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1. 发明授权

US07845540B2 Systems and methods for depositing conductive material into openings in microfeature workpieces 失效
标题翻译：将导电材料沉积在微型工件的开口中的系统和方法
公开(公告)号：US07845540B2
公开(公告)日：2010-12-07
申请号：US11215214
申请日：2005-08-30
申请人： Rick C. Lake , Ross S. Dando
发明人： Rick C. Lake , Ross S. Dando
IPC分类号： B23K1/18 , B23K31/02
CPC分类号： B23K3/0669 , B23K2101/40
摘要： Systems and methods for depositing conductive material into openings in microfeature workpieces are disclosed herein. One particular embodiment of a system for processing microfeature workpieces includes a processing chamber and a solder reservoir in the processing chamber. The solder reservoir includes a slot having a generally vertical orientation positioned to receive a microfeature workpiece. In several embodiments, the system can further include a conductive material at least partially filling the slot.
摘要翻译：本文公开了用于将导电材料沉积在微特征工件的开口中的系统和方法。用于处理微特征工件的系统的一个具体实施例包括在处理室中的处理室和焊料储存器。焊料储存器包括具有定位成接收微特征工件的大致垂直取向的槽。在几个实施例中，系统还可以包括至少部分地填充槽的导电材料。

2. 发明授权

US07588804B2 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces 失效
标题翻译：具有隔离气体连接器的反应器和用于将材料沉积到微器件工件上的方法
公开(公告)号：US07588804B2
公开(公告)日：2009-09-15
申请号：US10922039
申请日：2004-08-19
申请人： Ross S. Dando
发明人： Ross S. Dando
IPC分类号： C23C16/455 , C23C16/44 , C23C16/22 , C23C16/30
CPC分类号： C23C16/4409 , C23C16/455 , C23C16/45561
摘要： Reactors having isolated gas connectors, systems that include such reactors, and methods for depositing materials onto micro-devices workpieces are disclosed herein. In one embodiment, a reactor for depositing material onto a micro-device workpiece includes a reaction chamber, a lid attachable to the reaction chamber, and a connector. The connector has a first portion coupled to the lid, a second portion coupled to the reaction chamber, a gas passageway extending through the first and second portions, and a seal. The seal can surround the gas passageway between the first and second portions. The first portion is detachably coupled to the second portion. In one aspect of this embodiment, the connector can also include a second gas passageway extending through the first and second portions and a second seal surrounding the second gas passageway between the first and second portions.
摘要翻译：具有隔离气体连接器的反应器，包括这种反应器的系统以及用于将材料沉积到微器件工件上的方法在本文中公开。在一个实施例中，用于将材料沉积到微器件工件上的反应器包括反应室，可附接到反应室的盖和连接器。连接器具有联接到盖的第一部分，耦合到反应室的第二部分，延伸穿过第一和第二部分的气体通道和密封件。密封件可围绕第一和第二部分之间的气体通道。第一部分可拆卸地联接到第二部分。在该实施例的一个方面，连接器还可以包括延伸穿过第一和第二部分的第二气体通道和围绕第一和第二部分之间的第二气体通道的第二密封件。

3. 发明授权

US07431225B2 Methods of operating a liquid vaporizer 失效
标题翻译：操作液体蒸发器的方法
公开(公告)号：US07431225B2
公开(公告)日：2008-10-07
申请号：US11198560
申请日：2004-08-10
申请人： Ross S. Dando , Allen P. Mardian , Raynald B. Cantin , Gurtej S. Sandhu
发明人： Ross S. Dando , Allen P. Mardian , Raynald B. Cantin , Gurtej S. Sandhu
IPC分类号： B05B1/30 , B05B1/24 , C23C16/00 , F22B23/06 , F25B21/02
CPC分类号： H01L21/6708 , C23C16/4481
摘要： The present invention is generally directed to a vaporizer with positive liquid shut-off. In one illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body, a nozzle positioned within the body, the nozzle having at least one opening formed therethrough that defines a vaporized liquid exit, and a positive shut-off valve, a portion of which is adapted to engage the vaporized liquid exit of the nozzle. In another illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to-the body and a plurality of peltier cells coupled to the body.
摘要翻译：本发明一般涉及具有正液体截止的汽化器。在一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口，位于主体内的喷嘴，喷嘴具有限定蒸发的液体出口的至少一个通过其形成的开口，以及正截止阀，其一部分适于接合喷嘴的汽化液体出口。在另一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口以及耦合到主体的多个珀耳帖细胞。

