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1. 发明授权

US08663906B2 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same 失效
标题翻译：用于精细图案形成的含硅组合物及使用其的精细图案形成方法
公开(公告)号：US08663906B2
公开(公告)日：2014-03-04
申请号：US12733451
申请日：2008-09-12
申请人： Ralph R Dammel , Wen-Bing Kang , Yasuo Shimizu , Tomonori Ishikawa
发明人： Ralph R Dammel , Wen-Bing Kang , Yasuo Shimizu , Tomonori Ishikawa
IPC分类号： G03F7/20 , G03F7/30 , G03F7/40
CPC分类号： H01L21/0273 , G03F7/0757 , G03F7/405
摘要： The present invention provides a composition for forming a fine pattern with high dry etching resistance and a method for forming the fine pattern. The composition for fine pattern formation containing: a resin containing a repeating unit having a silazane bond; and a solvent as well as a method for fine pattern formation using the same.
摘要翻译：本发明提供了一种用于形成具有高耐干蚀刻性的精细图案的组合物和形成精细图案的方法。精细图案形成用组合物，含有含有具有硅氮烷键的重复单元的树脂; 和溶剂以及使用其形成精细图案的方法。

2. 发明申请

US20100255430A1 SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHOD FOR FINE PATTERN FORMATION USING THE SAME 失效
标题翻译：用于精细图案形成的含硅组合物及其使用的精细图案形成方法
公开(公告)号：US20100255430A1
公开(公告)日：2010-10-07
申请号：US12733451
申请日：2008-09-12
申请人： Ralph R. Dammel , Wen-Bing Kang , Yasuo Shimizu , Tomonori Ishikawa
发明人： Ralph R. Dammel , Wen-Bing Kang , Yasuo Shimizu , Tomonori Ishikawa
IPC分类号： G03F7/20 , C08L83/00
CPC分类号： H01L21/0273 , G03F7/0757 , G03F7/405
摘要： The present invention provides a composition for forming a fine pattern with high dry etching resistance and a method for forming the fine pattern. The composition for fine pattern formation containing: a resin containing a repeating unit having a silazane bond; and a solvent as well as a method for fine pattern formation using the same.
摘要翻译：本发明提供了一种用于形成具有高耐干蚀刻性的精细图案的组合物和形成精细图案的方法。精细图案形成用组合物，含有含有具有硅氮烷键的重复单元的树脂; 和溶剂以及使用其形成精细图案的方法。

3. 发明授权

US06361917B1 Process for patterning poly(arylenevinylene) polymer films by irradiation with light 失效
标题翻译：通过光照射图案化聚（亚芳基亚乙烯基）聚合物膜的方法
公开(公告)号：US06361917B1
公开(公告)日：2002-03-26
申请号：US08681117
申请日：1996-07-22
申请人： Wen-Bing Kang , Nu Yu , Akihiko Tokida
发明人： Wen-Bing Kang , Nu Yu , Akihiko Tokida
IPC分类号： G03C516
CPC分类号： H01L51/0038 , C08G61/00 , C09K11/06 , H01L51/5012 , H01L51/56 , H05B33/14
摘要： A process for forming a pattern which comprises irradiating with light a film of a poly(arylenevinylene) polymer represented by the following formula (I) —(Ar—CR1=CR2)n— (I) wherein Ar is a substituted or unsubstituted divalent aromatic hydrocarbon group or a substituted or unsubstituted divalent heterocyclic ring group, and the aromatic hydrocarbon group and the heterocyclic ring group may be a fused ring, R1, R2 independently of each other, are H, CN, alkyl, alkoxy are substituted or unsubstituted aromatic hydrocarbon groups or substituted or unsubstituted aromatic heterocycles, which may both be fused rings, and n is an integer of 2 or more. It is preferred that either R1 or R2 is H and more preferred that both R1 and R2 are H.
摘要翻译：一种形成图案的方法，其包括用光照射由下式（I）表示的聚（亚芳基亚乙烯基）聚合物的膜，其中Ar是取代或未取代的二价芳族烃基或取代或未取代的二价杂环基，以及芳香族烃基和杂环基可以是稠环，R 1，R 2彼此独立地是H，CN，烷基，烷氧基是取代或未取代的芳族烃基或取代或未取代的芳族杂环，其可以稠合环，n为2以上的整数。 R1或R2优选为H，更优选R1和R2均为H.

