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1. 发明申请

US20100028697A1 METHOD OF COATING METAL STRIPS 审中-公开
标题翻译：涂层金属条的方法
公开(公告)号：US20100028697A1
公开(公告)日：2010-02-04
申请号：US12520999
申请日：2007-09-13
申请人： Rene Koschabek , Martin Bartmann , Thorsten Brand , Andreas Schubert
发明人： Rene Koschabek , Martin Bartmann , Thorsten Brand , Andreas Schubert
IPC分类号： B32B15/09 , C08G63/00 , C08G63/12 , C08G63/181 , C08G63/183 , C08G63/199 , C08L67/00 , B05D3/02
CPC分类号： C09D175/06 , B05D3/0254 , B05D7/14 , B05D2252/02 , C08G18/423 , C08L61/28 , C09D5/08 , C09D167/00 , Y10T428/31681 , C08L2666/16
摘要： The present invention relates to the use of branched, amorphous, polyester-based macropolyols for coating metal strips, to methods of coating metal strips and to the coated metal strips thus obtained. The coating comprises branched polyesters having trifunctional branching agent contents of between 10 and 25 mol %, based on the alcohol component, and the molecular weight of the polyester is between 2500 and 4500 g/mol.
摘要翻译：本发明涉及用于涂覆金属条的支化，无定形，聚酯基大分子多酚，涂覆金属条的方法以及如此获得的涂覆金属带的方法。涂层包含基于醇组分，具有10-25mol％三官能支化剂含量的支链聚酯，聚酯的分子量为2500-445g / mol。

2. 发明申请

US20120027602A1 HUB ASSEMBLY FOR USE WITH A WIND TURBINE AND METHOD OF MAKING THE SAME 有权
标题翻译： HUB装配与风力涡轮机一起使用及其制造方法
公开(公告)号：US20120027602A1
公开(公告)日：2012-02-02
申请号：US13168307
申请日：2011-06-24
申请人： Andreas Schubert
发明人： Andreas Schubert
IPC分类号： F03D11/04
CPC分类号： F03D1/0691 , Y02E10/721 , Y02P70/523
摘要： A hub assembly for use with a wind turbine is provided. The hub assembly includes a body formed from a first material, a bearing seat formed integrally with the body, and a support assembly positioned within an opening defined by the bearing seat and at least partially coupled to the body. The support assembly includes an insert formed from a second material different than the first material.
摘要翻译：提供了一种与风力涡轮机一起使用的轮毂组件。轮毂组件包括由第一材料形成的主体，与主体一体形成的轴承座，以及定位在由轴承座限定的并且至少部分联接到主体的开口内的支撑组件。支撑组件包括由不同于第一材料的第二材料形成的插入件。

3. 发明申请

US20080197295A1 Device And Method For Producing Resist Profiled Elements 失效
标题翻译：用于生产抗蚀剂成型元件的装置和方法
公开(公告)号：US20080197295A1
公开(公告)日：2008-08-21
申请号：US10599659
申请日：2005-03-30
申请人： Wittich Kaule , Rainer Plontke , Ines Stollberg , Andreas Schubert , Marius Dichtl
发明人： Wittich Kaule , Rainer Plontke , Ines Stollberg , Andreas Schubert , Marius Dichtl
IPC分类号： G21K5/04 , G03F7/00
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G03F7/0005 , G03F7/0017 , G11B7/007 , H01J37/3174
摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
摘要翻译：本发明涉及一种用于制造抗蚀剂成型元件的装置和方法。根据本发明，使用电子束光刻系统来产生电子束，所述光束的轴线基本上垂直于要在其中产生抗蚀剂成型元件的抗蚀剂层。可以以电子表面剂量的方式调整电子束，使得由于电子束的照射可以产生非正交抗蚀剂成型元件。

