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    • 6. 发明授权
    • Information processing device, information recording medium manufacturing device, information recording medium, methods therefore, and computer program
    • 信息处理装置,信息记录介质制造装置,信息记录介质,方法和计算机程序
    • US08203730B2
    • 2012-06-19
    • US13196505
    • 2011-08-02
    • Yoshikazu Takashima
    • Yoshikazu Takashima
    • G06K15/00
    • G11B20/00086G11B20/0021
    • An information processing device for executing content reproduction processing includes: a content reproduction processing unit for executing data transformation processing for replacing a part of configuration data of input content to be reproduced with transformation data, and executing processing for reproducing the reproduction content; and a parameter generating unit for providing the content reproduction processing unit with a parameter to be applied in the data transformation processing; wherein the content reproduction processing unit has a configuration for obtaining a parameter identifier that is different for each segment set as a sectioning region of reproduction content, and outputting a parameter calculation request accompanied by the parameter identifier to the parameter generating unit; and wherein the parameter generating unit has a configuration for providing the content reproducing unit with a parameter corresponding to a segment, in response to the parameter calculation request from the content reproducing unit.
    • 一种用于执行内容再现处理的信息处理装置,包括:内容再现处理单元,用于执行用变换数据替换要再现的输入内容的配置数据的一部分的数据变换处理,以及执行用于再现再现内容的处理; 以及参数生成单元,用于向所述内容再现处理单元提供要在所述数据变换处理中应用的参数; 其中,所述内容再现处理单元具有用于获得对于作为再现内容的分割区域设置的每个段不同的参数标识符的配置,并且将参数标识符附加到参数生成单元的参数计算请求; 并且其中所述参数产生单元具有用于响应于来自所述内容再现单元的参数计算请求向所述内容再现单元提供与段对应的参数的配置。
    • 8. 发明授权
    • Semiconductor device manufacturing apparatus and manufacturing method of semiconductor device
    • 半导体装置的制造装置及半导体装置的制造方法
    • US08172946B2
    • 2012-05-08
    • US11885551
    • 2006-02-24
    • Tomoshi TaniyamaYoshikazu TakashimaMikio Ohno
    • Tomoshi TaniyamaYoshikazu TakashimaMikio Ohno
    • C23C16/00
    • C23C16/4412H01L21/0217H01L21/02211H01L21/02271H01L21/3185H01L21/67017H01L21/67109
    • Stagnation of gas used for substrate processing in an exhaust trap is prevented, and localized precipitation of components in the gas used for substrate processing is reduced. The proposed apparatus includes a substrate processing chamber (cylindrical space 250), a gas supply tube 232 for supplying substrate processing gas to the substrate processing chamber, a first exhaust tube (upstream exhaust tube 231a) for discharging gas used for substrate processing from the substrate processing chamber, an exhaust trap 49 for removing components contained in the gas used for substrate processing introduced through the first exhaust tube, and a second exhaust tube (downstream exhaust tube 231b) for exhausting gas out of said exhaust trap 49 after components have been removed from the gas used for substrate processing, wherein the exhaust trap 49 is provided with a cooled baffle plate 59 that is substantially perpendicular to the direction in which gas is introduced into the exhaust trap 49 and that has a concave surface 59a in the side facing the gas introduction port 55a of the exhaust trap 49.
    • 防止在排气阱中用于基板处理的气体滞留,并且减少了用于基板处理的气体中的部件的局部沉淀。 所提出的装置包括基板处理室(圆筒空间250),用于向基板处理室供给基板处理气体的气体供给管232,用于从基板排出用于基板处理的气体的第一排气管(上游排气管231a) 处理室,用于除去包含在用于通过第一排气管引入的基板处理的气体中的部件的排气阱49和用于在部件被去除之后将气体从排气阱49排出的第二排气管(下游排气管231b) 来自用于基板处理的气体,其中排气阱49设置有冷却的挡板59,该挡板基本上垂直于气体被引入排气阱49的方向,并且在面向该排气阱的一侧具有凹面59a 排气收集器49的气体导入口55a。