4. 发明申请

US20100119717A1 WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME 审中-公开
标题翻译：用于形成微波炉的水溶性树脂组合物及其形成微波炉的方法
公开(公告)号：US20100119717A1
公开(公告)日：2010-05-13
申请号：US12451150
申请日：2008-05-01
申请人： Sung-Eun Hong , Yusuke Takano , Wen-Bing Kang
发明人： Sung-Eun Hong , Yusuke Takano , Wen-Bing Kang
IPC分类号： B05D3/00 , C08K5/17
CPC分类号： H01L21/0271 , G03F7/40 , H01L21/3085 , H01L21/3086 , H01L21/3088
摘要： A process which comprises applying a water-soluble resin composition comprising a water-soluble vinyl resin, a compound having at least two amino groups in the molecule, a solvent, and, if necessary, an additive such as a surfactant on a resist pattern (2) formed on a substrate (1) to form a water-soluble resin film (3) , modifying part of the water-soluble resin film adjacent to the resist pattern through mixing to form a water-insolubilized layer (4) which cannot be removed by water washing on the surface of the resist pattern, and removing unmodified part of the water-soluble resin film by water washing and which enables the effective scale-down of separation size and hole opening size of a resist pattern to a level finer than the limit of resolution of the wave length of exposure. It is preferable to use as the water-soluble vinyl resin a homopolymer of a nitrogen-containing vinyl monomer such as acrylamine, vinylpyrrolidone or vinylimidazole, a copolymer of two or more nitrogen-containing vinyl monomers, or a copolymer of at least one nitrogen-containing vinyl monomer and at least one nitrogen-free vinyl monomer.
摘要翻译：一种方法，其包括将包含水溶性乙烯基树脂的水溶性树脂组合物，分子中具有至少两个氨基的化合物，溶剂和必要时在抗蚀图案上添加表面活性剂等添加剂 2）形成在基板（1）上以形成水溶性树脂膜（3），通过混合将与抗蚀剂图案相邻的水溶性树脂膜的一部分进行改性以形成不可溶的水不溶层（4）通过在抗蚀剂图案的表面上进行水洗除去，并且通过水洗除去未改性的水溶性树脂膜的部分，并且能够将抗蚀剂图案的分离尺寸和开孔尺寸有效地缩小到比曝光波长分辨率的极限。作为水溶性乙烯基树脂，优选使用丙烯酰胺，乙烯基吡咯烷酮或乙烯基咪唑等含氮乙烯基单体的均聚物，两种以上含氮乙烯基单体的共聚物，或至少一种含氮乙烯基单体的共聚物，含有乙烯基单体和至少一种无氮乙烯基单体。

