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1. 发明申请

US20110141865A1 Metrology for Extreme Ultraviolet Light Source 有权
标题翻译：极紫外光源计量
公开(公告)号：US20110141865A1
公开(公告)日：2011-06-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
IPC分类号： G11B20/00 , G11B7/00
CPC分类号： G01J1/429 , H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。光采集系统包括配置为光学地分离这些部分的二向色光学装置。

2. 发明授权

US08173985B2 Beam transport system for extreme ultraviolet light source 有权
标题翻译：用于极紫外光源的光束传输系统
公开(公告)号：US08173985B2
公开(公告)日：2012-05-08
申请号：US12638092
申请日：2009-12-15
申请人： Robert A. Bergstedt , William N. Partlo , Igor V. Fomenkov , Nam-Hyong Kim
发明人： Robert A. Bergstedt , William N. Partlo , Igor V. Fomenkov , Nam-Hyong Kim
IPC分类号： H05G2/00 , H01L21/027 , G03F7/20
CPC分类号： H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间，其容纳极紫外光收集器和目标位置; 以及光束传送系统，其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

3. 发明申请

US20110140008A1 Beam Transport System for Extreme Ultraviolet Light Source 有权
标题翻译：用于极紫外光源的光束传输系统
公开(公告)号：US20110140008A1
公开(公告)日：2011-06-16
申请号：US12638092
申请日：2009-12-15
申请人： Robert A. Bergstedt , William N. Partlo , Igor V. Fomenkov , Nam-Hyong Kim
发明人： Robert A. Bergstedt , William N. Partlo , Igor V. Fomenkov , Nam-Hyong Kim
IPC分类号： G21K5/04
CPC分类号： H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间，其容纳极紫外光收集器和目标位置; 以及光束传送系统，其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

4. 发明授权

US08000212B2 Metrology for extreme ultraviolet light source 有权
标题翻译：极紫外光源测量
公开(公告)号：US08000212B2
公开(公告)日：2011-08-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
IPC分类号： G11B7/00
CPC分类号： G01J1/429 , H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。光采集系统包括配置为光学地分离这些部分的二向色光学装置。

5. 发明申请

US20100327192A1 Alignment Laser 有权
标题翻译：对准激光
公开(公告)号：US20100327192A1
公开(公告)日：2010-12-30
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
IPC分类号： H05G2/00 , H01S3/22 , H01S3/08
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

6. 发明授权

US08304752B2 EUV light producing system and method utilizing an alignment laser 有权
标题翻译： EUV光产生系统和利用对准激光的方法
公开(公告)号：US08304752B2
公开(公告)日：2012-11-06
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
IPC分类号： G01J1/04 , G01J1/18
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

7. 发明申请

US20110102759A1 Laser System 有权
标题翻译：激光系统
公开(公告)号：US20110102759A1
公开(公告)日：2011-05-05
申请号：US12987039
申请日：2011-01-07
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
IPC分类号： G03B27/54
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

8. 发明授权

US07746913B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07746913B2
公开(公告)日：2010-06-29
申请号：US11981449
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70583 , H01S3/005 , H01S3/08 , H01S3/08059 , H01S3/105 , H01S3/2251 , H01S3/235 , H01S3/2366
摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.
摘要翻译：可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光房间第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束的脉冲，其可以包括环形功率放大级; 种子注射机制。

9. 发明授权

US07643528B2 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US07643528B2
公开(公告)日：2010-01-05
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

10. 发明申请

US20080165337A1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US20080165337A1
公开(公告)日：2008-07-10
申请号：US11981450
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Ivan Lalovic
IPC分类号： G03B27/54 , G03F7/26
CPC分类号： G03F7/70625 , G03F7/70025 , G03F7/70583 , G03F7/70616 , H01S3/08004 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/2308
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

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