethylenic group or with up to 75% of a monomer having two terminal ethylenic groups or three terminal ethylenic groups different from said triacrylate or trimethacrylate monomers defined above.
摘要翻译：离散的，基本不可穿透的交联聚合物珠粒，其平均直径为0.7-20μm，其中至少90％的珠子总数低于20μm，在任何溶剂或溶剂中是非团聚的，包括用于制备液体单体或单体的溶剂其中。聚合物珠粒是三和四丙烯酸酯和三甲基丙烯酸酯和四甲基丙烯酸酯单体的均聚物，其共聚物，所述丙烯酸酯或甲基丙烯酸酯单体之一的共聚物与高达50％的具有单末端烯属基团的单体或最多75％具有两个末端烯基或与上述三丙烯酸酯或三甲基丙烯酸酯单体不同的三个末端烯基的单体。

8. 发明授权

US4229520A Photo-polymerization and development process which produces dot-etchable material 失效
标题翻译：产生点蚀刻材料的光聚合和显影工艺
公开(公告)号：US4229520A
公开(公告)日：1980-10-21
申请号：US49314
申请日：1979-06-18
申请人： Martin D. Bratt , Abraham B. Cohen
发明人： Martin D. Bratt , Abraham B. Cohen
IPC分类号： G03F1/56 , G03F3/10 , G03F7/30 , G03C5/00 , G03C1/68
CPC分类号： G03F1/56 , G03F3/101 , G03F7/30
摘要： Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.
摘要翻译：描述了光聚合元件，其包含片状载体，光聚合层，其光致变化区域的厚度至多为0.0006英寸（0.015mm），光密度至少为3.0。由这些元件制成的抗蚀剂图像可以通过化学地切割图像区域然后喷涂或摩擦它们的过程来蚀刻。这些元件可用作接触速度光刻胶片和其它图形艺术应用。

9. 发明授权

US4859571A Embedded catalyst receptors for metallization of dielectrics 失效
标题翻译：用于金属化电介质的嵌入式催化剂受体
公开(公告)号：US4859571A
公开(公告)日：1989-08-22
申请号：US947833
申请日：1986-12-30
申请人： Abraham B. Cohen , Roxy Fan , John A. Quinn
发明人： Abraham B. Cohen , Roxy Fan , John A. Quinn
IPC分类号： C23C18/16 , C23C18/18 , C23C18/20 , C23C18/28 , C23C18/31 , C23C18/34 , C23C18/40 , C23C18/44 , G03F7/004 , H05K1/18 , H05K3/00 , H05K3/18 , H05K3/38
CPC分类号： H05K3/38 , G03F7/0047 , H05K3/184 , H05K3/185 , H05K3/387 , H05K2201/0209 , H05K2203/0525 , H05K2203/1415 , H05K3/0023
摘要： The invention is directed to a laminate for the preparation of printed circuits by electroless plating of conductive metal thereon which comprisesa. an electrically insulative substrate bearingb. an adherent layer of crosslinked polymeric adhesive, which is insoluble in photodielectric developing solutions, having partially embedded therein finely divided particles of adsorbent which protrude from the adhesive surface away from the substrate, the protrusive surfaces of which are adsorptive with respect to electroless plating catalysts or reductive precursors thereof, andc. a solid layer of photodielectric adherently overlying the layer of adhesive and adsorbent particles.

10. 发明授权

US4286046A Process for preparation of multicolor surprint proofs with silica overcoat 失效
标题翻译：用二氧化硅外套制备多色印花样张的方法
公开(公告)号：US4286046A
公开(公告)日：1981-08-25
申请号：US45245
申请日：1979-06-04
申请人： Abraham B. Cohen , Roxy Fan
发明人： Abraham B. Cohen , Roxy Fan
IPC分类号： G03C11/08 , G03C11/00 , G03F3/10 , G03F7/09 , G03F7/28 , G03F7/40 , G03C5/00
CPC分类号： G03C11/00 , G03F3/103 , G03F7/28 , Y10S430/151
摘要： Process for preparation of multicolor surprint proofs from a composite photoimaged element, e.g., photopolymer element, having, in order, a sheet support, at least two colored photoimaged elements, and a layer of colloidal silica applied thereon, said colloidal silica being coated from a substantially aqueous dispersion wherein the colloidal silica has an average particle diameter of less than 500 nm and wherein at least 75% of the solids of said dispersion are silica, the silica layer being at least 20 mg/dm.sup.2 when dried. The multicolor proofs obtained contain a sharp image free from any three-dimensional effects and have a delustered, matte appearance which simulates printed press sheets.
摘要翻译：用于制备复合光电元件例如光聚合物元件的多色印花样张的方法，其中依次具有片状载体，片状载体，至少两种着色的成像元素和涂覆在其上的胶体二氧化硅层，所述胶体二氧化硅由基本上为水分散体，其中胶体二氧化硅的平均粒径小于500nm，并且其中至少75％的所述分散体的固体为二氧化硅，当干燥时，二氧化硅层为至少20mg / dm 2。获得的多色证明包含没有任何三维效果的清晰图像，并且具有模拟印刷压片的消光，无光泽外观。

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