5. 发明授权

US5844249A Apparatus for detecting defects of wires on a wiring board wherein optical sensor includes a film of polymer non-linear optical material 失效
标题翻译：用于检测布线板上的导线缺陷的装置，其中光学传感器包括聚合物非线性光学材料的薄膜
公开(公告)号：US5844249A
公开(公告)日：1998-12-01
申请号：US779571
申请日：1997-01-07
申请人： Yusuke Takano , Shizuo Ogura , Tsunetoshi Sugiyama , Wen-Bing Kang
发明人： Yusuke Takano , Shizuo Ogura , Tsunetoshi Sugiyama , Wen-Bing Kang
IPC分类号： G01N21/956 , G01R31/309 , G01N21/86
CPC分类号： G01N21/956 , G01R31/309
摘要： A detecting apparatus capable of supporting even narrow wire widths and of detecting defects of wires in a non-contact manner is provided. The detecting apparatus comprises an optical sensor, a sensor head, and a signal processing unit. The optical sensor comprises a transparent substrate, a transparent electrode disposed on the transparent substrate, a thin film of a polymer non-linear optical material disposed on the transparent electrode, and a reflective film disposed on the thin film, and is positioned in close approximation to and without contacting an electrode to be measured on the wiring board. The sensor head comprises a light source, optical means for guiding light from the light source into the optical sensor, and detecting means for detecting reflected light from the optical sensor. The detecting means supplies the signal processing unit with a signal corresponding to the intensity of the reflected light when the electrode on the wiring board is applied with a voltage.
摘要翻译：提供能够以非接触方式支持甚至窄线宽度和检测线的缺陷的检测装置。检测装置包括光学传感器，传感器头和信号处理单元。光学传感器包括透明基板，设置在透明基板上的透明电极，设置在透明电极上的聚合物非线性光学材料的薄膜和设置在薄膜上的反射膜，并且近似定位在接线板上接触和不接触要测量的电极。传感器头包括光源，用于将来自光源的光引导到光学传感器中的光学装置，以及用于检测来自光学传感器的反射光的检测装置。当施加电压时，检测装置向信号处理单元提供与反射光的强度对应的信号。

6. 发明授权

US06939661B2 Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom 有权
标题翻译：封闭的含异氰酸酯化合物的组合物，用于形成辐射吸收涂层和由其形成的抗反射涂层
公开(公告)号：US06939661B2
公开(公告)日：2005-09-06
申请号：US10232081
申请日：2002-08-30
申请人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
IPC分类号： C08G18/80 , C09D175/04 , G03F7/09 , G03F7/004
CPC分类号： C08G18/80 , C09D175/04 , G02B1/111 , G03F7/091 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/151
摘要： A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition applied to a substrate and then baked, crosslinking proceeds to give an antireflective coating, which does not intermix with a resist layer to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed.
摘要翻译：一种用于形成辐射吸收涂层的组合物，其包含溶解在其中的有机溶剂，辐射吸收聚合物或辐射吸收材料以及具有封闭的异氰酸酯基团的交联剂。由于交联剂的异氰酸酯基团已经被阻断，所以含有交联剂的组合物具有优异的储存稳定性。当将组合物施加到基底上然后烘烤时，进行交联以得到抗反射涂层，其不与通过涂覆在其上形成的抗蚀剂层混合，并且其中没有光抗蚀剂层中的光产生的酸的扩散。结果，可以形成没有基脚或浮渣的抗蚀剂图像。

7. 发明授权

US5919579A Organic electroluminescent device 失效
标题翻译：有机电致发光器件
公开(公告)号：US5919579A
公开(公告)日：1999-07-06
申请号：US776078
申请日：1997-01-17
申请人： Wen-Bing Kang , Nu Yu , Akihiko Tokida , Thomas Potrawa , Andreas Winterfeldt
发明人： Wen-Bing Kang , Nu Yu , Akihiko Tokida , Thomas Potrawa , Andreas Winterfeldt
IPC分类号： C07D471/16 , C09K11/06 , H01L33/26 , H01L33/42 , H01L51/50 , H05B33/12 , H05B33/14 , H05B33/26 , H05B33/00
CPC分类号： C07D471/16 , C09K11/06 , H05B33/14 , Y10S428/917
摘要： An organic electroluminescent device comprising an anode, an organic hole transport layer, an organic emission layer and a cathode layered in this order on a substrate, or, optionally, comprising an additional electron transport layer between the organic emission layer and the cathode, wherein the organic emission layer comprises a naphthalimide derivative represented by formula (1) wherein R.sup.1 is a hydrogen atom, a straight chain or branched chain alkyl group having from 1 to 16 carbon atoms, an aryl group which may have substituents or an aralkyl group which may have substituents, and R.sup.2, R.sup.3, R.sup.4 are special substituents. ##STR1##
摘要翻译： PCT No.PCT / EP95 / 03128 Sec。 371日期1997年1月17日 102（e）日期1997年1月17日PCT提交1995年8月7日PCT公布。出版物WO96 / 05267 日期1996年2月22日在包括阳极，有机空穴传输层，有机发射层和阴极的基板上依次层叠的有机电致发光器件，或者可选地，在有机发光层和阴极，其中有机发射层包含由式（1）表示的萘二甲酰亚胺衍生物，其中R 1是氢原子，具有1至16个碳原子的直链或支链烷基，可以具有取代基的芳基或可以具有取代基的芳烷基，R2，R3，R4是特殊的取代基。