4. 发明授权

US07114669B2 Methods of operating a liquid vaporizer 失效
标题翻译：操作液体蒸发器的方法
公开(公告)号：US07114669B2
公开(公告)日：2006-10-03
申请号：US10917640
申请日：2004-08-13
申请人： Ross S. Dando , Allen P. Mardian , Raynald B. Cantin , Gurtej S. Sandhu
发明人： Ross S. Dando , Allen P. Mardian , Raynald B. Cantin , Gurtej S. Sandhu
IPC分类号： B05B1/30 , B05B1/24 , C23C16/00 , F22B23/06
CPC分类号： H01L21/6708 , C23C16/4481
摘要： The present invention is generally directed to a vaporizer with positive liquid shut-off. In one illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body, a nozzle positioned within the body, the nozzle having at least one opening formed therethrough that defines a vaporized liquid exit, and a positive shut-off valve, a portion of which is adapted to engage the vaporized liquid exit of the nozzle. In another illustrative embodiment, the vaporizer is comprised of a body, a liquid inlet and a carrier gas inlet coupled to the body and a plurality of peltier cells coupled to the body.
摘要翻译：本发明一般涉及具有正液体截止的汽化器。在一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口，位于主体内的喷嘴，喷嘴具有限定蒸发的液体出口的至少一个通过其形成的开口，以及正截止阀，其一部分适于接合喷嘴的汽化液体出口。在另一个说明性实施例中，蒸发器包括主体，液体入口和连接到主体的载气入口以及耦合到主体的多个珀耳帖细胞。

5. 发明授权

US06926775B2 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces 失效
标题翻译：具有隔离气体连接器的反应器和用于将材料沉积到微器件工件上的方法
公开(公告)号：US06926775B2
公开(公告)日：2005-08-09
申请号：US10365085
申请日：2003-02-11
申请人： Craig M. Carpenter , Ross S. Dando , Danny Dynka
发明人： Craig M. Carpenter , Ross S. Dando , Danny Dynka
IPC分类号： C23C16/44 , C23C16/455 , C23C16/54 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4401 , C23C16/45519 , C23C16/45544
摘要： Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.
摘要翻译：具有用于将材料沉积到微器件工件上的气体分配器的反应器，包括这种反应器的系统以及将材料沉积到微器件工件上的方法在本文中公开。在一个实施例中，用于将材料沉积到微器件工件上的反应器包括反应室，通道和门组件。反应室包括配置成在工件保持器上向微器件工件提供气体流的气体分配器。具有通向反应室的第一端和远离反应室的第二端的通道构造成提供从腔室进入和离开以处理微器件工件。门组件构造成在通道的第二端处打开并密封地关闭门。定位在门中的气体调节系统构造成保持通道中气体成分的期望浓度和相位。

