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1. 发明授权

US06750972B2 Gas discharge ultraviolet wavemeter with enhanced illumination 有权
标题翻译：气体放电紫外线波长计增强照明
公开(公告)号：US06750972B2
公开(公告)日：2004-06-15
申请号：US10173190
申请日：2002-06-14
申请人： Richard L. Sandstrom , John T. Melchior , Rajasekhar Rao
发明人： Richard L. Sandstrom , John T. Melchior , Rajasekhar Rao
IPC分类号： G01B902
CPC分类号： G01J3/26 , G01J1/4257 , G01J1/429 , G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/024 , G01J3/027 , G01J9/02 , G01J9/0246 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a wavemeter for an ultraviolet laser capable of long life beam quality monitoring in a pulsed ultraviolet laser system at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater. In a preferred embodiment an enhanced illumination configuration reduces per pulse illumination of an etalon by a factor of 28 compared to a popular prior art configuration. Optics are provided in this embodiment which reduce light entering the etalon to only that amount needed to illuminate a linear photo diode array positioned to measure interference patterns produced by the etalon. In this preferred embodiment two sample beams produced by reflections from two surfaces of a beam splitter are diffused by a defractive diffuser and the output of the defractive diffuser is focused on two separate secondary diffusers effectively combining both beams in two separate spectrally equivalent diffuse beams. One beam is used for wavelength and bandwidth measurement and the other beam is used for calibration. In preferred embodiments an etalon chamber contains nitrogen with an oxygen concentration of between 1.6 and 2.4 percent.
摘要翻译：本发明提供了一种用于紫外激光器的波长计，其能够在脉冲能量为5mJ以上的脉冲紫外激光系统中以大于2000Hz的脉冲速率进行长寿命光束质量监测。在一个优选实施例中，与常用的现有技术配置相比，增强的照明配置将标准具的每脉冲照明降低了28倍。在该实施例中提供光学器件，其将进入标准具的光仅仅照射照亮定位成测量由标准具产生的干涉图案的线性光电二极管阵列所需的量。在该优选实施例中，通过来自分束器的两个表面的反射产生的两个采样光束被减光扩散器扩散，并且消光扩散器的输出聚焦在两个分开的二次扩散器上，两个分离的二次扩散器在两个分开的光谱等效漫射光束中有效地组合两个光束。一个波束用于波长和带宽测量，另一个波束用于校准。在优选实施例中，标准具室含有氧浓度在1.6和2.4％之间的氮。

2. 发明申请

US20050226300A1 Very high repetition rate narrow band gas discharge laser system 失效
公开(公告)号：US20050226300A1
公开(公告)日：2005-10-13
申请号：US10815386
申请日：2004-03-31
申请人： Thomas Steiger , Edward Holtaway , Bryan Moosman , Rajasekhar Rao
发明人： Thomas Steiger , Edward Holtaway , Bryan Moosman , Rajasekhar Rao
IPC分类号： H01S3/00 , H01S3/038 , H01S3/097 , H01S3/104 , H01S3/13 , H01S3/22 , H01S3/23
CPC分类号： H01S3/038 , H01S3/0057 , H01S3/07 , H01S3/097 , H01S3/09702 , H01S3/104 , H01S3/1305 , H01S3/2333
摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.

3. 发明申请

US20050068538A1 GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE 有权
公开(公告)号：US20050068538A1
公开(公告)日：2005-03-31
申请号：US10676907
申请日：2003-09-30
申请人： Rajasekhar Rao , John Melchior , Holger Glatzel
发明人： Rajasekhar Rao , John Melchior , Holger Glatzel
IPC分类号： H01S3/23 , G01J3/45
CPC分类号： H01S3/2366 , H01S3/03 , H01S3/2333
摘要： A spectral analysis module, including a wavemeter, for a high repetition rate gas discharge laser having a laser output beam comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a primary beam-splitter in the path of the laser output laser of the gas discharge laser operative to pass the vast majority of the output beam and to reflect a first small portion of the output beam, the primary beam splitter oriented at an angle to sufficiently reduce the fluence on the primary beam-splitter, and creating overlapping fresnel reflections in the first small portion of the laser output beam; a secondary beam splitter made from a material having a damage threshold sufficiently high to tolerate the fluence created by the overlapping portion of the fresnel reflections in the first small portion of the output laser beam, the secondary beam splitter reflecting the vast majority of the first small portion of the output laser beam and passing a second small portion of the output laser beam; a telescoping optic in the path of the second small portion of the output beam operative to demagnify the second small portion of the output beam onto a first stage diffuser receiving the demagnified second small portion of the output laser beam, the demagnification selected to keep the fluence in the overlapping fresnel reflections in the second small portion of the output laser beam below the damage threshold of the first stage diffuser. The telescoping optic may demagnify a long axis of the second small portion of the output laser beam more than a short axis of the second small portion of the output laser beam, redistributing the fluence of the second small portion of the laser output beam across the first stage diffuser to keep any portion of the first stage diffuser from exceeding the damage threshold for the material from which the first stage diffuser is made. The vast majority of the first small portion of the laser output beam may be reflected into a power detection module. A second stage diffuser may creating a narrow cone of a focused second small portion of the laser output beam before the beam enters an interferometer.