4. 发明授权

US4217743A Apparatus for processing developed photographic films and prints 失效
标题翻译：用于处理显影照相胶片和印刷品的装置
公开(公告)号：US4217743A
公开(公告)日：1980-08-19
申请号：US912056
申请日：1978-06-02
申请人： Eberhard Escales , August Hell , Andreas Schubert , Klaus Weber
发明人： Eberhard Escales , August Hell , Andreas Schubert , Klaus Weber
IPC分类号： G03B27/46 , G03B27/32 , G03D15/00 , G03D15/04 , G03D15/10 , B65B57/14 , B65B61/06
CPC分类号： G03D15/10 , G03D15/005
摘要： Assemblies of collated film sections and related prints, each belonging to a customer, are fed seriatim into a tray at the right-hand side of a horizontal table in front of a seated attendant so that the attendant can remove an assembly with the right hand while the left-hand opens the corresponding customer pocket which is held in a position of readiness at the left-hand side of the table. The attendant can observe the collating operation by inspecting successive film frames while the frames move above an illuminated window below and in front of the web of photographic paper with exposed and developed prints thereon. The pockets are removed seriatim from a magazine and are transported to the left-hand side of the table where the rear panel of an oncoming pocket is held by suction to facilitate the task of opening the pocket by pulling the front panel away from the rear panel.
摘要翻译：每个属于客户的整理胶片部分和相关印刷品的组件被顺序地送入位于坐着的服务员前面的水平桌的右侧的托盘中，使得服务员可以用右手移除组件左侧打开相应的客户口袋，该客户口袋保持在桌子左侧的准备就绪位置。服务员可以通过检查连续的胶片框架来观察整理操作，同时框架在其上具有曝光和显影印刷的相纸的下方和前面的照明窗口上方移动。口袋从杂志中被排列并被传送到桌子的左侧，其中迎面而来的口袋的后面板通过抽吸来保持，以便于通过将前面板拉离后面板来打开口袋的任务。

5. 发明授权

US08928301B2 Pulse width modulation based controller 有权
标题翻译：基于脉宽调制的控制器
公开(公告)号：US08928301B2
公开(公告)日：2015-01-06
申请号：US13495696
申请日：2012-06-13
申请人： Andreas Schubert
发明人： Andreas Schubert
IPC分类号： H02M3/157
CPC分类号： H02M3/157 , H03K7/08
摘要： A control circuit adjusts the duty cycle of a PWM control signal. An analog processing component within the control circuit receives an analog feedback input signal and compares it to an analog reference signal to generate a pre-processed signal. A sigma-delta modulator within the analog processing component generates a quantized signal based on the pre-processed signal. A digital processing component stores a value. The controller then adjusts the duty cycle of the PWM signal to correspond to the value. A clock keeps the system synchronized.
摘要翻译：控制电路调节PWM控制信号的占空比。控制电路内的模拟处理部件接收模拟反馈输入信号并将其与模拟参考信号进行比较以产生预处理的信号。模拟处理组件内的Σ-Δ调制器基于预处理信号生成量化信号。数字处理组件存储值。然后，控制器调整PWM信号的占空比以对应于该值。时钟保持系统同步。

6. 发明授权

US08279402B2 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same 有权
标题翻译：用于具有疏水性涂层的浸没式光刻的光学布置，以及包括其的投影曝光设备
公开(公告)号：US08279402B2
公开(公告)日：2012-10-02
申请号：US12403132
申请日：2009-03-12
申请人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
发明人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
IPC分类号： G03F7/207
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706
摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
摘要翻译：一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

7. 发明授权

US07880152B2 Device and method for producing resist profiled elements 失效
标题翻译：用于制造抗蚀剂型材的装置和方法
公开(公告)号：US07880152B2
公开(公告)日：2011-02-01
申请号：US10599659
申请日：2005-03-30
申请人： Wittich Kaule , Rainer Plontke , Ines Stolberg , Andreas Schubert , Marius Dichtl
发明人： Wittich Kaule , Rainer Plontke , Ines Stolberg , Andreas Schubert , Marius Dichtl
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G03F7/0005 , G03F7/0017 , G11B7/007 , H01J37/3174
摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
摘要翻译：本发明涉及一种用于制造抗蚀剂成型元件的装置和方法。根据本发明，使用电子束光刻系统来产生电子束，所述光束的轴线基本上垂直于要在其中产生抗蚀剂成型元件的抗蚀剂层。可以以电子表面剂量的方式调整电子束，使得由于电子束的照射可以产生非正交抗蚀剂成型元件。