8. 发明授权

US06803168B1 Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition 有权
标题翻译：用于组合物中的抗反射涂层或辐射吸收涂层和化合物的组合物
公开(公告)号：US06803168B1
公开(公告)日：2004-10-12
申请号：US09237125
申请日：1999-01-26
申请人： Munirathna Padmanaban , Wen-Bing Kang , Hatsuyuki Tanaka , Ken Kimura , Georg Pawlowski
发明人： Munirathna Padmanaban , Wen-Bing Kang , Hatsuyuki Tanaka , Ken Kimura , Georg Pawlowski
IPC分类号： G03F7004
CPC分类号： G03F7/091 , C08F220/34 , C08G18/2825 , C08G18/2865 , C08G18/728 , C08G18/8116 , C09D4/00 , C09D5/32 , G03F7/0045
摘要： A composition for an anti-reflective coating or a radiation absorbing coating which can form an anti-reflective coating or a radiation absorbing coating having high absorption to exposed radiation in the range of 100 to 450 nm, no diffusion of photo-generated acid to anti-reflective coating and so on, no intermixing of resist and anti-reflective coating layer, good shelf-life stability, and good step coverage and novel compounds and polymers being preferably used in the composition are disclosed. The composition contains an acrylic or methacrylic compound or polymer with an isocyanate or thioisocyanate group bonded through an alkylene group to a side chain thereof or with an amino or hydroxyl group-containing organic chromophore which absorbs radiation in the range of 100 to 450 nm wavelength and is bonded, for example, through an alkylene group to the isocyanate or thioisocyanate group. Resist patters with high resolution are formed on a substrate. A composition for an anti-reflective coating or a radiation absorbing coating are applied on the substrate and baked to form an anti-reflective coating or a radiation absorbing coating layer. Then, a chemically amplified resist is coated thereon and after patternwize exposure, developed. During baking of the anti-reflective coating or radiation absorbing coating, hardening or curing of the coating takes place by the presence of the isocyanate or thioisocyanate group. On the other hand, the exposed radiation having wavelength in the range of 100 to 450 nm is absorbed by organic chromophore.
摘要翻译：用于抗反射涂层或辐射吸收涂层的组合物，其可以形成对100至450nm范围内的暴露辐射具有高吸收的抗反射涂层或辐射吸收涂层，而不会将光产生的酸扩散到抗反射涂层等，公开了抗蚀剂和抗反射涂层的互相混合，良好的保质期稳定性和良好的阶梯覆盖率，并且组合物中优选使用的新型化合物和聚合物。该组合物含有丙烯酸或甲基丙烯酸类化合物或具有通过亚烷基键合到其侧链上的异氰酸酯或硫代异氰酸酯基团或与吸收在波长为100至450nm范围内的辐射的含氨基或羟基的有机发色团的聚合物，以及例如通过亚烷基键合到异氰酸酯或硫代异氰酸酯基团。在基板上形成具有高分辨率的抗蚀剂图案。将用于抗反射涂层或辐射吸收涂层的组合物施加在基材上并烘烤以形成抗反射涂层或辐射吸收涂层。然后，将化学放大抗蚀剂涂覆在其上，并经过图案化曝光后显影。在防反射涂层或辐射吸收涂层的烘烤期间，涂层的硬化或固化通过异氰酸酯或硫代异氰酸酯基团的存在进行。另一方面，波长在100〜450nm的曝光的辐射被有机发色团吸收。