4. 发明授权

US08982922B2 Very high power laser chamber optical improvements 有权
标题翻译：超大功率激光腔的光学改进
公开(公告)号：US08982922B2
公开(公告)日：2015-03-17
申请号：US13588170
申请日：2012-08-17
申请人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
发明人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
IPC分类号： H01S3/08 , G02B5/04 , G02B5/12 , H01S3/034 , H01S3/00 , H01S3/081 , H01S3/225
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

5. 发明申请

US20050100072A1 High power laser output beam energy density reduction 审中-公开
标题翻译：大功率激光输出光束能量密度降低
公开(公告)号：US20050100072A1
公开(公告)日：2005-05-12
申请号：US10925746
申请日：2004-08-24
申请人： Rajasekhar Rao , Weiman Zhang , James Howey , Gamaralalage Padmabandu , Paolo Zambon , Richard Sandstrom
发明人： Rajasekhar Rao , Weiman Zhang , James Howey , Gamaralalage Padmabandu , Paolo Zambon , Richard Sandstrom
IPC分类号： H01S3/22
CPC分类号： G03F7/70183 , G02B27/0927 , G03F7/70025
摘要： A high power gas discharge laser for and method of producing laser output light pulses of high energy density is disclosed which may comprise a laser output light pulse beam optical track having a plurality of modular components arranged in order from a laser light source to a laser system output port and defining a laser output light pulse beam path having a single centerline axis; a first optical module and a second optical module in series in the optical track; a flexible interface element intermediate the first and the second optical module and rigidly attached to each of the first and second optical modules; and an optical element having a fixed position in the output laser pulse beam path comprising a rigid attachment to the first optical module, and extending within the flexible interface element. The optical element may comprise a beam expander, which may comprise a lensed beam expander. The optical element may comprise at least a part of a telescoping lens set forming an optical beam expander and the at least a part of a telescoping lens set comprises the entire telescoping lens set forming the optical beam expander or the at least a part of a telescoping lens set may comprise a first part of the beam expander cooperating with at least a second part located in a subsequent optical module in the laser output pulse beam optical track along the same optical centerline axis. A plurality of aligning mechanisms may align the optical element to a first and a second axis of the laser output pulse beam, the first and second axes being generally orthogonal to each other and orthogonal to the optical centerline axis, and also along the optical centerline axis. The beam expander may incorporate as one optic the output coupler optic and may have a moveable lens to enable a range of magnifications.
摘要翻译：公开了一种用于产生高能量密度的激光输出光脉冲的高功率气体放电激光器及其制造方法，其可以包括激光输出光脉冲光束光学轨道，其具有从激光光源到激光系统的顺序排列的多个模块化部件输出端口并且限定具有单个中心线轴线的激光输出光脉冲光束路径; 在光轨中串联的第一光模块和第二光模块; 柔性接口元件，其位于第一和第二光学模块之间，并刚性地附接到第一和第二光学模块中的每一个; 以及在所述输出激光脉冲光束路径中具有固定位置的光学元件，包括与所述第一光学模块的刚性附件，并且在所述柔性接口元件内延伸。光学元件可以包括光束扩展器，其可以包括透镜光束扩展器。光学元件可以包括形成光束扩展器的伸缩透镜组的至少一部分，并且伸缩透镜组的至少一部分包括形成光束扩展器的整个伸缩透镜组或伸缩透镜组的至少一部分透镜组可以包括光束扩展器的第一部分，其与位于激光输出脉冲光束光轨中的后续光学模块中的至少第二部分沿着相同的光学中心线轴协作。多个对准机构可将光学元件对准激光输出脉冲光束的第一和第二轴线，第一和第二轴线基本上彼此正交并且与光学中心线轴线正交，并且还沿着光学中心线轴线。光束扩展器可以并入作为输出耦合器光学器件的一个光学元件，并且可以具有可移动透镜以实现一定范围的放大率。