6. 发明授权

US06838114B2 Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces 失效
标题翻译：用于在将材料沉积到微器件工件上的过程中控制气体脉动的方法
公开(公告)号：US06838114B2
公开(公告)日：2005-01-04
申请号：US10155547
申请日：2002-05-24
申请人： Craig M. Carpenter , Ross S. Dando , Allen P. Mardian
发明人： Craig M. Carpenter , Ross S. Dando , Allen P. Mardian
IPC分类号： C23C16/44 , C23C16/455 , C23C16/52 , C23C16/00
CPC分类号： C23C16/45525 , C23C16/52
摘要： Methods for depositing materials onto micro-device workpieces in a reaction chamber. One embodiment of such a method comprises providing a flow of a first precursor through the reaction chamber to deposit the first precursor onto the micro-device workpiece in the reaction chamber, and providing a flow of a purge gas through the reaction chamber to purge excess amounts of the first precursor. The method continues by monitoring a parameter correlated to a quantity of the first precursor and/or the purge gas in the reaction chamber as the first precursor and/or the purge gas flows through the reaction chamber. An additional aspect of this method is terminating the flow of the first precursor and/or the flow of the purge gas based on the monitored parameter of the quantity of the first precursor and/or the purge gas. The procedure of monitoring a parameter correlated to a quantity of the first precursor and/or the purge gas can comprise determining a concentration of the first precursor and/or the purge gas in the reaction chamber using a selected radiation.
摘要翻译：在反应室中将材料沉积到微器件工件上的方法。这种方法的一个实施方案包括提供通过反应室的第一前体的流动，以将第一前体沉积在反应室中的微器件工件上，并且提供净化气体流过反应室以净化过量的第一个前体。当第一前体和/或吹扫气体流过反应室时，通过监测与反应室中的第一前体和/或吹扫气体的量相关的参数来继续该方法。该方法的另一方面是基于所监测的第一前体和/或吹扫气体的量的参数来终止第一前体和/或吹扫气体的流动。监测与第一前体和/或吹扫气体的量相关的参数的程序可以包括使用所选择的辐射确定反应室中的第一前体和/或吹扫气体的浓度。

7. 发明授权

US06821347B2 Apparatus and method for depositing materials onto microelectronic workpieces 失效
公开(公告)号：US06821347B2
公开(公告)日：2004-11-23
申请号：US10191889
申请日：2002-07-08
申请人： Craig M. Carpenter , Allen P. Mardian , Ross S. Dando , Kimberly R. Tschepen , Garo J. Derderian
发明人： Craig M. Carpenter , Allen P. Mardian , Ross S. Dando , Kimberly R. Tschepen , Garo J. Derderian
IPC分类号： B05C318
CPC分类号： C23C16/45544 , C23C16/45565
摘要： Reactors for vapor deposition of materials onto a microelectronic workpiece, systems that include such reactors, and methods for depositing materials onto microelectronic workpieces. In one embodiment, a reactor for vapor deposition of a material comprises a reaction chamber and a gas distributor. The reaction chamber can include an inlet and an outlet. The gas distributor is positioned in the reaction chamber. The gas distributor has a compartment coupled to the inlet to receive a gas flow and a distributor plate including a first surface facing the compartment, a second surface facing the reaction chamber, and a plurality of passageways. The passageways extend through the distributor plate from the first surface to the second surface. Additionally, at least one of the passageways has at least a partially occluded flow path through the plate. For example, the occluded passageway can be canted at an oblique angle relative to the first surface of the distributor plate so that gas flowing through the canted passageway changes direction as it passes through the distributor plate.