8. 发明授权

US07332730B2 Device and method for imaging a multiple particle beam on a substrate 有权
标题翻译：在基板上成像多个粒子束的装置和方法
公开(公告)号：US07332730B2
公开(公告)日：2008-02-19
申请号：US11270073
申请日：2005-11-09
申请人： Joachim Heinitz , Andreas Schubert
发明人： Joachim Heinitz , Andreas Schubert
IPC分类号： G01N23/00 , G01J1/00 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G01N23/04
摘要： A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system. The laser path measurement system relays positional data with a fixed clock rate to a synchronization and control device 50 that positions the beam base point along the x-coordinate and the y-coordinate via a beam tracking system, taking into account the corrective data and pixel phase, whereby precise staircase beam-to-table positioning is achieved across the entire substrate in spite of faulty table movement.
摘要翻译：公开了一种用于在基板上成像和定位多粒子束的装置和方法。该装置包括具有聚光透镜的粒子束源，其产生照射孔板的表面的粒子束。通过孔板从颗粒束产生多个单独的光束，然后孔径板由投影系统投射到基板上，在基板上描述光束基点。分别将基板或靶放置在可沿x坐标和y坐标移动的台上，并且设置有激光路径测量系统。激光路径测量系统以固定的时钟速率将位置数据中继到同步和控制设备50，同步和控制设备50通过光束跟踪系统沿着x坐标和y坐标定位光束基点，同时考虑校正数据和像素相位，从而在整个基板上实现了精确的楼梯光束对台定位，尽管表移动有故障。

9. 发明授权

US06774375B2 Method and apparatus for forming a curved polyline on a radiation-sensitive resist 失效
标题翻译：用于在辐射敏感抗蚀剂上形成弯曲折线的方法和装置
公开(公告)号：US06774375B2
公开(公告)日：2004-08-10
申请号：US09797861
申请日：2001-03-05
申请人： Rainer Plontke , Andreas Schubert , Michael Blume , Ines Stolberg
发明人： Rainer Plontke , Andreas Schubert , Michael Blume , Ines Stolberg
IPC分类号： B23K1500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/30455 , H01J2237/31761
摘要： In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.
摘要翻译：在用电子束（6）形成涂覆有辐射敏感抗蚀剂的衬底（4）上的折线的方法中，电子束（6）被引导到衬底（4）的表面上，在Z坐标的方向上，并且基板（4）在XY平面中相对于电子束（6）在各个步骤中移位。在位移的每个单独步骤之后，电子束（6）在位移运动停止期间以预定的能量输入作用在基板（4）上。根据从以前的几个步骤确定的折线的形状确定每个单独步骤的能量输入。还描述了使用电子束光刻技术的相应装置，可以形成具有非常均匀线宽的折线。该方法和装置特别适用于书写弯曲折线。

10. 发明授权

US07843252B2 Circuit with a regulated charge pump 有权
标题翻译：具有调节电荷泵的电路
公开(公告)号：US07843252B2
公开(公告)日：2010-11-30
申请号：US12490062
申请日：2009-06-23
申请人： Andreas Schubert
发明人： Andreas Schubert
IPC分类号： G05F1/10
CPC分类号： H02M3/07
摘要： A circuit, method for regulation, and use thereof is provided, whereby the circuit can include a charge pump that is connected to a supply voltage terminal in order to produce a pump voltage from a supply voltage, and includes a control circuit whose inputs are connected to the output of the charge pump and to the supply voltage terminal in order to sense a difference between the pump voltage and the supply voltage as a controlled variable. The circuit is designed to compare the controlled variable to a reference variable, and output is connected to a control input of the charge pump in order to control the charge pump as a function of the comparison.
摘要翻译：提供了一种电路，调节方法和使用方法，由此该电路可以包括一个电荷泵，该电荷泵连接到电源电压端子以便从电源电压产生一个泵电压，并且包括一个控制电路，其输入被连接到电荷泵的输出和电源电压端子，以便感测作为受控变量的泵电压和电源电压之间的差。该电路被设计为将受控变量与参考变量进行比较，并且输出连接到电荷泵的控制输入，以便根据比较来控制电荷泵。

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