9. 发明授权

US06465148B1 Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom 有权
标题翻译：含有由其形成的封端异氰酸酯化合物和抗反射膜的吸光膜形成用组合物
公开(公告)号：US06465148B1
公开(公告)日：2002-10-15
申请号：US09486843
申请日：2000-05-23
申请人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
IPC分类号： G03C173
CPC分类号： C08G18/80 , C09D175/04 , G02B1/111 , G03F7/091 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/151
摘要： A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition applied to a substrate and then baked, crosslinking proceeds to give an antireflective coating, which does not intermix with a resist layer to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed.
摘要翻译：一种用于形成辐射吸收涂层的组合物，其包含溶解在其中的有机溶剂，辐射吸收聚合物或辐射吸收材料以及具有封闭的异氰酸酯基团的交联剂。由于交联剂的异氰酸酯基团已经被阻断，所以含有交联剂的组合物具有优异的储存稳定性。当将组合物施加到基底上然后烘烤时，进行交联以得到抗反射涂层，其不与通过涂覆在其上形成的抗蚀剂层混合，并且其中没有光抗蚀剂层中的光产生的酸的扩散。结果，可以形成没有基脚或浮渣的抗蚀剂图像。

10. 发明授权

US06255405B1 Light-absorbing polymers and application thereof to anti-reflection film 有权
标题翻译：吸光聚合物及其应用于抗反射膜
公开(公告)号：US06255405B1
公开(公告)日：2001-07-03
申请号：US09424128
申请日：2000-03-23
申请人： Wen-Bing Kang , Yoshinori Nishiwaki , Ken Kimura , Syoko Matsuo , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Yoshinori Nishiwaki , Ken Kimura , Syoko Matsuo , Hatsuyuki Tanaka
IPC分类号： C08F12008
CPC分类号： G03F7/091 , C08F8/14 , C08F8/30 , C09D5/32 , C08F220/00
摘要： A high-performance anti-reflective coating which highly absorbs a given light, e.g., deep ultraviolet rays, tenaciously adheres to substrates upon coating formation, is satisfactory in covering, and eliminates the influence of standing waves in the production of integrated circuits; novel light-absorbing polymers for forming the anti-reflective coating; and a process for producing the polymers. One of the polymers is produced by esterifying a copolymer comprising carboxylic anhydride groups and/or dicarboxylic acid groups such as maleic acid as basic recurring units with a hydroxylated aromatic chromophore. The unreacted carboxylic acid groups or acid anhydride groups remaining in the esterified light-absorbing polymer may be amidated and/or imidized with an aminated aromatic compound. Each of these polymers is dissolved in an organic solvent comprising an alcohol, aromatic hydrocarbon, ketone, ester, or combination of these, and the solution is applied to a substrate and then baked to form an anti-reflective coating.
摘要翻译：在涂层形成时，高度吸收给定光（例如深紫外线）强力粘附于基材的高性能抗反射涂层在覆盖时是令人满意的，并且消除驻波在集成电路生产中的影响; 用于形成抗反射涂层的新型光吸收聚合物; 和聚合物的制造方法。其中一种聚合物是通过将包含羧酸酐基团和/或二羧酸基团如马来酸的共聚物作为碱性重复单元与羟基化芳族发色团酯化而制备的。残留在酯化光吸收聚合物中的未反应的羧酸基团或酸酐基团可以用胺化芳族化合物酰胺化和/或酰亚胺化。将这些聚合物中的每一种溶解在包含醇，芳族烃，酮，酯或它们的组合的有机溶剂中，并将溶液施加到基材上，然后烘焙以形成抗反射涂层。

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