8. 发明授权

US06797337B2 Method for delivering precursors 失效
标题翻译：交付前体的方法
公开(公告)号：US06797337B2
公开(公告)日：2004-09-28
申请号：US10223175
申请日：2002-08-19
申请人： Ross S. Dando , Craig M. Carpenter , Allen P. Mardian , Garo J. Derderian , Dan Gealy
发明人： Ross S. Dando , Craig M. Carpenter , Allen P. Mardian , Garo J. Derderian , Dan Gealy
IPC分类号： B05D300
CPC分类号： C23C16/4481
摘要： A method and apparatus for delivering precursors to a chemical vapor deposition or atomic layer deposition chamber is provided. The apparatus includes a temperature-controlled vessel containing a precursor. An energy source is used to vaporize the precursor at its surface such that substantially no thermal decomposition of the remaining precursor occurs. The energy source may include a carrier gas, a radio frequency coupling device, or an infrared irradiation source. After the precursor is exposed to the energy source, the vaporized portion of the precursor is transported via a temperature-controlled conduit to a chemical vapor deposition or atomic deposition chamber for further processing.
摘要翻译：提供了用于将前体输送到化学气相沉积或原子层沉积室的方法和装置。该装置包括含有前体的温度控制容器。使用能源在其表面蒸发前体，使得基本上不会发生剩余前体的热分解。能量源可以包括载气，射频耦合装置或红外辐射源。在前体暴露于能量源之后，前体的蒸发部分通过温度控制的导管输送到化学气相沉积或原子沉积室，用于进一步处理。

9. 发明授权

US06545604B1 Methods for electronic tracking of units originating from a common source, and assemblies comprising transponders attached to meat spikes 有权
标题翻译：用于电子跟踪源自共同源的单元的方法，以及包括连接到肉尖的转发器的组件
公开(公告)号：US06545604B1
公开(公告)日：2003-04-08
申请号：US09346635
申请日：1999-07-01
申请人： Ross S. Dando , Mark E. Tuttle
发明人： Ross S. Dando , Mark E. Tuttle
IPC分类号： G08B1314
CPC分类号： G06K7/10366 , A22B5/0064 , A22B7/00 , A22B7/007 , A22C17/10 , G06K7/0008 , G06K17/0022 , G06K2017/0045 , G08B13/2434 , G08B13/2462
摘要： In one aspect, the invention encompasses a method for electronic tracking of units originating from a common source which comprises a plurality of units physically joined with one another. A first transponder is physically associated with the common source, and the source is split to separate it into three or more of the units. A second transponder is physically associated with one of the three or more units, and the second transponder sends a code. The code of the second transponder is electrically associated with an identifier of the common source. In a particular aspect, the common source is an animal carcass.
摘要翻译：一方面，本发明包括用于电子跟踪源自公共源的单元的方法，该方法包括彼此物理连接的多个单元。第一个转发器与公共源物理关联，源被拆分成三个或更多个单元。第二个转发器与三个或更多个单元中的一个物理相关联，第二个应答器发送一个代码。第二应答器的代码与公共源的标识符电连接。在一个特定方面，共同的来源是动物尸体。

10. 发明授权

US5978230A Battery mounting apparatuses, electronic devices, and methods of forming electrical connections 失效
公开(公告)号：US5978230A
公开(公告)日：1999-11-02
申请号：US26250
申请日：1998-02-19
申请人： Ross S. Dando , Rickie C. Lake , Krishna Kumar
发明人： Ross S. Dando , Rickie C. Lake , Krishna Kumar
IPC分类号： H01M2/10 , H05K1/18 , H05K3/28 , H05K3/32 , H05K7/06
CPC分类号： H05K3/284 , H01M2/1044 , H05K3/321 , H05K1/189 , H05K2201/10037 , H05K2201/10977 , H05K2203/085 , Y10T29/49169 , Y10T29/49171
摘要： Battery mounting apparatuses, electronic devices, and methods of forming electrical connections are described. In one implementation, a flexible circuit substrate has an area within which an electrical component, e.g. a thin-profile battery terminal housing member, is to be adhered. A conductive contact node pattern is disposed within the area and sized to be conductively adhered with the component. In one aspect, the conductive contact node pattern comprises an outer conductive node on the substrate at least a portion of which is positioned within the outermost 25% of the area. An electrical component is conductively bonded with the contact node pattern and encapsulating material is provided over and underneath the component. In a preferred aspect, the substrate and electrical component are vacuum processed sufficiently to redistribute the encapsulating material under the component. The positioning of the contact node pattern provides sufficient support during vacuum processing such that any tendency of the substrate to become lodged against the component is reduced, if not eliminated.

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