6. 发明申请

US20050068542A1 OPTICAL MOUNTINGS FOR GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE 有权
标题翻译：用于气体放电的光学安装激光光谱分析模块
公开(公告)号：US20050068542A1
公开(公告)日：2005-03-31
申请号：US10676224
申请日：2003-09-30
申请人： James Howey , Rajasekhar Rao
发明人： James Howey , Rajasekhar Rao
IPC分类号： G01B9/02 , G01J11/00 , G02B7/02 , G02B7/182 , H01S3/13
CPC分类号： G02B7/1825 , G01J11/00 , G02B7/021
摘要： A wavemeter for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise an adjustable optic mounting containing an optic element having an assigned vertical optical plane in the wavemeter optical layout and comprising: a mounting dowel pin positioned on a platform holding the components of the wavemeter; a dowel receiving opening on the adjustable mirror mounting a tangent to which is in the assigned vertical optical plane. The adjustable optic mounting may contain a tilt mechanism incorporated into the adjustable optic mounting enabling tilting the optic element about an axis in a plane parallel to a platform holding components of the wavemeter. The mounting may also have an optic receiving recess indexed to the size of the optic element. The optic element may be retained by at least one spring clip and may be a flat rectangular mirror or a circular optic, e.g., a mirror or a lens. The mounting may also have an optic mounting frame containing an optical element; a slit assembly containing a microslit adapted to selectively pass a slit of the optical output of the optical diffusion element to a succeeding optical element, moveably mounted to the optic mounting frame; a microslit position adjustment mechanism moving the slit assembly from a retracted position exposing the optic diffusion element for purposes of alignment to a down position with the slit aligned and moving the microslit into alignment.
摘要翻译：一种用于具有输出激光束的高重复率气体放电激光器的波长计，其包括脉冲输出大于或等于15mJ /脉冲，亚纳米带宽调谐范围脉冲具有飞行器带宽精度和数十个飞行器带宽精度范围，用于以4000Hz及以上的脉冲重复频率在脉冲到脉冲基础上测量带宽，其可以包括可调光学安装件，其包含在波长计光学布局中具有指定的垂直光学平面的光学元件，并且包括：安装销钉位于保持波长计的组件的平台上; 可调节镜上的定位销接收开口安装在指定的垂直光学平面中的切线。可调节光学安装件可以包含结合到可调节光学安装件中的倾斜机构，使得可以在平行于保持波长计的部件的平台的平面中绕轴线倾斜光学元件。安装件还可以具有与光学元件的尺寸分度的光学接收凹部。光学元件可以由至少一个弹簧夹保持，并且可以是平面矩形镜或圆形光学器件，例如镜子或透镜。安装件还可以具有包含光学元件的光学安装框架; 狭缝组件，其包含适于选择性地将光扩散元件的光输出的狭缝传递到可移动地安装到光学安装框架的后续光学元件的微型灯; 微型位置调节机构使狭缝组件从缩回位置移动，该缩回位置暴露光学扩散元件，以便对准到下部位置，同时狭缝对准并将微光线移动到对准位置。

7. 发明授权

US08284815B2 Very high power laser chamber optical improvements 有权
标题翻译：超大功率激光腔的光学改进
公开(公告)号：US08284815B2
公开(公告)日：2012-10-09
申请号：US12577077
申请日：2009-10-09
申请人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
发明人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
IPC分类号： H01S3/08 , G02B5/04
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

8. 发明申请

US20100098120A1 VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 有权
标题翻译：非常大的功率激光室光学改进
公开(公告)号：US20100098120A1
公开(公告)日：2010-04-22
申请号：US12577077
申请日：2009-10-09
申请人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
发明人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
IPC分类号： H01S3/00 , H01S3/083 , G02B5/04
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

9. 发明申请

US20050174576A1 Gas discharge MOPA laser spectral analysis module 有权
公开(公告)号：US20050174576A1
公开(公告)日：2005-08-11
申请号：US11075973
申请日：2005-03-08
申请人： Rajasekhar Rao , John Melchior , Holger Glatzel
发明人： Rajasekhar Rao , John Melchior , Holger Glatzel
IPC分类号： G01B9/02 , G01J1/42 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G01J1/4257 , G01J1/429 , G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/024 , G01J3/027 , G01J3/26 , G01J9/02 , G01J9/0246 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

10. 发明申请

US20120307858A1 VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 审中-公开
标题翻译：非常大的功率激光室光学改进
公开(公告)号：US20120307858A1
公开(公告)日：2012-12-06
申请号：US13588170
申请日：2012-08-17
申请人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
发明人： Hong Ye , Alex Ershov , Rajasekhar Rao , Daniel Brown , Slava Rokitski , Rong (Lauren) Liu , Ray Cybulski , James J. Ferrell , Robert Bergstedt , John Viatella , Thomas Duffey
IPC分类号： H01S3/083 , G02B5/04
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

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